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    • 3. 发明授权
    • Vertical coffee-stain method for forming self-organized line structures
    • 用于形成自组织线结构的垂直咖啡染色方法
    • US08158465B2
    • 2012-04-17
    • US12484992
    • 2009-06-15
    • Sanjiv SambandanRobert A. StreetAna Claudia Arias
    • Sanjiv SambandanRobert A. StreetAna Claudia Arias
    • H01L21/336
    • B82Y40/00B05D1/185H01L21/288H01L21/76838H01L51/0022H01L51/0508
    • A “vertical” coffee-stain method for producing self-organized line structures and other very fine features that involves disposing a target structure in a solution made up of a fine particle solute dispersed in a liquid solvent such that a “waterline” is formed by the upper (liquid/air) surface of the solution on a targeted linear surface region of the substrate. The solvent is then caused to evaporate at a predetermined rate such that a portion of the solute forms a self-organized “coffee-stain” line structure on the straight-line portion of the substrate surface contacted by the receding waterline. The substrate and staining solution are selected such that the liquid solvent has a stronger attraction to the substrate surface than to itself to produce the required pinning and upward curving waterline. The target structure is optionally periodically raised to generate parallel lines that are subsequently processed to form, e.g., TFTs for large-area electronic devices.
    • 用于生产自组织线结构的“垂直”咖啡染色方法和其它非常细小的特征,其包括将目标结构设置在由分散在液体溶剂中的细颗粒溶质构成的溶液中,使得“水线”由 溶液的上(液/空)表面在基材的目标线性表面区域上。 然后使溶剂以预定的速率蒸发,使得一部分溶质在由后退水线接触的基底表面的直线部分上形成自组织的“咖啡污渍”线结构。 选择底物和染色溶液使得液体溶剂对基底表面的吸引力比其本身具有更强的吸引力以产生所需的钉扎和向上弯曲的水线。 目标结构可选地周期性地升高以产生随后被处理以形成例如用于大面积电子器件的TFT的平行线。