专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

61. 发明授权

US08475980B2 Methods of forming semiconductor devices using photolithographic shot grouping 有权
标题翻译：使用光刻射击分组形成半导体器件的方法
公开(公告)号：US08475980B2
公开(公告)日：2013-07-02
申请号：US13219579
申请日：2011-08-26
申请人： Jin Choi , Byung-gook Kim , Hee-bom Kim , Sang-hee Lee
发明人： Jin Choi , Byung-gook Kim , Hee-bom Kim , Sang-hee Lee
IPC分类号： G03C5/00 , G03F9/00
CPC分类号： G03F1/38 , G03F1/70 , G03F1/76
摘要： A method of forming a semiconductor device can include determining a shot set including a plurality of shots, based on a final pattern used to form a mask. Shots included in the plurality shots can be classified as being in a first pass shot set or in a second pass shot set, where each can include a plurality of non-directly neighboring shots. A first pass exposure can be performed to radiate a reticle to provide the first pass shot set and a second pass exposure can be performed to radiate the reticle to provide the second pass shot set.
摘要翻译：形成半导体器件的方法可以包括基于用于形成掩模的最终图案来确定包括多个镜头的镜头组。包括在多个镜头中的拍摄可以被分类为处于第一传球镜头或第二镜头组中的每一个，其中每个镜头可以包括多个非直接相邻镜头。可以执行第一遍曝光以辐射掩模版以提供第一遍照射设置，并且可以执行第二曝光曝光以辐射掩模版以提供第二遍照射设置。

62. 发明授权

US08329381B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08329381B2
公开(公告)日：2012-12-11
申请号：US13399090
申请日：2012-02-17
申请人： Jin Choi , Byung-Gook Kim , Hee-Bom Kim , Sang-Hee Lee
发明人： Jin Choi , Byung-Gook Kim , Hee-Bom Kim , Sang-Hee Lee
IPC分类号： G03C5/00
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： A pattern forming method includes providing a first mask with a first aperture, forming a first transfer pattern on a resist by irradiating a first electron beam through the first aperture, the first transfer pattern extending in a first direction and having a boundary along a circumference thereof, and the first electron beam having a cross section of a first square when emerging from the first aperture, and forming a second transfer pattern on the resist by irradiating a second electron beam through the first aperture, the second transfer pattern extending in the first direction and overlapping a portion the boundary of the first transfer pattern, and the second electron beam having a cross section of a second square when emerging from the first aperture.
摘要翻译：图案形成方法包括：提供具有第一孔的第一掩模，通过照射通过第一孔的第一电子束，在抗蚀剂上形成第一转印图案，第一转印图案沿着第一方向延伸并沿着其圆周具有边界并且所述第一电子束在从所述第一孔出射时具有第一正方形的横截面，并且通过照射通过所述第一孔的第二电子束在所述抗蚀剂上形成第二转移图案，所述第二转移图案沿所述第一方向延伸并且当从第一孔径出现时，与第一转印图案的边界的一部分重叠，并且第二电子束具有第二正方形的横截面。

63. 发明授权

US08133640B2 Apparatus and method for mounting pellicle 失效
标题翻译：用于安装防护薄膜的装置和方法
公开(公告)号：US08133640B2
公开(公告)日：2012-03-13
申请号：US12230473
申请日：2008-08-29
申请人： Sang-hee Lee , Jin Choi
发明人： Sang-hee Lee , Jin Choi
IPC分类号： G03F1/00 , G03B27/62
CPC分类号： G03F1/64 , Y10T156/1744
摘要： An apparatus and a method for mounting a pellicle includes a pellicle compression plate formed to apply a plurality of particular pressures to a plurality of points or areas of a region of the reticle where a pellicle frame of the pellicle contacts a reticle.
摘要翻译：一种用于安装防护薄膜组件的装置和方法包括形成为对掩模版区域的多个点或区域施加多个特定压力的防护薄片组件压缩板，其中防护薄膜组件的防护薄膜框架接触掩模版。

64. 发明申请

US20120047474A1 Method for Manufacturing Semiconductor Devices 有权
标题翻译：半导体器件制造方法
公开(公告)号：US20120047474A1
公开(公告)日：2012-02-23
申请号：US13192124
申请日：2011-07-27
申请人： Jin Choi , Sang-hee Lee , Seong-june Min
发明人： Jin Choi , Sang-hee Lee , Seong-june Min
IPC分类号： G06F17/50
CPC分类号： G03F1/78 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31771 , H01J2237/31776
摘要： A method of manufacturing semiconductor devices is disclosed. The method includes determining fractured shots that do not overlap each other based on a final pattern; determining overlapping shots that are shots that overlap each other based on the final pattern; generating area difference data by comparing the areas of the overlapping shots and the fractured shots with each other; calculating a radiation influenced pattern based on the area difference data; and correcting the overlapping shots based on the radiation influenced pattern.
摘要翻译：公开了制造半导体器件的方法。该方法包括基于最终模式确定彼此不重叠的断裂射击; 确定基于最终模式重叠的重叠拍摄; 通过比较重叠射击和断裂射击的面积来产生区域差异数据; 基于面积差异数据计算辐射影响模式; 并基于辐射影响模式校正重叠拍摄。

65. 发明申请

US20090097717A1 Method and Apparatus for User Authentication Using Face Image 有权
标题翻译：使用脸部图像进行用户认证的方法和装置
公开(公告)号：US20090097717A1
公开(公告)日：2009-04-16
申请号：US12298229
申请日：2007-04-25
申请人： Yun-Su Chung , Jin Choi , Jang-Hee Yoo , Kyo-Il Chung
发明人： Yun-Su Chung , Jin Choi , Jang-Hee Yoo , Kyo-Il Chung
IPC分类号： G06K9/00
CPC分类号： G06K9/00275 , G06K9/00288 , G06K9/522
摘要： A user authentication method and apparatus using a face image are provided. The method includes transforming a face image in a normalized spatial domain into frequency-domain data, extracting valid transform coefficients from the frequency-domain data based on energy-concentrated region information, extracting a feature vector from the extracted valid transform coefficients, and performing user authentication by comparing the extracted feature vector with a previously registered feature vector. Accordingly, it is possible to perform user authentication using a face image while using a minimum data dimension, thereby improving the speed and precision thereof.
摘要翻译：提供了一种使用面部图像的用户认证方法和装置。该方法包括将标准化空间域中的面部图像变换为频域数据，基于能量集中区域信息从频域数据中提取有效变换系数，从提取的有效变换系数中提取特征向量，并执行用户通过将提取的特征向量与先前登记的特征向量进行比较来进行认证。因此，可以在使用最小数据维度的同时使用面部图像进行用户认证，从而提高其速度和精度。

66. 发明申请

US20090073415A1 Apparatus and method for mounting pellicle 失效
标题翻译：用于安装防护薄膜的装置和方法
公开(公告)号：US20090073415A1
公开(公告)日：2009-03-19
申请号：US12230473
申请日：2008-08-29
申请人： Sang-hee Lee , Jin Choi
发明人： Sang-hee Lee , Jin Choi
IPC分类号： G03B27/62 , G03F1/14
CPC分类号： G03F1/64 , Y10T156/1744
摘要： An apparatus and a method for mounting a pellicle includes a pellicle compression plate formed to apply a plurality of particular pressures to a plurality of points or areas of a region of the reticle where a pellicle frame of the pellicle contacts a reticle.
摘要翻译：一种用于安装防护薄膜组件的装置和方法包括形成为对掩模版区域的多个点或区域施加多个特定压力的防护薄片组件压缩板，其中防护薄膜组件的防护薄膜框架接触掩模版。

67. 发明申请

US20070212408A1 Stable Pharmaceutical Composition Containing Benzimidazole Derivatives and Method of Manufacturing the Same 审中-公开
标题翻译：包含苯并咪唑衍生物的稳定药物组合物及其制备方法
公开(公告)号：US20070212408A1
公开(公告)日：2007-09-13
申请号：US11587720
申请日：2005-04-27
申请人： Nam Kim , Jin Choi , Jae Kim , Nam Lee , Je Ryu , Yong Hwang , Yong Oh , Dong Min , Key Um , Wei-Jong Kwak , Do Kum
发明人： Nam Kim , Jin Choi , Jae Kim , Nam Lee , Je Ryu , Yong Hwang , Yong Oh , Dong Min , Key Um , Wei-Jong Kwak , Do Kum
IPC分类号： A61K31/724 , C08B30/18 , A61K9/48 , A61K9/20
CPC分类号： B82Y5/00 , A61K47/6951
摘要： The present invention relates to an inclusion complex containing a benzimidazole derivative with excellent storage stability and a method of its preparation. In particular, the present invention relates to an inclusion complex containing a benzimidazole derivative with improved storage stability and a method of its preparation, where an inclusion complex is manufactured by performing an inclusion reaction by combining a benzimidazole derivative, cyclodextrin and a water-soluble polymer in an aqueous alkali solution in order to be formulated after stabilizing an acid-unstable benzimidazole derivative.
摘要翻译：本发明涉及包含具有优异储存稳定性的苯并咪唑衍生物的包合络合物及其制备方法。特别地，本发明涉及包含具有改进的储存稳定性的苯并咪唑衍生物的包合络合物及其制备方法，其中通过将苯并咪唑衍生物，环糊精和水溶性聚合物组合进行包合反应来制备包合络合物在碱性水溶液中，为了在稳定酸不稳定的苯并咪唑衍生物后配制。

68. 发明申请

US20070155874A1 Flameretardant thermoplastic resin composition 审中-公开
标题翻译：耐火热塑性树脂组合物
公开(公告)号：US20070155874A1
公开(公告)日：2007-07-05
申请号：US11715113
申请日：2007-03-07
申请人： Bok Jang , Jin Choi , Jung Yoon , In Jung
发明人： Bok Jang , Jin Choi , Jung Yoon , In Jung
IPC分类号： C08K5/49 , C08F290/04
CPC分类号： C08L51/04 , C08F279/02 , C08F279/04 , C08K5/523 , C08L55/02 , C08L61/04 , C08L67/02 , C09K21/12 , C08L2666/14 , C08L2666/02
摘要： Embodiments relate to a flame retardant thermoplastic resin composition, methods of preparing the flame retardant thermoplastic resin composition, and articles comprising the flame retardant thermoplastic resin composition.
摘要翻译：实施例涉及阻燃热塑性树脂组合物，制备阻燃热塑性树脂组合物的方法和包含阻燃热塑性树脂组合物的制品。

69. 发明申请

US20070072844A1 Fused-aryl and heteroaryl derivatives as modulators of metabolism and the prophylaxis and treatment of disorders related thereto 审中-公开
标题翻译：稠合芳基和杂芳基衍生物作为代谢的调节剂以及与之有关的疾病的预防和治疗
公开(公告)号：US20070072844A1
公开(公告)日：2007-03-29
申请号：US11602162
申请日：2006-11-20
申请人： Robert Jones , Graeme Semple , Yifeng Xiong , Young-Jun Shin , Albert Ren , Imelda Calderon , Beatriz Fioravanti , Jin Choi , Carleton Sage
发明人： Robert Jones , Graeme Semple , Yifeng Xiong , Young-Jun Shin , Albert Ren , Imelda Calderon , Beatriz Fioravanti , Jin Choi , Carleton Sage
IPC分类号： A61K31/551 , A61K31/519 , C07D487/02
CPC分类号： C07D215/233 , C07D471/04 , C07D473/00 , C07D487/04
摘要： The present invention relates to certain fused aryl and heteroaryl derivatives of Formula (I) that are modulators of metabolism. Accordingly, compounds of the present invention are useful in the prophylaxis or treatment of metabolic disorders and complications thereof, such as, diabetes and obesity.
摘要翻译：本发明涉及作为代谢调节剂的式（I）的某些稠合芳基和杂芳基衍生物。因此，本发明的化合物可用于预防或治疗代谢紊乱及其并发症，例如糖尿病和肥胖症。

70. 发明申请

US20070043171A1 Polymer composition comprising a rubber modified styrenic polymer resin and an ethylenic rubber polymer 审中-公开
标题翻译：包含橡胶改性苯乙烯聚合物树脂和乙烯橡胶聚合物的聚合物组合物
公开(公告)号：US20070043171A1
公开(公告)日：2007-02-22
申请号：US11319806
申请日：2005-12-28
申请人： Se Son , Sung Ahn , Dong Kim , Jin Choi
发明人： Se Son , Sung Ahn , Dong Kim , Jin Choi
IPC分类号： C08F8/00
CPC分类号： C08L23/16 , C08K3/016 , C08K5/0066 , C08L23/26 , C08L25/12 , C08L51/06 , C08L55/02 , C08L2666/04 , C08L2666/24
摘要： A polymer composition includes a rubber modified styrenic copolymer resin and an ethylenic rubber polymer that includes an acidic moiety. The composition can also include a styrenic polymer resin. Molded articles of the polymer composition have good impact strength and flowability.
摘要翻译：聚合物组合物包括橡胶改性苯乙烯共聚物树脂和包含酸性部分的乙烯橡胶聚合物。组合物还可以包括苯乙烯聚合物树脂。聚合物组合物的成型制品具有良好的冲击强度和流动性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式