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    • 73. 发明申请
    • METHOD OF MANUFACTURING DISPLAY UNIT
    • 制造显示单元的方法
    • US20130089940A1
    • 2013-04-11
    • US13613337
    • 2012-09-13
    • Toshiaki AraiTakashige Fujimori
    • Toshiaki AraiTakashige Fujimori
    • H01L33/08
    • H01L27/1225H01L29/66969H01L29/7869
    • A method of manufacturing a display unit includes: forming, on a substrate, a thin-film transistor having an oxide semiconductor layer; and forming, above the thin-film transistor, a display region that includes a plurality of display elements. The oxide semiconductor layer is formed using a sputtering method in which a target and the substrate are opposed to each other. The target is made of an oxide semiconductor and includes a plurality of divided portions that are jointed in a planar form. A spacing interval between two joints that are formed by the plurality of divided portions and are side-by-side with one another of the target is equal to or less than a width of a luminance distribution arising in the display region in a direction substantially orthogonal to the joints.
    • 制造显示单元的方法包括:在衬底上形成具有氧化物半导体层的薄膜晶体管; 以及在所述薄膜晶体管的上方形成包括多个显示元件的显示区域。 使用靶和衬底彼此相对的溅射法形成氧化物半导体层。 目标由氧化物半导体制成,并且包括以平面形式接合的多个分割部分。 由多个分割部分形成并且彼此并排的两个接合部之间的间隔间隔等于或小于在显示区域中基本正交的方向上出现的亮度分布的宽度 到关节。
    • 74. 发明授权
    • Thin film transistor, display unit, and method of manufacturing thin film transistor
    • 薄膜晶体管,显示单元和制造薄膜晶体管的方法
    • US08309956B2
    • 2012-11-13
    • US12629283
    • 2009-12-02
    • Toshiaki AraiNarihiro MorosawaKazuhiko Tokunaga
    • Toshiaki AraiNarihiro MorosawaKazuhiko Tokunaga
    • H01L29/10H01L29/12H01L29/08H01L35/24H01L51/00H01L31/102
    • H01L29/7869H01L27/1225H01L27/3262
    • A thin film transistor includes: a gate electrode; a gate insulting film formed on the gate electrode; an oxide semiconductor thin film layer forming a channel region corresponding to the gate electrode on the gate insulating film; a channel protective layer that is formed at least in a region corresponding to the channel region on the gate insulating film and the oxide semiconductor thin film layer, and that includes a first channel protective layer on a lower layer side and a second channel protective layer on an upper layer side; and a source/drain electrode that is formed on the channel protective layer and is electrically connected to the oxide semiconductor thin film layer. The first channel protective layer is made of an oxide insulating material, and one or both of the first channel protective layer and the second channel protective layer is made of a low oxygen permeable material.
    • 薄膜晶体管包括:栅电极; 形成在栅电极上的栅极绝缘膜; 形成与栅极绝缘膜上的栅电极对应的沟道区域的氧化物半导体薄膜层; 至少形成在与栅极绝缘膜和氧化物半导体薄膜层上的沟道区域对应的区域中的沟道保护层,其包括下层侧的第一沟道保护层和第二沟道保护层 上层侧 以及源极/漏极,其形成在沟道保护层上并与氧化物半导体薄膜层电连接。 第一沟道保护层由氧化物绝缘材料制成,第一沟道保护层和第二沟道保护层中的一个或两个由低透氧材料制成。