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    • 71. 发明申请
    • One-Time Programmable Memory and Operating Method Thereof
    • 一次性可编程存储器及其操作方法
    • US20090323387A1
    • 2009-12-31
    • US12146753
    • 2008-06-26
    • Chrong-Jung LinYa-Chin King
    • Chrong-Jung LinYa-Chin King
    • G11C17/00H01L29/76G11C7/00
    • H01L29/4983H01L27/112H01L27/11206H01L27/11226
    • A one-time programmable memory cell is provided, the one-time programmable memory cell comprises: a gate dielectric layer disposed on a well; a gate electrode disposed on the gate dielectric layer; source/drain regions disposed in the well at the sides of the gate electrode, respectively; a first salicide layer disposed on one of the source/drain regions; a capacitive dielectric layer disposed on the gate electrode and the other of the source/drain regions; a first conductive plug disposed on the first salicide layer; and a second conductive plug disposed on the capacitive dielectric layer. The size of the first conductive plug is different form the size of the second conductive plug.
    • 提供一次性可编程存储单元,一次性可编程存储单元包括:设置在阱上的栅介质层; 设置在所述栅极介电层上的栅电极; 源极/漏极区域分别设置在栅电极的侧面的阱中; 设置在所述源极/漏极区域之一上的第一自对准硅化物层; 设置在所述栅极电极和所述源极/漏极区域中的另一个之间的电容性介电层; 设置在所述第一自对准硅化物层上的第一导电插塞; 以及设置在所述电容电介质层上的第二导电插塞。 第一导电插头的尺寸与第二导电插头的尺寸不同。
    • 75. 发明申请
    • MOS based nonvolatile memory cell and method of operating the same
    • 基于MOS的非易失性存储单元及其操作方法
    • US20070297224A1
    • 2007-12-27
    • US11475114
    • 2006-06-27
    • Ya-Chin KingChrong-Jung Lin
    • Ya-Chin KingChrong-Jung Lin
    • G11C16/06G11C16/04G11C11/34
    • G11C16/0475G11C16/0425G11C16/10H01L29/42348H01L29/7923
    • A non-volatile memory cell formed on a sidewall of MOS transistor and method of operating the same are disclosed. The MOS based non-volatile memory cell is formed in the n-well and compatible with CMOS processes comprising a selecting gate, two ONO spacers, a p+ source/drain, and a p extended source region and an n extended drain. To program the cell, two strategies can be taken: (1) a band to band hot electron injection can be carried out and (2) channel hot hole induced hot electron injection. To read the nonvolatile cell, a reverse read is taken. In the reading process, the biased on the selecting gate has to make sure form a channel beneath selecting gate having its narrower end contacting with a the depletion boundary due to a reverse bias exerted on the source and n-well body so that if the cell stored with electron therein, a hole current flowing from the drain to the source can be read. To erase the datum in the cell, two approaching can be carried out. One is by FN erase, the other is by band to band induced hot hole injection.
    • 公开了一种形成在MOS晶体管的侧壁上的非易失性存储单元及其操作方法。 基于MOS的非易失性存储单元形成在n阱中并且与包括选择栅极,两个ONO间隔物,p +源极/漏极以及p扩展源极区域和n个延伸漏极的CMOS工艺兼容。 为了对电池进行编程,可以采取两种策略:(1)可以进行带带热电子注入,(2)通道热孔诱导热电子注入。 要读取非易失性单元,进行反向读取。 在读取过程中,由于施加在源极和n阱体上的反向偏压,选择栅极上的偏置必须确保形成其选择栅极之下的通道,其中窄栅极具有与耗尽边界接触的较窄端,使得如果电池 与其中的电子一起存储,可以读取从漏极流到源极的空穴电流。 要擦除单元格中的基准,可以进行两次逼近。 一种是通过FN擦除,另一种是通过频带带诱导热空穴注入。