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    • 62. 发明授权
    • High resolution amorphous silicon radiation detectors
    • 高分辨率非晶硅辐射探测器
    • US5117114A
    • 1992-05-26
    • US448240
    • 1989-12-11
    • Robert A. StreetSelig N. KaplanVictor Perez-Mendez
    • Robert A. StreetSelig N. KaplanVictor Perez-Mendez
    • G01T1/20G01T1/24H01L31/0232H01L31/117
    • H01L31/0232G01T1/2018H01L31/02322H01L31/117Y10S257/926
    • A radiation detector employing amorphous Si:H cells in an array with each detector cell having at least three contiguous layers (n type, intrinsic, p type), positioned between two electrodes to which a bias voltage is applied. An energy conversion layer atop the silicon cells intercepts incident radiation and converts radiation energy to light energy of a wavelength to which the silicon cells are responsive. A read-out device, positioned proximate to each detector element in an array allows each such element to be interrogated independently to determine whether radiation has been detected in that cell. The energy conversion material may be a layer of luminescent material having a columnar structure. In one embodiment a column of luminescent material detects the passage therethrough of radiation to be detected and directs a light beam signal to an adjacent a-Si:H film so that detection may be confined to one or more such cells in the array. One or both electrodes may have a comb structure, and the teeth of each electrode comb may be interdigitated for capacitance reduction. The amorphous Si:H film may be replaced by an amorphous Si:Ge:H film in which up to 40 percent of the amorphous material is Ge. Two dimensional arrays may be used in X-ray imaging, CT scanning, crystallography, high energy physics beam tracking, nuclear medicine cameras and autoradiography.
    • 一种辐射检测器,其采用阵列中的非晶Si:H电池,其中每个检测器单元具有至少三个相邻层(n型,本征型,p型),位于施加有偏置电压的两个电极之间。 硅单元顶部的能量转换层拦截入射辐射,并将辐射能转换成硅单元响应的波长的光能。 位于阵列中的每个检测器元件附近的读出装置允许独立地询问每个这样的元件以确定是否在该单元中检测到辐射。 能量转换材料可以是具有柱状结构的发光材料层。 在一个实施例中,一列发光材料检测待检测的辐射的通过,并将光束信号引导到相邻的a-Si:H膜,使得检测可以局限于阵列中的一个或多个这样的单元。 一个或两个电极可以具有梳状结构,并且每个电极梳的齿可以相互交叉以减少电容。 非晶Si:H膜可以由非晶Si:Ge:H膜替代,其中高达40%的无定形材料是Ge。 二维阵列可用于X射线成像,CT扫描,晶体学,高能物理光束跟踪,核医学相机和放射自显影。
    • 63. 发明授权
    • Image forming apparatus with a TFT backplane for xerography without a light source
    • 具有用于无光源的静电复印的TFT背板的图像形成装置
    • US08854403B2
    • 2014-10-07
    • US12366680
    • 2009-02-06
    • Vladislav SkorokhodGregory McGuireRobert A. Street
    • Vladislav SkorokhodGregory McGuireRobert A. Street
    • B41J2/39B41J2/395G03G15/32
    • B41J2/39G03G15/32
    • Systems and methods are described that facilitate using TFT control of electronic discharge for surface potential reduction and latent image formation on an imaging member. Corona charging is performed to first create a background surface potential, followed by selective discharge of individual pixels using an array of TFTs to supply free charge carriers to reduce the electrostatic surface potential to nearly zero. This is followed by discharged area development (DAD) to develop the latent image on a print medium (e.g., paper). The described systems and methods do not require a HVPS to drive the backplane; therefore, the TFT matrix is electrostatically decoupled from the developer and other system components in direct contact with the imaging member. Accordingly, known addressing systems may be used to address the TFT array.
    • 描述了有助于使用电子放电的TFT控制来在成像构件上进行表面电位降低和潜像形成的系统和方法。 执行电晕充电以首先产生背景表面电位,随后使用TFT阵列选择性地放电各个像素,以提供免费电荷载流子,以将静电表面电位降低到接近零。 随后是放电区域开发(DAD),以在打印介质(例如纸)上显影潜像。 所描述的系统和方法不需要HVPS来驱动背板; 因此,TFT矩阵与显影剂和与成像构件直接接触的其它系统部件静电分离。 因此,已知的寻址系统可以用于寻址TFT阵列。
    • 64. 发明授权
    • Photoreceptor with a TFT backplane for xerography without a ROS system
    • 具有TFT背板的感光体,用于没有ROS系统的静电复印
    • US08643685B2
    • 2014-02-04
    • US12366665
    • 2009-02-06
    • Gregory McGuireVladislav SkorokhodRobert A. Street
    • Gregory McGuireVladislav SkorokhodRobert A. Street
    • B41J2/39B41J2/395
    • G03G15/32G03G15/04054G03G2215/0407
    • Systems and methods are described that facilitate eliminating a need for a raster output scanner (ROS) or laser when generating a latent image on a photoreceptor. An addressable backplane is employed, comprising an array of field effect transistors (e.g., silicon or organic thin film transistors, or TFTs), wherein each TFT corresponds to a single pixel on a charge transport layer on the photoreceptor surface. Latent image formation is performed by forming a surface potential using corona charging, and then directing free charge carriers toward the photoreceptor surface to reduce electrostatic potential in areas that need to be toned. TFTs in the array are individually addressed, or selected, to connect to a common ground, which allows photodischarge to occur only in selected areas (e.g., pixels associated with the selected TFTs). Once the array of TFTs is addressed, an LED light source emits light over the surface of the photoreceptor, and only the selected (grounded) TFTs permit their associated pixels to discharge. In this manner, a latent image is formed without a need for a bulky and expensive ROS.
    • 描述了系统和方法,其在光感受器上产生潜像时有助于消除对光栅输出扫描器(ROS)或激光器的需要。 采用可寻址的背板,其包括场效应晶体管阵列(例如硅或有机薄膜晶体管或TFT),其中每个TFT对应于感光体表面上的电荷传输层上的单个像素。 通过使用电晕充电形成表面电位,然后将自由电荷载体引导到感光体表面来降低需要调色的区域中的静电潜力来进行潜在的图像形成。 阵列中的TFT被单独寻址或选择以连接到公共地,这允许仅在选定区域(例如,与所选择的TFT相关联的像素)中发生光电荷放电。 一旦解决了TFT阵列,LED光源就会在感光体的表面上发光,只有选定的(接地的)TFT允许其相关像素放电。 以这种方式,形成潜像,而不需要庞大且昂贵的ROS。
    • 67. 发明授权
    • Printed TFT and TFT array with self-aligned gate
    • 具有自对准栅极的印刷TFT和TFT阵列
    • US08269219B2
    • 2012-09-18
    • US13280407
    • 2011-10-25
    • Robert A. Street
    • Robert A. Street
    • H01L29/786
    • H01L29/4908H01L27/124H01L27/1292H01L29/66742H01L29/786
    • A method is used to form a self-aligning thin film transistor. The thin film transistor includes a gate contact formed with a state-switchable material, and a dielectric layer to isolate the gate contact. A source-drain layer, which includes a source contact, and a drain contact are formed with a source-drain material. An area of the gate contact is exposed to a form of energy, wherein the energy transforms a portion of the state switchable material from a non-conductive material to a conductive material, the conductive portion defining the gate contact. A semiconductor material is formed between the source contact and the drain contact.
    • 使用一种方法来形成自对准薄膜晶体管。 薄膜晶体管包括形成有状态切换材料的栅极触点和用于隔离栅极接触的介电层。 源极 - 漏极层,其包括源极接触和漏极接触,形成有源极 - 漏极材料。 栅极接触的区域暴露于能量的形式,其中能量将状态可切换材料的一部分从非导电材料转变为导电材料,导电部分限定栅极接触。 源极触点和漏极触点之间形成半导体材料。