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71. 发明授权

US07225588B2 Damping brace and structure 有权
标题翻译：阻尼支架和结构
公开(公告)号：US07225588B2
公开(公告)日：2007-06-05
申请号：US10883937
申请日：2004-07-02
申请人： Hiroshi Nakamura , Kazuaki Suzuki , Yasuhiro Nakata , Takashi Shirai
发明人： Hiroshi Nakamura , Kazuaki Suzuki , Yasuhiro Nakata , Takashi Shirai
IPC分类号： E04B1/98 , E04H9/02 , E04C3/34
CPC分类号： F16F7/00 , E04H9/028 , F16F2224/025 , F16F2230/16
摘要： A damping brace having an axial force member for providing bearing forces against tensile or compressive forces, a constraining member for constraining the axial force member, and a stiffening part for supplementing the stiffness of the axial force member. An adhesion preventive coating is provided for preventing adhesion between the constraining member and the stiffening part. A length of the stiffening part extending along the axial direction and the gap between the stiffening part and the constraining member are defined in such a way as to prevent an end of the axial force member from rotating in the axial direction beyond a specific angle when the compressive force is applied to the force member.
摘要翻译：一种阻尼支架，其具有用于提供抵抗拉伸或压缩力的轴承力的轴向力构件，用于约束轴向力构件的约束构件，以及用于补充轴向力构件的刚度的加强构件。为防止约束构件与加强部之间的粘合，设置防粘附层。沿着轴向方向延伸的加强部分的长度和加强部分和约束部件之间的间隙被限定为防止轴向力部件的端部在轴向上旋转超过特定角度，当对力部件施加压缩力。

72. 发明申请

US20060144006A1 Beam joint device 审中-公开
标题翻译：梁接头装置
公开(公告)号：US20060144006A1
公开(公告)日：2006-07-06
申请号：US10546108
申请日：2004-02-27
申请人： Kazuaki Suzuki , Yasushi Maeda , Yasuhiro Nakata , Hiroshi Nakamura , Toru Takeuchi
发明人： Kazuaki Suzuki , Yasushi Maeda , Yasuhiro Nakata , Hiroshi Nakamura , Toru Takeuchi
IPC分类号： E04H12/00
CPC分类号： E04B1/2403 , E04B2001/2415 , E04B2001/2442 , E04B2001/2448 , E04B2001/2454 , E04B2001/2457 , E04H9/024
摘要： A beam joining apparatus for joining a flange 2 of a beam 1 to a flange 6 mounted on a pillar 5 includes a splice plate 9 fastened to the flanges 6, 2 of the pillar 5 and the beam 1 and having a central plastic region 11, and an anti-buckling member 13 mounted independently of the splice plate 9, on the splice plate 9, for preventing the buckling of the plastic region 11.
摘要翻译：用于将梁1的凸缘2连接到安装在立柱5上的凸缘6的梁接合装置包括紧固在柱5的凸缘6和梁1上并且具有中心塑料区域11的接合板9，以及独立于接合板9安装在接合板9上的防弯曲构件13，用于防止塑性区域11的弯曲。

73. 发明申请

US20050092132A1 Method and apparatus for the production of metal powder 有权
标题翻译：用于生产金属粉末的方法和设备
公开(公告)号：US20050092132A1
公开(公告)日：2005-05-05
申请号：US10493903
申请日：2002-10-24
申请人： Yoshihiro Hirata , Yoshio Ueda , Hiroaki Takase , Kazuaki Suzuki
发明人： Yoshihiro Hirata , Yoshio Ueda , Hiroaki Takase , Kazuaki Suzuki
IPC分类号： B22F9/14 , C22B9/22
CPC分类号： B22F9/14 , B22F2999/00 , B22F2201/05
摘要： Provide a method and apparatus for producing, in an economical manner, metal powder offering high purity and comprising uniform particle shape and size. Produce metal powder of titanium metal, etc., using an apparatus that comprises a power supply for high-voltage/current discharge, a feeder of metal electrode made of titanium metal, etc., a high-voltage discharge generator equipped with a metal electrode made of titanium, etc., and its counter electrode, a water tank, a water inlet, an outlet for produced metal dispersion solution containing titanium metal, etc., a discharge pump, and an adjunct device for separating/recovering metal powder of titanium metal, etc., from the metal dispersion solution containing titanium metal, etc.
摘要翻译：提供一种以经济的方式制造提供高纯度并且包含均匀的颗粒形状和尺寸的金属粉末的方法和装置。使用包括用于高压/电流放电的电源的设备，由钛金属制成的金属电极的馈电器等来生产钛金属等的金属粉末;配备有金属电极的高压放电发生器由钛等制成，其对电极，水箱，进水口，用于生产含钛金属的金属分散液的出口等，排出泵和用于分离/回收钛金属粉末的辅助装置金属等，从含有金属分散液的钛金属等

74. 发明申请

US20050072272A1 High functional water containing titanium and method and apparatus for producing the same 有权
标题翻译：含钛高功能水及其制造方法及装置
公开(公告)号：US20050072272A1
公开(公告)日：2005-04-07
申请号：US10275681
申请日：2000-11-29
申请人： Yoshihiro Hirata , Yoshio Ueda , Hiroaki Takase , Kazuaki Suzuki
发明人： Yoshihiro Hirata , Yoshio Ueda , Hiroaki Takase , Kazuaki Suzuki
IPC分类号： A61K8/19 , A23L1/304 , A23L2/52 , A61K8/00 , A61K33/24 , A61P43/00 , A61Q19/00 , B01J3/00 , C02F1/68 , C01G23/00
CPC分类号： A61K33/24 , A23L2/52 , A23L33/16 , A23V2002/00 , C02F1/68 , A23V2250/1634
摘要： This invention provides a method and apparatus for manufacturing titanium-dissolved water with molten titanium dissolved therein, the molten titanium being titanium metal melted by the combustion gas resulting from the combustion of a mixed gas of oxygen and hydrogen in high-pressure water, as well as the resultant titanium-dissolved water and health articles, medical articles and cosmetics utilizing the physiologically activating effect of the high-function water containing titanium.
摘要翻译：本发明提供了一种用于溶解有熔融钛的钛溶解水的制造方法和装置，熔融钛是由在高压水中的氧气和氢气的混合气体的燃烧而产生的燃烧气体熔融的钛金属，以及作为所得的钛溶解水和健康用品，医疗用品和化妆品，利用含钛高功能水的生理活化作用。

75. 发明申请

US20050008585A1 Skin lotion comprising aqueous dispersion of ultra-fine titanium particles 审中-公开
标题翻译：皮肤洗剂含有超细钛颗粒的水性分散体
公开(公告)号：US20050008585A1
公开(公告)日：2005-01-13
申请号：US10494025
申请日：2002-11-01
申请人： Yoshihiro Hirata , Yoshio Ueda , Hiroaki Takase , Kazuaki Suzuki
发明人： Yoshihiro Hirata , Yoshio Ueda , Hiroaki Takase , Kazuaki Suzuki
IPC分类号： A61K8/02 , A61K8/04 , A61K8/29 , A61Q5/00 , A61Q5/02 , A61Q7/00 , A61Q19/00 , A61K7/42 , B32B27/04
CPC分类号： A61K8/044 , A61K8/02 , A61K8/29 , A61K2800/412 , A61Q5/006 , A61Q5/02 , A61Q7/00 , A61Q19/00
摘要： Use in cosmetic lotions and other applications a dispersion solution of super-fine titanium particles obtained by burning a mixture gas of oxygen and hydrogen in high-pressure water and using the combustion gas to melt titanium metal and thus causing super-fine titanium particles to micro-disperse in water, wherein such production process is implemented using an apparatus for producing a cosmetic lotion in which super-fine titanium particles are micro-dispersed that comprises a pressure-resistant container equipped with a high-pressure water tank, an injection nozzle for mixture gas of oxygen and hydrogen, a titanium metal bar, an ignition device and a combustion chamber.
摘要翻译：在化妆液和其他应用中使用通过在高压水中燃烧氧气和氢气的混合气体而获得的超细钛颗粒的分散溶液，并使用燃烧气体熔化钛金属，从而将超细钛颗粒引入微观 - 分散在水中，其中这种生产方法使用用于生产超细钛颗粒微分散的化妆品洗剂的设备来实现，其包括装备有高压水箱的耐压容器，用于氧和氢的混合气体，钛金属棒，点火装置和燃烧室。

76. 发明授权

US06756182B2 Charged-particle-beam microlithography methods exhibiting reduced coulomb effects 失效
标题翻译：显示减小的库仑效应的带电粒子束微光刻法
公开(公告)号：US06756182B2
公开(公告)日：2004-06-29
申请号：US10170040
申请日：2002-06-11
申请人： Sumito Shimizu , Kazuaki Suzuki
发明人： Sumito Shimizu , Kazuaki Suzuki
IPC分类号： G03C500
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , H01J37/3174 , H01J2237/31791 , Y10S430/143
摘要： Methods are disclosed for performing charged-particle-beam (CPB, e.g., electron-beam) microlithography with reduced Coulomb effects being manifest in pattern images as formed on the surface of a sensitive substrate. The pattern is defined on a segmented reticle, which can be a scattering-stencil reticle or scattering-membrane reticle. In an embodiment, the beam current actually reaching the substrate, as a proportion of beam current actually passing through the reticle, is reduced to 50% or less during exposure of the pattern. To achieve this reduction, the pattern as defined on the reticle can be normal or inverted in tone as required, and the resist on the substrate can be positive or negative in tone as required. In an example embodiment, the beam current reaching the substrate is reduced by establishing an opening ratio of 50% or less for the pattern as a whole as defined on the reticle. The opening ratio is expressed as 100[Aws/(Aws+Ahs)], wherein Ahs is a total area of the reticle occupied by both the weakly scattering reticle membrane and the highly scattering layer, and Aws is a total area of the reticle occupied by only the weakly scattering reticle membrane.
摘要翻译：公开了用于执行带电粒子束（CPB，例如电子束）微光刻的方法，其具有减少的库仑效应，表现为形成在敏感基板的表面上的图案图像。该图案被定义在分割的掩模版上，该掩模版可以是散射 - 模板掩模版或散射膜掩模版。在一个实施例中，当图案的曝光期间，通过实际通过标线的束电流的比例实际到达衬底的束电流减小到50％或更小。为了实现这种减小，如在掩模版上限定的图案可以根据需要正常或反转，并且基板上的抗蚀剂可以根据需要为正或负色调。在一个示例性实施例中，通过为分划板上定义的整体图案建立50％或更小的开口率来减小到达衬底的束电流。开口率表示为100 [Aws /（Aws + Ahs）]，其中Ahs是由弱散射掩模版膜和高度散射层所占据的掩模版的总面积，Aws是所述掩模版的总面积只有弱散射掩模版膜。

77. 发明授权

US06699639B2 Projection-exposure methods and apparatus exhibiting increased throughput 失效
标题翻译：投影曝光方法和装置显示出增加的产量
公开(公告)号：US06699639B2
公开(公告)日：2004-03-02
申请号：US10359524
申请日：2003-02-05
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： G03C500
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70425 , G03F7/70433 , G03F7/70475 , H01J37/3174 , H01J2237/31761 , H01J2237/31764 , H01J2237/31767
摘要： Projection-exposure apparatus and methods are disclosed that exhibit increased throughput by providing improved schemes by which the reticle stage and wafer stage move to accomplish exposure. Portions of a die pattern on a “pattern original” (e.g., reticle) are sequentially illuminated by an energy beam (e.g., beam of electromagnetic radiation or charged particles). The energy beam passes through the pattern portions and forms a demagnified image on a substrate through a projection-optical system. While moving the pattern original and the substrate, the entire die pattern is sequentially illuminated according to an exposure order, and the die pattern is demagnifyingly transferred to the substrate on which the images of the illuminated pattern portions are stitched together. When transferring and exposing the die pattern to multiple locations on the substrate, the exposure order is reversed after exposing each die pattern.
摘要翻译：公开了通过提供分划板台和晶片台移动以完成曝光的改进方案来展现增加的生产量的投影曝光装置和方法。 “图案原件”（例如，掩模版）上的裸片图案的部分被能量束（例如，电磁辐射束或带电粒子）依次照射。能量束通过图案部分，并通过投影光学系统在基板上形成缩小图像。在移动图案原稿和基板的同时，根据曝光顺序顺序地照射整个裸片图案，并且将裸片图案缩小地转印到其上照射图案部分的图像被缝合在一起的基板。当将模具图案转印并暴露于基板上的多个位置时，曝光顺序在曝光每个模具图案之后反转。

78. 发明授权

US06621089B1 Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same 失效
标题翻译：光栅聚焦检测器和带电粒子束微光刻设备及其方法
公开(公告)号：US06621089B1
公开(公告)日：2003-09-16
申请号：US09694089
申请日：2000-10-19
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： G03F900
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/31794
摘要： The thickness of the reticle used in charged-particle-beam (CPB) microlithography is a few microns at most. Hence, the reticle bends easily and flexes when subject to vibration, causing instability in reticle axial height position relative to the projection-lens system, and errors in image focus, rotation and magnification. Apparatus are disclosed that include a device for detecting the axial height position of the reticle. The device produces one or more beams of light (IR to visible) to strike the reticle at an oblique (not 0 degrees) angle of incidence, detects light reflected from the reticle surface, and detects lateral shifts of the reflected light as received by a height detector. Hence, reticle focus is detected easily and in real time. Multiple detection beams can be used, thereby allowing detection of both axial height position and inclination of the reticle with high accuracy. Reticle-position data can be used to regulate operation of, e.g., an exposure meter.
摘要翻译：用于带电粒子束（CPB）微光刻的掩模版的厚度最多为几微米。因此，当受到振动时，掩模版容易弯曲并弯曲，导致相对于投影透镜系统的标线轴高度位置不稳定，以及图像聚焦，旋转和放大的误差。公开了包括用于检测掩模版的轴向高度位置的装置的装置。该装置产生一束或多束光（IR到可见光）以倾斜（非0度）入射角撞击光罩，检测从标线片表面反射的光，并检测由高度检测器因此，准确地检测到掩模版焦点。可以使用多个检测光束，从而能够高精度地检测光罩的轴向高度位置和倾斜度。标线片位置数据可用于调节例如曝光计的操作。

79. 发明授权

US06590218B1 Projection-exposure methods and apparatus exhibiting increased throughput 失效
标题翻译：投影曝光方法和装置显示出增加的产量
公开(公告)号：US06590218B1
公开(公告)日：2003-07-08
申请号：US09461156
申请日：1999-12-14
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： H61J37304
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70425 , G03F7/70433 , G03F7/70475 , H01J37/3174 , H01J2237/31761 , H01J2237/31764 , H01J2237/31767
摘要： Projection-exposure apparatus and methods are disclosed that exhibit increased throughput by providing improved schemes by which the reticle stage and wafer stage move to accomplish exposure. Portions of a die pattern on a “pattern original” (e.g., reticle) are sequentially illuminated by an energy beam (e.g., beam of electromagnetic radiation or charged particles). The energy beam passes through the pattern portions and forms a demagnified image on a substrate through a projection-optical system. While moving the pattern original and the substrate, the entire die pattern is sequentially illuminated according to an exposure order, and the die pattern is demagnifyingly transferred to the substrate on which the images of the illuminated pattern portions are stitched together. When transferring and exposing the die pattern to multiple locations on the substrate, the exposure order is reversed after exposing each die pattern.
摘要翻译：公开了通过提供分划板台和晶片台移动以完成曝光的改进方案来展现增加的生产量的投影曝光装置和方法。 “图案原件”（例如，掩模版）上的裸片图案的部分被能量束（例如，电磁辐射束或带电粒子）依次照射。能量束通过图案部分，并通过投影光学系统在基板上形成缩小图像。在移动图案原稿和基板的同时，根据曝光顺序顺序地照射整个裸片图案，并且将裸片图案缩小地转印到其上照射图案部分的图像被缝合在一起的基板。当将模具图案转印并暴露于基板上的多个位置时，曝光顺序在曝光每个模具图案之后反转。

80. 发明授权

US06573515B1 Charged-particle-beam projection-exposure apparatus and methods exhibiting improved alignment and registration of projected pattern portions 失效
标题翻译：带电粒子束投影曝光装置和显示改进的投射图案部分的对准和对准的方法
公开(公告)号：US06573515B1
公开(公告)日：2003-06-03
申请号：US09419829
申请日：1999-10-14
申请人： Kazuaki Suzuki
发明人： Kazuaki Suzuki
IPC分类号： G21G500
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/31764
摘要： Charged-particle-beam projection-exposure apparatus and methods are disclosed that achieve improved pattern-transfer accuracy, especially when using a segmented stencil reticle. To such end, the pattern field of a reticle pattern is divided into multiple exposure units that are individually and sequentially exposed onto corresponding regions on a substrate (e.g., semiconductor wafer). Any exposure units defining a feature surrounding an island region are split into complementary exposure units. Boundaries between adjacent exposure units are placed so as not to cross features or feature portions in the respective exposure units, defined by “white” regions of the reticle. Thus, when images of the exposure units are stitched together on the wafer, improved feature registration, alignment, and linewidth control are achieved.
摘要翻译：公开了充电粒子束投影曝光装置和方法，其实现了改进的图案转印精度，特别是当使用分段模版掩模版时。为此，将掩模版图案的图案区域分割为单独地且顺序地暴露在基板（例如，半导体晶片）上的相应区域上的多个曝光单元。定义围绕岛屿区域的特征的任何曝光单元被分成互补曝光单元。相邻曝光单元之间的边界被放置成不会在由掩模版的“白色”区域限定的各个曝光单元中的特征部分或特征部分交叉。因此，当在晶片上将曝光单元的图像拼接在一起时，实现了改进的特征对准，对准和线宽控制。

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