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    • 65. 发明授权
    • Methods for forming thick self-supporting masks
    • 形成厚自支撑面罩的方法
    • US4022927A
    • 1977-05-10
    • US592001
    • 1975-06-30
    • Aloysius T. PfeifferLubomyr T. Romankiw
    • Aloysius T. PfeifferLubomyr T. Romankiw
    • G03F1/20H01L21/027B05D3/06
    • G03F1/20Y10S430/143Y10S430/153Y10S430/167Y10S430/168
    • A method of constructing a relatively thick, self-supporting mask suitable for electron beam projection processes. Thickness is achieved by multiple steps of coating with resist, exposure and development. Either positive or negative resist may be used for second and subsequent coatings. Second and subsequent exposures are directed through the first relatively thin mask formed and through the substrate to eliminate critical alignment of subsequent masks. When desired thickness is achieved an even thicker frame may be fabricated for support purposes and the mask may then be lifted off the substrate on which it had rested during the fabrication steps.When positive resist is employed, the resist remaining after development is baked on to give added structural strength to the mask. This baked resist can be coated with an additional layer of metal by evaporation or sputtering to give greater mechanical strength. When negative resist is employed, the portions of the resist protected by the relatively thin previously formed mask are removed and additional material is plated to increase the thickness and strength of the mask. The unprotected resist material is then also removed. The completed mask can be further strengthened by evaporating or sputtering an additional layer of metal or oxide.
    • 一种构造适合于电子束投影工艺的相对厚的自支撑掩模的方法。 厚度通过涂覆抗蚀剂,曝光和显影的多个步骤实现。 正或负的抗蚀剂可以用于第二和随后的涂层。 第二次和随后的曝光通过形成的第一相对较薄的掩模并穿过基底,以消除随后的掩模的临界对准。 当实现期望的厚度时,可以制造更厚的框架用于支撑目的,并且然后可以在制造步骤期间将掩模从衬底上提升出来。
    • 68. 发明授权
    • Planar magnetic writer having offset portions
    • 具有偏移部分的平面磁性写入器
    • US08427780B2
    • 2013-04-23
    • US12358503
    • 2009-01-23
    • Robert Glenn BiskebornLubomyr T. RomankiwSteven Erik SteenBucknell Chapman Webb
    • Robert Glenn BiskebornLubomyr T. RomankiwSteven Erik SteenBucknell Chapman Webb
    • G11B5/17
    • G11B5/29G11B5/1272G11B5/17G11B5/1871
    • A magnetic head in one embodiment includes a bottom pole; a top pole positioned above a plane extending through the bottom pole and parallel to a plane of deposition of the bottom pole, wherein the top pole is at least partially offset from the bottom pole in a direction parallel to a plane of deposition of the top pole; a first write gap in the top pole; and a first coil for generating a magnetic flux across the first write gap. A method in one embodiment includes forming a bottom pole; forming a top pole above a plane extending through the bottom pole and parallel to a plane of deposition of the bottom pole, wherein the top pole is at least partially offset from the bottom pole in a direction parallel to a plane of deposition of the top pole, wherein at least one write gap is formed in the top pole; forming side poles for coupling the top and bottom poles; and forming a first coil for generating a magnetic flux across the first write gap.
    • 一个实施例中的磁头包括底极; 位于平面延伸穿过底极并平行于底极沉积平面的平面上方的顶极,其中顶极在平行于顶极沉积平面的方向上至少部分地偏离底极 ; 顶极的第一个写入间隙; 以及用于在所述第一写入间隙上产生磁通量的第一线圈。 一个实施例中的方法包括形成底极; 在平行于所述底极的平面的平面上形成顶极,并且平行于所述底极的沉积平面,其中所述顶极至少部分地偏离所述底极,所述方向平行于所述顶极的沉积平面 ,其中在所述顶极中形成至少一个写入间隙; 形成用于联接顶极和底极的侧极; 以及形成用于在所述第一写入间隙上产生磁通量的第一线圈。