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    • 1. 发明申请
    • Display Device and Method for Manufacturing Display Device
    • 显示设备和显示设备制造方法
    • US20120091444A1
    • 2012-04-19
    • US13333304
    • 2011-12-21
    • Gen FujiiErika TakahashiErumu KikuchiSachiko Kawakami
    • Gen FujiiErika TakahashiErumu KikuchiSachiko Kawakami
    • H01L51/54
    • H01L51/0004H01L27/3246H01L27/3283
    • To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.
    • 提供具有更高图像质量和可靠性的显示设备或具有低成本且高生产率的大屏幕的大尺寸显示设备。 在显示装置中使用的功能层(例如着色层或像素电极层)通过将液体功能层形成材料排出到形成有包含第一有机化合物的层的开口而形成,该第一有机化合物具有C-N 键或作为碱的主链中的C-O键和包含第二有机化合物作为隔板的层。 控制附着在包含有机化合物的层的表面上对液体功能层形成材料具有疏液性的氟密度,从而可以选择性地形成疏液区域和亲液性区域。
    • 2. 发明授权
    • Display device and method for manufacturing display device
    • 显示装置及其制造方法
    • US08083956B2
    • 2011-12-27
    • US12246947
    • 2008-10-07
    • Gen FujiiErika TakahashiErumu KikuchiSachiko Kawakami
    • Gen FujiiErika TakahashiErumu KikuchiSachiko Kawakami
    • H01L21/302
    • H01L51/0004H01L27/3246H01L27/3283
    • To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.
    • 提供具有更高图像质量和可靠性的显示设备或具有低成本且高生产率的大屏幕的大尺寸显示设备。 在显示装置中使用的功能层(例如着色层或像素电极层)通过将液体功能层形成材料排出到形成有包含第一有机化合物的层的开口而形成,该第一有机化合物具有C-N 键或作为碱的主链中的C-O键和包含第二有机化合物作为隔板的层。 控制附着在包含有机化合物的层的表面上对液体功能层形成材料具有疏液性的氟密度,从而可以选择性地形成疏液区域和亲液性区域。
    • 4. 发明授权
    • Display device and method for manufacturing display device
    • 显示装置及其制造方法
    • US08847482B2
    • 2014-09-30
    • US13333304
    • 2011-12-21
    • Gen FujiiErika TakahashiErumu KikuchiSachiko Kawakami
    • Gen FujiiErika TakahashiErumu KikuchiSachiko Kawakami
    • H01L51/00H01L27/32
    • H01L51/0004H01L27/3246H01L27/3283
    • To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.
    • 提供具有更高图像质量和可靠性的显示设备或具有低成本且高生产率的大屏幕的大尺寸显示设备。 在显示装置中使用的功能层(例如着色层或像素电极层)通过将液体功能层形成材料排出到形成有包含第一有机化合物的层的开口而形成,该第一有机化合物具有C-N 键或作为碱的主链中的C-O键和包含第二有机化合物作为隔板的层。 控制附着在包含有机化合物的层的表面上对液体功能层形成材料具有疏液性的氟密度,从而可以选择性地形成疏液区域和亲液性区域。
    • 6. 发明申请
    • LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 液晶显示装置及其制造方法
    • US20090109388A1
    • 2009-04-30
    • US12258866
    • 2008-10-27
    • Erika TAKAHASHIGen FujiiShuji FukaiTakeshi Nishi
    • Erika TAKAHASHIGen FujiiShuji FukaiTakeshi Nishi
    • G02F1/1339G02F1/1333G02F1/1337
    • G02F1/13394G02F1/13392G02F2202/28
    • To control the positioning of a spacer more accurately in a liquid crystal display device to prevent display defects due to incorrect positioning in a display region. To provide a liquid crystal display device with higher image quality and reliability, and to provide a method for manufacturing the liquid crystal display device with high yield. In a liquid crystal display device, a region onto which a spherical spacer is discharged is subjected to liquid-repellent treatment in order to reduce the wettability with respect to a liquid in which the spherical spacer is dispersed. The liquid (the droplet) does not spread over the liquid-repellent region and is dried while moving the spherical spacer toward the center of the liquid. Thus, incorrect positioning shortly after discharging, which has been caused by the loss of control in the liquid, can be corrected by moving the spherical spacer while drying the liquid.
    • 为了在液晶显示装置中更准确地控制间隔物的定位,以防止由于在显示区域中的不正确定位而引起的显示缺陷。 提供具有更高图像质量和可靠性的液晶显示装置,并且提供一种以高产量制造液晶显示装置的方法。 在液晶显示装置中,为了降低相对于其中分散有球形间隔物的液体的润湿性,对排出球形间隔物的区域进行拒水处理。 液体(液滴)不会在液体排斥区域上扩散,并且在将球形间隔物朝向液体的中心移动的同时被干燥。 因此,可以通过在干燥液体的同时移动球形间隔物来校正由于液体中的失控而引起的放电后不正确的定位。
    • 7. 发明授权
    • Manufacturing method of semiconductor device and semiconductor device
    • 半导体器件和半导体器件的制造方法
    • US08330157B2
    • 2012-12-11
    • US12911041
    • 2010-10-25
    • Gen FujiiErika Takahashi
    • Gen FujiiErika Takahashi
    • H01L29/10
    • H01L51/0022H01L51/0533H01L51/0545
    • A method of manufacturing a semiconductor device includes steps of forming a gate electrode over a light-transmitting substrate, forming a gate insulating layer containing an inorganic material over the gate electrode and the substrate, forming an organic layer containing a photopolymerizable reactive group over the gate insulating layer, polymerizing selectively the organic layer by irradiating the organic layer with light from back side of the substrate, using the gate electrode as a mask, forming an organic polymer layer by removing a residue of the organic layer, being other than polymerized, forming an organosilane film including a hydrolytic group over the gate insulating layer in a region other than a region in which the organic polymer layer is formed, forming source and drain electrodes by applying a composition containing a conductive material over the organic polymer layer, and forming a semiconductor layer over the gate electrode, the source and drain electrodes.
    • 一种制造半导体器件的方法包括以下步骤:在透光衬底上形成栅电极,在栅电极和衬底上形成含有无机材料的栅极绝缘层,在栅极上形成含有可光聚合反应性基团的有机层 通过使用栅电极作为掩模从基板的背面用光照射有机层来选择性地聚合有机层,通过除去除了聚合的有机层的残留物形成有机聚合物层,形成 在除了形成有机聚合物层的区域以外的区域的栅极绝缘层上包含水解基团的有机硅烷膜,通过在有机聚合物层上涂布含有导电性材料的组合物形成源极和漏极,形成 栅电极上的半导体层,源极和漏极。
    • 8. 发明授权
    • Manufacturing method of semiconductor device and semiconductor device
    • 半导体器件和半导体器件的制造方法
    • US07825407B2
    • 2010-11-02
    • US12639274
    • 2009-12-16
    • Gen FujiiErika Takahashi
    • Gen FujiiErika Takahashi
    • H01L51/40
    • H01L51/0022H01L51/0533H01L51/0545
    • A method of manufacturing a semiconductor device includes steps of forming a gate electrode over a light-transmitting substrate, forming a gate insulating layer containing an inorganic material over the gate electrode and the substrate, forming an organic layer containing a photopolymerizable reactive group over the gate insulating layer, polymerizing selectively the organic layer by irradiating the organic layer with light from back side of the substrate, using the gate electrode as a mask, forming an organic polymer layer by removing a residue of the organic layer, being other than polymerized, forming an organosilane film including a hydrolytic group over the gate insulating layer in a region other than a region in which the organic polymer layer is formed, forming source and drain electrodes by applying a composition containing a conductive material over the organic polymer layer, and forming a semiconductor layer over the gate electrode, the source and drain electrodes.
    • 一种制造半导体器件的方法包括以下步骤:在透光衬底上形成栅电极,在栅电极和衬底上形成含有无机材料的栅极绝缘层,在栅极上形成含有可光聚合反应性基团的有机层 通过使用栅电极作为掩模从基板的背面用光照射有机层来选择性地聚合有机层,通过除去除了聚合的有机层的残留物形成有机聚合物层,形成 在除了形成有机聚合物层的区域以外的区域的栅极绝缘层上包含水解基团的有机硅烷膜,通过在有机聚合物层上涂布含有导电性材料的组合物形成源极和漏极,形成 栅电极上的半导体层,源极和漏极。
    • 10. 发明授权
    • Method for manufacturing semiconductor device
    • 制造半导体器件的方法
    • US07827521B2
    • 2010-11-02
    • US11964251
    • 2007-12-26
    • Gen FujiiErika Takahashi
    • Gen FujiiErika Takahashi
    • G06F17/50
    • H01L22/12H01L2924/0002H01L2924/00
    • When a design diagram of the semiconductor device by a conventional CAD tool is used, a pattern which can be formed with the ink-jet apparatus is limited; therefore, there is a possibility that some circuits of the desired semiconductor device cannot be formed as they are designed. A plurality of basic patterns which can be obtained by discharging with the ink-jet apparatus are prepared, and layout of a desired integrated circuit is performed by combining the patterns. A light-exposure mask is formed based on the layout obtained. Light exposure is performed using the light-exposure mask. Then, development is performed, and the resist film remains in the light-exposed region of which width is narrower than the diameter of the droplet landed. Liquid repellent treatment is performed to an exposed portion on the surface, and then the material droplet is dropped over the resist film. Discharging is selectively performed by a droplet discharging method to form a wiring of which width is narrower than the dot diameter.
    • 当使用通过常规CAD工具的半导体器件的设计图时,可以用喷墨设备形成的图案是有限的; 因此,有可能在设计期间不能形成期望的半导体器件的一些电路。 准备通过喷墨装置放电可获得的多种基本图案,并通过组合图案来执行期望的集成电路的布局。 基于获得的布局形成曝光掩模。 使用曝光掩模进行曝光。 然后,进行显影,并且抗蚀剂膜保持在其暴露的区域中,其宽度比着落的液滴的直径窄。 对表面上的暴露部分进行疏液处理,然后将材料滴落在抗蚀剂膜上。 通过液滴喷射法选择性地进行排出,形成宽度比点直径窄的布线。