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    • 68. 发明授权
    • Pattern inspection apparatus
    • 图案检验仪
    • US07372560B2
    • 2008-05-13
    • US10809409
    • 2004-03-26
    • Toru TojoToshiyuki WatanabeIkunao IsomuraAkihiko Sekine
    • Toru TojoToshiyuki WatanabeIkunao IsomuraAkihiko Sekine
    • G01N21/00
    • G01N21/956
    • A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.
    • 图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光 形成表面,检测器,通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构,设置在光学焦平面附近,朝向 图案形成表面,并且在空间上分离第一和第二检查光的照射区域,使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。