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    • 65. 发明申请
    • Interference cancellation in RFID systems
    • RFID系统中的干扰消除
    • US20060098765A1
    • 2006-05-11
    • US10981893
    • 2004-11-05
    • Michael ThomasWilliam ColleranErik FountainTodd Humes
    • Michael ThomasWilliam ColleranErik FountainTodd Humes
    • H03D1/04H04B1/38
    • H04B1/525
    • An interference canceller for a RFID reader senses a signal related to the interference signal in the receive path of the reader. The canceller outputs an adjustment signal that depends on the sensed signal, which is coupled into the receive path before a downconverter in the receive path. The canceller can use a signal derived from the transmit path in generating the adjustment signal. The canceller adjusts the amplitude or phase (or both) of the derived signal to form the adjustment signal so that it cancels a carrier feed-through interference signal when injected into the receive path. The canceller can include a vector modulator to adjust the amplitude and/or phase of the derived signal; or alternatively, the canceller can include a variable attenuator and a variable phase shifter to adjust the amplitude and/or phase of the derived signal. The loop can be continuous or non-continuous.
    • 用于RFID读取器的干扰消除器感测与读取器的接收路径中的干扰信号相关的信号。 消除器输出取决于感测信号的调整信号,该信号在接收路径中的下变频器之前被耦合到接收路径中。 消除器可以使用从发送路径导出的信号来产生调整信号。 消除器调节导出信号的幅度或相位(或两者)以形成调整信号,使得当注入到接收路径中时,它抵消载波馈通干扰信号。 消除器可以包括矢量调制器以调整导出信号的幅度和/或相位; 或者替代地,消除器可以包括可变衰减器和可变移相器,以调整导出信号的幅度和/或相位。 循环可以是连续的或非连续的。
    • 67. 发明授权
    • Laser thin film poly-silicon annealing optical system
    • 激光薄膜多晶硅退火光学系统
    • US07009140B2
    • 2006-03-07
    • US10884101
    • 2004-07-01
    • William N. PartioPalash P. DasRussell HudymaMichael Thomas
    • William N. PartioPalash P. DasRussell HudymaMichael Thomas
    • B23K26/00
    • B23K26/0732B23K26/0622B23K26/0738C30B1/023C30B13/24H01L21/02686H01L21/2026
    • A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may cmprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 μm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of teh long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level. 2. The apparatus may also have a high average power in the laser ouput light pulse beam as delivered to the workpiece and a a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The linewidth due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.
    • 公开了一种高能量,高重复率的工件表面加热方法和装置,其可以使在等于或高于4000Hz的工作的脉冲XeF激光器产生在约351nm的中心波长的激光输出光脉冲光束; 光学系统将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20um,并且扩大激光输出光脉冲光束以在光束的长轴上形成工件覆盖的长度 轴; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将所述激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍数以允许所述场停止在所述工件处保持足够陡峭的光束轮廓而不阻塞所述光束轮廓 强度水平太高 该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率,以及在短轴光学组件中具有弯管校正机构。 弯管矫正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值,以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的弯头矫正机构,其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。