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71. 发明授权

US09037704B2 Server and method for managing monitored data 有权
标题翻译：管理监控数据的服务器和方法
公开(公告)号：US09037704B2
公开(公告)日：2015-05-19
申请号：US13543885
申请日：2012-07-09
申请人： Chung-I Lee , Yi-Guo Wang , Kuan-Chiao Peng , Jian Huang , Yi-Ming Lu
发明人： Chung-I Lee , Yi-Guo Wang , Kuan-Chiao Peng , Jian Huang , Yi-Ming Lu
IPC分类号： G06F15/173 , H04L12/26
CPC分类号： H04L43/04
摘要： A monitoring server receives the latest monitored data and corresponding monitoring time from monitoring devices connected to the server at a specified time interval. The monitoring server records monitored data of each monitoring item and the corresponding monitoring time to a pointed node of a device data list, and adds the monitored data and the corresponding monitoring time, which are recorded in the pointed node of the device data list, into a monitored data list. When a web server requests real-time monitored data, corresponding monitored data is read from the device data list and sent to the web server. When the web server requests historical monitored data of an designated period, corresponding monitored data of the designated period is read from the monitored data list and sent to the web server.
摘要翻译：监控服务器以指定的时间间隔从连接到服务器的监控设备接收最新的监控数据和相应的监控时间。监视服务器将每个监控项目的监视数据和对设备数据列表的指向节点的相应监视时间进行记录，并将记录在设备数据列表的指向节点中的监视数据和相应的监视时间添加到监控数据列表。当Web服务器请求实时监控数据时，从设备数据列表中读取相应的监控数据，并将其发送到Web服务器。当Web服务器请求指定时段的历史监视数据时，从监视数据列表中读取指定时段的对应监视数据，并将其发送到Web服务器。

72. 发明授权

US08810075B2 Power off delay circuit and power supply system 有权
标题翻译：断电延时电路和电源系统
公开(公告)号：US08810075B2
公开(公告)日：2014-08-19
申请号：US13186460
申请日：2011-07-19
申请人： Yi-Guo Chiu
发明人： Yi-Guo Chiu
IPC分类号： H02J9/06
CPC分类号： H02J9/06 , Y10T307/625 , Y10T307/826
摘要： A power off delay circuit includes a first diode with an anode receiving input power and a boost transformer circuit connected to a cathode of the first diode. The boost transformer circuit outputs power signals to a load circuit, and includes a capacitor, a primary winding, a first secondary winding, and a second secondary winding. The capacitor is charged when an input power is on, and discharges when the input power is off. The first secondary winding boosts power flowing through the primary winding and the first switch branch to charge the capacitor via the third switch branch when the input power is on. The capacitor discharges via the second secondary winding and the fourth switch branch when the input power is off, and the primary winding boosts discharging power of the capacitor, and outputs boosted discharging power to the load circuit via the second switch branch.
摘要翻译：断电延迟电路包括具有阳极接收输入功率的第一二极管和连接到第一二极管的阴极的升压变压器电路。升压变压器电路将功率信号输出到负载电路，并且包括电容器，初级绕组，第一次级绕组和第二次级绕组。当输入电源打开时，电容器充电，当输入电源关闭时放电。当输入电源接通时，第一次级绕组增加流过初级绕组和第一开关分支的功率经由第三开关支路对电容器充电。当输入电源关闭时，电容器经由第二次级绕组和第四开关支路放电，并且初级绕组升高电容器的放电功率，并且经由第二开关支路将升压的放电电力输出到负载电路。

73. 发明授权

US08597384B2 Gasification cooling system having seal 有权
标题翻译：气化冷却系统有密封
公开(公告)号：US08597384B2
公开(公告)日：2013-12-03
申请号：US12567661
申请日：2009-09-25
申请人： Yasir Hafeez Abbasi , Cliff Yi Guo , Wade Albert Taber , Xinyuan Zhang
发明人： Yasir Hafeez Abbasi , Cliff Yi Guo , Wade Albert Taber , Xinyuan Zhang
IPC分类号： B01J7/00 , C10B1/00 , F28F1/00
CPC分类号： F28D7/16 , C10J3/86 , C10J2300/1612 , C10J2300/1653 , C10J2300/1678 , C10J2300/1846 , C10K1/002 , C10K1/003 , C10K1/004 , C10K1/005 , C10K1/02 , C10K1/04 , C10K3/04 , F28D2021/0075 , F28F2265/26 , Y02E20/16 , Y02E20/18 , Y02E20/185
摘要： A system, in certain embodiments, includes a gasification cooling system having an annular seal with a bellows. For example, the gasification cooling system may include a housing with an inlet, an outlet, and an interior between the inlet and the outlet, wherein the interior has a throat adjacent the inlet, and the throat expands in a flow direction from the inlet toward the outlet. The annular seal may be disposed in the throat of the housing, wherein the annular seal includes the bellows.
摘要翻译：在某些实施例中，系统包括具有带波纹管的环形密封的气化冷却系统。例如，气化冷却系统可以包括在入口和出口之间具有入口，出口和内部的壳体，其中内部具有邻近入口的喉部，并且喉部沿入口方向的流动方向膨胀出口。环形密封件可以设置在壳体的喉部中，其中环形密封件包括波纹管。

74. 发明申请

US20130045598A1 Method for chemical mechanical polishing tungsten 有权
标题翻译：钨化学机械抛光方法
公开(公告)号：US20130045598A1
公开(公告)日：2013-02-21
申请号：US13209749
申请日：2011-08-15
申请人： Yi Guo , Jerry Lee , Raymond L. Lavoie, JR. , Guangyun Zhang
发明人： Yi Guo , Jerry Lee , Raymond L. Lavoie, JR. , Guangyun Zhang
IPC分类号： H01L21/304
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/31053 , H01L21/3212 , H01L21/7684
摘要： A method for chemical mechanical polishing of a substrate comprising tungsten using a nonselective chemical mechanical polishing composition.
摘要翻译：使用非选择性化学机械抛光组合物对包含钨的基材进行化学机械抛光的方法。

75. 发明申请

US20120258598A1 Stabilized Chemical Mechanical Polishing Composition and Method of Polishing a Substrate 有权
标题翻译：稳定的化学机械抛光组合物和抛光底物的方法
公开(公告)号：US20120258598A1
公开(公告)日：2012-10-11
申请号：US13494412
申请日：2012-06-12
申请人： Yi Guo , Zhendong Liu , Kancharla-Arun Kumar Reddy , Guangyun Zhang
发明人： Yi Guo , Zhendong Liu , Kancharla-Arun Kumar Reddy , Guangyun Zhang
IPC分类号： C09K13/00 , H01L21/302 , B82Y30/00
CPC分类号： H01L21/31053 , C09G1/02 , C09K3/1463
摘要： A chemical mechanical polishing composition, comprising, as initial components: water; 0.1 to 20 wt % abrasive having an average particle size of 5 to 50 nm; and, 0.001 to 1 wt % of an adamantyl substance according to formula (II): wherein A is selected from N and P; wherein each R8 is independently selected from hydrogen, a saturated or unsaturated C1-15 alkyl group, C6-15 aryl group, C6-15 aralkyl group, C6-15 alkaryl group; and, wherein the anion in formula (II) can be any anion that balances the positive charge on the cation in formula (II).
摘要翻译：化学机械抛光组合物，其包含作为初始组分的水; 0.1〜20重量％的平均粒径为5〜50nm的研磨剂; 和0.001至1重量％的根据式（II）的金刚烷基物质：其中A选自N和P; 其中每个R 8独立地选自氢，饱和或不饱和的C 1-15烷基，C 6-15芳基，C 6-15芳烷基，C 6-15烷芳基; 并且其中式（II）中的阴离子可以是平衡式（II）中阳离子上的正电荷的任何阴离子。

76. 发明申请

US20120252255A1 ELECTRICAL CONNECTOR WITH CANTILEVERED ARM INTEGRALLY FORMED ON METAL SHELL 有权
标题翻译：带金属外壳的电动连接器整体形成
公开(公告)号：US20120252255A1
公开(公告)日：2012-10-04
申请号：US13073970
申请日：2011-03-28
申请人： ROBERT COLANTUONO , TERRANCE F. LITTLE , YI-GUO QI , HUNG-YANG YEH
发明人： ROBERT COLANTUONO , TERRANCE F. LITTLE , YI-GUO QI , HUNG-YANG YEH
IPC分类号： H01R13/627
CPC分类号： H01R13/6275 , H01R13/6582 , H01R13/6592
摘要： An electrical connector includes an insulative housing, a number of contacts retained in the insulative housing and a metal shell enclosing the insulative housing. The metal shell includes a top wall defining a pair of slits each extending along a transverse direction, a cutout communicating with the slits and a L-shaped cantilevered arm residing in the slits and the cutout. The cantilevered arm includes a base portion protruding along the transverse direction and situated between the pair of slits and a deformable arm extending into the cutout along a mating direction perpendicular to the transverse direction. The deformable arm comprises a locking protrusion bent upwardly for locking with a notch of a mateable connector.
摘要翻译：电连接器包括绝缘壳体，保持在绝缘壳体中的多个触点和围绕绝缘壳体的金属壳体。金属外壳包括限定沿横向方向延伸的一对狭缝的顶壁，与狭缝连通的切口和位于狭缝和切口中的L形悬臂。悬臂包括沿着横向方向突出并位于一对狭缝之间的基部和沿垂直于横向方向的配合方向延伸到切口内的可变形臂。可变形臂包括向上弯曲的锁定突起，用于与可配对连接器的凹口锁定。

77. 发明授权

US08119529B2 Method for chemical mechanical polishing a substrate 有权
标题翻译：化学机械抛光基材的方法
公开(公告)号：US08119529B2
公开(公告)日：2012-02-21
申请号：US12432021
申请日：2009-04-29
申请人： Yi Guo , Zhendong Liu
发明人： Yi Guo , Zhendong Liu
IPC分类号： H01L21/302
CPC分类号： H01L21/31053 , B24B37/0056 , B24B37/044 , C09G1/02
摘要： A method for chemical mechanical polishing of a substrate, comprising: providing a substrate, wherein the substrate comprises silicon dioxide; providing a chemical mechanical polishing composition, wherein the chemical mechanical polishing composition comprises: water, an abrasive; a diquaternary cation according to formula (I); and optionally a quaternary alkylammonium compound; providing a chemical mechanical polishing pad; creating dynamic contact at an interface between the chemical mechanical polishing pad and the substrate; and dispensing the chemical mechanical polishing composition onto the chemical mechanical polishing pad at or near the interface between the chemical mechanical polishing pad and the substrate; wherein the chemical mechanical polishing composition has a pH of 2 to 6; wherein the chemical mechanical polishing composition exhibits a silicon dioxide removal rate of at least 1,500 Å/min.
摘要翻译：一种用于基板的化学机械抛光的方法，包括：提供基板，其中所述基板包括二氧化硅; 提供化学机械抛光组合物，其中所述化学机械抛光组合物包括：水，研磨剂; 式（I）的二季阳离子; 和任选的季烷基铵化合物; 提供化学机械抛光垫; 在化学机械抛光垫和基底之间的界面处产生动态接触; 以及将化学机械抛光组合物分配到化学机械抛光垫或化学机械抛光垫与基底之间界面附近的化学机械抛光垫上; 其中所述化学机械抛光组合物的pH为2至6; 其中化学机械抛光组合物的二氧化硅去除率至少为1500埃/分钟。

78. 发明申请

US20110306211A1 Stabilized Chemical Mechanical Polishing Composition And Method Of Polishing A Substrate 有权
标题翻译：稳定的化学机械抛光组合物和抛光底物的方法
公开(公告)号：US20110306211A1
公开(公告)日：2011-12-15
申请号：US12815564
申请日：2010-06-15
申请人： Yi Guo , Zhendong Liu , Kancharla-Arun Kumar Reddy , Guangyun Zhang
发明人： Yi Guo , Zhendong Liu , Kancharla-Arun Kumar Reddy , Guangyun Zhang
IPC分类号： H01L21/306 , C09K13/00
CPC分类号： H01L21/31053 , C09G1/02 , C09K3/1463
摘要： A chemical mechanical polishing composition, comprising, as initial components: water; 0.1 to 40 wt % abrasive having an average particle size of 5 to 150 nm; 0.001 to 1 wt % of an adamarityl substance according to formula (II); 0 to 1 wt % diquaternary substance according to formula (I); and, 0 to 1 wt % of a quaternary ammonium compound. Also, provided is a method for chemical mechanical polishing using the chemical mechanical polishing composition.
摘要翻译：化学机械抛光组合物，其包含作为初始组分的水; 0.1〜40重量％的平均粒径为5〜150nm的研磨剂; 0.001至1重量％的根据式（II）的金属物质; 0至1重量％的式（I）的二季物质; 和0〜1重量％的季铵化合物。此外，提供了使用化学机械抛光组合物的化学机械抛光的方法。

79. 发明申请

US20110230050A1 METHOD OF POLISHING A SUBSTRATE COMPRISING POLYSILICON AND AT LEAST ONE OF SILICON OXIDE AND SILICON NITRIDE 有权
标题翻译：抛光包含多晶硅和至少一种氧化硅和氮化硅的基材的方法
公开(公告)号：US20110230050A1
公开(公告)日：2011-09-22
申请号：US12724990
申请日：2010-03-16
申请人： Yi Guo , Zhendong Liu , Kancharla-Arun Kumar Reddy , Guangyun Zhang
发明人： Yi Guo , Zhendong Liu , Kancharla-Arun Kumar Reddy , Guangyun Zhang
IPC分类号： H01L21/306
CPC分类号： H01L21/31053 , C09G1/02
摘要： A method for chemical mechanical polishing of a substrate is provided, comprising: providing a substrate, wherein the substrate comprises polysilicon and at least one of silicon oxide and silicon nitride; providing a chemical mechanical polishing composition, comprising, as initial components: water; an abrasive; and an alkyl aryl polyether sulfonate compound, wherein the alkyl aryl polyether sulfonate compound has a hydrophobic portion having an alkyl group bound to an aryl ring and a nonionic acyclic hydrophilic portion having 4 to 100 carbon atoms; providing a chemical mechanical polishing pad with a polishing surface; moving the polishing surface relative to the substrate; dispensing the chemical mechanical polishing composition onto the polishing surface; and, abrading at least a portion of the substrate to polish the substrate; wherein at least some of the polysilicon is removed from the substrate; and, wherein at least some of the at least one of silicon oxide and silicon nitride is removed from the substrate.
摘要翻译：提供了一种用于基板的化学机械抛光的方法，包括：提供基板，其中所述基板包括多晶硅和氧化硅和氮化硅中的至少一种; 提供化学机械抛光组合物，其包含作为初始组分的水; 研磨剂烷基芳基聚醚磺酸酯化合物，其中烷基芳基聚醚磺酸酯化合物具有与芳环结合的烷基的疏水部分和具有4至100个碳原子的非离子非环状亲水部分; 提供具有抛光表面的化学机械抛光垫; 相对于衬底移动抛光表面; 将化学机械抛光组合物分配到抛光表面上; 并且研磨所述衬底的至少一部分以抛光所述衬底; 其中所述多晶硅中的至少一些从所述衬底移除; 并且其中所述至少一种氧化硅和氮化硅中的至少一种从所述衬底去除。

80. 发明申请

US20110072720A1 GASIFICATION COOLING SYSTEM HAVING SEAL 有权
标题翻译：具有密封性的气化冷却系统
公开(公告)号：US20110072720A1
公开(公告)日：2011-03-31
申请号：US12567661
申请日：2009-09-25
申请人： Yasir Hafeez Abbasi , Cliff Yi Guo , Wade Albert Taber , Xinyuan Zhang
发明人： Yasir Hafeez Abbasi , Cliff Yi Guo , Wade Albert Taber , Xinyuan Zhang
IPC分类号： C10J3/72
CPC分类号： F28D7/16 , C10J3/86 , C10J2300/1612 , C10J2300/1653 , C10J2300/1678 , C10J2300/1846 , C10K1/002 , C10K1/003 , C10K1/004 , C10K1/005 , C10K1/02 , C10K1/04 , C10K3/04 , F28D2021/0075 , F28F2265/26 , Y02E20/16 , Y02E20/18 , Y02E20/185
摘要： A system, in certain embodiments, includes a gasification cooling system having an annular seal with a bellows. For example, the gasification cooling system may include a housing with an inlet, an outlet, and an interior between the inlet and the outlet, wherein the interior has a throat adjacent the inlet, and the throat expands in a flow direction from the inlet toward the outlet. The annular seal may be disposed in the throat of the housing, wherein the annular seal includes the bellows.
摘要翻译：在某些实施例中，系统包括具有带波纹管的环形密封的气化冷却系统。例如，气化冷却系统可以包括在入口和出口之间具有入口，出口和内部的壳体，其中内部具有邻近入口的喉部，并且喉部沿入口方向的流动方向膨胀出口。环形密封件可以设置在壳体的喉部中，其中环形密封件包括波纹管。

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