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71. 发明授权

US5519316A Method and apparatus for measuring a toner concentration of a two-component developer 失效
标题翻译：用于测量双组分显影剂的调色剂浓度的方法和装置
公开(公告)号：US5519316A
公开(公告)日：1996-05-21
申请号：US337438
申请日：1994-11-08
申请人： Tomoe Hagiwara , Mitsuo Aoki , Masanori Suzuki , Tomio Kondou , Takahisa Kato
发明人： Tomoe Hagiwara , Mitsuo Aoki , Masanori Suzuki , Tomio Kondou , Takahisa Kato
IPC分类号： G01N27/72 , G01N27/74 , G03G9/08 , G03G9/10 , G03G15/08 , G03G15/09
CPC分类号： G01N27/74 , G03G15/0853
摘要： In an electrophotographic or electrostatic image forming device, the toner concentration of a two-component developer, i.e., a mixture of toner and carrier is measured on the basis of an output of a magnetic bridge type concentration sensor responsive to the magnetic permeability of the developer. The sensor has a surface whose mean roughness along the center line is less than 0.4 .mu.m Ra.
摘要翻译：在电子照相或静电图像形成装置中，基于响应于显影剂的磁导率的磁桥式浓度传感器的输出来测量双组分显影剂（即调色剂和载体的混合物）的调色剂浓度。传感器具有表面，其中心线的平均粗糙度小于0.4μmRa。

72. 发明授权

US5516037A Paper container and stopper applying apparatus for paper containers 失效
标题翻译：用于纸容器的纸容器和塞子施加装置
公开(公告)号：US5516037A
公开(公告)日：1996-05-14
申请号：US341945
申请日：1994-11-16
申请人： Hidehiko Okamoto , Masayo Kajiura , Masataka Okushita , Takahisa Kato
发明人： Hidehiko Okamoto , Masayo Kajiura , Masataka Okushita , Takahisa Kato
IPC分类号： B31B1/90 , B65D5/06 , B65D5/42
CPC分类号： B65D5/068 , B31B2201/9019
摘要： A paper container according to the present invention includes a tab region half cut for defining a tab region of a shape whose lower part is closed and whose upper part is opened in the substantially central part of one of top folded-in side panels. A stopper is applied to an upper end of the tab region or near the upper end. The tab region is pulled from below after a pair of top folded-in side panels are separated apart, whereby a tab is formed, and the tab is pulled to split the seal between the top ribs and then the top folded-in ribs, and then the seal is opened. The tab region half cut is simply provided, and a stopper is simply provided for prohibiting breakage of the tab. The tab is not raised until the seal is opened, so that the tab does not interfere with manufacturing the container.
摘要翻译：根据本发明的纸容器包括用于限定其下部封闭的形状的突片区域的突片区域半切口，并且其上部在顶部折叠侧板的大致中心部分中开口。止动器被施加到突片区域的上端或靠近上端。在一对顶部折叠的侧面板分离开之后，从下方拉出突片区域，由此形成突片，并且拉伸突片以在顶部肋之间分离密封件，然后将顶部折叠肋条分开，并且然后打开密封。简单地提供突片区域半切口，并且简单地设置止动件以防止突片的破损。在密封件打开之前，突片不会升起，使得突片不会妨碍制造容器。

73. 发明授权

US11096552B2 Method and apparatus for controlling manipulator 有权
公开(公告)号：US11096552B2
公开(公告)日：2021-08-24
申请号：US15741171
申请日：2015-06-30
申请人： CANON U.S.A., INC. , THE BRIGHAM AND WOMEN'S HOSPITAL INC. , Nobuhiko Hata , Takahisa Kato , Kiyoshi Takagi , Hidekazu Kose
发明人： Nobuhiko Hata , Takahisa Kato , Kiyoshi Takagi , Hidekazu Kose
IPC分类号： A61B1/00 , A61B1/005 , B25J9/16 , A61B34/30 , A61B1/018 , B25J9/10 , B25J13/06 , B25J18/06
摘要： The present invention provides a method and an apparatus for controlling a flexible manipulator including a plurality of bendable mechanisms via a control apparatus. The control apparatus includes a drive-mode selecting unit allows for the selection of a movement mode which may provide a bending movement, an angled view movement, or a remote center movement.

74. 发明授权

US08846152B2 Antioxidant agent and process for producing metallic material 有权
标题翻译：抗氧化剂及其制造方法
公开(公告)号：US08846152B2
公开(公告)日：2014-09-30
申请号：US13810104
申请日：2011-07-13
申请人： Kazuhiro Shimoda , Tomio Yamakawa , Koji Muramatsu , Yuji Inoue , Junichi Nishimori , Yasuyoshi Hidaka , Keishi Matsumoto , Takahisa Kato , Shuichi Akiyama
发明人： Kazuhiro Shimoda , Tomio Yamakawa , Koji Muramatsu , Yuji Inoue , Junichi Nishimori , Yasuyoshi Hidaka , Keishi Matsumoto , Takahisa Kato , Shuichi Akiyama
IPC分类号： B05D3/02 , C09K15/02 , C03C8/14 , C03C8/16 , C03C8/22 , C21D1/70 , C21D8/02 , C21C7/06 , C23C24/10 , C03C3/087 , C03C3/093 , C03C8/02 , C03C8/04
CPC分类号： C09K15/02 , B05D3/02 , B21B45/0242 , C03C3/087 , C03C3/093 , C03C8/02 , C03C8/04 , C03C8/14 , C03C8/16 , C03C8/22 , C10M173/02 , C10M2201/062 , C10M2201/087 , C10M2201/103 , C10M2201/12 , C10N2210/02 , C10N2230/10 , C10N2240/40 , C10N2240/403 , C21C7/06 , C21D1/70 , C21D8/0226 , C21D8/0284 , C21D8/10 , C23C24/10
摘要： There is provided an antioxidant agent capable of preventing scale from being produced on the surface of a heated metallic starting material more effectively than the conventional antioxidant agent. The antioxidant agent according to the present invention contains a plurality of glass frits having different softening points and an inorganic compound having a melting point not higher than 600° C. The inorganic compound mainly softens in the low-temperature range of about 600° C. The plurality of glass frits mainly soften in the low-temperature range of about 600 to 1300° C. Therefore, the antioxidant agent covers the surface of metallic starting material in a broad temperature range, oxidizes the surface of metallic starting material, and prevents the production of scale.
摘要翻译：提供了一种抗氧化剂，其能够比常规抗氧化剂更有效地防止在加热的金属起始材料的表面上产生垢。本发明的抗氧化剂含有多种具有不同软化点的玻璃料和熔点不高于600℃的无机化合物。无机化合物在约600℃的低温范围内主要软化。多个玻璃料主要在约600至1300℃的低温范围内软化。因此，抗氧化剂在宽温度范围内覆盖金属原料的表面，氧化金属原料的表面，并防止生产规模。

75. 发明申请

US20140197325A1 CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME 审中-公开
标题翻译：充电颗粒光束和曝光装置使用它
公开(公告)号：US20140197325A1
公开(公告)日：2014-07-17
申请号：US14005078
申请日：2012-03-14
申请人： Takahisa Kato , Yutaka Setomoto
发明人： Takahisa Kato , Yutaka Setomoto
IPC分类号： H01J37/12 , H01J3/18
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J3/18 , H01J37/3177 , H01J2237/04924 , H01J2237/1205 , H01J2237/1207
摘要： An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are each larger than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.
摘要翻译：静电带电粒子束透镜包括：电极，其包括平板，该平板具有沿光轴方向延伸的法线的第一表面和与该第一表面相对的第二表面，该电极具有从第一表面延伸的通孔表面到第二表面。当开口横截面被定义为沿着垂直于法线的平面截取的通孔的横截面，并且代表性直径被定义为通过对开口横截面进行回归分析而获得的圆的直径时，代表在第一表面侧的第一区域中的开口横截面的直径和位于第二表面侧的第二区域中的开口横截面的代表性直径分别大于开口横截面的代表性直径第三区域，其是设置在第一表面和第二表面之间的电极中的区域。

76. 发明申请

US20140190006A1 METHOD FOR MANUFACTURING CHARGED PARTICLE BEAM LENS 审中-公开
标题翻译：制造充电颗粒光束镜的方法
公开(公告)号：US20140190006A1
公开(公告)日：2014-07-10
申请号：US14005037
申请日：2012-03-14
申请人： Yutaka Setomoto , Takahisa Kato
发明人： Yutaka Setomoto , Takahisa Kato
IPC分类号： H05K3/46
CPC分类号： H05K3/4679 , H01J37/12 , H01J2237/0437 , H01J2237/04924 , H01J2237/1205 , Y10T29/49165
摘要： There is provided a method for manufacturing a charged particle beam lens having a bonded electrode obtained by bonding at least a first conductive substrate having a first through-hole and a second conductive substrate having a second through-hole. The above method includes: forming the first through-hole in the first conductive substrate; forming the second through-hole in the second conductive substrate; and bonding the first conductive substrate and the second conductive substrate so that the first through-hole and the second through-hole communicate with each other.
摘要翻译：提供了一种制造带电粒子束透镜的方法，该方法具有通过将至少具有第一通孔的第一导电基板和具有第二通孔的第二导电基板结合而获得的接合电极。上述方法包括：在第一导电衬底中形成第一通孔; 在第二导电衬底中形成第二通孔; 并且将第一导电基板和第二导电基板接合，使得第一通孔和第二通孔彼此连通。

77. 发明申请

US20130202803A1 ANTIOXIDANT AGENT AND PROCESS FOR PRODUCING METALLIC MATERIAL 有权
标题翻译：用于生产金属材料的抗氧化剂和方法
公开(公告)号：US20130202803A1
公开(公告)日：2013-08-08
申请号：US13880780
申请日：2011-07-13
申请人： Kazuhiro Shimoda , Keishi Matsumoto , Yasuyoshi Hidaka , Tomio Yamakawa , Shuichi Akiyama , Takahisa Kato
发明人： Kazuhiro Shimoda , Keishi Matsumoto , Yasuyoshi Hidaka , Tomio Yamakawa , Shuichi Akiyama , Takahisa Kato
IPC分类号： C09K15/02
CPC分类号： C03C8/22 , B05D3/02 , B21B45/0242 , C03C3/087 , C03C3/093 , C03C8/02 , C03C8/04 , C03C8/14 , C03C8/16 , C09K15/02 , C21D1/68 , C21D1/70 , C21D8/0284 , C21D8/10 , C23C24/082 , C23C24/10
摘要： There is provided an antioxidant agent excellent in anti-dripping property and anti-peeling property. The antioxidant agent in accordance with the present invention contains a plurality of glass frits having different softening points, potter's clay, and bentonite and/or sepiolite. On account of the potter's clay, the antioxidant agent applied to the surface of a metallic starting material is less liable to drip down. Further, on account of the bentonite and/or sepiolite, the antioxidant agent is less liable to peel off the surface of the metallic starting material.
摘要翻译：提供了抗滴落性和抗剥离性优异的抗氧化剂。根据本发明的抗氧化剂含有多种具有不同软化点的玻璃料，陶土，膨润土和/或海泡石。由于陶器的粘土，施加到金属原料表面的抗氧化剂不容易滴落。此外，由于膨润土和/或海泡石，抗氧化剂不易从金属原料的表面剥离。

78. 发明申请

US20130115376A1 ANTIOXIDANT AGENT, PROCESS FOR PRODUCING ANTIOXIDANT AGENT, AND PROCESS FOR PRODUCING METALLIC MATERIAL 有权
标题翻译：抗氧化剂，生产抗氧化剂的方法和生产金属材料的方法
公开(公告)号：US20130115376A1
公开(公告)日：2013-05-09
申请号：US13810104
申请日：2011-07-13
申请人： Kazuhiro Shimoda , Tomio Yamakawa , Koji Muramatsu , Yuji Inoue , Junichi Nishimori , Yasuyoshi Hidaka , Keishi Matsumoto , Takahisa Kato , Shuichi Akiyama
发明人： Kazuhiro Shimoda , Tomio Yamakawa , Koji Muramatsu , Yuji Inoue , Junichi Nishimori , Yasuyoshi Hidaka , Keishi Matsumoto , Takahisa Kato , Shuichi Akiyama
IPC分类号： C09K15/02
CPC分类号： C09K15/02 , B05D3/02 , B21B45/0242 , C03C3/087 , C03C3/093 , C03C8/02 , C03C8/04 , C03C8/14 , C03C8/16 , C03C8/22 , C10M173/02 , C10M2201/062 , C10M2201/087 , C10M2201/103 , C10M2201/12 , C10N2210/02 , C10N2230/10 , C10N2240/40 , C10N2240/403 , C21C7/06 , C21D1/70 , C21D8/0226 , C21D8/0284 , C21D8/10 , C23C24/10
摘要： There is provided an antioxidant agent capable of preventing scale from being produced on the surface of a heated metallic starting material more effectively than the conventional antioxidant agent. The antioxidant agent according to the present invention contains a plurality of glass frits having different softening points and an inorganic compound having a melting point not higher than 600° C. The inorganic compound mainly softens in the low-temperature range of about 600° C. The plurality of glass frits mainly soften in the low-temperature range of about 600 to 1300° C. Therefore, the antioxidant agent covers the surface of metallic starting material in a broad temperature range, oxidizes the surface of metallic starting material, and prevents the production of scale.
摘要翻译：提供了一种抗氧化剂，其能够比常规抗氧化剂更有效地防止在加热的金属起始材料的表面上产生垢。本发明的抗氧化剂含有多种具有不同软化点的玻璃料和熔点不高于600℃的无机化合物。无机化合物在约600℃的低温范围内主要软化。多个玻璃料主要在约600至1300℃的低温范围内软化。因此，抗氧化剂在宽温度范围内覆盖金属原料的表面，氧化金属原料的表面，并防止生产规模。

79. 发明授权

US08343368B2 Method of fabricating a structure by anisotropic etching, and silicon substrate with an etching mask 有权
标题翻译：通过各向异性蚀刻制造结构的方法和具有蚀刻掩模的硅衬底
公开(公告)号：US08343368B2
公开(公告)日：2013-01-01
申请号：US12553015
申请日：2009-09-02
申请人： Toshiyuki Ogawa , Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
发明人： Toshiyuki Ogawa , Takahisa Kato , Kazutoshi Torashima , Takahiro Akiyama
IPC分类号： B44C1/22
CPC分类号： B81C1/00396 , B81B2201/047 , B81B2203/0118 , B81C1/0042 , B81C1/00626 , H01L21/3083
摘要： In a fabrication method of fabricating a structure, a basic etching mask corresponding a target shape with a convex corner, and a correction etching mask with a first portion, a second portion and an opening portion are formed on a single-crystal silicon substrate, and the silicon substrate with the basic etching mask and the correction etching mask formed thereon is subjected to an anisotropic etching to form the silicon substrate having the target shape. The first portion extends in a direction, respective ends of the first portion are connected to the basic etching mask. The second portion is connected to a side of the first portion extending in the direction.
摘要翻译：在制造结构的制造方法中，在单晶硅衬底上形成对应于具有凸角的目标形状的基本蚀刻掩模和具有第一部分，第二部分和开口部分的校正蚀刻掩模，以及对其上形成有基本蚀刻掩模的硅衬底和形成在其上的校正蚀刻掩模进行各向异性蚀刻以形成具有目标形状的硅衬底。第一部分沿<110>方向延伸，第一部分的相应端部连接到基本蚀刻掩模。第二部分连接到沿<110>方向延伸的第一部分的一侧。

80. 发明授权

US08324113B2 Silicon processing method and silicon substrate with etching mask 失效
标题翻译：硅处理方法和硅衬底与蚀刻掩模
公开(公告)号：US08324113B2
公开(公告)日：2012-12-04
申请号：US12545235
申请日：2009-08-21
申请人： Takahisa Kato , Yasuhiro Shimada
发明人： Takahisa Kato , Yasuhiro Shimada
IPC分类号： H01L21/302
CPC分类号： B81C1/00626 , B81B2201/0271 , B81C1/00404 , B81C2201/0133 , B81C2201/0198
摘要： A silicon processing method includes: forming a mask pattern on a principal plane of a single-crystal silicon substrate; and applying crystal anisotropic etching to the principal surface to form a structure including a (111) surface and a crystal surface equivalent thereto and having width W1 and length L1. The principal plane includes a (100) surface and a crystal surface equivalent thereto or a (110) surface and a crystal surface equivalent thereto. A determining section for determining the width W1 of the structure is formed in the mask pattern. The width of the determining section for the width W1 of the mask pattern is width W2. The width of the mask pattern other than the determining section is larger than the width W2 over a length direction of the mask pattern.
摘要翻译：硅处理方法包括：在单晶硅衬底的主平面上形成掩模图案; 并对主表面施加结晶各向异性蚀刻，形成包括（111）表面和与其等效的晶面的结构，并具有宽度W1和长度L1。主平面包括（100）表面和与其等效的（110）表面和与其等效的（110）表面和晶体表面。用于确定结构的宽度W1的确定部分形成在掩模图案中。掩模图案的宽度W1的确定部的宽度为宽度W2。除了确定部分之外的掩模图案的宽度大于在掩模图案的长度方向上的宽度W2。

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