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61. 发明申请

US20140109771A1 BEVERAGE EXTRACTION APPARATUS 审中-公开
标题翻译：饮料提取装置
公开(公告)号：US20140109771A1
公开(公告)日：2014-04-24
申请号：US13979885
申请日：2011-08-24
申请人： Yoshihiro Nakao , Yoshiaki Yokoo , Makoto Nakajima , Hiroaki Shimizu , Hiroki Furuta , Morio Mitsuhashi , Kitaro Oka , Chiseko Sakuma
发明人： Yoshihiro Nakao , Yoshiaki Yokoo , Makoto Nakajima , Hiroaki Shimizu , Hiroki Furuta , Morio Mitsuhashi , Kitaro Oka , Chiseko Sakuma
IPC分类号： A47J31/44
CPC分类号： A47J31/44 , A23F5/262 , A47J31/407 , B65D85/8043
摘要： A roasted plant extraction apparatus is provided which is capable of selectively reducing excessive bitterness in an extract liquid obtained by water extraction from a roasted plant raw material while preserving desirable flavor ingredients and body. A beverage extraction apparatus includes a granule containing part containing granules for extraction of a beverage, first pouring device for pouring an extraction solvent into the granule containing part from a first direction, and collecting device for collecting a coffee extract liquid extracted by device of the extraction solvent at the side of layers of the coffee granules corresponding to the first direction. The granule containing part is provided with a detachable restraining member for placing the granules for extraction of a beverage in a substantially sealed state.
摘要翻译：本发明提供了一种焙烤植物提取装置，其能够选择性地减少通过从焙烤植物原料中提取水而获得的提取液中的过度的苦味，同时保留理想的风味成分和身体。一种饮料提取装置，包括：含有颗粒的含有颗粒的颗粒，用于提取饮料;第一倾倒装置，用于从第一方向将提取溶剂注入到所述颗粒容纳部分;以及收集装置，用于收集通过提取装置提取的咖啡提取液咖啡颗粒层对应于第一方向的溶剂。颗粒容纳部分设置有用于将基本上密封状态的饮料提取的颗粒放置的可拆卸的限制构件。

62. 发明授权

US08470406B2 Method of spray application, and spray apparatus, for bentonite material 有权
标题翻译：用于膨润土材料的喷涂方法和喷涂装置
公开(公告)号：US08470406B2
公开(公告)日：2013-06-25
申请号：US12064004
申请日：2006-08-10
申请人： Ichizo Kobayashi , Takeshi Sasakura , Toshiyuki Tanaka , Makoto Nakajima , Masaru Toida , Takahisa Isobe
发明人： Ichizo Kobayashi , Takeshi Sasakura , Toshiyuki Tanaka , Makoto Nakajima , Masaru Toida , Takahisa Isobe
IPC分类号： B05D1/02
CPC分类号： B28C5/026 , B01F5/0256 , B05B7/0416 , E02D31/02 , E02D31/04 , E21F15/10 , G21F9/36
摘要： The present invention provides a spray method and spray apparatus for bentonite-based material that allow forming a bentonite layer of high dry density. A spray apparatus 1 comprises a supersonic nozzle 2, to which a compressor 5 and a bentonite container 6 are connected. The supersonic nozzle 2 is fed compressed air from the compressor 5 and a bentonite-based material from the bentonite container 6. The compressed air, mixed with the bentonite-based material, is accelerated to supersonic speed when passing through a constriction portion 14 of the supersonic nozzle 2, and is sprayed at supersonic speed out of a jet orifice 11.
摘要翻译：本发明提供了一种用于膨润土基材料的喷涂方法和喷涂装置，其允许形成高密度的膨润土层。喷雾装置1包括超音速喷嘴2，压缩机5和膨润土容器6连接到该喷嘴上。超音速喷嘴2从压缩机5输送压缩空气和来自膨润土容器6的膨润土类材料。与膨润土类材料混合的压缩空气通过膨润土类材料的收缩部14时被加速到超声速度超音速喷嘴2，并且以超音速喷射出喷射孔11。

63. 发明授权

US08140793B2 Virtual tape device, data backup method, and recording medium 有权
标题翻译：虚拟磁带设备，数据备份方法和记录介质
公开(公告)号：US08140793B2
公开(公告)日：2012-03-20
申请号：US12490604
申请日：2009-06-24
申请人： Hajime Nonaka , Yoshiaki Mori , Makoto Nakajima , Muneyuki Yoshikawa
发明人： Hajime Nonaka , Yoshiaki Mori , Makoto Nakajima , Muneyuki Yoshikawa
IPC分类号： G06F13/00
CPC分类号： G06F1/3203 , G06F1/3268 , G06F3/0625 , G06F3/0634 , G06F3/0686 , Y02D10/154
摘要： To provide a virtual tape device to reduce power consumption by utilizing a disk array device conforming to MAID. Two or more disk devices are divided into an information managing disk group whose power is kept on at all times and to two or more recording disk groups whose power is turned on/off as necessary when managing data. The virtual tape device includes: a volume information managing part which manages positions of virtual tapes allotted to storage areas of the recording disk groups; and a data managing part which rearranges, in the recording disk group whose power is on, the virtual tape for storing the data to the recording disk group whose power is off based on writing/reading information stored in the information managing disk group and positional information of the virtual tapes, and executes a control to write backup data to the recording disk group whose power is on.
摘要翻译：通过利用符合MAID的磁盘阵列设备来提供虚拟磁带设备以降低功耗。两个或更多个磁盘设备被分成一直保持功率的信息管理磁盘组，并且在管理数据时，根据需要将其功率打开/关闭的两个或更多个记录磁盘组分配。虚拟磁带装置包括：卷信息管理部，其管理分配给记录盘组的存储区域的虚拟磁带的位置; 以及数据管理部，其根据存储在信息管理盘组中的写入/读取信息，在存储在信息管理盘组中的写入/读取信息的情况下，重新排列在电源打开的记录盘组中，将用于存储数据的虚拟磁带重新排列到电源关闭的记录盘组上，的虚拟磁带，并且执行控制以将备份数据写入到其打开电源的记录盘组。

64. 发明授权

US07888301B2 Resist, barc and gap fill material stripping chemical and method 有权
标题翻译：抗蚀剂，棒材和间隙填充材料剥离化学和方法
公开(公告)号：US07888301B2
公开(公告)日：2011-02-15
申请号：US10581475
申请日：2004-12-01
申请人： David D. Bernhard , Yoichiro Fujita , Tomoe Miyazawa , Makoto Nakajima
发明人： David D. Bernhard , Yoichiro Fujita , Tomoe Miyazawa , Makoto Nakajima
IPC分类号： C11D7/32
CPC分类号： H01L21/31111 , C11D3/044 , C11D3/245 , C11D3/30 , C11D3/43 , C11D7/10 , C11D7/28 , C11D7/3209 , C11D7/5004 , C11D11/0047 , G03F7/423 , G03F7/425 , H01L21/02063 , H01L21/02071
摘要： An aqueous-based composition and process for removing photoresist, bottom anti-reflective coating (BARC) material, and/or gap fill material from a substrate having such material(s) thereon. The aqueous-based composition includes a fluoride source, at least one organic amine, at least one organic solvent, water, and optionally chelating agent and/or surfactant. The composition achieves high-efficiency removal of such material(s) in the manufacture of integrated circuitry without adverse effect on metal species on the substrate, such as copper, and without damage to SiOC-based dielectric materials employed in the semiconductor architecture.
摘要翻译：一种用于从其上具有这种材料的基材去除光致抗蚀剂，底部抗反射涂层（BARC）材料和/或间隙填充材料的水基组合物和方法。水基组合物包括氟化物源，至少一种有机胺，至少一种有机溶剂，水和任选的螯合剂和/或表面活性剂。组合物可以在集成电路的制造中实现这种材料的高效去除，而不会对衬底（例如铜）上的金属物质产生不利影响，并且不损坏半导体结构中使用的基于SiOC的介电材料。

65. 发明授权

US07873138B2 Structure and method for bolting neutron reflector 有权
标题翻译：螺栓中子反射器的结构和方法
公开(公告)号：US07873138B2
公开(公告)日：2011-01-18
申请号：US10311602
申请日：2002-04-25
申请人： Makoto Nakajima , Hirokazu Shoumura , Kenji Umeda
发明人： Makoto Nakajima , Hirokazu Shoumura , Kenji Umeda
IPC分类号： G21C5/00
CPC分类号： G21C11/06 , G21Y2002/206 , G21Y2002/303 , G21Y2004/301 , Y02E30/40
摘要： A neutron reflector bolt fastening structure is disclosed in which even upon relaxation in the fastening forces thereof being generated in tie rods for divided stage portions as a result of neutron irradiation, it is possible to press the neutron reflector firmly against a core vessel. The neutron reflector bolt fastening structure includes: a neutron reflector which includes of a plurality of divided stage portions and situated in a core vessel in a reactor vessel; a plurality of tie rods for fixing the neutron reflector to the core vessel; and a plurality of bolts for exclusively fixing the lowermost stage portion of the plurality of stage portions of the neutron reflector to the core vessel.
摘要翻译：公开了一种中子反射器螺栓紧固结构，其中即使在由于中子照射而产生在用于分割台部分的拉杆中的紧固力的松弛中，也可以将中子反射器牢固地压靠在核心容器上。中子反射器螺栓紧固结构包括：中子反射器，其包括多个分级台部并且位于反应器容器中的核心容器中; 多个用于将中子反射器固定到核心容器的拉杆; 以及用于将中子反射器的多个台阶部分的最下段部分专门固定到核心容器的多个螺栓。

66. 发明申请

US20080006305A1 Resist, Barc and Gap Fill Material Stripping Chemical and Method 有权
标题翻译：抗蚀剂，Barc和Gap填充材料剥离化学和方法
公开(公告)号：US20080006305A1
公开(公告)日：2008-01-10
申请号：US10581475
申请日：2004-12-01
申请人： David D. Bernhard , Yoichiro Fujita , Tomoe Miyazawa , Makoto Nakajima
发明人： David D. Bernhard , Yoichiro Fujita , Tomoe Miyazawa , Makoto Nakajima
IPC分类号： G03F7/42 , B08B3/04 , C11D7/32
CPC分类号： H01L21/31111 , C11D3/044 , C11D3/245 , C11D3/30 , C11D3/43 , C11D7/10 , C11D7/28 , C11D7/3209 , C11D7/5004 , C11D11/0047 , G03F7/423 , G03F7/425 , H01L21/02063 , H01L21/02071
摘要： An aqueous-based composition and process for removing photoresist, bottom anti-reflective coating (BARC) material, and/or gap fill material from a substrate having such material(s) thereon. The aqueous-based composition includes a fluoride source, at least one organic amine, at least one organic solvent, water, and optionally chelating agent and/or surfactant. The composition achieves high-efficiency removal of such material(s) in the manufacture of integrated circuitry without adverse effect on metal species on the substrate, such as copper, and without damage to SiOC-based dielectric materials employed in the semiconductor architecture.
摘要翻译：一种用于从其上具有这种材料的基材去除光致抗蚀剂，底部抗反射涂层（BARC）材料和/或间隙填充材料的水基组合物和方法。水基组合物包括氟化物源，至少一种有机胺，至少一种有机溶剂，水和任选的螯合剂和/或表面活性剂。组合物可以在集成电路的制造中实现这种材料的高效去除，而不会对衬底（例如铜）上的金属物质产生不利影响，并且不损坏半导体结构中使用的基于SiOC的介电材料。

67. 发明授权

US06982009B2 Method and device for cleaning abrasive plates on an abrasive machine 失效
标题翻译：用于在研磨机上清洁研磨板的方法和装置
公开(公告)号：US06982009B2
公开(公告)日：2006-01-03
申请号：US10937830
申请日：2004-09-09
申请人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
发明人： Yasuhide Denda , Yoshio Nakamura , Yoshinobu Nishimoto , Makoto Nakajima , Tsuyoshi Hasegawa , Norihiko Moriya
IPC分类号： B08B3/00
CPC分类号： B24B37/08 , B08B3/024 , B08B15/04 , B08B2203/0229 , B24B53/017 , Y10S134/902
摘要： The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.
摘要翻译：本发明的方法清洗研磨机的上磨料板和下研磨板的磨料面。该方法由清洁装置执行，该清洁装置包括：用于喷射水的喷嘴; 用于防止喷射水在空气中飞散的刷子，刷子包围喷嘴; 以及用于封闭防磨刷和上磨料板的外边缘之间的间隙的另一刷子，其特征在于以下步骤：从喷嘴向上磨料板的研磨面喷射水; 将喷嘴移向上磨料板的外边缘; 并且当在防磨刷和上磨料板的外边缘之间形成间隙时，通过闭合刷闭合间隙。

68. 发明申请

US20050159090A1 Polishing apparatus 有权
标题翻译：抛光设备
公开(公告)号：US20050159090A1
公开(公告)日：2005-07-21
申请号：US11033884
申请日：2005-01-13
申请人： Makoto Nakajima
发明人： Makoto Nakajima
IPC分类号： B24B37/08 , B24B47/12 , H01L21/304 , B24B7/00
CPC分类号： B24B37/08 , B24B37/105 , B24B47/12
摘要： The small polishing apparatus is capable of simultaneously polishing both side faces of a work piece, and a lower polishing plate, an internal gear and a sun gear are respectively driven by direct drive (DD) motors. The polishing apparatus comprises: an upper and a lower polishing plates; a sun gear and an internal gear; and a carrier provided between the polishing plates and engaged with the gears. Both side faces of the work piece held by the carrier are simultaneously polished by the polishing plates. DDmotors respectively rotate the lower polishing plate and the gears. Each DD motor has a ring-shaped output member. A first DD motor has the output member directly connected to a rotary holding member rotatably holding the lower polishing plate. A second DD motor is provided under the first DD motor. One end of a rotary shaft, which is pierced through the first DD motor, is connected to a rotary holding member rotatably holding one of the gears, and the other end is directly connected to the output member of the second DD motor.
摘要翻译：小型抛光装置能够同时抛光工件的两个侧面，并且下部抛光板，内部齿轮和太阳齿轮分别由直接驱动（DD）电动机驱动。抛光装置包括：上和下抛光板; 太阳齿轮和内齿轮; 以及设置在所述研磨板之间并与所述齿轮接合的载体。由载体保持的工件的两个侧面由抛光板同时抛光。 DDmotors分别旋转下抛光板和齿轮。每个DD电机具有环形输出部件。第一DD马达具有直接连接到可旋转地保持下抛光板的旋转保持构件的输出构件。第一DD电机设置在第一DD电机下面。旋转轴的穿过第一DD电动机的一端连接到可旋转地保持其中一个齿轮的旋转保持构件，另一端直接连接到第二DD电动机的输出构件。

69. 发明授权

US06705929B1 Cloth cleaning device and polishing machine 失效
标题翻译：布清洁装置和抛光机
公开(公告)号：US06705929B1
公开(公告)日：2004-03-16
申请号：US09716398
申请日：2000-11-20
申请人： Yoshinobu Nishimoto , Makoto Nakajima , Yoshio Nakamura , Yasuhide Denda , Chihiro Miyagawa
发明人： Yoshinobu Nishimoto , Makoto Nakajima , Yoshio Nakamura , Yasuhide Denda , Chihiro Miyagawa
IPC分类号： B24B700
CPC分类号： B24B53/017 , B08B3/024
摘要： Cloth cleaning device of a polishing machine which is capable of fully cleaning a polishing cloth including a part in the vicinity of a center roller. The cloth cleaning device includes an arm movable in a plane parallel to the polishing cloth between a first position above the polishing cloth and a second position outside of the polishing cloth. A jet nozzle is attached to the arm and directs high pressure water toward the polishing cloth. An enclosing member encloses the jet nozzle so as to prevent the high pressure water, which has been directed out from the jet nozzle, from scattering. The jet nozzle is oriented toward the center roller and the high pressure water is directed toward the part of the polishing cloth in the vicinity of the center roller when the arm moves the jet nozzle close to the center roller.
摘要翻译：能够完全清洁包括中心辊附近的部分的抛光布的抛光机的布料清洗装置。布清洁装置包括在抛光布上方的第一位置和抛光布之外的第二位置的平行于抛光布的平面中可移动的臂。喷嘴连接到臂上，并将高压水引向抛光布。封闭构件包围喷嘴，以防止从喷嘴喷出的高压水不会飞散。当喷嘴靠近中心辊移动喷嘴时，喷嘴朝向中心辊定向，高压水指向中心辊附近的抛光布的部分。

70. 发明授权

US4976393A Semiconductor device and production process thereof, as well as wire bonding device used therefor 失效
标题翻译：半导体装置及其制造方法以及使用的引线接合装置
公开(公告)号：US4976393A
公开(公告)日：1990-12-11
申请号：US134458
申请日：1987-12-17
申请人： Makoto Nakajima , Yoshio Ohashi , Toshio Chuma , Kazuo Hatori , Isao Araki , Masahiro Koizumi , Jin Onuki , Hitoshi Suzuki , Susumu Okikawa
发明人： Makoto Nakajima , Yoshio Ohashi , Toshio Chuma , Kazuo Hatori , Isao Araki , Masahiro Koizumi , Jin Onuki , Hitoshi Suzuki , Susumu Okikawa
IPC分类号： B23K20/00 , H01L21/00
CPC分类号： H01L24/85 , B23K20/007 , H01L24/48 , H01L24/78 , H01L2224/05624 , H01L2224/32245 , H01L2224/45015 , H01L2224/45124 , H01L2224/45139 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48247 , H01L2224/48465 , H01L2224/48624 , H01L2224/48724 , H01L2224/48799 , H01L2224/73265 , H01L2224/78268 , H01L2224/78301 , H01L2224/786 , H01L2224/85045 , H01L2224/85065 , H01L2224/85075 , H01L2224/85099 , H01L2224/851 , H01L2224/85181 , H01L2224/85205 , H01L2224/85424 , H01L2224/92247 , H01L24/45 , H01L24/73 , H01L2924/00011 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01014 , H01L2924/01018 , H01L2924/01023 , H01L2924/01028 , H01L2924/01029 , H01L2924/01033 , H01L2924/01039 , H01L2924/01045 , H01L2924/01047 , H01L2924/01079 , H01L2924/01082 , H01L2924/01083 , H01L2924/01204 , H01L2924/01205 , H01L2924/10253 , H01L2924/1305 , H01L2924/13091 , H01L2924/14 , H01L2924/181 , H01L2924/20753 , H01L2924/3025
摘要： The present invention concerns a semiconductor device and a process for producing semiconductor device, as well as a wire bonding device used therefor.In accordance with the present invention, a ball formed at the top end of a bonding wire is sphericalized by electric discharge within a reducing gas atmosphere at a high temperature from 100.degree. C. to 200.degree. C. By using the ball of the bonding wire formed under such a condition to the bonding of the bonding pad of a semiconductor pellet, it is possible to conduct highly reliable ball bonding with excellent bondability and with no development of cracks or the like in the semiconductor pellet, as well as to obtain a highly reliable semiconductor device, that is, LSI or IC.

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