会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 61. 发明授权
    • Method for manufacturing semiconductor device
    • 制造半导体器件的方法
    • US07875530B2
    • 2011-01-25
    • US11602261
    • 2006-11-21
    • Tomoko TamuraTomoyuki AokiTakuya TsurumeKoji Dairiki
    • Tomoko TamuraTomoyuki AokiTakuya TsurumeKoji Dairiki
    • H01L21/00H01L21/46H01L21/30
    • H01L27/1266H01L27/1214
    • First semiconductor integrated circuits and second semiconductor integrated circuits arranged over a first substrate so that each of the second semiconductor integrated circuits is adjacent to one of the first semiconductor integrated circuits are transferred to additional substrates through multiple transfer operations. After the first semiconductor integrated circuits and the second semiconductor integrated circuits formed over the first substrate are transferred to the additional substrates (a fourth substrate and a fifth substrate) respectively, the circuits are divided into a semiconductor device corresponding to each semiconductor integrated circuit. The first semiconductor integrated circuits are arranged while keeping a distance from each other over the fourth substrate, and the second semiconductor integrated circuits are arranged while keeping a distance from each other over the fifth substrate. Thus, a large division margin of each of the fourth substrate and the fifth substrate can be obtained.
    • 第一半导体集成电路和第二半导体集成电路布置在第一基板上,使得第二半导体集成电路中的每一个与第一半导体集成电路之一相邻,通过多次传送操作被传送到附加的基板。 在第一半导体集成电路和形成在第一衬底上的第二半导体集成电路分别转移到附加衬底(第四衬底和第五衬底)之后,将电路分成对应于每个半导体集成电路的半导体器件。 第一半导体集成电路在第四衬底上彼此保持距离的同时被布置,并且第二半导体集成电路被布置成在第五衬底上彼此保持距离。 因此,可以获得第四基板和第五基板中的每一个的大分割裕度。
    • 68. 发明授权
    • Manufacturing method of semiconductor device
    • 半导体器件的制造方法
    • US07504317B2
    • 2009-03-17
    • US11600070
    • 2006-11-16
    • Tomoyuki AokiTomoko TamuraTakuya TsurumeKoji Dairiki
    • Tomoyuki AokiTomoko TamuraTakuya TsurumeKoji Dairiki
    • H01L21/46
    • H01L27/1266H01L21/78H01L27/1214
    • It is an object to provide a manufacturing method of a semiconductor device with high reliability. A plurality of first semiconductor integrated circuits, a plurality of second semiconductor integrated circuits each of which is arranged to be adjacent to one of the first semiconductor integrated circuits, a plurality of third semiconductor integrated circuits each of which is arranged to be adjacent to one of the first semiconductor integrated circuits and one of the second semiconductor integrated circuits, and a plurality of fourth semiconductor integrated circuits each of which is arranged to be adjacent to one of the first semiconductor integrated circuits, one of the second semiconductor integrated circuits, and one of the third semiconductor integrated circuits are formed over a first substrate. The first semiconductor integrated circuits are transferred to a second substrate. A first protective layer is formed to cover the first semiconductor integrated circuits and a surface of the second substrate in the periphery of the first semiconductor integrated circuits. The second substrate and the first protective layer are divided so that the plurality of the first semiconductor integrated circuits is divided into individual pieces and part of the second substrate remains in the periphery of the first semiconductor integrated circuits. Accordingly, a semiconductor device having the first semiconductor integrated circuit is manufactured.
    • 本发明的目的是提供一种高可靠性的半导体器件的制造方法。 多个第一半导体集成电路,多个第二半导体集成电路,每个第二半导体集成电路被布置为与第一半导体集成电路之一相邻,多个第三半导体集成电路被布置为与 第一半导体集成电路和第二半导体集成电路之一,以及多个第四半导体集成电路,每个第四半导体集成电路被布置为与第一半导体集成电路之一相邻,第二半导体集成电路之一和第二半导体集成电路之一 第三半导体集成电路形成在第一基板上。 第一半导体集成电路被转移到第二衬底。 形成第一保护层以覆盖第一半导体集成电路和第一半导体集成电路的周边中的第二基板的表面。 第二基板和第一保护层被分割成使得多个第一半导体集成电路被分成单独的部分,并且第二基板的一部分保留在第一半导体集成电路的周围。 因此,制造具有第一半导体集成电路的半导体器件。