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71. 发明申请

US20050244995A1 Method for manufacturing display device, liquid crystal telvision, and EL television 有权
标题翻译：制造显示装置，液晶电视和EL电视的方法
公开(公告)号：US20050244995A1
公开(公告)日：2005-11-03
申请号：US11109642
申请日：2005-04-20
申请人： Kunihiko Fukuchi , Toshiyuki Isa , Gen Fujii
发明人： Kunihiko Fukuchi , Toshiyuki Isa , Gen Fujii
IPC分类号： G02F1/1343 , H01L21/768 , H01L21/77 , H01L21/84 , H01L27/32 , H01L51/56
CPC分类号： H01L27/1292 , G02F1/13439 , H01L27/3244 , H01L27/3297 , H01L51/56 , H01L2251/5315 , H01L2251/5323
摘要： An object of the present invention is to provide a method for manufacturing a display device with few steps and high yield. One feature of the invention is to form a first mask pattern having low wettability over a conductive layer, form a second mask pattern having high wettability over the conductive layer using the first mask pattern as a mask, and form a mask pattern for etching the conductive layer by removing the first mask pattern. Another feature is to form a pixel electrode by etching the conductive layer.
摘要翻译：本发明的目的是提供一种制造具有几个步骤和高产率的显示装置的方法。本发明的一个特征是形成在导电层上具有低润湿性的第一掩模图案，使用第一掩模图案作为掩模形成在导电层上具有高润湿性的第二掩模图案，并形成蚀刻导电性的掩模图案通过去除第一掩模图案。另一个特征是通过蚀刻导电层来形成像素电极。

72. 发明申请

US20050163938A1 Display device, method for manufacturing thereof, and television device 有权
标题翻译：显示装置及其制造方法以及电视装置
公开(公告)号：US20050163938A1
公开(公告)日：2005-07-28
申请号：US11042518
申请日：2005-01-26
申请人： Shunpei Yamazaki , Osamu Nakamura , Shinji Maekawa , Gen Fujii , Toshiyuki Isa
发明人： Shunpei Yamazaki , Osamu Nakamura , Shinji Maekawa , Gen Fujii , Toshiyuki Isa
IPC分类号： C25B11/00 , G09G3/20 , G09G3/32 , H01L21/77 , H01L27/32 , H01L51/52 , H05B33/08 , H05B33/10 , H05B33/22
CPC分类号： H01L51/0022 , G09G3/3208 , G09G3/3225 , G09G2300/0842 , G09G2300/0861 , G09G2310/0251 , H01L27/1285 , H01L27/1292 , H01L27/3244 , H01L51/055 , H01L51/529
摘要： The invention provides a display device and a method for manufacturing thereof by increasing a material efficiently as well as simplifying steps. Also, the invention provides a technique for forming a pattern such as a wiring, that is used for forming a display device, to have a predetermined shape with an excellent controllability. The method for manufacturing a display device includes the steps of: forming a lyophobic region; selectively irradiating laser beam in the lyophobic region to form a lyophilic region; selectively discharging a composition, that contains a conductive material, in the lyophilic region to form a gate electrode layer; forming a gate insulating layer and a semiconductor layer over the gate electrode layer; discharging a composition containing a conductive material over the semiconductor layer to form a source electrode layer and a drain electrode layer; and forming a pixel electrode layer on the source or drain electrode layer.
摘要翻译：本发明提供一种显示装置及其制造方法，其通过有效地增加材料以及简化步骤来制造。此外，本发明提供了一种用于形成用于形成显示装置的布线等图案以具有优异的可控性的预定形状的技术。制造显示装置的方法包括以下步骤：形成疏液区域; 选择性地将激光束照射在疏液区域以形成亲液性区域; 选择性地将含有导电材料的组合物在亲液区域中排出以形成栅极电极层; 在栅电极层上形成栅极绝缘层和半导体层; 在半导体层上排出含有导电材料的组合物，以形成源电极层和漏电极层; 以及在源极或漏极电极层上形成像素电极层。

73. 发明授权

US09620714B2 Method for forming pattern, method for manufacturing light emitting device, and light emitting device 有权
公开(公告)号：US09620714B2
公开(公告)日：2017-04-11
申请号：US13213255
申请日：2011-08-19
申请人： Gen Fujii , Erika Takahashi
发明人： Gen Fujii , Erika Takahashi
IPC分类号： H01L51/00 , H01L21/768 , H01L27/32 , H01L51/05 , H01L51/56
CPC分类号： H01L51/0005 , H01L21/76825 , H01L21/76826 , H01L27/3246 , H01L27/3283 , H01L51/0545 , H01L51/56 , Y02P80/30
摘要： Oxidation treatment is performed to the surface of a substrate provided with a photocatalytic conductive film and an insulating film; treatment with a silane coupling agent is performed, so that a silane coupling agent film is formed and the surface of the substrate is modified to be liquid-repellent; and the surface of the substrate is irradiated with light of a wavelength (less than to equal to 390 nm) which has energy of greater than or equal to a band gap of a material for forming the photocatalytic conductive film, so that only the silane coupling agent film over the surface of the photocatalytic conductive film is decomposed and the surface of the photocatalytic conductive film can be modified to be lyophilic.

74. 发明授权

US08558227B2 Semiconductor device and manufacturing method of the same 有权
标题翻译：半导体器件及其制造方法相同
公开(公告)号：US08558227B2
公开(公告)日：2013-10-15
申请号：US13567235
申请日：2012-08-06
申请人： Gen Fujii
发明人： Gen Fujii
IPC分类号： H01L29/10
CPC分类号： H01L21/288 , C23C18/1216 , C23C18/14 , C23C18/1608 , C23C18/165 , C23C18/1651 , C23C18/1893 , H01L27/1285 , H01L27/1292 , H01L29/458 , H01L29/4908
摘要： The manufacturing method of the present invention includes steps of selectively forming a photocatalyst material or a material including an amino group by discharging a composition including the photocatalyst material or the material including an amino group; immersing the photocatalyst material or the material including an amino group in a solution including a plating catalyst material so as to adsorb or deposit the plating catalyst material onto the photocatalyst material or the material including an amino group; and immersing the plating catalyst material in a plating solution including a metal material so as to form a metal film on a surface of the photocatalyst material or the material including an amino group adsorbing or depositing the plating catalyst material, thereby manufacturing a semiconductor device. The pH of the solution including the plating catalyst material is adjusted in a range of 3 to 6.
摘要翻译：本发明的制造方法包括通过排出包含光催化剂材料的组合物或包含氨基的材料来选择性地形成光催化剂材料或包含氨基的材料的步骤; 将光催化剂材料或包含氨基的材料浸入包括镀催化剂材料的溶液中以将镀催化剂材料吸附或沉积到光催化剂材料或包含氨基的材料上; 以及将镀催化剂材料浸渍在包含金属材料的镀液中，以在光催化剂材料的表面上形成金属膜，或者包含吸附或沉积镀催化剂材料的氨基的材料，从而制造半导体器件。包括电镀催化剂材料的溶液的pH调节在3至6的范围内。

75. 发明授权

US08519404B2 Light-emitting device and method for manufacturing the same 有权
公开(公告)号：US08519404B2
公开(公告)日：2013-08-27
申请号：US12562162
申请日：2009-09-18
申请人： Osamu Nakamura , Gen Fujii , Fuminori Tateishi
发明人： Osamu Nakamura , Gen Fujii , Fuminori Tateishi
IPC分类号： H01L29/04 , H01L31/036
CPC分类号： H01L51/0022 , H01L27/12 , H01L27/1222 , H01L27/124 , H01L27/1251 , H01L27/1285 , H01L27/1292 , H01L27/156 , H01L27/3262 , H01L27/3279 , H01L29/42384 , H01L29/66765 , H01L29/78669 , H01L29/78696 , H01L51/56 , H01L2227/323
摘要： The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.

76. 发明授权

US08518728B2 Semiconductor element, method for manufacturing the same, liquid crystal display device, and method for manufacturing the same 有权
标题翻译：半导体元件及其制造方法，液晶显示装置及其制造方法
公开(公告)号：US08518728B2
公开(公告)日：2013-08-27
申请号：US12983336
申请日：2011-01-03
申请人： Yohei Kanno , Gen Fujii
发明人： Yohei Kanno , Gen Fujii
IPC分类号： H01L21/00 , H01L21/84 , H01L51/40
CPC分类号： H01L29/66765 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L29/42384 , H01L29/78603 , H01L29/78696
摘要： In case that a conventional TFT is formed to have an inversely staggered type, a resist mask is required to be formed by an exposing, developing, and droplet discharging in forming an island-like semiconductor region. It resulted in the increase in the number of processes and the number of materials. According to the present invention, a process can be simplified since after forming a source region and a drain region, a portion serving as a channel region is covered by an insulating film serving as a channel protecting film to form an island-like semiconductor film, and so a semiconductor element can be manufactured by using only metal mask without using a resist mask.
摘要翻译：在常规TFT形成为具有反交错型的情况下，需要通过在形成岛状半导体区域中的曝光，显影和液滴放电来形成抗蚀剂掩模。这导致过程数量和材料数量的增加。根据本发明，由于在形成源极区域和漏极区域之后，由于作为沟道区域的部分被用作沟道保护膜的绝缘膜覆盖以形成岛状半导体膜，因此可以简化工艺，因此可以仅使用金属掩模而不使用抗蚀剂掩模来制造半导体元件。

77. 发明申请

US20120091444A1 Display Device and Method for Manufacturing Display Device 有权
标题翻译：显示设备和显示设备制造方法
公开(公告)号：US20120091444A1
公开(公告)日：2012-04-19
申请号：US13333304
申请日：2011-12-21
申请人： Gen Fujii , Erika Takahashi , Erumu Kikuchi , Sachiko Kawakami
发明人： Gen Fujii , Erika Takahashi , Erumu Kikuchi , Sachiko Kawakami
IPC分类号： H01L51/54
CPC分类号： H01L51/0004 , H01L27/3246 , H01L27/3283
摘要： To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.
摘要翻译：提供具有更高图像质量和可靠性的显示设备或具有低成本且高生产率的大屏幕的大尺寸显示设备。在显示装置中使用的功能层（例如着色层或像素电极层）通过将液体功能层形成材料排出到形成有包含第一有机化合物的层的开口而形成，该第一有机化合物具有C-N 键或作为碱的主链中的C-O键和包含第二有机化合物作为隔板的层。控制附着在包含有机化合物的层的表面上对液体功能层形成材料具有疏液性的氟密度，从而可以选择性地形成疏液区域和亲液性区域。

78. 发明申请

US20110212558A1 LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US20110212558A1
公开(公告)日：2011-09-01
申请号：US13101766
申请日：2011-05-05
申请人： Shunpei YAMAZAKI , Shinji MAEKAWA , Gen Fujii , Hideaki KUWABARA
发明人： Shunpei YAMAZAKI , Shinji MAEKAWA , Gen Fujii , Hideaki KUWABARA
IPC分类号： H01L21/336
CPC分类号： G02F1/13458 , G02F1/136227 , G02F1/136286 , G02F2001/13415 , G02F2001/136295 , H01L27/1292
摘要： As a substrate gets larger, time of manufacture is increased due to the repetition of film formations and etchings; waste disposal costs of etchant and the like are increased; and material efficiency is significantly reduced. A base film for improving adhesion between a substrate and a material layer formed by a droplet discharge method is formed in the invention. Further, a manufacturing method of a liquid crystal display device according to the invention includes at least one step for forming the following patterns required for manufacturing a liquid crystal display device without using a photomask: a pattern of a material layer typified by a wiring (or an electrode) pattern, an insulating layer pattern; or a mask pattern for forming another pattern.
摘要翻译：由于重复膜形成和蚀刻，衬底越来越大，制造时间增加; 蚀刻剂等的废物处理成本增加; 材料效率显着降低。在本发明中形成了用于改善基板和通过液滴喷射方法形成的材料层之间的粘附性的基膜。此外，根据本发明的液晶显示装置的制造方法包括至少一个步骤，用于形成在不使用光掩模的情况下制造液晶显示装置所需的以下图案：以布线为代表的材料层的图案（或电极）图案，绝缘层图案; 或用于形成另一图案的掩模图案。

79. 发明授权

US07951710B2 Method for manufacturing thin film transistor and display device 有权
标题翻译：制造薄膜晶体管和显示装置的方法
公开(公告)号：US07951710B2
公开(公告)日：2011-05-31
申请号：US10586661
申请日：2005-02-15
申请人： Gen Fujii
发明人： Gen Fujii
IPC分类号： H01L21/44 , H01L21/00
CPC分类号： H01L29/66742 , G02F2001/136295 , H01L21/288 , H01L27/1285 , H01L27/1292 , H05K3/1241
摘要： The present invention discloses a display device and a manufacturing method thereof by which a manufacturing process can be simplified. Further, the present invention discloses technique for manufacturing a pattern such as a wiring into a desired shape with good controllability. A method for forming a pattern for constituting the display device according to the present invention comprises the steps of forming a first region and a second region; discharging a composition containing a pattern formation material to a region across the second region and the first region; and flowing a part of the composition discharged to the first region into the second region; wherein wettability with respect to the composition of the first region is lower than that of the second composition.
摘要翻译：本发明公开了一种可以简化制造工艺的显示装置及其制造方法。此外，本发明公开了一种用于将诸如布线的图案制造成具有良好可控性的期望形状的技术。根据本发明的用于形成用于构成显示装置的图案的方法包括以下步骤：形成第一区域和第二区域; 将含有图案形成材料的组合物排放到横跨第二区域和第一区域的区域; 并将排出到第一区域的组合物的一部分流入第二区域; 其中相对于第一区域的组合物的润湿性低于第二组合物的润湿性。

80. 发明授权

US07827521B2 Method for manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US07827521B2
公开(公告)日：2010-11-02
申请号：US11964251
申请日：2007-12-26
申请人： Gen Fujii , Erika Takahashi
发明人： Gen Fujii , Erika Takahashi
IPC分类号： G06F17/50
CPC分类号： H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： When a design diagram of the semiconductor device by a conventional CAD tool is used, a pattern which can be formed with the ink-jet apparatus is limited; therefore, there is a possibility that some circuits of the desired semiconductor device cannot be formed as they are designed. A plurality of basic patterns which can be obtained by discharging with the ink-jet apparatus are prepared, and layout of a desired integrated circuit is performed by combining the patterns. A light-exposure mask is formed based on the layout obtained. Light exposure is performed using the light-exposure mask. Then, development is performed, and the resist film remains in the light-exposed region of which width is narrower than the diameter of the droplet landed. Liquid repellent treatment is performed to an exposed portion on the surface, and then the material droplet is dropped over the resist film. Discharging is selectively performed by a droplet discharging method to form a wiring of which width is narrower than the dot diameter.
摘要翻译：当使用通过常规CAD工具的半导体器件的设计图时，可以用喷墨设备形成的图案是有限的; 因此，有可能在设计期间不能形成期望的半导体器件的一些电路。准备通过喷墨装置放电可获得的多种基本图案，并通过组合图案来执行期望的集成电路的布局。基于获得的布局形成曝光掩模。使用曝光掩模进行曝光。然后，进行显影，并且抗蚀剂膜保持在其暴露的区域中，其宽度比着落的液滴的直径窄。对表面上的暴露部分进行疏液处理，然后将材料滴落在抗蚀剂膜上。通过液滴喷射法选择性地进行排出，形成宽度比点直径窄的布线。

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