会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 62. 发明授权
    • Process and structure to fabricate CPP spin valve heads for ultra-high recording density
    • 制造用于超高记录密度的CPP自旋阀头的工艺和结构
    • US07423848B2
    • 2008-09-09
    • US11881628
    • 2007-07-27
    • Cheng T. HorngRu-Ying Tong
    • Cheng T. HorngRu-Ying Tong
    • G11B5/39
    • H01F10/3272B82Y25/00B82Y40/00G11B5/3906G11B5/3948H01F10/3259H01F10/3263H01F41/306H01L43/08H01L43/10H01L43/12
    • A CPP-GMR spin value sensor structure with an improved MR ratio and increased resistance is disclosed. All layers except certain pinned layers, copper spacers, and a Ta capping layer are oxygen doped by adding a partial O2 pressure to the Ar sputtering gas during deposition. Oxygen doped CoFe free and pinned layers are made slightly thicker to offset a small decrease in magnetic moment caused by the oxygen dopant. Incorporating oxygen in the MnPt AFM layer enhances the exchange bias strength. An insertion layer such as a nano-oxide layer is included in one or more of the free, pinned, and spacer layers to increase interfacial scattering. The thickness of all layers except the copper spacer may be increased to enhance bulk scattering. A CPP-GMR single or dual spin valve of the present invention has up to a threefold increase in resistance and a 2 to 3% increase in MR ratio.
    • 公开了具有改进的MR比和增加的电阻的CPP-GMR自旋值传感器结构。 除了某些被钉扎层,铜间隔物和Ta覆盖层之外的所有层通过在沉积期间向Ar溅射气体添加部分O 2 O 2压力而进行氧掺杂。 氧掺杂的CoFe自由和被钉扎层被制成稍微更厚以抵消由氧掺杂剂引起的小的磁矩的减小。 在MnPt AFM层中掺入氧增强了交换偏压强度。 诸如纳米氧化物层之类的插入层被包括在一个或多个游离,钉扎和间隔层中以增加界面散射。 除了铜间隔物之外的所有层的厚度可以增加以增加体散射。 本发明的CPP-GMR单自旋阀或双自旋阀的电阻增加了三倍,MR比增加了2〜3%。
    • 67. 发明授权
    • High performance MTJ element for conventional MRAM and for STT-RAM and a method for making the same
    • 用于常规MRAM和STT-RAM的高性能MTJ元件及其制造方法
    • US08372661B2
    • 2013-02-12
    • US11981127
    • 2007-10-31
    • Cheng T. HorngRu-Ying TongChyu-Jiuh TorngWitold Kula
    • Cheng T. HorngRu-Ying TongChyu-Jiuh TorngWitold Kula
    • H01L21/00
    • H01L43/10B82Y10/00H01L27/228H01L43/08H01L43/12
    • A STT-RAM MTJ that minimizes spin-transfer magnetization switching current (Jc) is disclosed. The MTJ has a MgO tunnel barrier layer formed with a natural oxidation process to achieve a low RA (10 ohm-um2) and a Fe or Fe/CoFeB/Fe free layer which provides a lower intrinsic damping constant than a CoFeB free layer. A Fe, FeB, or Fe/CoFeB/Fe free layer when formed with a MgO tunnel barrier (radical oxidation process) and a CoFeB AP1 pinned layer in a MRAM MTJ stack annealed at 360° C. provides a high dR/R (TMR)>100% and a substantial improvement in read margin with a TMR/Rp_cov=20. High speed measurement of 100 nm×200 nm oval STT-RAM MTJs has shown a Jc0 for switching a Fe free layer is one half that for switching an amorphous CO40Fe40B20 free layer. A Fe/CoFeB/Fe free layer configuration allows the Hc value to be increased for STT-RAM applications.
    • 公开了使自旋转移磁化开关电流(Jc)最小化的STT-RAM MTJ。 MTJ具有形成有自然氧化工艺的MgO隧道阻挡层,以实现低的RA(10欧姆 - um2)和不含CoFeB自由层的较低的固有阻尼常数的Fe或Fe / CoFeB / Fe自由层。 当在360℃退火的MRAM MTJ堆叠中形成具有MgO隧道势垒(自由基氧化法)和CoFeB AP1钉扎层的Fe,FeB或Fe / CoFeB / Fe自由层时,提供高dR / R(TMR )> 100%,TMR / Rp_cov = 20时读取余量大幅度提高。 100 nm×200 nm椭圆STT-RAM MTJ的高速测量显示,用于切换无Fe层的Jc0是用于切换无定形CO40Fe40B20自由层的一半。 Fe / CoFeB / Fe自由层配置允许为STT-RAM应用增加Hc值。
    • 68. 发明授权
    • Low switching current MTJ element for ultra-high STT-RAM and a method for making the same
    • 用于超高STT-RAM的低开关电流MTJ元件及其制造方法
    • US07948044B2
    • 2011-05-24
    • US12082155
    • 2008-04-09
    • Cheng T. HorngRu-Ying TongYimin Guo
    • Cheng T. HorngRu-Ying TongYimin Guo
    • H01L29/82
    • H01L43/08H01L43/12Y10S977/883
    • A STT-RAM MTJ that minimizes spin-transfer magnetization switching current (Jc) while achieving a high dR/R is disclosed. The MTJ has a MgO tunnel barrier formed by natural oxidation to achieve a low RA, and a CoFeB/FeSiO/CoFeB composite free layer with a middle nanocurrent channel layer to minimize Jc0. There is a thin Ru capping layer for a spin scattering effect. The reference layer has a shape anisotropy and Hc substantially greater than that of the free layer to establish a “self-pinned” state. The free layer, capping layer and hard mask are formed in an upper section of a nanopillar that has an area substantially less than a lower pedestal section which includes a bottom electrode, reference layer, seed layer, and tunnel barrier layer. The reference layer is comprised of an enhanced damping constant material that may be an insertion layer, and the free layer has a low damping constant.
    • 公开了一种在实现高dR / R的同时使自旋转移磁化开关电流(Jc)最小化的STT-RAM MTJ。 MTJ具有通过自然氧化形成的MgO隧道势垒以实现低RA,以及具有中间纳米通道层的CoFeB / FeSiO / CoFeB复合自由层以使Jc0最小化。 有一个薄的Ru覆盖层用于自旋散射效应。 参考层具有形状各向异性,并且Hc基本上大于自由层的Hc以形成“自固定”状态。 自由层,覆盖层和硬掩模形成在纳米柱的上部,其具有基本上小于包括底部电极,参考层,种子层和隧道势垒层的下基座部分的面积。 参考层由增强的阻尼常数材料组成,其可以是插入层,并且自由层具有低阻尼常数。