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    • 71. 发明授权
    • Ceramic capacitor
    • 陶瓷电容器
    • US07889509B2
    • 2011-02-15
    • US11513039
    • 2006-08-31
    • Kazuhiro UrashimaShinji YuriManabu SatoYasuhiro Sugimoto
    • Kazuhiro UrashimaShinji YuriManabu SatoYasuhiro Sugimoto
    • H05K7/00
    • H05K1/185H01G2/06H01G4/385H01L23/49816H01L23/50H01L2224/05568H01L2224/05573H01L2224/16225H01L2224/16235H01L2924/00014H01L2924/01019H01L2924/01078H01L2924/09701H01L2924/14H01L2924/15174H01L2924/15311H01L2924/19041H01L2924/19042H01L2924/3025H05K1/0231H05K3/4602H05K2201/10045H05K2201/10674H05K2201/10712H01L2224/05599
    • A circuit board (10, 10″, 10′″) comprising: a board core (11) having a main core surface (12) and a rear core surface (13); a ceramic capacitor (101, 101′, 101″, 101′″, 101″″, 101″″′, 101″″″) having a main capacitor surface (102) and a rear capacitor surface (103), having a structure in which a first inner electrode layer (141) and a second inner electrode layer (142) are alternately stacked with a ceramic dielectric layer (105) interposed therebetween, and having a plurality of capacitor function units (107, 108) being electrically independent from each other, the ceramic capacitor (101, 101′, 101″, 101′″, 101″″, 101″″′, 101″″″) being buried in the board core (11) in a state where the main core surface (12) and the main capacitor surface (102) are directed in a same direction; and a buildup layer (31) having a structure in which an interlayer insulating layer (33, 35) and a conductor layer (42) are alternately stacked on the main core surface (12) and the main capacitor surface (102) and having a semiconductor integrated circuit device mounting region (23, 51, 52) for mounting a semiconductor integrated circuit device (21, 53, 54) having a plurality of processor cores (24, 25) on a surface (39) of the buildup layer (31), wherein the plurality of capacitor function units (107, 108) are capable of being electrically connected to the plurality of processor cores (24, 25), respectively.
    • 一种电路板(10,10“,10”),包括:具有主芯表面(12)和后芯表面(13)的板芯(11); 具有主电容器表面(102)和后电容器表面(103)的陶瓷电容器(101,101',101“,101”,101“”,101“”,101“”“), 其中第一内部电极层(141)和第二内部电极层(142)交替层叠有介于其间的陶瓷介电层(105),并且具有多个电容器功能单元(107,108),其电独立于 相互之间的陶瓷电容器(101,101',101“,101”,101“,101”,101“”101“”)被埋在板芯11中, (12)和主电容器表面(102)指向相同的方向; 以及具有层间绝缘层(33,35)和导体层(42)在主芯面(12)和主电容器表面(102)上交替层叠的结构的积层(31),具有 半导体集成电路器件安装区域(23,51,52),用于安装具有多个处理器核心(24,25)的半导体集成电路器件(21,53,54),所述多个处理器核心(24,25)在所述生成层(31)的表面(39)上 ),其中所述多个电容器功能单元(107,108)能够分别电连接到所述多个处理器核(24,25)。
    • 72. 发明授权
    • Wireless communication method, wireless communication system using the same, and wireless terminal thereof
    • 无线通信方法,使用其的无线通信系统及其无线终端
    • US07787433B2
    • 2010-08-31
    • US10586146
    • 2005-01-13
    • Manabu Sato
    • Manabu Sato
    • H04B7/208H04M1/00
    • H04W68/12H04W88/04H04W88/06
    • A business wireless communication system, which includes both a repeater relay station of a wireless network using a repeater system and an FDMA relay station of a wireless network using FDMA system, comprises means for ensuring that the repeater relay station, when receiving a call signal from a repeater wireless terminal of the wireless communication network of the repeater system, is communication-line-connected to the FDMA relay station so as to forward the call signal to the FDMA relay station, which sets the forwarded call signal to a control signal and transmits it to an FDMA wireless terminal of the wireless communication network of the FDMA system; and means for ensuring that the FDMA wireless terminal receives the control signal to communicate with the repeater wireless terminal via the repeater relay station. In this way, there can be provided a wireless communication method, a system using the same, and a wireless terminal thereof, wherein a single reception frequency is used to attend to call signals of two different wireless communication systems.
    • 包括使用中继器系统的无线网络的中继站中继站和使用FDMA系统的无线网络的FDMA中继站的业务无线通信系统包括用于确保中继器中继站在接收到来自 中继器系统的无线通信网络的中继器无线终端通信线路连接到FDMA中继站,以将呼叫信号转发到FDMA中继站,FDMA中继站将转发的呼叫信号设置为控制信号,并发送 它到FDMA系统的无线通信网络的FDMA无线终端; 以及用于确保FDMA无线终端经由中继器中继站接收到与中继器无线终端通信的控制信号的装置。 以这种方式,可以提供一种无线通信方法,使用该无线通信方法的系统及其无线终端,其中使用单个接收频率来接收两个不同无线通信系统的呼叫信号。
    • 77. 发明申请
    • PLASMA ETCHING METHOD AND COMPUTER-READABLE STORAGE MEDIUM
    • 等离子体蚀刻方法和计算机可读存储介质
    • US20070165355A1
    • 2007-07-19
    • US11617440
    • 2006-12-28
    • Manabu SatoYoshiki IgarashiYoshimitsu KonMasanobu Honda
    • Manabu SatoYoshiki IgarashiYoshimitsu KonMasanobu Honda
    • H01T23/00
    • H01L21/0273H01L21/31116H01L21/31138H01L21/31144
    • A plasma processing apparatus includes a first and a second electrode disposed to face each other in a processing chamber, the second electrode supporting a substrate; a first RF power supply for applying a first RF power of a higher frequency to the second electrode; a second RF power supply for applying a second RF power of a lower frequency to the second electrode; and a DC power source for applying a DC voltage to the first electrode. In a plasma etching method for etching a substrate by using the plasma processing apparatus, the first and the second radio frequency power are applied to the second electrode to convert a processing gas containing no CF-based gas into a plasma and a DC voltage is applied to the first electrode, to thereby etch an organic film or an amorphous film on the substrate by using a silicon-containing mask.
    • 等离子体处理装置包括在处理室中彼此面对的第一和第二电极,第二电极支撑基板; 用于向第二电极施加较高频率的第一RF功率的第一RF电源; 用于将较低频率的第二RF功率施加到所述第二电极的第二RF电源; 以及用于向第一电极施加DC电压的DC电源。 在通过使用等离子体处理装置蚀刻基板的等离子体蚀刻方法中,将第一和第二射频功率施加到第二电极,以将不含CF基气体的处理气体转换成等离子体,并施加DC电压 从而通过使用含硅掩模在基板上蚀刻有机膜或非晶膜。