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    • 70. 发明申请
    • PLASMA PROCESSING APPARATUS
    • 等离子体加工设备
    • US20120186747A1
    • 2012-07-26
    • US13236775
    • 2011-09-20
    • Shinji OBAMAMasaru IzawaKenji MaedaYoshihide KiharaKouichi YamamotoHitoshi Tamura
    • Shinji OBAMAMasaru IzawaKenji MaedaYoshihide KiharaKouichi YamamotoHitoshi Tamura
    • H01L21/00C23F1/08
    • H01J37/32284
    • A plasma processing apparatus is provided with a processing chamber which is arranged inside a vacuum container and plasma is formed inside, a circular shape plate member made of a dielectric material arranged above the processing chamber through which an electric field is transmitted, and a cavity part having a cylindrical shape arranged above the plate member and the electric field is introduced inside, in which the cavity part is provided with a first cylindrical cavity part having a cylindrical shape cavity with a large diameter and having the plate member as the bottom face, a second cylindrical cavity part arranged above to be connected to the first cylindrical cavity part and having a cylindrical shape cavity with a small diameter, and a step portion for connecting these between the first and the second cylindrical cavity parts.
    • 一种等离子体处理装置,具有设置在真空容器内的等离子体内部的处理室,配置在通过电场传播的处理室上方的电介质材料构成的圆形板状构件,以及空腔部 具有布置在板构件上方的圆柱形状并且将电场引入内部,其中空腔部分设置​​有具有大直径的圆柱形形状的腔体并具有板构件作为底面的第一圆柱形空腔部分, 第二圆柱形空腔部分,其布置在上面以连接到第一圆柱形空腔部分并且具有小直径的圆柱形形状腔;以及阶梯部分,用于将它们连接在第一和第二圆柱形空腔部分之间。