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    • 61. 发明授权
    • Process for producing thin film
    • 薄膜生产工艺
    • US5958155A
    • 1999-09-28
    • US683195
    • 1996-07-18
    • Ken KawamataNobuaki Mitamura
    • Ken KawamataNobuaki Mitamura
    • C23C14/06C23C14/34C23C14/35C23C14/40C30B25/06G02B1/10G02B1/113C22C23/00
    • C23C14/3421C23C14/06C23C14/35C23C14/352
    • A substrate (2) is rotatably installed in a vacuum chamber (1) at an upper part thereof MgF.sub.2 granules (3) as a film source material are placed in a quartz boat (4) and mounted on a magnetron cathode (5). The magnetron cathode (5) is connected through a matching box (6) to a 13.56 MHz radio frequency power source (7). Cooling water (8) for holding the temperature of the magnetron cathode (5) constant flows against a lower face of the magnetron cathode (5). A side wall of the vacuum chamber (1) is provided with gas introduction ports (9), (10) for introducing gas in the vacuum chamber (1). A shutter (11) is placed between the magnetron cathode (5) and the substrate (2). This structure provides a process enabling forming a thin film at a high speed by sputtering, especially a high speed sputtering process enabling forming a thin fluoride film free of light absorption.
    • 将基板(2)可旋转地安装在其上部的真空室(1)中,将作为膜源材料的MgF 2颗粒(3)放置在石英舟(4)中并安装在磁控阴极(5)上。 磁控管阴极(5)通过匹配盒(6)连接到13.56MHz射频电源(7)。 用于保持磁控阴极(5)的温度的冷却水(8)恒定地流过磁控阴极(5)的下表面。 真空室(1)的侧壁设置有用于在真空室(1)中引入气体的气体导入口(9),(10)。 在磁控管阴极(5)和基板(2)之间放置有快门(11)。 该结构提供了能够通过溅射高速形成薄膜的方法,特别是能够形成不含光吸收的氟化物薄膜的高速溅射工艺。
    • 62. 发明授权
    • Heater mechanism for crystal pulling apparatus
    • 拉晶机加热机构
    • US5887015A
    • 1999-03-23
    • US763883
    • 1996-12-11
    • Nobuaki MitamuraToshiharu UesugiAtsushi IwasakiShinobu Takeyasu
    • Nobuaki MitamuraToshiharu UesugiAtsushi IwasakiShinobu Takeyasu
    • C30B15/14C03B5/027
    • C30B15/14
    • A heater mechanism for a crystal pulling apparatus is disclosed. Electrodes made of copper or the like and disposed under a heater are connected to the heater via graphite members. A cover member is attached to each graphite member, so that the downwardly extending portion of the cover member surrounds the outer surface of the graphite member. Accordingly, a leak or splash of a melt is prevented from contacting the electrodes. The length of each graphite member is equal to or greater than the distance between the bottom surface of the heater and the top surface of a melt spill tray which distance is measured when the heater mechanism is raised The cover member is vertically slidable along the outer surface of each graphite member. Thus, even when a material melt leaks out from a crucible, the electrodes of the heater mechanism can be protected from a fusion damage or the like which would be otherwise caused by the leak of the melt.
    • 公开了一种用于晶体拉制装置的加热器机构。 设置在加热器下方的由铜等制成的电极通过石墨部件连接到加热器。 盖构件附接到每个石墨构件,使得盖构件的向下延伸的部分围绕石墨构件的外表面。 因此,防止熔体的泄漏或飞溅与电极接触。 每个石墨构件的长度等于或大于加热器的底表面和熔体溢出托盘的上表面之间的距离,该加热器机构升高时测量的距离。盖构件沿着外表面可垂直滑动 的每个石墨构件。 因此,即使当材料熔体从坩埚中泄漏出来时,也可以保护加热器机构的电极免受由熔体泄漏引起的熔融损伤等的​​影响。
    • 66. 发明授权
    • Rolling steel bearing
    • 滚动轴承
    • US5085733A
    • 1992-02-04
    • US572480
    • 1990-08-23
    • Nobuaki Mitamura
    • Nobuaki Mitamura
    • C22C38/18
    • C22C38/18F16C33/32F16C33/62Y10S148/906
    • A rolling contact parts steel has C: 0.2-0.6 wt%; Si: 0.3-2.0 wt%; Cr: 0.5-2.5 wt%; Mn: 1.7 wt% or less; O: 12 ppm or less; and the balance of Fe and an inevitable impurity. The steel produces a fine carbide without the need for a separate heat treatment. The dimensioal stability at high temperature of the steel is superior. A rolling bearing has at least one of the races and the rolling element thereof made of the steel, the steel being carburized or carbonitrided, then quenched and then, finally, tempered. The one of the races and the rolling element will not soften at a high temperature.
    • 滚动接触部件钢具有C:0.2-0.6重量% Si:0.3〜2.0重量% Cr:0.5〜2.5重量% Mn:1.7重量%以下; O:12ppm以下; 而Fe的余量和不可避免的杂质。 该钢生产精细的碳化物,而不需要单独的热处理。 钢的高温尺寸稳定性优异。 滚动轴承具有由钢制成的种类和滚动体中的至少一种,钢被渗碳或碳氮共混,然后淬火,然后最终回火。 其中一个种族和滚动体不会在高温下软化。
    • 68. 发明申请
    • System for Manufacturing Silicon Single Crystal and Method for Manufacturing Silicon Single Crystal Using this System
    • 使用该系统制造硅单晶的系统和制造硅单晶的方法
    • US20100031869A1
    • 2010-02-11
    • US12308122
    • 2007-05-28
    • Makoto IidaNobuaki MitamuraTakahiro Yanagimachi
    • Makoto IidaNobuaki MitamuraTakahiro Yanagimachi
    • C30B15/20
    • C30B15/203C30B29/06C30B35/00
    • The present invention provides a system for manufacturing a silicon single crystal which designs manufacturing conditions under which a value of F/G is controlled to fall within a predetermined range in order that a crystal quality of a silicon single crystal manufactured by a pulling apparatus using the CZ method falls within a target standard, including, automatically, at least: means 1 tentatively designing manufacturing conditions of a silicon single crystal in a subsequent batch from a crystal quality result of a silicon single crystal in a previous batch; means 2 calculating a correction amount from an amount of change in F and/or G due to constituent members of the pulling apparatus in the subsequent batch; means 3 calculating a correction amount from an amount of change in F and/or G due to a manufacturing process in the subsequent batch; and means 4 adding the correction amount by the means 2 and/or the means 3 to the manufacturing conditions by the means 1 to calculate manufacturing conditions in the subsequent batch. As a result, there can be provided the system for manufacturing a silicon single crystal that can more assuredly obtain a silicon single crystal having a desired crystal quality and improve productivity or a yield and a method for manufacturing a silicon single crystal using this system.
    • 本发明提供了一种制造硅单晶的系统,其设计了将F / G的值控制在规定范围内的制造条件,以使由使用 CZ方法属于目标标准,至少包括:1,从上一批硅晶单晶的晶体质量结果出发,初步设计后续批次中硅单晶的制造条件; 装置2根据后续批次中的牵引装置的构成部件从F和/或G的变化量计算校正量; 意味着3根据后续批次中的制造过程从F和/或G的变化量计算校正量; 以及通过装置1将装置2和/或装置3的校正量加到制造条件的装置4,以计算后续批次中的制造条件。 结果,可以提供一种制造硅单晶的系统,其可以更可靠地获得具有期望的晶体质量的硅单晶并且提高生产率或产率,以及使用该系统制造单晶硅的方法。
    • 70. 发明授权
    • Method for producing a single crystal and silicon single crystal wafer
    • 单晶和硅单晶晶片的制造方法
    • US07326395B2
    • 2008-02-05
    • US10568186
    • 2004-08-13
    • Izumi FusegawaNobuaki MitamuraTakahiro Yanagimachi
    • Izumi FusegawaNobuaki MitamuraTakahiro Yanagimachi
    • C01B33/26
    • C30B15/20C30B29/06Y10T117/1068
    • The present invention is a method for producing a single crystal in accordance with Czochralski method by flowing an inert gas downward in a chamber 1 of a single crystal-pulling apparatus 11 and surrounding a single crystal 3 pulled from a raw material melt 2 with a gas flow-guide cylinder 4, wherein when a single crystal within N region outside OSF region generated in a ring shape in the radial direction of the single crystal is pulled, the single crystal within N region is pulled in a condition that flow amount of the inert gas between the single crystal and the gas flow-guide cylinder is 0.6 D(L/min) or more and pressure in the chamber is 0.6 D(hPa) or less, in which D (mm) is a diameter of the single crystal to be pulled. It is preferable that there is used the gas flow-guide cylinder that Fe concentration is 0.05 ppm or less, at least, in a surface thereof. Thereby, there is provided a method for producing a single crystal, wherein in the case that a single crystal is produced by an apparatus having a gas flow-guide cylinder in accordance with CZ method, the single crystal has low defect density and Fe concentration can be suppressed to be 1×1010 atoms/cm3 or less even in a peripheral part thereof.
    • 本发明是一种根据切克劳斯基法制造单晶的方法,该方法是使惰性气体在单晶拉制装置11的室1中向下流动,并围绕从原料熔体2拉出的单晶3与气体 流动引导圆筒4,其中当拉伸在单晶体的径向方向上以环形产生的OSF区域外的N区域内的单晶时,N区域内的单晶在惰性流动量的条件下被拉 单晶和气体导流筒之间的气体为0.6D(L / min)以上,室内的压力为0.6D(hPa)以下,其中D(mm)为单晶直径 被拉。 至少在其表面中优选使用气体导向气缸Fe浓度为0.05ppm以下。 因此,提供了一种单晶的制造方法,其中,在通过具有根据CZ法的气体导向筒的装置制造单晶的情况下,单晶的缺陷密度低,Fe浓度可以 即使在其周边部分被抑制为1×10 10原子/ cm 3以下。