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    • 74. 发明授权
    • Control valve
    • 控制阀
    • US07051991B2
    • 2006-05-30
    • US10917451
    • 2004-08-13
    • Isao Suzuki
    • Isao Suzuki
    • F16K31/02
    • F16K7/14F16K31/06F16K31/1225
    • An actuator operated by a solenoid and a force amplifying means utilizing hydraulic pressure are used in combination with a diaphragm, to thereby provide a diaphragm valve made of Teflon™, and which is compact in size, has low power consumption, and which is capable of exerting a large force. The force amplifying means mainly comprises a cylinder including cylinder portions having different cross-sectional areas and oil filled in the cylinder. A force amplification ratio is equal to a ratio between the cross-sectional areas of the cylinder portions. A plunger which receives a biasing force of a spring is provided on an upper side of the force amplifying means. The plunger is operated by a solenoid, and a driving force of the plunger is amplified by the force amplifying means and transmitted to the diaphragm, thus adjusting a degree of valve opening. A flow rate control valve of the present invention is free from the problems of conventional control valves, and used for controlling a flow rate of a fluid, such as a chemical liquid or an exceptionally high-purity liquid.
    • 由螺线管操作的致动器和利用液压的力放大装置与隔膜结合使用,从而提供由Teflon TM制成的隔膜阀,其尺寸紧凑,功耗低,并且其是 能够施加很大的力量。 力放大装置主要包括一个圆柱体,该圆柱体包括具有不同横截面面积的圆筒部分和填充在圆筒中的油。 力放大率等于圆筒部分的横截面积之间的比率。 接收弹簧的偏置力的柱塞设置在力放大装置的上侧。 柱塞由螺线管操作,并且柱塞的驱动力被力放大装置放大并传递到隔膜,由此调节阀开度。 本发明的流量控制阀没有常规控制阀的问题,用于控制诸如化学液体或特别高纯度液体的流体的流量。
    • 76. 发明申请
    • Control valve
    • 控制阀
    • US20050098748A1
    • 2005-05-12
    • US10917451
    • 2004-08-13
    • Isao Suzuki
    • Isao Suzuki
    • F16K7/16F16K7/14F16K31/06F16K31/12
    • F16K7/14F16K31/06F16K31/1225
    • An actuator operated by a solenoid and a force amplifying means utilizing hydraulic pressure are used in combination with a diaphragm, to thereby provide a diaphragm valve made of Teflon™, and which is compact in size, has low power consumption, and which is capable of exerting a large force. The force amplifying means mainly comprises a cylinder including cylinder portions having different cross-sectional areas and oil filled in the cylinder. A force amplification ratio is equal to a ratio between the cross-sectional areas of the cylinder portions. A plunger which receives a biasing force of a spring is provided on an upper side of the force amplifying means. The plunger is operated by a solenoid, and a driving force of the plunger is amplified by the force amplifying means and transmitted to the diaphragm, thus adjusting a degree of valve opening. A flow rate control valve of the present invention is free from the problems of conventional control valves, and used for controlling a flow rate of a fluid, such as a chemical liquid or an exceptionally high-purity liquid.
    • 由螺线管操作的致动器和利用液压的力放大装置与隔膜结合使用,从而提供由Teflon TM制成的隔膜阀,其尺寸紧凑,功耗低,并且其是 能够施加很大的力量。 力放大装置主要包括一个圆柱体,该圆柱体包括具有不同横截面面积的圆筒部分和填充在圆筒中的油。 力放大率等于圆筒部分的横截面积之间的比率。 接收弹簧的偏置力的柱塞设置在力放大装置的上侧。 柱塞由螺线管操作,并且柱塞的驱动力被力放大装置放大并传递到隔膜,从而调节阀开度。 本发明的流量控制阀没有常规控制阀的问题,用于控制诸如化学液体或特别高纯度液体的流体的流量。
    • 79. 发明授权
    • Method for detecting defects in dielectric film
    • 电介质膜缺陷检测方法
    • US06118280A
    • 2000-09-12
    • US49201
    • 1998-03-27
    • Hideki MatsunagaIsao SuzukiHiroshi TomitaShiro TakenoAkira Okada
    • Hideki MatsunagaIsao SuzukiHiroshi TomitaShiro TakenoAkira Okada
    • G01N27/00G01N1/28G01N21/84H01L21/66
    • G01N21/8422G01N1/2813
    • Disclosed are a method and an apparatus for detecting a defect in a dielectric film. The dielectric film is electrified in an electrolyte solution containing a metal in such a manner the dielectric film is charged negative, thereby the metal is deposited on the dielectric film at a position corresponding to the defect. The detecting method has a first deposition step for forming a first metal deposit on the dielectric film in an annular form surrounding the position corresponding to the defect; and a second deposition step for forming a second metal deposit located on the position corresponding to the defect, on the dielectric film. The detecting apparatus has a vessel for accommodating the electrolyte solution; a first electrode for electrifying the dielectric film and a second electrode; and an electric power source for controlably applying a voltage to electrifying between the first electrode and the second electrode in which a value and a direction of the applied voltage is variable.
    • 公开了一种用于检测电介质膜中的缺陷的方法和装置。 电介质膜以含有金属的电解质溶液的方式通电,使电介质膜带电为负电荷,从而在对应于该缺陷的位置处将金属沉积在电介质膜上。 检测方法具有第一沉积步骤,用于以包围与缺陷相对应的位置的环形形式在电介质膜上形成第一金属沉积物; 以及第二沉积步骤,用于在所述电介质膜上形成位于与所述缺陷相对应的位置上的第二金属沉积物。 检测装置具有用于容纳电解质溶液的容器; 用于使所述电介质膜带电的第一电极和第二电极; 以及用于可控制地施加电压以在所述第一电极和所述第二电极之间通电的电源,其中所述施加电压的值和方向可变。
    • 80. 发明授权
    • Method for manufacturing polycrystal semiconductor film
    • 多晶半导体膜的制造方法
    • US5970368A
    • 1999-10-19
    • US939660
    • 1997-09-29
    • Hideyuki SasakiMichihiro OoseIsao SuzukiShiro TakenoMitsuhiro TomitaYoshito KawakyuYuki MatsuuraHiroshi Mitsuhashi
    • Hideyuki SasakiMichihiro OoseIsao SuzukiShiro TakenoMitsuhiro TomitaYoshito KawakyuYuki MatsuuraHiroshi Mitsuhashi
    • H01L21/20H01L21/205H01L29/04
    • H01L21/2026
    • There is disclosed a method for manufacturing a polycrystal semiconductor film comprising the steps of applying a high energy beam to a surface of a semiconductor film comprising an amorphous or a polycrystal semiconductor provided on a surface of a substrate to melt only the semiconductor film, and solidifying the film via a solid and liquid coexisting state to form a semiconductor film comprising a polycrystal semiconductor having a large grain diameter, by heating a liquid part using a difference in an electric resistance in the liquid and solid coexisting state to heat only the liquid part, and by extending the solidification time until the completion of solidifying of the molten liquid crystal film. Furthermore, as the base film of the semiconductor film, a material having a melting point of 1600.degree. C. and a thermal conductivity of 0.01 cal/cm.s..degree. C. is used to suppress heat dissipation from the molten liquid of the semiconductor to the substrate so that time until the complete solidification can be prolonged. Furthermore, the beam is irradiated so as to form a standing wave at a predetermined position of the surface of the semiconductor film to generate the heat density distribution having the same cycle with the standing wave and to melt the semiconductor film with the result that a polycrystal semiconductor film comprising a uniform and a large crystal grains by controlling the distribution of the crystal nuclei at the interface between the base film and the substrate.
    • 公开了一种制造多晶半导体膜的方法,包括以下步骤:将高能束施加到包括设置在基板表面上的非晶或多晶半导体的半导体膜的表面,以仅熔化半导体膜,并固化 通过固体和液体共存状态形成包含具有大粒径的多晶半导体的半导体膜,通过使用液体中的电阻差和固体共存状态加热液体部分以仅加热液体部分, 并延长凝固时间直到熔融液晶膜凝固完成。 此外,作为半导体膜的基膜,具有熔点为1600℃,导热率为0.01cal / cm 3的材料。 使用DEG来抑制从半导体的熔融液体到基板的散热,从而可以延长直到完全凝固的时间。 此外,照射光束以在半导体膜的表面的预定位置处形成驻波,以产生具有与驻波相同周期的热密度分布并熔化半导体膜,结果是多晶 通过控制在基膜和基板之间的界面处的晶核的分布而包含均匀和大的晶粒的半导体膜。