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    • 74. 发明申请
    • EXPOSURE APPARATUS
    • 曝光装置
    • US20070070317A1
    • 2007-03-29
    • US11537071
    • 2006-09-29
    • Makoto MIZUNOHiroshi Ito
    • Makoto MIZUNOHiroshi Ito
    • G03B27/42
    • G03B27/42G03F7/70341
    • An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a substrate to be exposed, via a liquid that is filled in a space between the substrate and a final lens that is closest to the substrate, a movement restricting part for restricting a movement of the liquid by forming a interval between the movement restricting part and the substrate, the interval is smaller than a interval of the space, and a moving part for moving the movement restricting part so that the interval between the movement restricting part and the substrate increases.
    • 曝光装置包括:投影光学系统,用于通过填充在基板和最靠近基板的最终透镜之间的空间中的液体将掩模版图案投影到待曝光的基板上;移动限制部件,用于 通过在所述移动限制部和所述基板之间形成间隔来限制所述液体的移动,所述间隔小于所述间隔的间隔,以及移动部,其使所述移动限制部移动,使得所述移动限制部与所述移动限制部之间的间隔, 衬底增加。