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61. 发明申请

US20070188723A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070188723A1
公开(公告)日：2007-08-16
申请号：US11353232
申请日：2006-02-14
申请人： Bernardus Luttikhuis , Erik Loopstra , Harmen Schoot , Fransicus Jacobs
发明人： Bernardus Luttikhuis , Erik Loopstra , Harmen Schoot , Fransicus Jacobs
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70783
摘要： The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps the substrate in directions parallel to the plane of the patterning device, perpendicular to the plane of the patterning device and rotationally. The second clamping device clamps the patterning device only in directions parallel to the plane of the substrate.
摘要翻译：光刻设备中的掩模使用第一夹紧装置夹紧在第一侧上，并使用第二夹紧装置夹紧在不同于第一侧的第二侧上。夹紧力优选使用薄膜施加。第一夹具将基板平行于图案形成装置的平面垂直于图案形成装置的平面并旋转夹紧基板。第二夹紧装置仅在平行于基板的平面的方向上夹持图案形成装置。

62. 发明申请

US20070146664A1 Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatus 有权
标题翻译：光刻设备，设备制造方法和校准光刻设备的方法
公开(公告)号：US20070146664A1
公开(公告)日：2007-06-28
申请号：US11314157
申请日：2005-12-22
申请人： Koen Jacobus Zaal , Johannes Jacobs , Erik Loopstra , Joost Ottens , Frederik De Jong
发明人： Koen Jacobus Zaal , Johannes Jacobs , Erik Loopstra , Joost Ottens , Frederik De Jong
IPC分类号： G03B27/42
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.
摘要翻译：浸没式光刻设备具有布置成保持基板的多个基板保持器，每个基板保持器具有用于使温度控制流体通过的导管。对不同衬底保持器的热响应进行校准，并计算和使用流量，以便所有保持器在同一时间内恢复到预定温度。

63. 发明申请

US20070096566A1 Electromagnetic actuator, method of manufacturing a part of an electromagnetic actuator, and lithographic apparatus comprising an electromagnetic actuator 失效
标题翻译：电磁致动器，制造电磁致动器的一部分的方法，以及包括电磁致动器的光刻设备
公开(公告)号：US20070096566A1
公开(公告)日：2007-05-03
申请号：US11262962
申请日：2005-11-01
申请人： Sven Hol , Erik Loopstra
发明人： Sven Hol , Erik Loopstra
IPC分类号： H02K41/00
CPC分类号： H02K41/03 , G03F7/70758 , G03F7/70858 , H01J2329/00 , H02K9/00
摘要： A lithographic apparatus has a patterning support constructed to support a patterning device and a substrate support constructed to support a substrate. At least one of the patterning support and the substrate support is moved by an electromagnetic actuator. The actuator has a first part and a second part that are movable relative to each other. The first part has a coil structure, and the second part including a plurality of permanent magnets interacting with the coil structure. The second part is provided with a cooling structure arranged adjacent the permanent magnets. Cooling ducts are arranged between adjacent permanent magnets, or on a side of the permanent magnets facing the coil structure.
摘要翻译：光刻设备具有构造成支撑图案形成装置和构造成支撑衬底的衬底支撑件的图形化支撑件。图案形成支撑件和基板支撑件中的至少一个由电磁致动器移动。致动器具有可相对于彼此移动的第一部分和第二部分。第一部分具有线圈结构，并且第二部分包括与线圈结构相互作用的多个永磁体。第二部分设置有与永磁体相邻布置的冷却结构。冷却管道布置在相邻的永磁体之间，或者在面向线圈结构的永磁体的一侧。

64. 发明申请

US20070058172A1 Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit 有权
标题翻译：位置测量单元，测量系统和包括该位置测量单元的光刻设备
公开(公告)号：US20070058172A1
公开(公告)日：2007-03-15
申请号：US11226460
申请日：2005-09-15
申请人： Engelbertus Antonius Van Der Pasch , Erik Loopstra
发明人： Engelbertus Antonius Van Der Pasch , Erik Loopstra
IPC分类号： G01B9/02
CPC分类号： G01B9/02051 , G01B9/02029 , G01B2290/70 , G03F7/70775
摘要： A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.
摘要翻译：用于确定第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。衍射型编码器通过第一和第二衍射光栅上的衍射来确定第二光栅相对于第一光栅的第一维度中的位置。干涉仪确定反射镜的第二维度中的位置。测量单元包括用于传送编码器测量光束以及干涉仪测量光束的组合光学单元。此外，测量单元可以包括用于编码器的组合光源以及干涉仪。第一和第二衍射光栅中的一个可进一步示出一些零级反射以提供干涉仪的反射镜。

65. 发明申请

US20070013885A1 Stage apparatus, lithographic apparatus and device manufacturing method 有权
标题翻译：舞台装置，光刻装置及装置的制造方法
公开(公告)号：US20070013885A1
公开(公告)日：2007-01-18
申请号：US11486378
申请日：2006-07-14
申请人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/42
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： In order to improve the productivity of a lithographic apparatus, a stage apparatus to hold two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.
摘要翻译：为了提高光刻设备的生产率，描述了用于保持两个图案形成装置的平台装置。图案形成装置被布置成使得扫描方向上的图案之间的距离对应于图案在扫描方向上的长度。通过这样做，可以通过用第一图案曝光第一模具，跳过与第一模具相邻的第二模具，以及使用第二图案露出与第二模具相邻的第三模具来执行改进的曝光顺序。

66. 发明申请

US20060238721A1 Liquid immersion lithography system having a tilted showerhead relative to a substrate 有权
标题翻译：液浸光刻系统相对于基底具有倾斜的喷头
公开(公告)号：US20060238721A1
公开(公告)日：2006-10-26
申请号：US11403196
申请日：2006-04-13
申请人： Nicolaas Kate , Erik Loopstra , Aleksandr Khmelichek , Louis Markoya , Harry Sewell
发明人： Nicolaas Kate , Erik Loopstra , Aleksandr Khmelichek , Louis Markoya , Harry Sewell
IPC分类号： G03B21/18
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography system includes projection optics and a showerhead. The projection optics are configured to expose a substrate with a patterned beam. The showerhead includes a first nozzle and a second nozzle that are configured to be at different distances from a surface of the substrate during an exposure operation.
摘要翻译：液浸光刻系统包括投影光学元件和喷头。投影光学器件被配置为用图案化的光束曝光衬底。喷头包括第一喷嘴和第二喷嘴，其被配置为在曝光操作期间与基板的表面不同的距离。

67. 发明申请

US20060139585A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060139585A1
公开(公告)日：2006-06-29
申请号：US11022936
申请日：2004-12-28
申请人： Marc Maria Van Der Wijst , Dominicus Jacobus Franken , Erik Loopstra , Marius Ravensbergen
发明人： Marc Maria Van Der Wijst , Dominicus Jacobus Franken , Erik Loopstra , Marius Ravensbergen
IPC分类号： G03B27/68
CPC分类号： G03F7/70266 , G03F7/70825
摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
摘要翻译：公开了一种光刻设备，其具有可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过，并且具有被配置为透射基本上平行于投影系统的光轴的力的组合的可变形透镜致动器，以及围绕可变形透镜元件上的多个子区域处于基本上垂直于光轴的轴线的局部扭矩。

68. 发明申请

US20060103908A1 Active faceted mirror system for lithography 有权
公开(公告)号：US20060103908A1
公开(公告)日：2006-05-18
申请号：US10986076
申请日：2004-11-12
申请人： Erik Loopstra , Stephen Roux
发明人： Erik Loopstra , Stephen Roux
IPC分类号： G02B26/00
CPC分类号： G02B27/0977 , G02B7/1827 , G02B27/0905 , G03F7/70116 , G03F7/702 , G03F7/70291
摘要： An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.

69. 发明申请

US20060087639A1 System and method for using a two part cover for and a box for protecting a reticle 有权
标题翻译：使用两部分盖子和盒子保护标线的系统和方法
公开(公告)号：US20060087639A1
公开(公告)日：2006-04-27
申请号：US11299787
申请日：2005-12-13
申请人： Santiago Puerto , Erik Loopstra , Andrew Massar , Duane Kish , Abdullah Alikhan , Woodrow Olson , Jonathan Feroce
发明人： Santiago Puerto , Erik Loopstra , Andrew Massar , Duane Kish , Abdullah Alikhan , Woodrow Olson , Jonathan Feroce
IPC分类号： G03B27/62
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983 , G03F9/7011 , H01L21/67353 , H01L21/67359 , Y10S414/135
摘要： A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
摘要翻译：使用系统和方法来保护面罩免受空气传播的颗粒污染。它们包括提供固定在两部分覆盖物中的掩模版。两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

70. 发明申请

US20050099616A1 Movable stage system, lithographic apparatus, and device manufacturing method 有权
标题翻译：移动平台系统，光刻设备和设备制造方法
公开(公告)号：US20050099616A1
公开(公告)日：2005-05-12
申请号：US10864805
申请日：2004-06-10
申请人： Erik Loopstra , Robert-Han Schmidt
发明人： Erik Loopstra , Robert-Han Schmidt
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , G03B27/62
CPC分类号： G03F7/70766 , G03F7/70716 , G03F7/70758 , G03F7/709
摘要： A movable stage system capable of operating in a lithographic apparatus, is presented. The movable stage system includes a base, a platform that is movable relative to the base, a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform, and a drive mechanism configured to move the platform and the balance mass relative to the base. The drive mechanism comprises at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction, and a driving device configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.
摘要翻译：提出了一种能够在光刻设备中工作的可移动平台系统。可移动平台系统包括基座，可相对于基座移动的平台，可相对于基座移动的平衡块，其构造成补偿由平台的运动产生的力;以及驱动机构，其构造成移动平台和平衡质量相对于基座。所述驱动机构包括至少一个皮带传动装置，其连接所述平台和所述平衡块，使得当所述平台沿着一个方向移动时，所述平衡块沿至少部分相反的方向移动，并且驱动装置构造成机械地接合所述平衡质量或平台直接驱动平台或平衡块。

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