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61. 发明授权

US07919921B2 Photomultiplier 有权
标题翻译：光电倍增管
公开(公告)号：US07919921B2
公开(公告)日：2011-04-05
申请号：US11921944
申请日：2006-06-01
申请人： Hiroyuki Kyushima , Hideki Shimoi , Hiroyuki Sugiyama , Hitoshi Kishita , Suenori Kimura , Yuji Masuda , Takayuki Ohmura
发明人： Hiroyuki Kyushima , Hideki Shimoi , Hiroyuki Sugiyama , Hitoshi Kishita , Suenori Kimura , Yuji Masuda , Takayuki Ohmura
IPC分类号： H01J43/18
CPC分类号： H01J43/18
摘要： The present invention relates to a photomultiplier having a fine structure capable of realizing high multiplication efficiency. The photomultiplier comprises a housing whose inside is maintained vacuum, and, on a device mounting surface which is a part of an inner wall surface defining an internal space of the housing, a photocathode serving as a reflection type photocathode, an electron-multiplier section, an anode, and a voltage distributing section are disposed integrally. In particular, the electron-multiplier section is constituted by dynodes at multiple stages cascade-multiplying photoelectrons from the photocathode, and the voltage distributing section, which applies corresponding voltages to the dynodes at the respective stages respectively, is on the same surface together with the electron-multiplier section.
摘要翻译：本发明涉及具有能够实现高倍增效率的精细结构的光电倍增管。光电倍增管包括其内部保持真空的壳体，并且在作为限定壳体的内部空间的内壁表面的一部分的装置安装表面上，用作反射型光电阴极的光电阴极，电子倍增器部分，阳极和电压分配部一体地设置。特别地，电子倍增器部分由多级级联倍增电倍增电极构成，光电阴极的级联倍增电极和分别对相应电平的倍增电极施加相应电压的电压分配部分与电子倍增器部分。

62. 发明授权

US07906725B2 Vacuum device 有权
标题翻译：真空装置
公开(公告)号：US07906725B2
公开(公告)日：2011-03-15
申请号：US11922029
申请日：2006-06-28
申请人： Hideki Shimoi , Hiroyuki Sugiyama , Hiroyuki Kyushima
发明人： Hideki Shimoi , Hiroyuki Sugiyama , Hiroyuki Kyushima
IPC分类号： H05K5/06
CPC分类号： H01J43/28 , H01J5/24 , H01L51/5243 , H01L51/5246
摘要： An object is to sufficiently keep the airtightness in a vacuum container even when it is made smaller. A photomultiplier tube 1 comprises a flat sheet-like lower substrate 4, a casing-like frame 3b erected on the lower substrate 4, an upper substrate 2 including a frame 3a airtightly joined to an opening part of the frame 3b while holding a low-melting metal therebetween, and a frame-like projection 25b arranged in parallel with the frame 3b on the inner side of the frame 3b on the lower substrate 4.
摘要翻译：一个目的是在真空容器中充分保持气密，即使它变小。光电倍增管1包括平板状下基板4，竖立在下基板4上的壳状框架3b，上基板2，其具有气密地接合到框架3b的开口部的框架3a，熔融金属，以及在下基板4上的框架3b的内侧上与框架3b平行布置的框架状突起25b。

63. 发明授权

US07880385B2 Photomultiplier including an electronic-multiplier section in a housing 有权
标题翻译：光电倍增器，包括壳体中的电子倍增器部分
公开(公告)号：US07880385B2
公开(公告)日：2011-02-01
申请号：US11921959
申请日：2006-06-01
申请人： Hiroyuki Kyushima , Hideki Shimoi , Hiroyuki Sugiyama , Hitoshi Kishita , Suenori Kimura , Yuji Masuda , Takayuki Ohmura
发明人： Hiroyuki Kyushima , Hideki Shimoi , Hiroyuki Sugiyama , Hitoshi Kishita , Suenori Kimura , Yuji Masuda , Takayuki Ohmura
IPC分类号： H01J43/04 , H01J43/18 , H01J43/00
CPC分类号： H01J43/24
摘要： The present invention relates to a photomultiplier having a fine structure capable of realizing high detection accuracy by effectively suppressing cross talk among electron-multiplier channels. The photomultiplier comprises a housing whose inside is maintained vacuum, and, in the housing, a photocathode, an electron-multiplier section, and anodes are disposed. The electron-multiplier section has groove portions for cascade-multiplying photoelectrons as electron-multiplier channels, and the anodes are constituted by channel electrodes corresponding to the groove portions respectively defined by wall parts. In particular, at least parts of the respective channel electrodes are located in spaces sandwiched between pairs of wall parts defining the corresponding groove portions.
摘要翻译：本发明涉及具有能够通过有效地抑制电子倍增器通道之间的串扰来实现高检测精度的精细结构的光电倍增管。光电倍增管包括其内部保持真空的壳体，并且在壳体中设置光电阴极，电子倍增器部分和阳极。电子倍增器部分具有用于级联倍增光电子作为电子倍增器通道的槽部分，并且阳极由对应于分别由壁部分限定的槽部分的沟道电极构成。特别地，各通道电极的至少一部分位于夹在形成相应凹槽部分的一对壁部分之间的空间中。

64. 发明授权

US07867807B2 Method for manufacturing photoelectric converting device 有权
标题翻译：光电转换装置的制造方法
公开(公告)号：US07867807B2
公开(公告)日：2011-01-11
申请号：US12161890
申请日：2007-02-28
申请人： Hitoshi Kishita , Hiroyuki Sugiyama , Hiroyuki Kyushima , Hideki Shimoi , Keisuke Inoue
发明人： Hitoshi Kishita , Hiroyuki Sugiyama , Hiroyuki Kyushima , Hideki Shimoi , Keisuke Inoue
IPC分类号： H01L21/00
CPC分类号： H01J40/02
摘要： The present invention relates to a manufacturing method of obtaining a photoelectric converting device which can sufficiently maintain airtightness of a housing space for photocathode without degradation of the characteristics of the photocathode. In accordance with the manufacturing method, on the side wall end face of a lower frame and a bonding portion of an upper frame forming an envelope of the photoelectric converting device, a multilayered metal film of chromium and nickel is formed. In a vacuum space decompressed to a predetermined degree of vacuum and having a temperature not more than the melting point of indium, these upper and lower frames introduced therein are brought into close contact with each other with a predetermined pressure while sandwiching indium wire members, and accordingly, an envelope having a housing space whose airtightness is sufficiently maintained is obtained.
摘要翻译：本发明涉及一种获得光电转换装置的制造方法，该光电转换装置能够充分保持用于光电阴极的容纳空间的气密性，而不会降低光电阴极的特性。根据制造方法，在下框架的侧壁端面和形成光电转换装置的外壳的上框架的接合部分形成铬和镍的多层金属膜。在减压至预定真空度并且具有不高于铟的熔点的温度的真空空间中，引入其中的这些上下框架以预定压力彼此紧密接触，同时夹入铟线构件，并且因此，获得具有充分保持气密性的收纳空间的信封。

65. 发明申请

US20090283290A1 Vacuum Device 有权
标题翻译：真空装置
公开(公告)号：US20090283290A1
公开(公告)日：2009-11-19
申请号：US11922029
申请日：2006-06-28
申请人： Hideki Shimoi , Hiroyuki Sugiyama , Hiroyuki Kyushima
发明人： Hideki Shimoi , Hiroyuki Sugiyama , Hiroyuki Kyushima
IPC分类号： H05K5/06
CPC分类号： H01J43/28 , H01J5/24 , H01L51/5243 , H01L51/5246
摘要： An object is to sufficiently keep the airtightness in a vacuum container even when it is made smaller. A photomultiplier tube 1 comprises a flat sheet-like lower substrate 4, a casing-like frame 3b erected on the lower substrate 4, an upper substrate 2 including a frame 3a airtightly joined to an opening part of the frame 3b while holding a low-melting metal therebetween, and a frame-like projection 25b arranged in parallel with the frame 3b on the inner side of the frame 3b on the lower substrate 4.
摘要翻译：一个目的是在真空容器中充分保持气密，即使它变小。光电倍增管1包括平板状下基板4，竖立在下基板4上的壳状框架3b，上基板2，其具有气密地接合到框架3b的开口部的框架3a，熔融金属，以及在下基板4上的框架3b的内侧上与框架3b平行布置的框架状突起25b。

66. 发明申请

US20090212699A1 PHOTOMULTIPLIER 失效
标题翻译：照相机
公开(公告)号：US20090212699A1
公开(公告)日：2009-08-27
申请号：US12388961
申请日：2009-02-19
申请人： Takayuki Ohmura , Hiroyuki Kyushima , Hideki Shimoi , Tsuyoshi Kodama
发明人： Takayuki Ohmura , Hiroyuki Kyushima , Hideki Shimoi , Tsuyoshi Kodama
IPC分类号： H01J43/18
CPC分类号： H01J43/26 , H01J43/28
摘要： The present invention relates to a photomultiplier that realizes a significant improvement of response time characteristics by a structure enabling mass production. The photomultiplier comprises a sealed container, and, in the sealed container, a photocathode, an electron multiplier section, and an anode are respectively disposed. The electron multiplier section includes multiple stages of dynode units, and each of the multiple stages of dynode units is fixed with one end of the associated dynode pin while being electrically connected thereto. In particular, the dynode pin, whose one ends are fixed to the multiple stages of dynode units, are held within an effective region of the electron multiplier section contributing to secondary electron multiplication, when the electron multiplier section is viewed from the photocathode side. By this configuration, a focusing distance from the photocathode to a first stage dynode unit can be shortened effectively and the effective region of the electron multiplier section can be enlarged to effectively reduce variations in transit time of photoelectrons propagating from the photocathode to the first stage dynode unit.
摘要翻译：本发明涉及光电倍增器，其通过能够批量生产的结构实现响应时间特性的显着改善。光电倍增管包括密封容器，并且在密封容器中分别设置光电阴极，电子倍增器部分和阳极。电子倍增器部分包括多级倍增电极单元，并且多级倍增电极单元中的每一级在相关联的倍增极引脚的一端被电连接的同时被固定。特别地，当从光电阴极侧观察电子倍增器部分时，其一端固定到倍增电极单元的多级的倍增极引脚被保持在有助于二次电子倍增的电子倍增器部分的有效区域内。通过这种结构，可以有效地缩短从光电阴极到第一级倍增电极单元的聚焦距离，并且可以扩大电子倍增器部分的有效区域，从而有效地减少从光电阴极传播到第一级倍增电极的光电子的通过时间的变化单元。

67. 发明申请

US20060091317A1 Photomultiplier and radiation detector 有权
公开(公告)号：US20060091317A1
公开(公告)日：2006-05-04
申请号：US11189023
申请日：2005-07-26
申请人： Hideki Shimoi , Hiroyuki Kyushima
发明人： Hideki Shimoi , Hiroyuki Kyushima
IPC分类号： G01T1/20 , G01T1/24 , H01J31/50
CPC分类号： H01J43/28
摘要： Onto a base member, through which stem pins are passed and holding members are to be joined to the respective surfaces thereof, the stem pins and the holding members are joined by fusion by melting of the base member to arrange a stem with at least three or more layers formed by sandwiching the base member by the holding members. In comparison to a conventional arrangement wherein the stem is arranged as a single layer of glass material and this is melted to fuse the stem pins, the positional precision, flatness, and levelness of both surfaces of the stem are improved.

68. 发明授权

US07023134B2 Dynode producing method and structure 有权
标题翻译： Dynode生产方法和结构
公开(公告)号：US07023134B2
公开(公告)日：2006-04-04
申请号：US10311586
申请日：2001-06-15
申请人： Hideki Shimoi , Hiroyuki Kyushima
发明人： Hideki Shimoi , Hiroyuki Kyushima
IPC分类号： H01J43/00
CPC分类号： H01J43/22 , H01J9/125
摘要： An inner surface of an electron-multiplier hole (14) includes a first curved surface (19a) and a second curved surface (19b) that face each other. The first curved surface (19a) extends from an edge of an input opening (14a) in such a way as to face the input opening (14a), and is shaped like a substantially circular arc having a predetermined radius. The second curved surface (19b) extends from an edge of an output opening (14b) in such a way as to face the output opening (14b), and is shaped like a substantially circular arc having a predetermined radius.
摘要翻译：电子倍增器孔（14）的内表面包括彼此相对的第一曲面（21a）和第二曲面（24b）。第一弯曲表面（20a）从输入开口（14a）的边缘以与面向输入开口（14a）的方式延伸，并且被形状为具有预定半径的大致圆弧形。第二弯曲表面（20b）从输出开口（14b）的边缘以与面向输出开口（14b）的方式延伸，并形成为具有预定半径的基本圆弧。

69. 发明授权

US5880458A Photomultiplier tube with focusing electrode plate having frame 失效
标题翻译：具有聚焦电极板的光电倍增管具有框架
公开(公告)号：US5880458A
公开(公告)日：1999-03-09
申请号：US954964
申请日：1997-10-21
申请人： Hideki Shimoi , Hiroyuki Kyushima , Hisaki Katoh
发明人： Hideki Shimoi , Hiroyuki Kyushima , Hisaki Katoh
IPC分类号： H01J43/06 , H01J43/22 , H01J43/04 , H01J43/10 , H01J43/18
CPC分类号： H01J43/06 , H01J43/22
摘要： In the photomultiplier tube 1, the focusing electrode plate 17 has the focusing portion 20 for focusing incident electrons and the frame 21 surrounding the focusing portion 20. The focusing portion 20 has a plurality of slit openings 18. The dynode unit 10 is constructed from a plurality of dynode plates 11 laminated one on another. Each dynode plate 11 has a plurality of electron through-holes 13 located in confrontation with the plurality of slit openings 18. A plurality of anodes 9 are provided for receiving electrons emitted from the respective through-holes 13 of the dynode unit 10. The frame 21 has dummy openings 22 at positions located in confrontation with edges 15 of the first stage dynode plate 11a in the dynode unit 10.
摘要翻译：在光电倍增管1中，聚焦电极板17具有用于聚焦入射电子的聚焦部分20和围绕聚焦部分20的框架21.聚焦部分20具有多个狭缝开口18.倍增电极单元10由多个多极板11彼此层叠。每个倍增极板11具有与多个狭缝开口18对置的多个电子通孔13.多个阳极9用于接收从倍增极单元10的各个通孔13发射的电子。框架 21具有位于与倍增极单元10中的第一级倍增极板11a的边缘15对置的位置处的虚设开口22。

70. 发明授权

US08945416B2 Laser processing method 有权
标题翻译：激光加工方法
公开(公告)号：US08945416B2
公开(公告)日：2015-02-03
申请号：US13389048
申请日：2011-07-19
申请人： Hideki Shimoi , Keisuke Araki
发明人： Hideki Shimoi , Keisuke Araki
IPC分类号： H01L21/02 , B23K26/38 , B23K26/40 , H01L21/306 , H01L21/48 , B23K26/00
CPC分类号： H05K3/002 , B23K26/382 , B23K26/384 , B23K26/40 , B23K26/55 , B23K2101/35 , B23K2103/50 , H01L21/30604 , H01L21/30625 , H01L21/486 , H05K2203/107
摘要： A laser processing method of converging laser light into an object to be processed made of silicon so as to form a modified region and etching the object along the modified region so as to form the object with a through hole comprises an etch resist film producing step of producing an etch resist film resistant to etching on an outer surface of the object; a laser light converging step of converging the laser light at the object after the etch resist film producing step so as to form the modified region along a part corresponding to the through hole in the object and converging the laser light at the etch resist film so as to form a defect region along a part corresponding to the through hole in the etch resist film; and an etching step of etching the object after the laser light converging step so as to advance the etching selectively along the modified region and form the through hole.
摘要翻译：一种激光加工方法，其将激光会聚到由硅制成的待加工物体中以形成改质区域，并沿着改质区域蚀刻物体以形成具有通孔的物体，其包括：抗蚀剂膜制造步骤产生耐蚀刻物体的外表面上的蚀刻抗蚀剂膜; 在该抗蚀剂膜制造工序之后，将激光会聚在被处理物体上的激光聚光步骤，沿着与物体的贯通孔对应的部分形成改质区域，并将激光会聚在抗蚀剂膜上，以便沿着与蚀刻抗蚀剂膜中的通孔对应的部分形成缺陷区域; 以及在激光聚光步骤之后蚀刻所述物体以便沿着所述改质区域选择性地进行蚀刻并形成所述通孔的蚀刻步骤。

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