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61. 发明申请

US20080049336A1 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US20080049336A1
公开(公告)日：2008-02-28
申请号：US11907797
申请日：2007-10-17
申请人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
发明人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
IPC分类号： G02B9/64 , G02B17/00 , G02B3/00 , G02B9/04 , G02B9/12 , G02B9/62
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the light beam path of the immersion optical system. The object surface is contactable with a liquid.
摘要翻译：浸入式光学系统包括沿着浸没式光学系统的光束路径设置的多个透镜。多个透镜包括可与液体层接触的液体浸没透镜。物镜表面的光学共轭点形成在浸没式光学系统的光束路径中。物体表面可与液体接触。

62. 发明授权

US07331676B2 Apparatus for projecting a reduced image of a photomask using a schwarzschild objective 有权
标题翻译：用于使用施瓦辛目标投影光掩模的缩小图像的装置
公开(公告)号：US07331676B2
公开(公告)日：2008-02-19
申请号：US11348185
申请日：2006-02-06
申请人： Joerg Ferber , Henning Schmidt
发明人： Joerg Ferber , Henning Schmidt
IPC分类号： G03B21/14
CPC分类号： G03F7/70108 , G03F7/70225 , G03F7/70233
摘要： An optical system for projecting an image of a photomask on a substrate, using a Schwarzschild objective includes an excimer laser, beam shaping optics for shaping a laser beam from the laser and a beam-dividing prism. The beam-dividing prism has a dividing-face including four facets inclined at an angle to each other. The four facets divide the shaped beam into four beam-portions propagating at an angle to the system axis. The beam-portions overlap at the photomask and mutually diverge into the entrance aperture in the concave mirror of the Schwarzschild objective such that all of the light in the beam portions is incident on the convex mirror of the objective in an annular zone outside of the central obscuration zone of the convex mirror. This essentially eliminates transfer losses normally caused by this obscuration zone.
摘要翻译：用于使用Schwarzschild物镜将光掩模图像投影在基板上的光学系统包括准分子激光器，用于使来自激光器的激光束成形的光束整形光学元件和分束棱镜。分束棱镜具有包括相互倾斜的四个小面的分割面。四个小面将成形的光束分成与系统轴成一定角度传播的四个光束部分。光束部分在光掩模处重叠并且相互分开进入施瓦茨物镜的凹面镜中的入口孔，使得光束部分中的所有光在中心的外部的环形区域中入射到物镜的凸面镜上凸面镜的遮蔽区。这基本上消除了通常由该遮蔽区引起的传输损耗。

63. 发明授权

US07321419B2 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07321419B2
公开(公告)日：2008-01-22
申请号：US11258846
申请日：2005-10-27
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/58 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A hydrostatic bearing is provided opposite to a wafer on a table. The hydrostatic bearing maintains the distance between the bearing surface and the wafer in the direction of the optical axis of a projection optical system at a predetermined value.
摘要翻译：在桌子上与晶片相对设置静压轴承。静压轴承将投影光学系统的光轴方向上的轴承表面和晶片之间的距离保持在预定值。

64. 发明授权

US07319508B2 Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices 失效
标题翻译：投影曝光装置及方法，反折射光学系统及装置制造方法
公开(公告)号：US07319508B2
公开(公告)日：2008-01-15
申请号：US11878402
申请日：2007-07-24
申请人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
发明人： Yasuhiro Omura , Naomasa Shiraishi , Soichi Owa
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G02B17/0892 , G02B13/24 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70833
摘要： A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical axis, a first reflection plane that is arranged in an optical path between the first lens and the combination, and a second reflection plane that is arranged in an optical path between the combination and the third lens. An intersection line of an extension plane of the first reflection plane and an extension plane of the second reflection plane is set up so that the first optical axis, the second optical axis and the third optical axis intersect at one point. In addition, at least one of the first lens and the third lens is movable.
摘要翻译：反折射光学系统在第二表面上形成第一表面的图像。该系统包括具有第一光轴的第一透镜，凹面镜和第二透镜的组合，该组合具有第二光轴，具有第三光轴的第三透镜，配置在光学器件中的第一反射面第一透镜和组合之间的路径，以及布置在组合和第三透镜之间的光路中的第二反射面。第一反射面的延伸面和第二反射面的延伸面的交线被设定为使得第一光轴，第二光轴和第三光轴在一点相交。此外，第一透镜和第三透镜中的至少一个是可移动的。

65. 发明授权

US07317583B2 High numerical aperture projection system and method for microlithography 失效
标题翻译：高数值孔径投影系统和微光刻法
公开(公告)号：US07317583B2
公开(公告)日：2008-01-08
申请号：US10224485
申请日：2002-08-21
申请人： Mark L Oskotsky , Stanislav Smirnov
发明人： Mark L Oskotsky , Stanislav Smirnov
IPC分类号： G02B17/08
CPC分类号： G03F7/70225 , G02B17/08 , G02B17/0892 , G03F7/70275
摘要： The present invention relates to a high numerical aperture exposure system having a wafer. The exposure system in the present invention includes a beam-splitter, a reticle, a reticle optical group, where the reticle optical group is placed between the reticle and the beam-splitter, a concave mirror, a concave mirror optical group, where the concave mirror optical group is placed between the concave mirror and the beam-splitter, a fold mirror, where the fold mirror is placed between the beam-splitter and the wafer, and a wafer optical group, where the wafer optical group is placed between the beam-splitter and the wafer. In the present invention, a beam of light is directed through the reticle and the reticle optical group to the beam-splitter, then it is reflected by the beam-splitter onto the concave mirror. Concave mirror reflects the light onto the fold mirror through the beam-splitter. Fold mirror reflects the light onto the wafer through the wafer optical group. The present invention forms an intermediate image between the fold mirror and the wafer optical group. Furthermore, in an embodiment an aperture stop can be placed between the concave mirror optical group and the concave mirror.
摘要翻译：本发明涉及具有晶片的高数值孔径曝光系统。本发明的曝光系统包括光束分离器，光罩，光罩光学组，其中标线片光学组置于光罩和分光器之间，凹面镜，凹面镜光学组，其中凹面反射镜光学组被放置在凹面镜和分光器之间，折叠镜放置在分束器和晶片之间的折叠镜和晶片光学组，其中晶片光学组被放置在光束分配器和晶圆。在本发明中，光束被引导通过光罩和光掩模光学组到分束器，然后被分束器反射到凹面镜上。凹面镜通过分光镜将光反射到折叠镜上。折叠镜通过晶片光学组将光反射到晶片上。本发明在折射镜和晶片光学组之间形成中间图像。此外，在一个实施例中，可以在凹面镜光学组和凹面镜之间设置孔径光阑。

66. 发明申请

US20070297072A1 Projection optical system, exposure apparatus, and exposure method 审中-公开
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20070297072A1
公开(公告)日：2007-12-27
申请号：US11882208
申请日：2007-07-31
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B17/00
CPC分类号： G03F7/7015 , G02B9/34 , G02B17/0844 , G03F7/70225 , G03F7/70341 , H01L21/027
摘要： A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion.
摘要翻译：投影物镜包括至少四个弯曲镜，其包括第一曲面镜，其是最光学正镜，以及沿着光路限定的第二最光学前向镜的第二曲面镜。此外，中间透镜元件物理地设置在第一和第二反射镜之间，中间透镜元件是单通式透镜。物镜在浸入中形成数值孔径至少为1.0的图像。

67. 发明申请

US20070291243A1 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20070291243A1
公开(公告)日：2007-12-20
申请号：US11785715
申请日：2007-04-19
申请人： Kousuke Suzuki
发明人： Kousuke Suzuki
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70225 , G03F7/70258 , G03F7/70783
摘要： An exposure apparatus includes a projection optical system, which projects a pattern of a mask onto a prescribed exposure area on a substrate at a prescribed projection magnification. The optical axis center of the projection optical system is set to a position different from that of the center of the projection area onto which the pattern is projected. The exposure apparatus further includes a magnification modification device, which modifies the projection magnification of the projection optical system; a calculation device, which calculates a shift length of the center of the projection area associated with modification of the projection magnification; and a correction device, which corrects the position information of the exposure area based on the shift length of the center of the projection area.
摘要翻译：曝光装置包括投影光学系统，其以规定的投影倍率将掩模的图案投影到基板上的规定的曝光区域上。将投影光学系统的光轴中心设定为与投影图案的投影区域的中心不同的位置。所述曝光装置还具备能够改变所述投影光学系统的投影倍率的倍率变更装置，计算装置，其计算与投影倍率的修改相关联的投影区域的中心的移动长度; 以及校正装置，其基于投影区域的中心的移动长度校正曝光区域的位置信息。

68. 发明申请

US20070273965A1 CATADIOPTRIC PROJECTION SYSTEM FOR 157nm LITHOGRAPHY 失效
标题翻译：用于157nm光刻的CATADIOPTROPE投影系统
公开(公告)号：US20070273965A1
公开(公告)日：2007-11-29
申请号：US11757760
申请日：2007-06-04
申请人： Russell Hudyma
发明人： Russell Hudyma
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A photolithography reduction projection catadioptric objective includes a first optical group including an even number of at least four mirrors, and a second at least substantially dioptric optical group more imageward than the first optical group including a number of lenses for providing image reduction. The first optical group provides compensative axial colour correction for the second optical group.
摘要翻译：光刻还原投影反射折光物镜包括包括偶数个至少四个反射镜的第一光学组以及比包括多个用于提供图像缩小的透镜的第一光学组更多的第二至少基本上为屈光度的光学组。第一光学组为第二光学组提供补偿轴向色彩校正。

69. 发明申请

US20070171547A1 Broad band DUV, VUV long-working distance catadioptric imaging system 有权
标题翻译：宽带DUV，VUV长距离反射折射成像系统
公开(公告)号：US20070171547A1
公开(公告)日：2007-07-26
申请号：US11594634
申请日：2006-11-08
申请人： David Shafer , Yung-Ho Chuang
发明人： David Shafer , Yung-Ho Chuang
IPC分类号： G02B17/00
CPC分类号： G02B21/04 , G02B13/143 , G02B17/0804 , G02B17/0808 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A high performance objective having very small central obscuration, an external pupil for apertureing and Fourier filtering, loose manufacturing tolerances, large numerical aperture, long working distance, and a large field of view is presented. The objective is preferably telecentric. The design is ideally suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths in the UV to VUV spectral range.
摘要翻译：提出了具有非常小的中心遮蔽性的高性能物镜，用于孔径和傅立叶滤波的外部光瞳，宽的制造公差，大的数值孔径，长的工作距离和大的视场。目标最好是远心的。该设计非常适用于紫外至紫外光谱范围波长的宽带亮场和激光暗场成像和检测。

70. 发明授权

US07239446B2 Optical reduction system with control of illumination polarization 失效
标题翻译：具有照明偏振控制的光学还原系统
公开(公告)号：US07239446B2
公开(公告)日：2007-07-03
申请号：US10730947
申请日：2003-12-10
申请人： Justin L. Kreuzer
发明人： Justin L. Kreuzer
IPC分类号： G02B27/28
CPC分类号： G02B17/0892 , G02B5/3083 , G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70358 , G03F7/70566 , G03F7/70966
摘要： An optical reduction system with polarization dose sensitive output for use in the photolithographic manufacture of semiconductor devices having variable compensation for reticle retardation before the long conjugate end. The variable compensation component(s) before the reticle provides accurate adjustment of the polarization state at or near the reticle. The variable compensation components can be variable wave plates, layered wave plates, opposing mirrors, a Berek's compensator and/or a Soleil-Babinet compensator. The catadioptric optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mm×5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.
摘要翻译：一种具有极化剂量敏感输出的光学还原系统，用于在长共轭末端之前具有对光掩膜延迟的可变补偿的半导体器件的光刻制造。掩模版之前的可变补偿分量可以精确调整光罩处或附近的偏振状态。可变补偿分量可以是可变波片，分层波片，相对镜，Berek补偿器和/或Soleil-Babinet补偿器。反折射光学还原系统提供了相对较高的数值孔径0.7，能够在26mm×5mm的场上图形化小于0.25微米的特征。因此，光学还原系统很好地适用于在半导体制造中使用的步进和扫描微光刻曝光工具。其它几个实施例组合了不同屈光力的元件以扩大可实现的光谱带宽。

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