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61. 发明申请

US20060035571A1 Polishing apparatus 有权
公开(公告)号：US20060035571A1
公开(公告)日：2006-02-16
申请号：US11201307
申请日：2005-08-11
申请人： Makoto Nakajima , Yoshio Nakamura , Tadakazu Miyashita
发明人： Makoto Nakajima , Yoshio Nakamura , Tadakazu Miyashita
IPC分类号： B24B29/00
CPC分类号： B24B37/08 , B24B41/007
摘要： An upper polishing plate is moved downward until facing a lower polishing plate to polish a work piece. The upper polishing plate is rotated in a horizontal plane together with a first elastic member, a second elastic member, an outer member and a connecting member. A pressure difference between a first pressing force pressing the outer member or an inner member upward and a second pressing force pressing the outer member or the inner member downward, which is produced in a first closed space by supplying a compressed fluid into and discharging the same from the first closed space, is adjusted, so that a third pressing force of the upper polishing plate, which presses a work piece, can be adjusted.

62. 发明授权

US06445758B1 Internal structure of nuclear reactor with coolant flow stabilizing facility 有权
标题翻译：具有冷却剂流动稳定设施的核反应堆内部结构
公开(公告)号：US06445758B1
公开(公告)日：2002-09-03
申请号：US09416933
申请日：1999-10-13
申请人： Hajime Izumi , Makoto Nakajima , Chikara Kurimura , Takehiko Tsutsui , Noboru Kubo , Mikio Kurihara , Toshio Ichikawa
发明人： Hajime Izumi , Makoto Nakajima , Chikara Kurimura , Takehiko Tsutsui , Noboru Kubo , Mikio Kurihara , Toshio Ichikawa
IPC分类号： G21C1502
CPC分类号： G21C15/14 , G21Y2002/204 , G21Y2004/302 , Y02E30/32
摘要： Within an upper plenum of a nuclear reactor, a portion of a heated coolant flows radially outward from a central portion of a core barrel (30) towards outlet nozzles (12) in a region of an upper core plate (21) extending outside of an outer periphery of the core along an inner wall of a core barrel (30). Portions of the coolant flows beneath the outlet nozzles (12). Thus, streams of heated coolant flowing in opposite directions may collide with each other. After collision, the flow directions of the heated coolant are changed to flow upward. Due to the collision, the coolant flow behavior becomes complicated and unstable, making it difficult to measure the temperature of the heated coolant with an outlet pipe (42) connected to the outlet nozzle (12). Within an upper plenum (40) defined above a fuel region through which a coolant flows and which is hydraulically communicated with a plurality of outlet nozzles (12) mounted on a side wall of a nuclear reactor vessel (10), short flow stabilizing members (1) each being lower than the outlet nozzle (12) are disposed in the vicinity of a core barrel (30) in an region outside of the fuel region.
摘要翻译：在核反应堆的上部增压室内，加热的冷却剂的一部分从芯筒（30）的中心部分向着出口喷嘴（12）径向向外流动，在上芯板（21）芯沿着芯筒（30）的内壁的外周。冷却剂的一部分流过出口喷嘴（12）。因此，沿相反方向流动的加热的冷却剂流可能彼此碰撞。在碰撞之后，加热的冷却剂的流动方向被改变以向上流动。由于碰撞，冷却剂流动行为变得复杂和不稳定，使得难以用连接到出口喷嘴（12）的出口管（42）来测量加热的冷却剂的温度。在位于冷却剂流过的燃料区域上方并且与安装在核反应堆容器（10）的侧壁上的多个出口喷嘴（12）液压连通的燃料区域上方的上部空气室（40）内，短流动稳定构件每个低于出口喷嘴（12）的喷嘴（1）设置在燃料区域外侧的区域中的芯筒（30）附近。

63. 发明授权

US4354897A Process for forming contact through holes 失效
标题翻译：用于形成接触孔的方法
公开(公告)号：US4354897A
公开(公告)日：1982-10-19
申请号：US234194
申请日：1981-02-13
申请人： Makoto Nakajima
发明人： Makoto Nakajima
IPC分类号： H01L21/3205 , G03F7/40 , H01L21/28 , H01L21/311 , H01L21/768 , B44C1/22 , H01L21/306
CPC分类号： H01L21/31144 , G03F7/40 , H01L21/31116 , H01L21/76804
摘要： A process for forming a contact through-hole in an insulating layer lying between multilayer conductors comprises the steps of: forming a photoresist layer on the insulating layer with an aperture therein exposing, and defining, the position of a through-hole to be found in the insulating layer; wet-etching the insulating layer in the portion exposed by the aperture to form a preceding hole; heating the photoresist layer to bend the end portion of the photoresist layer into the preceding hole but to a limited extent such that the end portion does not come into contact with sloped side wall of the preceding hole; and dry-etching the insulating layer to complete the etching of the contact through-hole while maintaining the desired, sloped sidewall thereof, thereby preventing cracks from occurring in the upper one of the multilayer conductors in the portions thereof which extend through the through-hole.
摘要翻译：在位于多层导体之间的绝缘层中形成接触通孔的方法包括以下步骤：在绝缘层上形成光致抗蚀剂层，其中孔内露出并限定待发现的通孔的位置绝缘层; 在由孔径暴露的部分中湿式蚀刻绝缘层以形成前一孔; 加热光致抗蚀剂层以将光致抗蚀剂层的端部弯曲成前一孔，但是在有限的程度上使得端部不与前一孔的倾斜侧壁接触; 并且干法蚀刻绝缘层，以完成对接触通孔的蚀刻，同时保持其期望的倾斜侧壁，从而防止在其中的上部多层导体中的其中延伸穿过通孔的部分产生裂纹。

64. 发明授权

US4334513A Electronic fuel injection system for internal combustion engine 失效
标题翻译：内燃机电子燃油喷射系统
公开(公告)号：US4334513A
公开(公告)日：1982-06-15
申请号：US163505
申请日：1980-06-27
申请人： Makoto Nakajima , Masaru Naramura
发明人： Makoto Nakajima , Masaru Naramura
IPC分类号： F02D41/34 , F02D35/00 , F02D41/02 , F02D41/04 , F02D45/00 , F02M69/36 , F02M69/46 , F02B3/00
CPC分类号： F02M69/46 , F02M69/36
摘要： In an electronic fuel injection system for an internal combustion engine, a vacuum switch and a throttle valve switch respectively monitor the intake manifold pressure and the opening of the throttle valve. Fuel enrichment is achieved in response to these two switches in such a manner that the fuel enrichment is performed even in the case of low speed and relatively high load engine operating conditions, as well as at full throttle. In such a low speed, relatively high load range, the amount of fuel enrichment may be less than at full throttle. Optionally the fuel enrichment is achieved only by the vacuum switch without the throttle switch. The vacuum switch optionally has an altitude compensation mechanism.
摘要翻译：在内燃机的电子燃料喷射系统中，真空开关和节气门开关分别监视进气歧管的压力和节流阀的开度。燃料浓缩是以这样一种方式实现的，即即使在低速和相对较高的负载发动机运行条件以及全速节气门的情况下也执行燃料浓缩。在这样的低速，相对较高的负载范围内，燃料浓缩的量可能小于全节气门。可选地，仅通过没有节气门开关的真空开关实现燃料浓缩。真空开关可选择具有高度补偿机构。

65. 发明授权

US4065426A Method for the preparation of powdered rubber 失效
标题翻译：橡胶粉的制备方法
公开(公告)号：US4065426A
公开(公告)日：1977-12-27
申请号：US690905
申请日：1976-05-28
申请人： Takeshi Yamawaki , Takanori Uchida , Makoto Nakajima
发明人： Takeshi Yamawaki , Takanori Uchida , Makoto Nakajima
IPC分类号： C08C1/00 , C08C1/14 , C08J3/12 , C08J3/16 , C08J3/20 , C08J3/215 , C08K3/04 , C08K5/01
CPC分类号： C08J3/16 , C08C1/14 , C08J3/215 , C08J2321/00 , Y10S528/936
摘要： Rubber crumbs are imparted with non-tackiness or antiblocking property by treating the crumbs with a mixture of a rubber latex and an aqueous carbon black slurry in the presence of a coagulant.
摘要翻译：通过在凝结剂存在下用橡胶胶乳和水性炭黑浆料的混合物处理该碎屑，赋予橡胶屑以非粘性或防粘连性。

66. 发明授权

US10051989B2 Beverage extraction apparatus 有权
公开(公告)号：US10051989B2
公开(公告)日：2018-08-21
申请号：US13979885
申请日：2011-08-24
申请人： Yoshihiro Nakao , Yoshiaki Yokoo , Makoto Nakajima , Hiroaki Shimizu , Hiroki Furuta , Morio Mitsuhashi , Kitaro Oka , Chiseko Sakuma
发明人： Yoshihiro Nakao , Yoshiaki Yokoo , Makoto Nakajima , Hiroaki Shimizu , Hiroki Furuta , Morio Mitsuhashi , Kitaro Oka , Chiseko Sakuma
IPC分类号： A47J31/44 , A23F5/26 , A47J31/40 , B65D85/804
CPC分类号： A47J31/44 , A23F5/262 , A47J31/407 , B65D85/8043
摘要： A roasted plant extraction apparatus is provided which is capable of selectively reducing excessive bitterness in an extract liquid obtained by water extraction from a roasted plant raw material while preserving desirable flavor ingredients and body. A beverage extraction apparatus includes a granule containing part containing granules for extraction of a beverage, first pouring device for pouring an extraction solvent into the granule containing part from a first direction, and collecting device for collecting a coffee extract liquid extracted by device of the extraction solvent at the side of layers of the coffee granules corresponding to the first direction. The granule containing part is provided with a detachable restraining member for placing the granules for extraction of a beverage in a substantially sealed state.

67. 发明授权

US09760006B2 Silicon-containing resist underlayer film forming composition having urea group 有权
公开(公告)号：US09760006B2
公开(公告)日：2017-09-12
申请号：US12811424
申请日：2009-01-08
申请人： Makoto Nakajima , Yuta Kanno , Wataru Shibayama
发明人： Makoto Nakajima , Yuta Kanno , Wataru Shibayama
IPC分类号： G03F7/11 , G03F7/09 , G03F7/075 , G03F7/30 , G03F7/32 , G03F7/36 , G03F7/40 , C09D183/08 , C08G77/26
CPC分类号： G03F7/11 , C08G77/26 , C09D183/08 , G03F7/0752 , G03F7/0757 , G03F7/091 , G03F7/30 , G03F7/322 , G03F7/36 , G03F7/40
摘要： There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising: a hydrolyzable organosilane having a urea group; a hydrolysis product thereof; or a hydrolysis-condensation product thereof. The hydrolyzable organosilane is for example a compound of Formula (1): where at least one of three groups T1, T2, and T3 is a group of Formula (2):

68. 发明授权

US08877425B2 Silicon-containing resist underlayer film forming composition having fluorine-based additive 有权
标题翻译：含氟抗蚀剂下层膜形成用组合物含氟类添加剂
公开(公告)号：US08877425B2
公开(公告)日：2014-11-04
申请号：US13880787
申请日：2011-10-20
申请人： Yuta Kanno , Makoto Nakajima , Tomoko Misaki , Motonobu Matsuyama , Masayuki Haraguchi
发明人： Yuta Kanno , Makoto Nakajima , Tomoko Misaki , Motonobu Matsuyama , Masayuki Haraguchi
IPC分类号： G03F7/09 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/40
CPC分类号： G03F7/091 , C08G77/14 , C08G77/26 , C09D183/06 , G03F7/0752 , G03F7/11 , H01L21/0271 , H01L21/3081 , C08L33/16 , C09D183/08
摘要： A resist underlayer film forming composition for lithography includes: as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof, a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof, and a monomer D having a silicon atom-containing organic group and at least one radical polymerizable double bond in the molecule thereof, in the presence of a polymerization initiator C in a content of 5% by mole or more and 200% by mole or less, based on the total mole of the monomer A, the monomer B, and the monomer D; and as a component (II), a hydrolyzable silane compound, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a silicon-containing compound that is a combination of these compounds.
摘要翻译：用于光刻的抗蚀剂下层膜形成组合物包括：作为组分（I），通过在其分子中聚合具有两个或更多个可自由基聚合的双键的单体A获得的含氟高支化聚合物，具有氟烷基的单体B 和分子中的至少一个自由基聚合性双键，以及分子中具有含硅原子的有机基团和至少一个自由基聚合性双键的单体D，在聚合引发剂C的存在下，相对于单体A，单体B和单体D的总摩尔数为5摩尔％以上且200摩尔％以下。作为组分（II），可水解硅烷化合物，其水解产物，其水解缩合产物或这些化合物的组合的含硅化合物。

69. 发明申请

US20130183830A1 SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL 有权
标题翻译：用于形成耐下层膜的含硅组合物，其中含有保护的脂肪醇的有机基团
公开(公告)号：US20130183830A1
公开(公告)日：2013-07-18
申请号：US13825158
申请日：2011-09-14
申请人： Satoshi Takeda , Makoto Nakajima , Yuta Kanno
发明人： Satoshi Takeda , Makoto Nakajima , Yuta Kanno
IPC分类号： H01L21/033
CPC分类号： H01L21/0332 , C08G77/14 , C08G77/16 , C09D183/04 , G03F7/0752 , G03F7/091 , G03F7/094
摘要： Described herein are compositions for forming an underlayer film for a solvent-developable resist. These compositions can include a hydrolyzable organosilane having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof and a solvent. The composition can form a resist underlayer film including, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof, the silicon atom in the silane compound having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group in a ratio of 0.1 to 40% by mol based on the total amount of silicon atoms. Also described is a method for applying the composition onto a semiconductor substrate and baking the composition to form a resist underlayer film.
摘要翻译：本文描述了用于形成用于溶剂可显影抗蚀剂的下层膜的组合物。这些组合物可以包括具有与含有保护的脂族醇基的有机基团键合的硅原子的水解性有机硅烷，可水解的有机硅烷的水解产物，可水解的有机硅烷的水解缩合产物，或其组合和溶剂。该组合物可以形成抗蚀剂下层膜，该抗蚀剂下层膜包括可水解的有机硅烷，可水解的有机硅烷的水解产物，可水解的有机硅烷的水解缩合产物或其组合，硅烷化合物中硅原子与硅原子键合的硅原子相对于硅原子总量，含有保护的脂族醇基的有机基团的比例为0.1〜40摩尔％。还描述了将组合物施加到半导体衬底上并烘烤该组合物以形成抗蚀剂下层膜的方法。

70. 发明授权

US08426112B2 Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group 有权
标题翻译：含有含氮甲硅烷基的聚合物的抗蚀下层膜成膜组合物
公开(公告)号：US08426112B2
公开(公告)日：2013-04-23
申请号：US12676687
申请日：2008-09-10
申请人： Makoto Nakajima , Wataru Shibayama , Yuta Kanno
发明人： Makoto Nakajima , Wataru Shibayama , Yuta Kanno
IPC分类号： G03F7/09 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/38
CPC分类号： G03F7/091 , G03F7/0752
摘要： There is provided a resist underlayer film for lithography causing no intermixing with a photoresist and having a dry etching rate higher than that of the photoresist, and a resist underlayer film forming composition for forming the underlayer film. A resist underlayer film forming composition for lithography comprising: a polymer containing a partial structure of Formula (1): where X1 is a group of Formula (2), Formula (3), Formula (4) or Formula (4-1): and a solvent. The polymer may contain, besides the partial structure of Formula (1), a partial structure of Formula (5): (R1)a(R3)bSi(O—)4−(a+b) Formula (5) and/or a partial structure of Formula (6): [(R4)cSi(O—)3−c]2Y Formula (6).
摘要翻译：提供了一种用于光刻的抗蚀剂下层膜，其不与光致抗蚀剂混合并且具有比光致抗蚀剂更高的干蚀刻速率，以及用于形成下层膜的抗蚀剂下层膜组合物。 1，一种含有式（1）部分结构的聚合物：其中X1是式（2），式（3），式（4）或式（4-1）的基团：和溶剂。除了式（1）的部分结构之外，聚合物可以包含式（5）的部分结构：（R1）a（R3）bSi（O-）4-（a + b）式（5）和/或式（6）的部分结构：[（R4）cSi（O-）3-c] 2YFormula（6）。

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