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71. 发明授权

US5594246A Method and apparatus for x-ray analyses 失效
标题翻译： x射线分析的方法和装置
公开(公告)号：US5594246A
公开(公告)日：1997-01-14
申请号：US430535
申请日：1995-04-25
申请人： Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
发明人： Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
IPC分类号： G01N23/225 , H01J37/252 , G01N23/223
CPC分类号： G01N23/2252 , H01J37/252 , H01J2237/2445
摘要： An X-ray analyzing method includes the steps of applying an irradiated electron beam, converged by a condenser lens and an objective lens into a thin beam, to the inside of a fine hole existing on the surface of a sample; observing X-rays generated from a residual substance existing inside the fine hole; and performing a qualitative and quantitative analysis of the residual substance. The X-rays are observed by an X-ray detector installed in an internal space of the condenser lens, an internal space of the objective lens, or between the condenser lens and the objective lens, by detecting only the X-rays radiated within the angular range -.theta. to +.theta., where .theta. is an angle formed with a center axis of the electron beam, and so defined that tan .theta. is substantially equal to a/d, where a and d are the radius and the depth of the fine hole, respectively.
摘要翻译： X射线分析方法包括以下步骤：将由聚光透镜和物镜会聚的照射的电子束施加到薄的光束中，使其存在于样品表面上的细孔的内部; 观察由存在于细孔内的残留物质产生的X射线; 并对剩余物质进行定性和定量分析。 X射线由安装在聚光透镜的内部空间，物镜的内部空间或者聚光透镜与物镜之间的X射线检测器观测，仅检测在该透镜内辐射的X射线角度范围-θ至+θ，其中θ是与电子束的中心轴形成的角度，并且如此定义为tanθ基本上等于a / d，其中a和d是微细的半径和深度孔。

72. 发明授权

US4851673A Secondary ion mass spectrometer 失效
标题翻译：二次离子质谱仪
公开(公告)号：US4851673A
公开(公告)日：1989-07-25
申请号：US228018
申请日：1988-08-04
申请人： Eiichi Izumi , Hiroshi Iwamoto , Eisuke Mitani , Hiroyasu Shichi
发明人： Eiichi Izumi , Hiroshi Iwamoto , Eisuke Mitani , Hiroyasu Shichi
IPC分类号： H01J37/244 , G01Q30/02 , H01J49/02 , H01J49/04 , H01J49/06 , H01J49/26
CPC分类号： H01J49/02
摘要： A secondary ion mass spectrometer including primary ion emitting means for generating a primary ion to irradiate a specimen with the primary ion, means for separating secondary ions sputtered from the specimen, in accordance with mass-to-charge ratios, and detection means for detecting a secondary ion current emerging from the secondary ion separating means is disclosed, in which, when the value of the secondary ion current becomes greater than the upper limit of the dynamic range of the detecting means, the secondary ion current is attenuated by an attenuator, and the value of secondary ion current detected by the detection means is divided by the attenuation factor of the attenuator to obtain a corrected value. Thus, the secondary ion mass spectrometer is prevented from producing an erroneous analytical result due to the saturation of the detection means, that is, has a wide dynamic range, in which the amount of secondary ion varies by eight to ten orders of magnitude. Accordingly, the sescondary ion mass spectrometer can quantitatively determine a high-concentration element and a considerably-low-concentration element at the same time, and can determine the concentration distribution of an analytical element in a wide concentration range from a large value to a considerably small value.
摘要翻译：一种二次离子质谱仪，包括用于产生一次离子以用一次离子照射样本的初级离子发射装置，用于根据质荷比分离从样品溅射的二次离子的装置，以及检测装置公开了从二次离子分离装置出现的二次离子电流，其中当二次离子电流的值变得大于检测装置的动态范围的上限时，二次离子电流被衰减器衰减，并且由检测装置检测的二次离子电流的值除以衰减器的衰减因子以获得校正值。因此，二次离子质谱仪由于检测装置饱和，即二次离子量变化八到十个数量级的宽动态范围而被防止产生错误的分析结果。因此，该saysondary离子质谱仪可以同时定量地确定高浓度元素和相当低浓度的元素，并且可以确定从大值到相当大的浓度范围内的分析元素的浓度分布价值小

73. 发明授权

US4687938A Ion source 失效
标题翻译：离子源
公开(公告)号：US4687938A
公开(公告)日：1987-08-18
申请号：US808027
申请日：1985-12-12
申请人： Hifumi Tamura , Hiroyasu Shichi
发明人： Hifumi Tamura , Hiroyasu Shichi
IPC分类号： H01J27/26 , H01J37/08 , H01J37/26 , H01J27/00
CPC分类号： H01J27/26 , H01J37/08
摘要： An ion source includes an ion source material holder adapted to load an ion source material thereon and having an aperture at the bottom thereof, an ion emitter mounted on the ion source material holder at the aperture, heating means for heating the ion source material holder and the ion emitter, and an ion extracting electrode for extracting an ion beam from the ion emitter. The ion emitter is made of a mixture of a material having a large work function and a material having a small work function, in order to be able to emit both positive ions and negative ions from the ion emitter. The polarity of a voltage applied between the ion emitter and the ion extracting electrode is changed so that one of the positive ion beam and the negative ion beam can be selectively extracted from the ion emitter.
摘要翻译：离子源包括离子源材料保持器，其适于在其上装载离子源材料并且在其底部具有孔，安装在孔处的离子源材料保持器上的离子发射器，用于加热离子源材料保持器的加热装置和离子发射体和用于从离子发射器提取离子束的离子提取电极。离子发射器由具有大功函数的材料和具有小功函数的材料的混合物制成，以便能够从离子发射器发射正离子和负离子。改变施加在离子发射体和离子提取电极之间的电压的极性，使得能够从离子发射体中选择性地提取正离子束和负离子束中的一个。

74. 发明申请

US20130126731A1 Charged Particle Microscope and Ion Microscope 审中-公开
标题翻译：带电粒子显微镜和离子显微镜
公开(公告)号：US20130126731A1
公开(公告)日：2013-05-23
申请号：US13521588
申请日：2011-02-04
申请人： Hiroyasu Shichi , Shinichi Matsubara , Yoichi Ose , Yoshimi Kawanami
发明人： Hiroyasu Shichi , Shinichi Matsubara , Yoichi Ose , Yoshimi Kawanami
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , H01J37/08 , H01J37/28 , H01J2237/006 , H01J2237/0807
摘要： In order to provide a safe and environmentally-friendly charged gas particle microscope that exhibits a superior ionized gas-utilization efficiency and economic efficiency, the gas field ion source of a charged particle microscope is equipped with a vacuum chamber in which are provided a vacuum chamber evacuation mechanism, an acicular emitter tip, an extraction electrode disposed facing the emitter tip, and a mechanism for supplying a gas to the vicinity of the emitter tip, and is configured so that the gas in the region around the tip of acicular ion emitter is ionized and extracted as an ion beam. Therein, the evacuation mechanism and the gas supply mechanism are connected, and a material for adhering the gas to be ionized is disposed between the evacuation mechanism and the gas supply mechanism.
摘要翻译：为了提供一种表现出优异的电离气体利用效率和经济效率的安全环保的带电气体微粒显微镜，带电微粒显微镜的气体离子源装备有真空室，真空室抽吸机构，针状发射极尖端，面向发射极尖端的引出电极和用于向发射极尖端附近提供气体的机构，并且被构造成使得针状离子发射体的尖端周围的区域中的气体为电离并提取为离子束。其中，排气机构和气体供给机构连接，并且用于将待离子化的气体粘附的材料设置在排气机构和气体供给机构之间。

75. 发明授权

US08115184B2 Gas field ion source, charged particle microscope, and apparatus 有权
标题翻译：气体离子源，带电粒子显微镜和装置
公开(公告)号：US08115184B2
公开(公告)日：2012-02-14
申请号：US12318583
申请日：2008-12-31
申请人： Hiroyasu Shichi , Shinichi Matsubara , Takashi Ohshima , Satoshi Tomimatsu , Tomihiro Hashizume , Tohru Ishitani
发明人： Hiroyasu Shichi , Shinichi Matsubara , Takashi Ohshima , Satoshi Tomimatsu , Tomihiro Hashizume , Tohru Ishitani
IPC分类号： H01J49/00
CPC分类号： H01J27/26 , H01J37/08 , H01J2237/0805 , H01J2237/0807 , H01J2237/182
摘要： A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.
摘要翻译：一种气体离子源，其可以在粗吸真空中同时增加电导，并且从离子电流的增加的角度降低提取电极的孔直径。气体离子源具有改变真空气体分子离子化室中的电导的机理。也就是说，根据是否从气体分子离子化室抽出离子束，改变对气体分子离子化室进行抽真空的电导。通过将盖子形成为构成用双金属合金改变电导的机构的部件的部分，可以根据气体分子离子化室的温度来改变电导率，例如，电导率变为相对较小的电导率相对较低的温度和相对高的温度下的相对较大的电导率。

76. 发明授权

US5877498A Method and apparatus for X-ray analyses 失效
标题翻译： X射线分析的方法和装置
公开(公告)号：US5877498A
公开(公告)日：1999-03-02
申请号：US893034
申请日：1997-07-15
申请人： Aritoshi Sugimoto , Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
发明人： Aritoshi Sugimoto , Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
IPC分类号： G01N23/225 , H01J37/256
CPC分类号： G01N23/2252 , H01J2237/2445 , H01J2237/2807
摘要： An X-ray analyzing method for inspecting opening states of fine holes comprises the steps of: irradiating a finely converged electron beam into a first fine hole, observing an X-ray emitted from the inside of said first fine hole in order to obtain an first X-ray analysis data about the residue substance existing at the bottom of said first fine hole; irradiating a finely converged electron beam into a second fine hole, observing an X-ray emitted from the inside of said second fine hole in order to obtain an second X-ray analysis data about the residue substance existing at the bottom of said second fine hole; and comparing said first X-ray analysis data with said second X-ray analysis data, forming a judgment as to whether or not a difference between said first and second analysis data is smaller than a predetermined threshold value and using an outcome of said judgment to determine the opening states of said first and second fine holes. The X-ray observations are carried out by detecting only the X-rays emitted within the angular range -.theta. to +.theta. where notation .theta. is an angle formed with a center axis of the irradiated electron beam and so defined that tan .theta. is equal to a/d whereas notations a and d are the radius and the depth of the fine holes.
摘要翻译：用于检查细孔的打开状态的X射线分析方法包括以下步骤：将精细会聚的电子束照射到第一细孔中，观察从所述第一细孔的内部发射的X射线，以获得第一细孔关于存在于所述第一细孔底部的残留物质的X射线分析数据; 将精细会聚的电子束照射到第二细孔中，观察从所述第二细孔的内部发射的X射线，以获得关于存在于所述第二细孔底部的残留物质的第二X射线分析数据 ; 以及将所述第一X射线分析数据与所述第二X射线分析数据进行比较，形成关于所述第一和第二分析数据之间的差是否小于预定阈值的判断，并且使用所述判断结果确定所述第一和第二细孔的打开状态。通过仅检测在角度范围θ至+θ内发射的X射线来进行X射线观察，其中符号θ是与照射的电子束的中心轴形成的角度，并且如此定义，tanθ等于 a / d，而符号a和d是细孔的半径和深度。

77. 发明授权

US5012109A Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US5012109A
公开(公告)日：1991-04-30
申请号：US378286
申请日：1989-07-11
申请人： Hiroyasu Shichi , Setsuo Nomura , Eisuke Mitani
发明人： Hiroyasu Shichi , Setsuo Nomura , Eisuke Mitani
IPC分类号： H01J37/147 , G01Q30/02 , G01Q80/00 , H01J37/244 , H01J37/252 , H01J37/256 , H01J37/26 , H01J37/28 , H01J37/30
CPC分类号： H01J37/265 , H01J37/256
摘要： A charged particle beam apparatus comprising a charged particle beam source(s) for generating an ion beam and an electron beam, a focusing lens system for finely focusing each of the generated ion beam and electron beam, a charged particle beam deflecting system for deflecting each of the focused ion beam and electron beam, and a specimen subjected to irradiation thereof with each of the focused ion beam and electron beam is provided with means for detecting the deviation of the irradiation positions of the ion beam and the electron beam on the specimen from each other and means for making the irradiation positions of the ion beam and the electron beam on the specimen coincident with each other on the basis of the result of detection of the deviation of the irradiation positions from each other.
摘要翻译：一种带电粒子束装置，包括用于产生离子束和电子束的带电粒子束源，用于精细聚焦每个所产生的离子束和电子束的聚焦透镜系统，用于偏转每一个的带电粒子束偏转系统聚焦离子束和电子束的照射样本和其中每个聚焦离子束和电子束照射的样本设置有用于检测离子束和电子束在样本上的照射位置的偏差的装置，彼此之间的离子束和电子束的照射位置彼此一致的装置，基于检测到照射位置彼此偏离的结果。

78. 发明授权

US4841143A Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US4841143A
公开(公告)日：1989-06-20
申请号：US160408
申请日：1988-02-25
申请人： Hifumi Tamura , Hiroyasu Shichi , Kaoru Umemura
发明人： Hifumi Tamura , Hiroyasu Shichi , Kaoru Umemura
IPC分类号： G01N23/225 , G01Q70/10 , H01J37/22 , H01J37/252 , H01J37/256
CPC分类号： H01J37/256 , H01J37/244 , H01J2237/2449 , H01J2237/2527
摘要： A charged particle beam apparatus is disclosed, which comprises a charged particle source; focusing means for focusing a charged particle beam emitted by the charged particle source on a sample and irradiating it therewith; deflecting means for deflecting the charged particle beam so as to scan the sample therewith; secondary ion separating means disposed approximately symmetrically with respect to the axis of the charged particle beam at the proximity of said sample and separating positive and negative secondary ions generated by the irradiation of the sample into positive and negative ions; and mass analyzers for analyzing the mass of the separated positive and negative secondary ions, respectively.
摘要翻译：公开了一种带电粒子束装置，其包括带电粒子源; 用于将由带电粒子源发射的带电粒子束聚焦在样品上并将其照射的聚焦装置; 用于使带电粒子束偏转以便用其扫描样品的偏转装置; 二次离子分离装置相对于所述样品附近的带电粒子束的轴线近似对称设置，并且将由样品照射产生的正和负二次离子分离成正离子和负离子; 以及用于分析分离的正负二次离子的质量的质量分析器。

79. 发明授权

US08530865B2 Gas field ion source, charged particle microscope, and apparatus 有权
公开(公告)号：US08530865B2
公开(公告)日：2013-09-10
申请号：US13355104
申请日：2012-01-20
申请人： Hiroyasu Shichi , Shinichi Matsubara , Takashi Ohshima , Satoshi Tomimatsu , Tomihiro Hashizume , Tohru Ishitani
发明人： Hiroyasu Shichi , Shinichi Matsubara , Takashi Ohshima , Satoshi Tomimatsu , Tomihiro Hashizume , Tohru Ishitani
IPC分类号： H01J49/26 , H01J49/00 , H01J37/08
CPC分类号： H01J27/26 , H01J37/08 , H01J2237/0805 , H01J2237/0807 , H01J2237/182
摘要： A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.

80. 发明授权

US08263943B2 Ion beam device 有权
标题翻译：离子束装置
公开(公告)号：US08263943B2
公开(公告)日：2012-09-11
申请号：US13144620
申请日：2010-01-08
申请人： Hiroyasu Shichi , Shinichi Matsubara , Norihide Saho , Noriaki Arai , Tohru Ishitani
发明人： Hiroyasu Shichi , Shinichi Matsubara , Norihide Saho , Noriaki Arai , Tohru Ishitani
IPC分类号： H01J49/10 , H01J37/28
CPC分类号： H01J37/08 , H01J27/26 , H01J37/15 , H01J2237/0216 , H01J2237/0807 , H01J2237/28
摘要： Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (21) for generating ions; an emitter base mount (64) for supporting the emitter tip; an ionizing chamber which has an extraction electrode (24) opposed to the emitter tip and which is configured so as to surround the emitter tip (21); and a gas supply tube (25) for supplying gas to the vicinity of the emitter tip. The emitter base mount and a vacuum container magnetically interact with each other.
摘要翻译：提供了一种具有气体电离电离离子源的离子束装置，其能够防止发射极尖端以非接触的方式振动。气体电场离子源由用于产生离子的发射极尖端（21）组成; 发射极底座（64），用于支撑发射器尖端; 电离室具有与发射极尖端相对的引出电极（24），其构造为围绕发射极尖端（21）; 以及用于将气体供给到发射极尖端附近的气体供给管（25）。发射极基座和真空容器彼此磁性相互作用。

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