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61. 发明申请

US20060265682A1 Manufacturing aware design and design aware manufacturing 有权
标题翻译：制造意识设计和设计意识制造
公开(公告)号：US20060265682A1
公开(公告)日：2006-11-23
申请号：US11214472
申请日：2005-08-28
申请人： Akira Fujimura
发明人： Akira Fujimura
IPC分类号： G06F17/50 , G06F19/00
CPC分类号： G03F7/70125
摘要： Some embodiments of the invention provide a process for designing and manufacturing an integrated circuit (“IC”). The process selects a wiring configuration and an illumination configuration. The process uses the selected wiring configuration to design an IC layout. The process then uses the selected illumination configuration to manufacture the IC based on the designed IC layout. Some embodiments concurrently select an optimal pair of wiring and illumination configurations. Other embodiments select an illumination configuration based on the selected wiring configuration. Yet other embodiments select a wiring configuration based on the selected illumination configuration. In some embodiments, selecting the illumination configuration entails selecting at least one stepper lens for the IC layout, where the stepper lens illuminates at least one mask for at least one particular layer of the IC layout. In some embodiments, this selection entails selecting a stepper lens for each particular layer of the IC layout. Also, in some embodiments, selecting the wiring configuration entails defining the width and/or spacing of the routes along different directions on at least one particular wiring layer of the IC layout. In some embodiments, this selection entails selecting width and/or spacing of routes along different directions on each particular layer of the IC layout.
摘要翻译：本发明的一些实施例提供了一种用于设计和制造集成电路（“IC”）的方法。该过程选择接线配置和照明配置。该过程使用选定的接线配置来设计IC布局。然后，该过程使用所选择的照明配置来基于设计的IC布局来制造IC。一些实施例同时选择一对最佳布线和照明配置。其他实施例基于所选择的布线配置来选择照明配置。其他实施例基于所选择的照明配置来选择布线配置。在一些实施例中，选择照明配置需要为IC布局选择至少一个步进透镜，其中步进透镜照亮IC布局的至少一个特定层的至少一个掩模。在一些实施例中，该选择需要为IC布局的每个特定层选择步进透镜。此外，在一些实施例中，选择布线配置需要在IC布局的至少一个特定布线层上限定沿着不同方向的路线的宽度和/或间隔。在一些实施例中，该选择需要选择在IC布局的每个特定层上沿不同方向的路线的宽度和/或间隔。

62. 发明授权

US07130025B2 Illumination apparatus, exposure apparatus and device manufacturing method 有权
标题翻译：照明装置，曝光装置及装置的制造方法
公开(公告)号：US07130025B2
公开(公告)日：2006-10-31
申请号：US11082508
申请日：2005-03-17
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70125 , G03F7/701 , G03F7/70566
摘要： An illumination apparatus for illuminating a mask having a pattern, using light from a light source, includes a generating section for generating an effective light source distribution for a modified illumination to the mask, a polarization setting section for setting a predetermined polarization state in plural areas in the effective light source distribution, and an adjusting section for commonly controlling a polarization state of each area.
摘要翻译：一种用于照亮具有来自光源的光的具有图案的掩模的照明装置，包括用于产生用于对掩模进行改进照明的有效光源分布的产生部分，用于在多个区域中设置预定极化状态的偏振设置部分在有效光源分布中，以及用于共同控制各区域的偏振状态的调整部。

63. 发明申请

US20060197934A1 Exposure method and apparatus 有权
标题翻译：曝光方法和装置
公开(公告)号：US20060197934A1
公开(公告)日：2006-09-07
申请号：US11363038
申请日：2006-02-28
申请人： Kenji Yamazoe
发明人： Kenji Yamazoe
IPC分类号： G03B27/72
CPC分类号： G03F7/70125 , G03F1/00 , G03F7/70566
摘要： An exposure method for exposing a dense contact hole pattern onto a plate via a projection optical system includes the step of illuminating one of a binary mask and an attenuated phase shifting mask which one has the dense contact hole pattern by utilizing light from a light source and an illumination optical system, wherein the illuminating step uses an off-axis illumination that is polarized in a tangential direction when a value that is directed to half of a interval between centers of two adjacent contact holes in the dense contact hole pattern and is normalized by λ/NA is 0.25×√2 or smaller, where λ is a wavelength of the light, and NA is a numerical aperture of the projection optical system at an image side.
摘要翻译：通过投影光学系统将致密接触孔图案暴露在板上的曝光方法包括通过利用来自光源的光来照亮具有致密接触孔图案的二值掩模和衰减相移掩模之一的步骤，以及照明光学系统，其中当针对致密接触孔图案中的两个相邻接触孔的中心之间的间隔的一半的值并且通过如下方式进行归一化时，照明步骤使用在切线方向上极化的离轴照明 λ/ NA为0.25×2或更小，其中λ是光的波长，NA是投影光学系统在像侧的数值孔径。

64. 发明授权

US07100145B2 Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs 有权
公开(公告)号：US07100145B2
公开(公告)日：2006-08-29
申请号：US10938510
申请日：2004-09-13
申请人： Xuelong Shi , Jang Fung Chen , Duan-Fu Stephen Hsu
发明人： Xuelong Shi , Jang Fung Chen , Duan-Fu Stephen Hsu
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F7/70125 , G03F7/70433 , G03F7/70441
摘要： Optical proximity effects (OPEs) are a well-known phenomenon in photolithography. OPEs result from the structural interaction between the main feature and neighboring features. It has been determined by the present inventors that such structural interactions not only affect the critical dimension of the main feature at the image plane, but also the process latitude of the main feature. Moreover, it has been determined that the variation of the critical dimension as well as the process latitude of the main feature is a direct consequence of light field interference between the main feature and the neighboring features. Depending on the phase of the field produced by the neighboring features, the main feature critical dimension and process latitude can be improved by constructive light field interference, or degraded by destructive light field interference. The phase of the field produced by the neighboring features is dependent on the pitch as well as the illumination angle. For a given illumination, the forbidden pitch region is the location where the field produced by the neighboring features interferes with the field of the main feature destructively. The present invention provides a method for determining and eliminating the forbidden pitch region for any feature size and illumination condition. Moreover, it provides a method for performing illumination design in order to suppress the forbidden pitch phenomena, and for optimal placement of scattering bar assist features.

65. 发明申请

US20060181691A1 Apparatus for projecting a pattern into an image plane 有权
标题翻译：用于将图案投影到图像平面中的装置
公开(公告)号：US20060181691A1
公开(公告)日：2006-08-17
申请号：US11339844
申请日：2006-01-26
申请人： Molela Moukara , Rainer Pforr , Thomas Muelders , Mario Hennig , Karsten Zeiler
发明人： Molela Moukara , Rainer Pforr , Thomas Muelders , Mario Hennig , Karsten Zeiler
IPC分类号： G03B27/54
CPC分类号： G03F7/70283 , G03F1/30 , G03F1/32 , G03F7/701 , G03F7/70108 , G03F7/70125
摘要： An improvement of the imaging quality with simultaneous transfer of line-space gratings and peripheral structures including a MUX space is achieved using a quadrupole illumination whose poles are formed in elongate fashion and whose longitudinal axes are arranged perpendicular to the orientation of the lines of the line-space grating arranged on a mask. The structure imaging of the line-space grating is improved with regard to contrast, MEEF, and process window, while the geometrical fidelity of the peripheral structure, in particular of the MUX space, is stabilized over a wide depth of field range.
摘要翻译：通过同时传输线间隔光栅和包括MUX空间的外围结构，可以实现成像质量的提高，其使用四极照明，其极以细长形式形成，其纵轴垂直于线的线的方向排列光栅布置在掩模上。相对于对比度，MEEF和处理窗口，线空间光栅的结构成像得到改善，而外围结构（特别是MUX空间）的几何保真度在宽的景深范围内是稳定的。

66. 发明申请

US20060146302A1 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
公开(公告)号：US20060146302A1
公开(公告)日：2006-07-06
申请号：US11270826
申请日：2005-11-10
申请人： Jan Hauschild
发明人： Jan Hauschild
IPC分类号： G03B27/68
CPC分类号： G02B27/0075 , G03F7/70108 , G03F7/70125 , G03F7/70191 , G03F7/70641 , G03F9/7026
摘要： The invention is directed to a method for performing a tilted focus test that includes providing a target object, providing a projection beam of radiation using a radiation source, providing at least one reflective device to produce a projected projection beam of radiation onto the target portion, and producing a first projected projection beam of radiation onto the target object using the at least one reflective device in a first orientation. The invention further includes using a tilting device for tilting the at least one reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, producing a second projected projection beam of radiation onto the target object, determining a lateral shift of the first and second projected projection beams on the target object, and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

67. 发明授权

US07072040B2 Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus 失效
标题翻译：用于检查曝光装置的掩模，曝光装置的检查方法和曝光装置
公开(公告)号：US07072040B2
公开(公告)日：2006-07-04
申请号：US10958594
申请日：2004-10-06
申请人： Kazuya Fukuhara
发明人： Kazuya Fukuhara
IPC分类号： G01B11/00 , G01B27/42 , G03F1/00
CPC分类号： G03F7/70125 , G03F1/44 , G03F7/70566 , G03F7/70591 , G03F7/70616
摘要： To inspect the polarization state of light flux for exposure of an exposure apparatus, a mask for inspection is held at the photomask position. This mask for inspection comprises a polarizing element which is disposed in a light path of light flux forming an image of a light source and which can selectively transmit light flux with a plurality of polarization directions.
摘要翻译：为了检查用于曝光装置曝光的光束的偏振状态，在光掩模位置处保持用于检查的掩模。该用于检查的掩模包括偏振元件，其设置在形成光源的图像的光束的光路中，并且可以选择性地透射具有多个偏振方向的光通量。

68. 发明申请

US20060132748A1 Exposure system, exposure method and method for manufacturing a semiconductor device 失效
标题翻译：曝光系统，曝光方法和制造半导体器件的方法
公开(公告)号：US20060132748A1
公开(公告)日：2006-06-22
申请号：US11298706
申请日：2005-12-12
申请人： Kazuya Fukuhara
发明人： Kazuya Fukuhara
IPC分类号： G03B27/54
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/701 , G03F7/70125
摘要： An exposure system includes: an illumination optical system defining, in an effective illumination source plane, a center region forming a perpendicularly incident light and first and second eccentric regions forming obliquely incident lights having a perpendicular electric vector component perpendicular to a straight line connecting the first and second eccentric regions, the electric vector component being larger than a parallel electric vector component parallel to the straight line, and illuminating the mask pattern with the perpendicularly incident light and the obliquely incident lights; and a projection optical system projecting an image of the mask pattern to a processing object.
摘要翻译：曝光系统包括：照明光学系统，其在有效照明源平面中限定形成垂直入射光的中心区域，以及形成倾斜入射光的第一和第二偏心区域，所述倾斜入射光线具有垂直于连接第一和第二偏心区域，所述电子矢量分量大于与所述直线平行的平行电子矢量分量，并且利用所述垂直入射光和所述倾斜入射光照射所述掩模图案; 以及将掩模图案的图像投影到处理对象的投影光学系统。

69. 发明授权

US07046337B2 Exposure apparatus and method 有权
标题翻译：曝光装置和方法
公开(公告)号：US07046337B2
公开(公告)日：2006-05-16
申请号：US11229541
申请日：2005-09-20
申请人： Miyoko Kawashima , Akiyoshi Suzuki
发明人： Miyoko Kawashima , Akiyoshi Suzuki
IPC分类号： G03B27/42 , G03B27/52 , G03B27/72
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70125 , G03F7/7025 , G03F7/70341 , G03F7/70958
摘要： An exposure method that transfers a pattern formed on a mask onto an object to be exposed via a projection optical system that is at least partly immersed in liquid. The exposure method forms on a pupil of the projection optical system an effective light source that emits, from an axis orthogonal to an optical axis of the projection optical system, light that has an incident angle θ upon the object, wherein the light includes only s-polarized light in an area of an incident angle θ that satisfies 90°−θNA≦θ≦θNA, where θNA is the largest value of the incident angle θ.
摘要翻译：一种曝光方法，其通过至少部分浸没在液体中的投影光学系统将掩模上形成的图案转印到要曝光的物体上。曝光方法在投影光学系统的光瞳上形成有效光源，其从与投影光学系统的光轴正交的轴发射具有对象上的入射角θ的光，其中光仅包括s 入射角度θ的区域中的偏振光，其满足90°-θNA NA，其中θ< 是入射角度θ的最大值。

70. 发明申请

US20060028957A1 Optical system for spatially controlling light polarization and method for manufacturing the same 有权
标题翻译：用于空间控制光偏振的光学系统及其制造方法
公开(公告)号：US20060028957A1
公开(公告)日：2006-02-09
申请号：US11194458
申请日：2005-08-02
申请人： Ho-Chul Kim
发明人： Ho-Chul Kim
IPC分类号： G11B7/00
CPC分类号： G03F7/70158 , G03F7/70125 , G03F7/70566
摘要： An optical system for spatially controlling light polarization, and method for manufacturing the same, includes a light source for generating a light beam of a designated wavelength, a beam shaper for splitting the light beam generated from the light source into a plurality of partial beams, and a polarization controller controlling the polarization states of the partial beams. The polarization controller may be formed on the beam shaper or separate from the beam shaper.
摘要翻译：用于空间控制光偏振的光学系统及其制造方法包括用于产生指定波长的光束的光源，用于将从光源产生的光束分成多个局部光束的光束整形器，以及控制部分光束的偏振状态的偏振控制器。偏振控制器可以形成在光束整形器上或与光束整形器分离。

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