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61. 发明申请

US20100010182A1 Adhesive composition, film adhesive, and method for producing the adhesive composition 有权
标题翻译：粘合剂组合物，薄膜粘合剂和粘合剂组合物的制造方法
公开(公告)号：US20100010182A1
公开(公告)日：2010-01-14
申请号：US12458259
申请日：2009-07-07
申请人： Motoki Takahashi , Hirofumi Imai , Takahiro Asai , Koichi Misumi , Toshiyuki Ogata
发明人： Motoki Takahashi , Hirofumi Imai , Takahiro Asai , Koichi Misumi , Toshiyuki Ogata
IPC分类号： C08F122/40 , C08F120/10 , C08F120/18 , C08F112/08
CPC分类号： C09J7/02 , C07B63/00 , C08F6/001 , C08F6/10 , C08F6/12 , C08F212/08 , C08F220/12 , C08F220/14 , C08F2220/1825 , C08F2222/402 , C08J3/095 , C08J2325/08 , C08J2325/14 , C09J7/20 , C09J125/04 , C09J125/08 , C09J125/14 , C09J133/04 , C09J133/24 , C09J135/00 , C09J135/06 , C09J2425/00 , C09J2433/00 , C08F2220/1875 , C08L25/14
摘要： An adhesive composition is disclosed which includes a polymer prepared by copolymerizing a monomer containing a polymerizable group, the polymer including a low-molecular-weight component having a molecular weight equivalent to 1% or less of the weight-average molecular weight of the polymer, the low-molecular-weight component is contained in a range of not less than 0 weight % to less than 0.3 weight % of the total weight of the polymer. This allows provision of an adhesive composition having great adhesive strength in a high-temperature environment, especially at temperatures from 140° C. to 200° C., as well as high heat resistance and favorable crack resistance.
摘要翻译：公开了一种粘合剂组合物，其包括通过共聚含有可聚合基团的单体制备的聚合物，所述聚合物包括分子量等于聚合物的重均分子量的1％或更低的低分子量组分，低分子量成分的含量为聚合物总重量的0重量％〜小于0.3重量％。这允许提供在高温环境下，特别是在140℃至200℃的温度下具有很大粘附强度的粘合剂组合物，以及高耐热性和良好的抗裂性。

62. 发明申请

US20090234087A1 Adhesive composition and adhesive film 审中-公开
标题翻译：粘合剂组合物和粘合剂膜
公开(公告)号：US20090234087A1
公开(公告)日：2009-09-17
申请号：US12322145
申请日：2009-01-29
申请人： Takahiro Asai , Koichi Misumi , Toshiyuki Ogata , Motoki Takahashi , Hirofumi Imai
发明人： Takahiro Asai , Koichi Misumi , Toshiyuki Ogata , Motoki Takahashi , Hirofumi Imai
IPC分类号： C08F222/40
CPC分类号： C09J133/064
摘要： An adhesive composition of the present invention includes a polymer as a main component. The polymer is produced by copolymerization of a monomer composition which includes chain-structured alkyl (meth)acrylate and a monomer containing a maleimide group. This makes it possible to provide an adhesive composition used for forming an adhesive layer in which adhesive strength is kept in a high temperature environment. That is, it becomes possible to provide an adhesive composition that allows forming an adhesive layer which has high adhesive strength in a high temperature environment (particularly at 200° C. to 250° C.).
摘要翻译：本发明的粘合剂组合物包括聚合物作为主要成分。聚合物通过包含链状结构的（甲基）丙烯酸烷基酯和含有马来酰亚胺基团的单体的单体组合物的共聚来制备。这使得可以提供用于形成粘合剂层的粘合剂组合物，其中粘合强度保持在高温环境中。也就是说，可以提供一种粘合剂组合物，其可以在高温环境（特别是在200℃至250℃）下形成具有高粘合强度的粘合剂层。

63. 发明授权

US07326512B2 Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound 失效
标题翻译：含高分子化合物的高分子化合物，抗蚀剂组合物和溶解抑制剂
公开(公告)号：US07326512B2
公开(公告)日：2008-02-05
申请号：US10501459
申请日：2003-11-28
申请人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida , Hideo Hada , Ryoichi Takasu , Mitsuru Sato
发明人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida , Hideo Hada , Ryoichi Takasu , Mitsuru Sato
IPC分类号： G03F7/039 , C08F18/20 , C08F214/18 , C08F14/18
CPC分类号： G03F7/0046 , C08F20/22 , G03F7/0397 , Y10S430/108
摘要： Provided are a polymer compound having high transparency for use in a photoresist composition for microfabrication of the next generation, a resist composition using the polymer compound as a base polymer, and a dissolution inhibitor agent composed of the polymer compound.To ensure etching resistance, an alicyclic group is introduced into a side chain portion. Hydrogen atoms on the ring of the alicyclic group are highly fluorinated to ensure transparency to light of 157 nanometer wavelength, represented by an adsorption coefficient equal to or less than 3.0 μm−1. As the alicyclic group, a polycyclic group is preferably used. Hydrogen atoms are highly fluorinated by preferably substituting all hydrogen atoms on the ring by fluorine atoms, that is, forming a perfluoroalicyclic group. The resist composition is formed by using the polymer compound as a base polymer and further, the dissolution inhibitor agent is formed of the polymer compound.
摘要翻译：提供了用于下一代微细加工的光致抗蚀剂组合物中使用的高透明性的高分子化合物，使用该高分子化合物作为基础聚合物的抗蚀剂组合物和由该高分子化合物构成的溶解抑制剂。为了确保耐蚀刻性，将脂环族基团引入侧链部分。脂环族基团上的氢原子被高度氟化，以确保由等于或小于3.0μm的吸附系数表示的157纳米波长的透明度。作为脂环基，优选使用多环基。通过优选用氟原子代替环上的所有氢原子，即形成全氟环脂基，氢原子被高度氟化。抗蚀剂组合物通过使用高分子化合物作为基础聚合物形成，并且该溶解抑制剂由高分子化合物形成。

64. 发明申请

US20070224520A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern 有权
标题翻译：高分子化合物，含有这种高分子化合物的光致抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US20070224520A1
公开(公告)日：2007-09-27
申请号：US11578189
申请日：2005-04-05
申请人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada , Masaaki Yoshida
发明人： Toshiyuki Ogata , Syogo Matsumaru , Hideo Hada , Masaaki Yoshida
IPC分类号： C08F8/00 , C07C69/54 , G03F7/039 , C08F20/20
CPC分类号： C08F220/28 , C07C69/54 , C07C2601/14 , C08F222/1006 , C08F232/08 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: [Formula 1] —CH2—O-AO—CH2—]n (1) (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).
摘要翻译：化学放大型正性抗蚀剂体系内的曝光后的状态下的碱溶解度显着变化的高分子化合物以及包含这种高分子化合物的光致抗蚀剂组合物和形成抗蚀剂的方法图案，能够以高分辨率形成精细图案。高分子化合物作为碱溶性基团（i）包括其中选自醇羟基，羧基和酚羟基的基团用酸解离的溶解抑制基团（ii）保护的取代基，通过如下所示的通式（1）：[式1] <？in-line-formula description =“In-line Formulas”end =“lead”？> - CH id =“PRIVATE-USE-CHARACTER-00001”he =“7.20mm”wi =“8.47mm”file =“US20070224520A1-20070927-Brketopenst.TIF”alt =“私人使用字符Brketopenst”img-content =“character”img -format =“tif”/> O-CH <2> （1）<？in-line-formula description =“In-line Formulas”end =“ 尾“→（其中，A表示1〜20个碳原子的有机基团，其化合价至少为n + 1，n表示1〜4的整数）。

65. 发明授权

US07264918B2 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith 有权
标题翻译：用于液浸曝光工艺的抗蚀剂组合物及其形成抗蚀剂图案的方法
公开(公告)号：US07264918B2
公开(公告)日：2007-09-04
申请号：US10546529
申请日：2004-03-24
申请人： Kotaro Endo , Masaaki Yoshida , Taku Hirayama , Hiromitsu Tsuji , Toshiyuki Ogata , Mitsuru Sato
发明人： Kotaro Endo , Masaaki Yoshida , Taku Hirayama , Hiromitsu Tsuji , Toshiyuki Ogata , Mitsuru Sato
IPC分类号： G03F7/039 , G03F7/11 , G03F7/207 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0382 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/115
摘要： A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the polymer changes in alkali-solubility due to the action of acid; and (B) an acid generator which generates acid due to exposure to light, and a method for forming a resist pattern using the resist composition. By the resist composition or the method, an adverse effect of the immersion liquid can be avoided while achieving high resolution and high depth of focus.
摘要翻译：一种用于液浸光刻工艺的抗蚀剂组合物，其包括：（A）包含（a1）碱可溶性结构单元的聚合物，其各自包含具有（i）氟原子或氟代烷基的脂环族基团和（ii）醇羟基基团，其中聚合物由于酸的作用而改变碱溶解度; 和（B）由于曝光而产生酸的酸发生剂，以及使用该抗蚀剂组合物形成抗蚀剂图案的方法。通过抗蚀剂组合物或方法，可以避免浸渍液体的不利影响，同时实现高分辨率和高焦度聚焦。

66. 发明申请

US20070190447A1 Photoresist composition and method of forming resist pattern 审中-公开
标题翻译：光刻胶组合物和形成抗蚀剂图案的方法
公开(公告)号：US20070190447A1
公开(公告)日：2007-08-16
申请号：US10589382
申请日：2005-02-01
申请人： Toshiyuki Ogata , Takuma Hojo , Hiromitsu Tsuji , Takako Hirosaki , Mitsuru Sato
发明人： Toshiyuki Ogata , Takuma Hojo , Hiromitsu Tsuji , Takako Hirosaki , Mitsuru Sato
IPC分类号： G03C1/00
CPC分类号： G03F7/0045 , B82Y30/00 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397
摘要： The photoresist composition is formed by including the fullerene derivative (A) having two or more malonic ester residues. Preferably, the malonic ester residue is, a group is preferably expressed by the general formula (1) below. In the formula (1), R1 and R2 independently represent an alkyl group, which may be identical or different from each other. The alkyl group is a normal or branched chain, or cyclic alkyl group having 1 to 10 carbons, and n is an integer from 2 to 10.
摘要翻译：通过包含具有两个或多个丙二酸酯残基的富勒烯衍生物（A）形成光致抗蚀剂组合物。优选地，丙二酸酯残基是一个基团优选由下面通式（1）表示。在式（1）中，R 1和R 2独立地表示可以相同或不同的烷基。烷基是碳原子数为1〜10的正，支链或环状烷基，n为2〜10的整数。

67. 发明申请

US20060154170A1 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith 有权
标题翻译：用于液浸曝光工艺的抗蚀剂组合物及其形成抗蚀剂图案的方法
公开(公告)号：US20060154170A1
公开(公告)日：2006-07-13
申请号：US10546529
申请日：2004-03-24
申请人： Kotaro Endo , Masaaki Yoshida , Taku Hirayama , Hiromitsu Tsuji , Toshiyuki Ogata , Mitsuru Sato
发明人： Kotaro Endo , Masaaki Yoshida , Taku Hirayama , Hiromitsu Tsuji , Toshiyuki Ogata , Mitsuru Sato
IPC分类号： G03C1/76
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0382 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/115
摘要： A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the polymer changes in alkali-solubility due to the action of acid; and (B) an acid generator which generates acid due to exposure to light, and a method for forming a resist pattern using the resist composition. By the resist composition or the method, an adverse effect of the immersion liquid can be avoided while achieving high resolution and high depth of focus.
摘要翻译：一种用于液浸光刻工艺的抗蚀剂组合物，其包括：（A）包含（a1）碱可溶性结构单元的聚合物，其各自包含具有（i）氟原子或氟代烷基的脂环族基团和（ii）醇羟基基团，其中聚合物由于酸的作用而改变碱溶解度; 和（B）由于曝光而产生酸的酸发生剂，以及使用该抗蚀剂组合物形成抗蚀剂图案的方法。通过抗蚀剂组合物或方法，可以避免浸渍液体的不利影响，同时实现高分辨率和高焦度聚焦。

68. 发明授权

US06998561B2 Wire electric discharge machine 有权
标题翻译：线放电机
公开(公告)号：US06998561B2
公开(公告)日：2006-02-14
申请号：US10689634
申请日：2003-10-22
申请人： Junichi Kato , Keiichiro Miyajima , Yasuo Arakawa , Toshiyuki Ogata
发明人： Junichi Kato , Keiichiro Miyajima , Yasuo Arakawa , Toshiyuki Ogata
IPC分类号： B23H7/06
CPC分类号： B23H7/065 , B23H2500/20
摘要： A wire electric discharge machine capable of preventing a straightness error from being caused by consumption of a wire electrode, to eliminate insufficient machining. A correction angle φ is predetermined for preventing the straightness error of the workpiece due to consumption. Correction amounts d1′, d2′ on a program plane and an upper surface of a workpiece, respectively, are determined based on the predetermined correction angle φ, and are added to or substracted from a predetermined offset amount depending on a wire electrode radius and an electric discharging gap, to determine corrected offset amounts d1, d2 on the program plane and the upper surface of the workpiece, respectively. Correction amounts dlo, dup for lower and upper wire guides in an offset direction are obtained based on the corrected offset amounts d1, d2, respectively, so that motion paths of upper and lower wire guides relative to the workpiece are determined.
摘要翻译：一种能够防止线电极消耗引起的平直度误差的电线放电机，消除不充分的加工。为了防止由于消耗引起的工件的直线度误差，修正角度φi是预定的。基于预定的校正角度phi来确定编程平面和工件的上表面上的校正量d 1'，d 2'，并且根据线电极半径和放电间隙，以分别确定编程平面和工件的上表面上的校正偏移量d 1，d 2。基于校正的偏移量d 1，d 2分别获得偏移方向上下导线器的修正量dlo，dup，从而确定上，下导线器相对于工件的运动路径。

69. 发明申请

US20050203262A1 Fluorinated polymers, photoresists and processes for microlithography 审中-公开
标题翻译：氟化聚合物，光致抗蚀剂和微光刻工艺
公开(公告)号：US20050203262A1
公开(公告)日：2005-09-15
申请号：US10521412
申请日：2003-07-23
申请人： Andrew Feiring , Frank Schadt , Toshiyuki Ogata , Koutaro Endo
发明人： Andrew Feiring , Frank Schadt , Toshiyuki Ogata , Koutaro Endo
IPC分类号： C08F114/18 , C08F214/18 , C08F220/28 , C08F220/30 , G03F7/004 , G03F7/039 , G03F7/32 , H01L21/027
CPC分类号： G03F7/0046 , C08F214/186 , C08F220/30 , G03F7/0395 , G03F7/0397
摘要： Fluorinated polymers useful in photoresist compositions and associated processes for microlithography are described. These polymers and photoresists have a fluoroalcohol functional group that simultaneously imparts high ultraviolet (UV) transparency and developability in basic media. The polymers also have a repeat unit derived from a C1-C25 alkyl hydroxymethylacrylate comonomer, e.g., tert-butyl hydroxymethylacrylate, or a C5-C50 polycyclic alkyl acrylate in which the polycyclic group contains a hydroxy group, e.g., hydroxyadamantyl acrylate. The materials of this invention have high UV tansparency, particularly at short wavelengths, e.g., 193 nm and 157 nm, which makes them highly useful for lithography at these short wavelengths.
摘要翻译：描述了可用于光致抗蚀剂组合物和用于微光刻的相关工艺的氟化聚合物。这些聚合物和光致抗蚀剂具有同时在基础介质中赋予高紫外（UV）透明度和显影性的氟代醇官能团。聚合物还具有衍生自C 1 -C 25烷基羟甲基丙烯酸酯共聚单体的重复单元，例如羟丙基甲基丙烯酸叔丁酯或C 5 >其中多环基团含有羟基的丙烯酸多环烷基酯，例如丙烯酸羟基金刚烷酯。本发明的材料具有高的紫外线透明度，特别是在短波长例如193nm和157nm处，这使得它们在这些短波长下对光刻非常有用。

70. 发明申请

US20050130056A1 Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound 失效
标题翻译：含高分子化合物的高分子化合物，抗蚀剂组合物和溶解抑制剂
公开(公告)号：US20050130056A1
公开(公告)日：2005-06-16
申请号：US10501459
申请日：2003-11-28
申请人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida , Hideo Hada , Ryoichi Takasu , Mitsuru Sato
发明人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida , Hideo Hada , Ryoichi Takasu , Mitsuru Sato
IPC分类号： C08F16/24 , C08F20/22 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/494
CPC分类号： G03F7/0046 , C08F20/22 , G03F7/0397 , Y10S430/108
摘要： Provided are a polymer compound having high transparency for use in a photoresist composition for microfabrication of the next generation, a resist composition using the polymer compound as a base polymer, and a dissolution inhibitor agent composed of the polymer compound. To ensure etching resistance, an alicyclic group is introduced into a side chain portion. Hydrogen atoms on the ring of the alicyclic group are highly fluorinated to ensure transparency to light of 157 nanometer wavelength, represented by an adsorption coefficient equal to or less than 3.0 μm−1. As the alicyclic group, a polycyclic group is preferably used. Hydrogen atoms are highly fluorinated by preferably substituting all hydrogen atoms on the ring by fluorine atoms, that is, forming a perfluoroalicyclic group. The resist composition is formed by using the polymer compound as a base polymer and further, the dissolution inhibitor agent is formed of the polymer compound.
摘要翻译：提供了用于下一代微细加工的光致抗蚀剂组合物中使用的高透明性的高分子化合物，使用该高分子化合物作为基础聚合物的抗蚀剂组合物和由该高分子化合物构成的溶解抑制剂。为了确保耐蚀刻性，将脂环族基团引入侧链部分。脂环族基团上的氢原子被高度氟化，以确保由等于或小于3.0μm的吸附系数表示的157纳米波长的透明度。作为脂环基，优选使用多环基。通过优选用氟原子代替环上的所有氢原子，即形成全氟环脂基，氢原子被高度氟化。抗蚀剂组合物通过使用高分子化合物作为基础聚合物形成，并且该溶解抑制剂由高分子化合物形成。

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