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61. 发明授权

US07884923B2 Laser surveying system and distance measuring method 有权
标题翻译：激光测量系统和测距方法
公开(公告)号：US07884923B2
公开(公告)日：2011-02-08
申请号：US12315357
申请日：2008-12-02
申请人： Kaoru Kumagai , Kenichiro Yoshino , Yasushi Tanaka , Ikuo Ishinabe
发明人： Kaoru Kumagai , Kenichiro Yoshino , Yasushi Tanaka , Ikuo Ishinabe
IPC分类号： G01C3/08
CPC分类号： G01C3/08 , G01S7/4814 , G01S17/10 , G01S17/42
摘要： A laser surveying system, comprising a light source for emitting a laser beam, a projection optical system for turning the laser beam from the light source to a parallel luminous flux, a scanning unit for projecting the luminous flux of the projected laser beam for scanning, a scanning direction detecting unit for detecting a scanning direction, a photodetection optical system for receiving a reflected light of the projected laser beam from an object to be measured, a photodetection element for performing photo-electric conversion of the reflected light received via the photodetection optical system, and a distance measuring unit for measuring a distance based on a signal from the photodetection element, wherein the projection optical system has a luminous flux diameter changing means, and a luminous flux diameter of the projected laser beam is enabled to be changed.
摘要翻译：一种激光测量系统，包括用于发射激光束的光源，用于将来自光源的激光束转动为平行光束的投影光学系统，用于投影用于扫描的投影激光束的光束的扫描单元，用于检测扫描方向的扫描方向检测单元，用于接收来自待测物体的投影激光束的反射光的光检测光学系统，用于对通过光检测光接收的反射光进行光电转换的光电检测元件系统和距离测量单元，用于基于来自光电检测元件的信号测量距离，其中投影光学系统具有光束直径改变装置，并且能够改变投影的激光束的光束直径。

62. 发明申请

US20080054260A1 Semiconductor Integrated Circuit Device, Method For Testing The Semiconductor Integrated Circuit Device, Semiconductor Wafer And Burn-In Test Apparatus 审中-公开
标题翻译：半导体集成电路器件，半导体集成电路器件测试方法，半导体晶片和老化测试仪器
公开(公告)号：US20080054260A1
公开(公告)日：2008-03-06
申请号：US11661680
申请日：2005-06-01
申请人： Takashi Ishitobi , Takashi Ohtori , Yasushi Tanaka
发明人： Takashi Ishitobi , Takashi Ohtori , Yasushi Tanaka
IPC分类号： H01L23/58 , G01R31/02 , G06F19/00
CPC分类号： G01R31/2855 , G01R31/2831 , H01L22/14 , H01L2924/0002 , H01L2924/00
摘要： A wafer test is performed to a wafer, and then a protective film is applied to part of a chip surface of each good chip other than terminals. For defective chips, a protective film is applied to an entire chip surface as well as terminals and, while keeping that state, a burn-in test is performed, thereby cutting off power supply and signal application to defective chips before burn-in test. Moreover, when a chip includes a self-test circuit to judge whether the chip is good or not and the chip is judged to be defective, the function of stopping an internal operation of the chip may be provided or a judgment signal may be transmitted to a burn-in test apparatus, thereby stopping power supply and signal application from the burn-in test apparatus. Thus, power supply and signal application to a chip judged to be defective after burn-in can be cut off.
摘要翻译：对晶片进行晶片测试，然后将保护膜施加到除端子之外的每个良好芯片的芯片表面的一部分。对于有缺陷的芯片，将保护膜应用于整个芯片表面和端子，并且在保持该状态的同时进行老化测试，从而在老化测试之前切断电源和信号施加到故障芯片。此外，当芯片包括用于判断芯片是否良好并且芯片被判断为有缺陷的自检电路时，可以提供停止芯片的内部操作的功能，或者可以将判断信号发送到老化测试装置，从而停止来自老化测试装置的电源和信号施加。因此，可以切断在老化后被判定为有缺陷的芯片的电源和信号应用。

63. 发明申请

US20070079278A1 Method and apparatus for reducing OPC model errors 失效
标题翻译：减少OPC模型误差的方法和装置
公开(公告)号：US20070079278A1
公开(公告)日：2007-04-05
申请号：US11243933
申请日：2005-10-05
申请人： Yasushi Tanaka , Masahiro Inohara , Matthew Angyal
发明人： Yasushi Tanaka , Masahiro Inohara , Matthew Angyal
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/68
摘要： A method is provided of accessing model error in an optical proximity correction (OPC) model. The method begins by obtaining a preliminary mask using an OPC model, creating an etched wafer from the preliminary mask using lithography, and measuring a specified critical dimension (CD) on the wafer and a second CD on the wafer. An edge placement error (EPE) is determined that corresponds to a difference between a measured value of the second CD on the wafer and a desired value of the second CD on the wafer. The aforementioned steps are repeated for a plurality of different values of the specified CD to obtain an EPE for each of the different values of the specified CD. For each of the plurality of values of the specified CD, a measured value of a second CD on the wafer is correlated with a corresponding value of the second CD on the mask. For each of the plurality of values of the specified CD, the measured value of the second CD on the wafer is correlated with its corresponding value of the second CD on the mask as predicted by the OPC model. For each of the immediately preceding correlations that are obtained, and at a selected measured value of the second CD on the wafer, a difference Δ is obtained between the difference of the mask CDs calculated by interpolation of wafer CD measurements and by OPC model predictions. Each value of Δ is transformed into an OPC model error that each correspond to a particular value of the specified CD.
摘要翻译：提供了一种访问光学邻近校正（OPC）模型中的模型误差的方法。该方法开始于使用OPC模型获得初步掩模，使用光刻从初步掩模创建蚀刻晶片，并测量晶片上的指定临界尺寸（CD）和晶片上的第二CD。确定对应于晶片上的第二CD的测量值与晶片上的第二CD的期望值之间的差异的边缘放置误差（EPE）。针对指定CD的多个不同值重复上述步骤，以获得指定CD的每个不同值的EPE。对于指定CD的多个值中的每一个，晶片上的第二CD的测量值与掩模上的第二CD的相应值相关。对于指定CD的多个值中的每一个，晶片上的第二CD的测量值与由OPC模型预测的掩模上的第二CD的对应值相关。对于所获得的每个先前相关性，并且在晶片上的第二CD的选定测量值处，通过硅片CD测量的插值和通过OPC模型预测计算出的掩模CD的差异获得差值Delta。 Delta的每个值被转换成OPC模型错误，每个对应于指定CD的特定值。

64. 发明申请

US20050003220A1 Composite molding with adhesive composition layer comprising conjugated diene polymer having cyclic structure, and coating material 失效
标题翻译：具有包含具有环状结构的共轭二烯聚合物的粘合剂组合物层的复合成型和涂层材料
公开(公告)号：US20050003220A1
公开(公告)日：2005-01-06
申请号：US10492821
申请日：2002-10-16
申请人： Shizuo Kitahara , Yasushi Tanaka , Atsushi Hayashi
发明人： Shizuo Kitahara , Yasushi Tanaka , Atsushi Hayashi
IPC分类号： B32B7/12 , C08C19/10 , C08F8/48 , C09D109/00 , C09D115/00 , C09J115/00 , B32B25/16 , C08F236/00
CPC分类号： B32B7/12 , B32B27/08 , B32B27/18 , B32B2250/24 , C08C19/10 , C08C19/28 , C09D11/00 , C09D11/106 , C09J115/00 , Y10T428/31931 , Y10T428/31935
摘要： A shaped composite article comprising a substrate and an adherend, which are comprised of different materials and are bonded together through a layer of an adhesive composition comprising as the main ingredient (i) a cyclic structure-containing conjugated diene polymer having a degree of cyclization of 30-95%, or (ii) a modified cyclic structure-containing conjugated diene polymer having a degree of cyclization of 30-95%, and having added thereto 0.1-20 wt. % of an α,β-ethylenically unsaturated carboxylic acid anhydride, wherein the ratio of {amount of (I)/[amount of (I)+amount of (II)]} is at least 60 wt. %, where (I) is an acid anhydride group added and (II) is a dicarboxylic acid group formed by hydrolysis of an acid anhydride group (I).
摘要翻译：一种成型复合制品，其包括基材和被粘物，所述基材和被粘物由不同的材料组成，并通过粘合剂组合物层粘合在一起，所述粘合剂组合物包含作为主要成分的（i）含环状共轭二烯聚合物，其环化度为 30-95％，或（ii）环化度为30-95％的改性环状结构的共轭二烯聚合物，并加入其中0.1-20重量％％的α，β-烯键式不饱和羧酸酐，其中{（I）/ [（I）的量）（II）的量]}的比率为至少60重量％。％，其中（I）是加入的酸酐基团，（II）是通过酸酐基团（I）的水解形成的二羧酸基团。

65. 发明授权

US06693085B2 Macrolide compound JK 失效
标题翻译：大环内酯化合物JK
公开(公告)号：US06693085B2
公开(公告)日：2004-02-17
申请号：US09926403
申请日：2001-10-26
申请人： Yasushi Tanaka , Hisayuki Komaki , Akira Nemoto , Katsukiyo Yazawa , Yuzuru Mikami
发明人： Yasushi Tanaka , Hisayuki Komaki , Akira Nemoto , Katsukiyo Yazawa , Yuzuru Mikami
IPC分类号： A01N4304
CPC分类号： C07H17/08 , C12P19/60 , C12R1/03
摘要： Compound JK represented by the general formula (1): wherein R is H or —CH3; or a pharmaceutically acceptable salt thereof. Compound JK has an excellent antimicrobial activity even against resistant strains including MRSA and is useful as an anti-microbial agent.
摘要翻译：化合物JK由通式（1）表示：其中R为H或-CH 3;或其药学上可接受的盐。化合物JK即使对抗MRSA的抗性菌株也具有优异的抗微生物活性，可用作抗微生物剂。

66. 发明授权

US6090610A Macrolide compound 0406 失效
标题翻译：大环内酯类化合物0406
公开(公告)号：US6090610A
公开(公告)日：2000-07-18
申请号：US239812
申请日：1999-01-29
申请人： Yasushi Tanaka , Hisayuki Komaki , Yuzuru Mikami , Katsukiyo Yazawa , Jun'ichi Kobayashi
发明人： Yasushi Tanaka , Hisayuki Komaki , Yuzuru Mikami , Katsukiyo Yazawa , Jun'ichi Kobayashi
IPC分类号： A01N43/02 , A61K31/35 , A61P37/06 , C07D493/18 , C07H19/01 , C12N1/20 , C12P19/58 , C12R1/365
CPC分类号： C07H19/01 , C12P19/58 , C12R1/365 , Y10S435/872
摘要： Compound 0406 having a chemical structural formula represented by the chemical formula (1) below and having an excellent immuno suppressive activity, and pharmaceutically acceptable salts thereof. ##STR1## (wherein R.sub.1 is --COCH.sub.2 COOH or H; R.sub.2 is --CO(CH.sub.2).sub.3 CH.sub.3 or --CO(CH.sub.2).sub.4 CH.sub.3 or H.)
摘要翻译：具有由下述化学式（1）表示的化学结构式并且具有优异的免疫抑制活性的化合物0406及其药学上可接受的盐。（其中R 1是-COCH 2 COOH或H; R 2是-CO（CH 2）3 CH 3或-CO（CH 2）4 CH 3或H.

67. 发明授权

US5965407A Anthracycline compound 0624 失效
标题翻译：蒽环类化合物0624
公开(公告)号：US5965407A
公开(公告)日：1999-10-12
申请号：US33856
申请日：1998-03-03
申请人： Yasushi Tanaka , Yuzuru Mikami , Katsukiyo Yazawa
发明人： Yasushi Tanaka , Yuzuru Mikami , Katsukiyo Yazawa
IPC分类号： A61K31/70 , A61K31/7028 , A61K31/7034 , A61K31/704 , A61P31/04 , A61P35/00 , C07H15/252 , C12P19/56 , C12R1/365 , A61K31/71 , C07H15/24
CPC分类号： C07H15/252 , C12P19/56
摘要： The present invention relates to compound 0624 having excellent antitumor activity and antimicrobial activity, which is represented by the general formula (1), and a pharmaceutically acceptable salt thereof. ##STR1## (wherein R represents H or COCH.sub.3.)
摘要翻译：本发明涉及由通式（1）表示的具有优异的抗肿瘤活性和抗菌活性的化合物0624及其药学上可接受的盐。（其中R表示H或COCH 3。

68. 发明授权

US5523801A Upper and lower adjacent picture signal traps 失效
标题翻译：上下相邻图像信号陷阱
公开(公告)号：US5523801A
公开(公告)日：1996-06-04
申请号：US229773
申请日：1994-04-19
申请人： Yasushi Tanaka , George Fang
发明人： Yasushi Tanaka , George Fang
IPC分类号： H04B1/26 , H04N5/14 , H04N5/21 , H04N5/44 , H04N5/62
CPC分类号： H04N5/4446 , H04N5/62 , H04N5/21
摘要： To provide a picture intermediate frequency circuit capable of preventing the occurrence of intermodulation beats in a strong electrical field, without affecting in any way the original picture signal. A picture intermediate frequency signal output from the tuner 2 is supplied to a pre-amplifier 5 via an adjacent sound trap circuit 4, and picture trap circuits 11 and 12, both of which are connected in series. Trap circuits 11 and 12 have an attenuation point in the upper and lower frequency components, respectively, equivalent to the frequency difference of the adjacent picture signal frequency with respect to the picture intermediate frequency signal, and trap the .+-.6 MHz frequency components of the picture intermediate frequency signal. This allows the trap circuits 11 and 12 to remove unnecessary adjacent picture signals before they reach the pre-amplifier 5. As a result, the high frequency component generated in the non-linear region of the pre-amplifier 5 in a strong electrical field is prevented from interfering with the high frequency component of the unnecessary adjacent picture signals that produce cross-modulation signals, thus eliminating the occurrence of cross-modulation beats.
摘要翻译：提供能够防止在强电场中发生互调节拍的图像中频电路，而不以任何方式影响原始图像信号。从调谐器2输出的图像中频信号经由相邻的声音陷波电路4和两个串联的图像陷波电路11和12提供给前置放大器5。陷波电路11和12分别具有与相邻图像信号频率相对于图像中频信号的频率差相当的上部和下部频率分量中的衰减点，并且捕获+/- 6MHz频率分量图片中频信号。这样就可以使陷波电路11和12在到达前置放大器5之前除去不必要的相邻图像信号。结果，在强电场中在前置放大器5的非线性区域中产生的高频分量是防止产生交叉调制信号的不必要的相邻图像信号的高频分量干扰，从而消除交叉调制节拍的发生。

69. 发明授权

US5494809A Method of producing iturin A and antifungal agent for profound mycosis 失效
公开(公告)号：US5494809A
公开(公告)日：1996-02-27
申请号：US395308
申请日：1995-02-28
申请人： Yasushi Tanaka , Takashi Tojo , Kazuhiko Uchida , Jun Uno , Yasushi Uchida , Osamu Shida
发明人： Yasushi Tanaka , Takashi Tojo , Kazuhiko Uchida , Jun Uno , Yasushi Uchida , Osamu Shida
IPC分类号： A01N43/713 , A01N63/00 , A61K38/00 , A61P31/04 , C07K7/56 , C12P21/04 , C12R1/07
CPC分类号： A01N63/00 , A01N43/713 , C07K7/56 , Y10S435/832
摘要： The present invention is a method of producing iturin A, in which cells of Bacillus amyloliquefaciens are incubated and iturin A is collected from the culture. It also relates to an antifungal agent for profound mycosis, containing iturin A as the active ingredient. Heretofore, there have been known few medicines effective against profound mycosis, but iturin A may be an effective antifungal agent for profound mycosis.

70. 发明授权

US5489342A Method of manufacturing silicon steel sheet having grains precisely arranged in goss orientation 失效
标题翻译：制造具有精确布置在高斯方向上的晶粒的硅钢板的方法
公开(公告)号：US5489342A
公开(公告)日：1996-02-06
申请号：US259389
申请日：1994-06-14
申请人： Kenichi Arai , Kazushi Ishiyama , Yasushi Tanaka , Akira Hiura , Misao Namikawa
发明人： Kenichi Arai , Kazushi Ishiyama , Yasushi Tanaka , Akira Hiura , Misao Namikawa
IPC分类号： C21D1/76 , C21D8/12 , C22C38/02 , H01F1/04
CPC分类号： C21D8/1233 , C22C38/02 , C21D1/76 , C21D8/1222 , C21D8/1266 , C21D8/1272
摘要： The present invention provides a method of manufacturing a silicon steel sheet having grains precisely arranged in the Goss orientation, comprising the steps of preparing a steel material containing 0.01 wt % or less of C, 2.5 to 7.0 wt % of Si, 0.01 wt % or less of S, 0.01 wt % or less of Al, 0.01 wt % or less of N, subjecting the steel material to hot rolling maintained 1000.degree. C. or higher such that the temperature of the rolled material at an end of the hot rolling step falls within the range of 700.degree. to 950.degree. C., subjecting the steel material to a primary cold rolling process at a rolling reduction of 30 to 85%, annealing the steel material at a temperature of 600.degree. to 900.degree. C., subjecting the steel material to a secondary cold rolling process at a rolling reduction of 40 to 80%, annealing the steel material again at a temperature of 600.degree. to 900.degree. C., subjecting the steel material to a tertiary cold rolling process at a rolling reduction of 50 to 75%, and annealing the steel material in a reducing atmosphere, or in a non-oxidizing atmosphere having an oxygen partial pressure of 0.5 Pa or less, or in a vacuum having an oxygen partial pressure of 0.5 Pa or less, at a temperature in the range of 1000.degree. to 1300.degree. C.
摘要翻译：本发明提供一种制造具有精确排列在高斯取向上的晶粒的硅钢板的方法，包括以下步骤：制备含有0.01重量％以下的C，2.5〜7.0重量％的Si，0.01重量％少量的S，0.01重量％以下的Al，0.01重量％以下的N，对钢材进行热轧保持1000℃以上，使得轧制材料在热轧工序结束时的温度在700〜950℃的范围内，对钢材进行一次冷轧，轧制压下率为30〜85％，在600〜900℃的温度下退火钢材，将钢材进行二次冷轧，轧制压下率为40〜80％，在600〜900℃的温度下再次退火钢材，对钢材进行三次冷轧轧制 50〜75％，退火t 在退火气氛中，或在氧分压为0.5Pa以下的非氧化性气氛中，或在氧分压为0.5Pa以下的真空中，在1000℃以上的温度下，至1300℃

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