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71. 发明申请

US20080160212A1 METHOD AND APPARATUSES FOR PROVIDING ELECTRICAL CONTACT FOR PLASMA PROCESSING APPLICATIONS 审中-公开
标题翻译：用于提供等离子体处理应用的电气接触的方法和装置
公开(公告)号：US20080160212A1
公开(公告)日：2008-07-03
申请号：US11616314
申请日：2006-12-27
申请人： Bon-Woong Koo , Steven R. Walther , Christopher J. Leavitt , Justin Tocco , Sung-Hwan Hyun , Timothy J. Miller , Jay T. Scheuer , Atul Gupta , Vikram Singh , Deven Raj
发明人： Bon-Woong Koo , Steven R. Walther , Christopher J. Leavitt , Justin Tocco , Sung-Hwan Hyun , Timothy J. Miller , Jay T. Scheuer , Atul Gupta , Vikram Singh , Deven Raj
IPC分类号： B28B7/38 , C23C16/00
CPC分类号： H01J37/32706 , H01J37/32623 , H01L21/67011 , H01L21/67069 , H01L21/68714 , H01L21/68735
摘要： A method and apparatuses for providing improved electrical contact to a semiconductor wafer during plasma processing applications are disclosed. In one embodiment, an apparatus includes a wafer platen for supporting the wafer; and a plurality of electrical contact elements, each of the plurality of electrical contact elements are configured to provide a path for supplying a bias voltage from a bias power supply to the wafer on the wafer platen. The plurality of electrical contact elements are also geometrically arranged such that at least one electrical contact element contacts an inner surface region (e.g., region between a center of wafer and a distance approximately half of the radius of the wafer) and at least one electrical contact element contacts an outer annular surface region (e.g., region between an outer edge of wafer and a distance approximately half of the radius of the wafer).
摘要翻译：公开了一种用于在等离子体处理应用期间提供与半导体晶片的改进的电接触的方法和装置。在一个实施例中，一种装置包括用于支撑晶片的晶片台板; 以及多个电接触元件，所述多个电接触元件中的每一个被配置为提供用于将来自偏置电源的偏置电压提供给晶片台板上的晶片的路径。多个电接触元件也被几何地布置成使得至少一个电接触元件接触内表面区域（例如，晶片的中心与晶片的半径的一半的距离）和至少一个电接触元件接触外部环形表面区域（例如，晶片的外边缘之间的区域和晶片的半径的一半的距离）。

72. 发明授权

US07348576B2 Technique for ion beam angle process control 有权
标题翻译：离子束角过程控制技术
公开(公告)号：US07348576B2
公开(公告)日：2008-03-25
申请号：US11146064
申请日：2005-06-07
申请人： Atul Gupta , Joseph C. Olson
发明人： Atul Gupta , Joseph C. Olson
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01L21/26586 , H01J37/304 , H01J37/3171 , H01J2237/24528 , H01J2237/30455 , H01J2237/30472 , H01J2237/31703 , H01L29/66803 , H01L29/785
摘要： A technique for ion beam angle process control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle process control in an ion implanter system. The method may comprise directing one or more ion beams at a substrate surface. The method may also comprise determining an average spread of incident angles at which the one or more ion beams strike the substrate surface. The method may further comprise adjusting the one or more ion beams based at least in part on the average spread of incident angles to produce a desired spread of ion beam incident angles.
摘要翻译：公开了一种用于离子束角过程控制的技术。在一个特定的示例性实施例中，该技术可以被实现为离子注入机系统中的离子束角度过程控制的方法。该方法可以包括在衬底表面处引导一个或多个离子束。该方法还可以包括确定一个或多个离子束撞击衬底表面的入射角的平均扩展。该方法还可以包括至少部分地基于入射角的平均扩展来调整一个或多个离子束，以产生期望的离子束入射角的扩展。

73. 发明申请

US20070224840A1 Method of Plasma Processing with In-Situ Monitoring and Process Parameter Tuning 审中-公开
标题翻译：等离子体处理方法采用现场监测和工艺参数调整
公开(公告)号：US20070224840A1
公开(公告)日：2007-09-27
申请号：US11687822
申请日：2007-03-19
申请人： Anthony Renau , Vikram Singh , Atul Gupta , Timothy Miller , Edwin Arevalo , George Papasouliotis , Yong Bae Jeon
发明人： Anthony Renau , Vikram Singh , Atul Gupta , Timothy Miller , Edwin Arevalo , George Papasouliotis , Yong Bae Jeon
IPC分类号： H01L21/00 , H01L21/336 , H01L21/22 , H01L21/38
CPC分类号： H01J37/32935 , H01J37/32412 , H01J37/3299 , H01L22/20
摘要： A method of selecting plasma doping process parameters includes determining a recipe parameter database for achieving at least one plasma doping condition. The initial recipe parameters are determined from the recipe parameter database. In-situ measurements of at least one plasma doping condition are performed. The in-situ measurements of the at least one plasma doping condition are correlated to at least one plasma doping result. At least one recipe parameter is changed in response to the correlation so as to improve at least one plasma doping process performance metric.
摘要翻译：选择等离子体掺杂工艺参数的方法包括确定用于实现至少一种等离子体掺杂条件的配方参数数据库。从配方参数数据库确定初始配方参数。进行至少一个等离子体掺杂条件的原位测量。至少一种等离子体掺杂条件的原位测量与至少一种等离子体掺杂结果相关。响应于相关性改变至少一个配方参数，以便改进至少一个等离子体掺杂工艺性能度量。

74. 发明申请

US20060224437A1 Systems and methods for customer relationship evaluation and resource allocation 有权
标题翻译：用于客户关系评估和资源分配的系统和方法
公开(公告)号：US20060224437A1
公开(公告)日：2006-10-05
申请号：US11244707
申请日：2005-10-06
申请人： Atul Gupta , Gautam Samanta
发明人： Atul Gupta , Gautam Samanta
IPC分类号： G06F17/30
CPC分类号： G06Q10/06 , G06Q10/0637 , G06Q10/06393 , G06Q30/0203 , G06Q30/0205
摘要： Customer relationships, particularly in a business-to-business environment, are evaluated and enhanced by generating actionable inferences through the measurement and analysis of both customer satisfaction and customer importance. Customer satisfaction information is captured from both an internal channel comprising key internal customer contacts or boundary employees, as well as an external channel comprising representatives from a plurality of identified respondent profile groups. Customer Importance is also considered in the overall analysis and interpretation of the customer satisfaction. By incorporating all the internally reported customer satisfaction, the externally obtained satisfaction figures and the customer importance scores, a framework is provided for the analysis of various relationships which can help to identify relationships that are in critical need of attention, isolate critical areas of improvement, and identify trends across various respondent profiles and lifecycle phases in a manner that optimizes the use of vendor organizational resources.
摘要翻译：通过测量和分析客户满意度和客户重要性，通过产生可操作的推论来评估和增强客户关系，特别是企业对企业环境。从包括关键内部客户联系人或边界雇员的内部渠道以及包括来自多个识别的受访者简档组的代表的外部渠道捕获客户满意度信息。在客户满意度的整体分析和解释中也考虑到客户的重要性。通过纳入所有内部报告的客户满意度，外部获得的满意度数据和客户重要度分数，提供了一个框架，用于分析各种关系，可以帮助确定关键需要关注的关系，隔离关键的改进领域，并以优化供应商组织资源的使用的方式来识别各种受访者概况和生命周期阶段的趋势。

75. 发明授权

US07065134B2 Adaptive equalizer with large data rate range 有权
公开(公告)号：US07065134B2
公开(公告)日：2006-06-20
申请号：US09940053
申请日：2001-08-27
申请人： Vasilis Papanikolaou , Apu Sivadas , Atul Gupta , Hossein Shakiba
发明人： Vasilis Papanikolaou , Apu Sivadas , Atul Gupta , Hossein Shakiba
IPC分类号： H03K5/159 , H03H7/30
CPC分类号： H04B3/145 , H04L25/03885
摘要： An adaptive equalizer with a large data rate range is provided. The equalizer comprises an equalizer core, a slicer and an automatic gain control (AGC) loop. The equalizer core is coupled to an input signal from a transmission medium and applies a transfer function to the input signal to compensate for losses incurred in the transmission medium in order to generate a core output signal. The equalizer core is also coupled to a bandwidth control signal that controls a bandwidth of the transfer function. The slicer is coupled to the core output signal and converts the core output signal to a digital output signal having a fixed digital output swing that approximates a transmission swing of the input signal prior to transmission over the transmission medium. The AGC loop is coupled to the core output signal and the digital output signal and compares the core output signal with the digital output signal in order to generate the bandwidth control signal.

76. 发明申请

US20050254565A1 Transmit amplitude independent adaptive equalizer 有权
标题翻译：发射幅度独立自适应均衡器
公开(公告)号：US20050254565A1
公开(公告)日：2005-11-17
申请号：US11187265
申请日：2005-07-22
申请人： Apu Sivadas , Atul Gupta , Kenneth Lazaris-Brunner , Vasilis Papanikolaou , Rajiv Shukla , Bharat Tailor
发明人： Apu Sivadas , Atul Gupta , Kenneth Lazaris-Brunner , Vasilis Papanikolaou , Rajiv Shukla , Bharat Tailor
IPC分类号： H04L25/03 , H03H7/30 , H03H21/00 , H04B3/04 , H04L25/00 , H04L27/08
CPC分类号： H04L25/03885
摘要： Transmit amplitude independent adaptive equalizers are provided that compensate for transmission losses in an input signal when the transmit signal amplitude is unknown. Several embodiments are provided, including a first embodiment having an equalizer core, a controllable-swing slicer and an amplitude control loop, a second embodiment having an equalizer core, a fixed-swing slicer and a control loop, a third embodiment having an equalizer core, a variable gain amplifier, and a variable gain amplifier control loop, and a fourth embodiment having an equalizer core, a fixed-swing slicer, a variable gain amplifier, and a variable gain amplifier control loop.
摘要翻译：提供发射幅度独立的自适应均衡器，当发射信号幅度未知时，其补偿输入信号中的传输损耗。提供了几个实施例，包括具有均衡器核心，可控摆动限幅器和幅度控制环路的第一实施例，具有均衡器核心，固定摆动切片器和控制回路的第二实施例，具有均衡器核心，可变增益放大器和可变增益放大器控制环路，以及具有均衡器核心，固定摆幅限幅器，可变增益放大器和可变增益放大器控制环路的第四实施例。

77. 发明授权

US6034554A Phase detector for high speed clock recovery from random binary signals 失效
标题翻译：相位检测器，用于从随机二进制信号中恢复高速时钟
公开(公告)号：US6034554A
公开(公告)日：2000-03-07
申请号：US53705
申请日：1998-04-02
申请人： John R. Francis , Atul Gupta
发明人： John R. Francis , Atul Gupta
IPC分类号： H03K5/26 , H03D13/00 , H03L7/08 , H03L7/085 , H03L7/089 , H03L7/091 , H04L7/033
CPC分类号： H03L7/0893 , H03D13/004 , H03L7/085 , H04L7/033
摘要： An improved phase detector for detecting the difference between an information signal and a clock signal is provided. The information signal is divided into a plurality of N divided signals, the data rate of each divided signal being the data rate of the information signal divided by N. A plurality of N variable width difference pulse signals are generated each being responsive to the phase difference between a divided signal and the clock signal. One or more fixed width reference pulse signals having a width proportional to one-half clock period are also generated. A phase error signal is then provided in response to the N difference pulse signals and the one or more reference pulse signals. Preferably, N is equal to 2.sup.M, where M is a positive integer greater than or equal to one.
摘要翻译：提供了一种用于检测信息信号和时钟信号之间的差异的改进的相位检测器。信息信号被分成多个N个分割信号，每个划分信号的数据速率是信息信号的数据速率除以N。产生多个N个可变宽度差异脉冲信号，每个可变宽度差脉冲信号响应于相位差在分频信号和时钟信号之间。还产生一个或多个具有与半个时钟周期成比例的宽度的固定宽度参考脉冲信号。然后响应于N个差分脉冲信号和一个或多个参考脉冲信号提供相位误差信号。优选地，N等于2M，其中M是大于或等于1的正整数。

78. 发明授权

US10250580B2 Out-of band remote authentication 有权
公开(公告)号：US10250580B2
公开(公告)日：2019-04-02
申请号：US13976063
申请日：2011-09-30
申请人： Abdul M. Bailey , Ned M. Smith , Atul Gupta
发明人： Abdul M. Bailey , Ned M. Smith , Atul Gupta
IPC分类号： H04L29/06 , H04L9/32 , H04W12/06
摘要： In an embodiment a single user authentication event, performed between a trusted path hardware module and a service provider via an out of band communication, can enable a user to transparently access multiple service providers using strong credentials that are specific to each service provider. The authentication event may be based on multifactor authentication that is indicative of a user's actual physical presence. Thus, for example, a user would not need to enter a different retinal scan to gain access to each of the service providers. Other embodiments are described herein.

79. 发明申请

US20150012718A1 SYSTEM FOR COMPENSATING FOR DYNAMIC SKEW IN MEMORY DEVICES 审中-公开
标题翻译：用于对存储器件中的动态补偿进行补偿的系统
公开(公告)号：US20150012718A1
公开(公告)日：2015-01-08
申请号：US13935554
申请日：2013-07-04
申请人： Atul Gupta , Ajay Gaite
发明人： Atul Gupta , Ajay Gaite
IPC分类号： G11C7/22 , G06F1/08
CPC分类号： G11C7/22 , G06F1/08 , G06F1/10
摘要： A memory device includes a memory array, a memory controller, data lines connecting the memory array and the memory controller, and a delay compensation module. The delay compensation module includes a delay line that provides delayed clock signals, a look-up table that stores a mapping between predefined data bit patterns and corresponding propagation delays for each data line, and delay compensation logic modules corresponding to the data lines. The delay compensation logic modules receive data bit patterns carried by the data lines, select propagation delays based on the data bit patterns and the look-up table data, and delay the bits carried by corresponding ones of the data lines based on delayed clock signals corresponding to the propagation delays.
摘要翻译：存储器件包括存储器阵列，存储器控制器，连接存储器阵列和存储器控制器的数据线以及延迟补偿模块。延迟补偿模块包括提供延迟时钟信号的延迟线，存储预定数据位模式与每条数据线的对应传播延迟之间的映射的查找表以及对应于数据线的延迟补偿逻辑模块。延迟补偿逻辑模块接收数据线承载的数据位模式，根据数据位模式和查找表数据选择传播延迟，并根据对应的延迟时钟信号延迟对应的数据线承载的位到传播延迟。

80. 发明授权

US08765583B2 Angled multi-step masking for patterned implantation 有权
标题翻译：用于图案化植入的角度多步骤掩模
公开(公告)号：US08765583B2
公开(公告)日：2014-07-01
申请号：US13029840
申请日：2011-02-17
申请人： Benjamin Riordon , Nicholas Bateman , Atul Gupta
发明人： Benjamin Riordon , Nicholas Bateman , Atul Gupta
IPC分类号： H01L21/331 , H01L21/425 , H01L21/265
CPC分类号： H01L21/26586 , H01L21/266 , H01L31/068 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of tilting a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. The mask and substrate are tilted at a first angle relative to the incoming ion beam. After the substrate is exposed to the ion beam, the mask and substrate are tilted at a second angle relative to the ion beam and a subsequent implant step is performed. Through the selection of the aperture size and shape, the cross-section of the mask, the distance between the mask and the substrate and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions.
摘要翻译：公开了一种倾斜掩模以执行衬底的图案植入的改进方法。掩模具有多个孔，并且被放置在离子源和基底之间。掩模和基底相对于入射离子束以第一角度倾斜。在衬底暴露于离子束之后，掩模和衬底相对于离子束以第二角度倾斜，并且执行随后的注入步骤。通过选择孔径尺寸和形状，掩模的横截面，掩模和衬底之间的距离以及植入步骤的数量，可以产生各种种植体图案。在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。在一些实施例中，植入模式包括重掺杂区域格栅。

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