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61. 发明授权

US5970923A Tank structure for hot-water supply unit 有权
标题翻译：热水供应单元罐体结构
公开(公告)号：US5970923A
公开(公告)日：1999-10-26
申请号：US141336
申请日：1998-08-27
申请人： Akira Nakashima
发明人： Akira Nakashima
IPC分类号： F24H1/28 , F24H1/18 , F24H1/20 , F22B37/36
CPC分类号： F24H1/181 , F24H1/205
摘要： A tank structure of a hot-water supply unit capable of permitting tap water under a high pressure to be supplied thereto without using any safety mechanism. An inner barrel of a tank body is formed by rounding or bending a flat plate of an increased thickness by rolling and then joining both lateral ends of the plate to each other by welding. The inner barrel and an outer barrel are joined together through a joint ring of a thickness between a thickness of the inner barrel and that of the outer barrel. Thus, the tank body can be readily manufactured using any specific equipment.
摘要翻译：能够在不使用任何安全机构的情况下供给高压自来水的热水供给单元的罐结构。罐体的内筒通过轧制而使厚度增加的平板进行倒圆或弯曲而形成，然后通过焊接将板的两个侧端彼此接合。内筒和外筒通过内筒的厚度和外筒的厚度之间的厚度的接合环连接在一起。因此，罐体可以容易地使用任何特定的设备制造。

62. 发明授权

US5376308A Coating solution for forming transparent conductive coating and process for preparing same 失效
标题翻译：用于形成透明导电涂层的涂布溶液及其制备方法
公开(公告)号：US5376308A
公开(公告)日：1994-12-27
申请号：US910300
申请日：1992-07-20
申请人： Toshiharu Hirai , Michio Komatsu , Akira Nakashima , Yoneji Abe , Yukihiro Iwasaki
发明人： Toshiharu Hirai , Michio Komatsu , Akira Nakashima , Yoneji Abe , Yukihiro Iwasaki
IPC分类号： B05D3/02 , B05D3/04 , B05D3/06 , C03C17/00 , C09D5/24 , G02F1/1343 , H01B1/20 , H01B1/22 , H01B1/24 , H05K1/09 , H01B1/02 , C08K3/20 , H01B1/06
CPC分类号： H01B1/24 , B05D3/046 , B05D3/067 , C03C17/007 , C03C17/009 , C09D5/24 , H01B1/20 , H01B1/22 , B05D3/0254 , C03C2217/45 , C03C2217/475 , C03C2217/476 , G02F1/13439 , H05K1/095 , Y10T428/31612 , Y10T428/31663
摘要： Conductive substrate having on their surface a coating formed from a coating solution for forming a transparent conductive coating prepared by dispersion of dissolving in water and/or organic solvent such conductive particles as having (a) an average particle diameter of not more than 500 .ANG., wherein (b) an amount of particles having a particle diameter of not more than 600 .ANG. is more than 60% by weight, (c) an amount of particles having a particle diameter of not more than 100 .ANG. is more than 5% by weight and (d) an amount of particles having a particle diameter of more than 1000 .ANG. is not more than 15% by weight, and a matrix comprising a silica polymer having (A) an average degree of polymerization of 1,500-10,000, and (B) an amount of the polymer having a degree of polymerization of not more than 3,000 being not more than 50% by weight, and (C) an amount of the polymer having a degree of polymerization of more than 10,000 being not more than 20% by weight, are excellent in adhesion and surface smoothness and also excellent in durability and transparency. Display devices provided with the above-mentioned transparent conductive substrates as the display panel are excellent in resolving power, and give constantly clear and sharp images.
摘要翻译： PCT No.PCT / JP91 / 01603 Sec。 371日期：1992年7月20日 102（e）日期1992年7月20日PCT 1991年11月21日PCT PCT。出版物WO92 / 09665 日期：1992年6月11日。导电基材在其表面上具有由用于形成透明导电涂层的涂布液形成的涂层，所述涂料溶液通过将溶解在水和/或有机溶剂中的分散体制备，所述导电颗粒具有（a）平均粒径不超过500，其中（b）粒径不大于600的颗粒的量大于60wt％，（c）粒径不大于100的颗粒数量ANGSTROM 大于5重量％，（d）粒径大于1000的颗粒的量不超过15重量％，并且包含二氧化硅聚合物的基质，其具有（A）平均聚合度（B）聚合度不大于3,000的聚合物的量不大于50重量％，（C）聚合度大于10,000的聚合物的量不是更多的t 韩20重量％，粘合性和表面平滑性优异，耐久性和透明性优异。设置有作为显示面板的上述透明导电基板的显示装置具有优异的分辨率，并且给出不断清晰和清晰的图像。

63. 发明授权

US4937148A Process for preparing conductive fine particles 失效
标题翻译：制备导电细颗粒的方法
公开(公告)号：US4937148A
公开(公告)日：1990-06-26
申请号：US346295
申请日：1989-05-01
申请人： Goro Sato , Michio Komatsu , Tsuguo Koyanagi , Masayuki Matsuda , Hiroo Yoshidome , Akira Nakashima , Kazuaki Inoue
发明人： Goro Sato , Michio Komatsu , Tsuguo Koyanagi , Masayuki Matsuda , Hiroo Yoshidome , Akira Nakashima , Kazuaki Inoue
IPC分类号： C01G15/00 , C01G19/02 , C09D5/24 , H01B1/08 , H01B1/20
CPC分类号： C01G19/02 , C01G15/00 , C09D5/24 , H01B1/08 , H01B1/20 , C01P2002/54 , Y10S428/918 , Y10T428/25 , Y10T428/256
摘要： Transparent conductive coatings excellent in transparency are provided on substrates such as glass, plastics, etc. by the use of conductive coating materials obtained by maintaining aqueous solutions of hydrolyzable tin containing or indium containing compounds at pH of 8-12, and gradually hydrolyzing said compounds in the solutions to form sols containing colloidal particles, followed by drying and calcining.
摘要翻译：通过使用通过维持pH为8-12的维持含有水解性锡或含铟化合物的水溶液获得的导电涂层材料，在诸如玻璃，塑料等的基材上提供透明度优异的透明导电涂层，并逐渐水解所述化合物在形成含有胶体颗粒的溶胶的溶液中，然后干燥和煅烧。

64. 发明申请

US20130298136A1 MULTIPROCESSOR SYSTEM 有权
标题翻译：多处理器系统
公开(公告)号：US20130298136A1
公开(公告)日：2013-11-07
申请号：US13979425
申请日：2011-12-21
申请人： Masumi Dakemoto , Akira Nakashima , Masaru Hasegawa
发明人： Masumi Dakemoto , Akira Nakashima , Masaru Hasegawa
IPC分类号： G06F9/50
CPC分类号： G06F9/50 , G06F9/5011 , G06F9/52 , G06F9/526
摘要： A multiprocessor system includes plural processing parts configured to execute a program stored in a program memory; a common resource shared by the processing parts; a resource status table in which an occupation status of the common resource is written; a resource access table in which address areas are associated with occupation manners of the common resource on a function basis of the program stored in the program memory; and a controlling part configured to determine whether to permit execution of a function which involves occupation of the common resource by one of the processing parts using the resource status table and the resource access table.
摘要翻译：多处理器系统包括被配置为执行存储在程序存储器中的程序的多个处理部件; 处理部分共享的共同资源; 资源状态表，其中写入公用资源的占用状态; 资源访问表，其中地址区域与存储在程序存储器中的程序的功能基础上与公共资源的占用方式相关联; 以及控制部，被配置为使用所述资源状态表和所述资源访问表来确定是否允许通过所述处理部中的一个执行涉及所述公共资源的功能的功能。

65. 发明授权

US08187351B2 Sol of spinous inorganic oxide particles, method of producing the sol, and polishing agent containing the sol 有权
标题翻译：棘状无机氧化物粒子的溶胶，溶胶的制造方法和含有该溶胶的研磨剂
公开(公告)号：US08187351B2
公开(公告)日：2012-05-29
申请号：US11987303
申请日：2007-11-29
申请人： Kazuhiro Nakayama , Mami Tokunaga , Akira Nakashima , Kazuaki Inoue , Osamu Yoshida , Yoshinori Wakamiya , Hiroyasu Nishida
发明人： Kazuhiro Nakayama , Mami Tokunaga , Akira Nakashima , Kazuaki Inoue , Osamu Yoshida , Yoshinori Wakamiya , Hiroyasu Nishida
IPC分类号： B24D3/00 , B24D11/00 , B24D18/00 , B24D3/02 , C09K3/14 , C09C1/68
CPC分类号： C09G1/02 , A23L29/015 , A23P10/30 , A23P20/19 , C09K3/1409 , C09K3/1463
摘要： The present invention provides a sol of spinous inorganic oxide particles not containing coarse particles, in which particles having extremely homogeneous particles are dispersed in a solvent. An acidic silicic acid is added to a dispersion liquid of core particles to grow core particles, and then again the acidic silicic acid is added at the addition rate 1.2 to 1.8 higher than that in the previous step to prepare a sol of spinous inorganic oxide particles. Then the sol is subjected to centrifugation to remove coarse particles having the diameter of 800 nm or more, thus spinous inorganic oxide particles having peculiar form such as a spinous one being obtained.
摘要翻译：本发明提供一种不含粗粒子的棘状无机氧化物粒子的溶胶，其中具有非常均匀的粒子的粒子分散在溶剂中。向芯粒子的分散液中加入酸性硅酸以生长核心颗粒，然后以比上一步骤高1.2至1.8的加入速率再次加入酸性硅酸以制备棘突无机氧化物颗粒的溶胶。然后对溶胶进行离心分离以除去直径为800nm以上的粗大粒子，得到棘突状棘突状棘突状的无定形无机氧化物粒子。

66. 发明授权

US07901652B2 Method of producing porous silica-based particles 有权
标题翻译：生产多孔二氧化硅基颗粒的方法
公开(公告)号：US07901652B2
公开(公告)日：2011-03-08
申请号：US11793707
申请日：2005-12-15
申请人： Kazuaki Inoue , Kazuhiro Nakayama , Akira Nakashima
发明人： Kazuaki Inoue , Kazuhiro Nakayama , Akira Nakashima
IPC分类号： C01B33/141 , C01B33/143
CPC分类号： C01B33/193 , B01J20/103 , B01J20/28004 , B01J20/28011 , C01B33/143 , C01B33/18 , C01P2004/03
摘要： Porous silica-based particles with relatively larger average diameter of 1 micron or more and a low particle density are prepared. The method includes the steps of (a) preparing two-layer separated liquid including an organic silicon compound layer and a water layer, then adding an organic solvent, an alkali, and a surfactant into the water layer while agitating at least the water layer so that the organic silicon compound layer and the water layer are not completely mixed with each other, further hydrolyzing and/or partial hydrolyzing the organic silicon compound in the mixed aqueous solution to prepare silica-based particle precursors, (b) adding sodium aluminate into the mixed aqueous solution containing the silica-based particle precursors and then preparing silica-based particles having pores, cavities or voids inside the particles, and (c) washing and drying the silica-based particles. The particles are useful for various applications such as microcapsules, adsorbents, catalysts, and so on.
摘要翻译：制备相对较大的平均直径为1微米或更大并且具有低颗粒密度的多孔二氧化硅基颗粒。该方法包括以下步骤：（a）制备包含有机硅化合物层和水层的两层分离液体，然后在至少水层搅拌的同时向水层中加入有机溶剂，碱和表面活性剂有机硅化合物层和水层彼此不完全混合，进一步水解和/或部分水解混合水溶液中的有机硅化合物以制备二氧化硅基颗粒前体，（b）将铝酸钠加入到混合含有二氧化硅基颗粒前体的水溶液，然后在颗粒内制备具有孔，空洞或空隙的二氧化硅基颗粒，和（c）洗涤和干燥二氧化硅基颗粒。这些颗粒可用于各种应用，如微胶囊，吸附剂，催化剂等。

67. 发明申请

US20090325385A1 Method for manufacturing silicon wafer 有权
标题翻译：硅晶片制造方法
公开(公告)号：US20090325385A1
公开(公告)日：2009-12-31
申请号：US12584269
申请日：2009-09-01
申请人： Shinichi Tomita , Masao Yoshimuta , Yasuyuki Hashimoto , Akira Nakashima
发明人： Shinichi Tomita , Masao Yoshimuta , Yasuyuki Hashimoto , Akira Nakashima
IPC分类号： H01L21/304
CPC分类号： H01L21/304 , H01L21/02024 , H01L21/2007 , H01L21/76256
摘要： A method for manufacturing a silicon wafer is characterized by performing one or both of grinding and polishing to a thin discoid silicon wafer to give bowl-shaped warpage that is concave at a central part to a wafer surface. One main surface of the thin discoid silicon wafer is adsorbed and held, and one or both of grinding and polishing are performed to the other main surface to fabricate a convex wafer whose thickness is increased from a wafer outer periphery toward a wafer center or fabricate a concave wafer whose thickness is reduced from the wafer outer periphery toward the wafer center. Then, the other main surface is adsorbed and held to protrude the center or the periphery of the one main surface side based on elastic deformation. One or both of grinding and polishing are carried out with respect to the one main surface to flatten the main surface, and adsorption and holding are released to give bowl-shaped warpage that is concave at the central part to the other main surface or the one main surface. By the method, an SOI wafer or an epitaxial silicon wafer having a high degree of flatness is obtained.
摘要翻译：硅晶片的制造方法的特征在于对薄盘状硅晶片进行研磨抛光中的一个或两个以给出在晶片表面的中心部分凹陷的碗形翘曲。吸附并保持薄盘形硅晶片的一个主表面，并且对另一个主表面进行研磨和抛光中的一个或两个以制造厚度从晶片外周朝向晶片中心增加的凸形晶片，或者制造其厚度从晶片外周朝向晶片中心减小的凹晶片。然后，基于弹性变形，另一个主表面被吸附并保持成一个主表面侧的中心或周边突出。研磨抛光中的一个或两个相对于一个主表面进行，以平坦化主表面，并且释放吸附和保持以产生碗形翘曲，其在中心部分处凹入另一个主表面或一个主表面。通过该方法，获得了具有高平坦度的SOI晶片或外延硅晶片。

68. 发明申请

US20080086951A1 Spinous silica-based sol and method of producing the same 有权
标题翻译：二氧化硅基溶胶及其制备方法
公开(公告)号：US20080086951A1
公开(公告)日：2008-04-17
申请号：US11907318
申请日：2007-10-11
申请人： Yoshinori Wakamiya , Hiroyasu Nishida , Yuji Tawarazako , Kazuaki Inoue , Osamu Yoshida , Akira Nakashima
发明人： Yoshinori Wakamiya , Hiroyasu Nishida , Yuji Tawarazako , Kazuaki Inoue , Osamu Yoshida , Akira Nakashima
IPC分类号： C09G1/04 , B01F3/12
CPC分类号： C09G1/02 , C01B33/14 , C09K3/1436 , C09K3/1463
摘要： The present invention provides a sol of spinous silica-based particles in which silica-based particles having peculiar forms, spinous forms are dispersed in a solvent. The spinous silica-based particles have verrucous projections formed on surfaces of spherical silica-based particles. In the spinous particles, a value of the surface roughness (SA1/SA2, SA1 indicating a specific surface area measured by the BET method or the Sears method and SA2 indicating a specific surface area converted from an average particle diameter (D2) measured by the image analysis method) is in the range from 1.7 to 10. Furthermore the average diameter (D2) measured by the image analysis method is in the range from 7 to 150 nm.
摘要翻译：本发明提供一种其中具有特殊形式的二氧化硅基颗粒，棘突分散在溶剂中的棘状二氧化硅基颗粒的溶胶。棘状二氧化硅基颗粒在球状二氧化硅基颗粒的表面上形成疣状突起。在棘突中，表示粗糙度（SA 1 / SA 2，SA 1，表示通过BET法测定的比表面积或Sears法）和SA 2，表示从平均粒径（D 2）通过图像分析方法测量）在1.7至10的范围内。此外，通过图像分析方法测量的平均直径（D 2）在7至150nm的范围内。

69. 发明申请

US20080012201A1 Sheet feeding device 审中-公开
标题翻译：送纸装置
公开(公告)号：US20080012201A1
公开(公告)日：2008-01-17
申请号：US11701407
申请日：2007-02-02
申请人： Akira Nakashima , Toyoaki Nanba
发明人： Akira Nakashima , Toyoaki Nanba
IPC分类号： B65H5/08
CPC分类号： B65H3/0684 , B65H3/48 , B65H3/54 , B65H2404/1521
摘要： A sheet feeding device includes a stacking plate, a pick-up device, means for blowing air, and a holding member. On the plate, sheets to be fed into a processing apparatus are placed. The device sends out a top one of the sheets placed on the plate, and has a pick-up roller to be brought into contact with an upper side of the top sheet at a position within a predetermined level range when the sheet is to be fed into the apparatus. The means blows air to the sheet with a predetermined force in a direction to separate the sheet from the other sheets placed on the plate or from the plate. The member is to be brought into contact with the upper side at a position upstream of the roller with respect to a feeding direction in which the sheet is to be fed into the apparatus.
摘要翻译：片材进给装置包括堆叠板，拾取装置，用于吹送空气的装置和保持构件。在板上放置要送入处理装置的片材。该装置发出放置在板上的最上面的片材，并且具有一个拾取辊，以便在片材被供给时在一个预定水平范围内的位置与顶片的上侧接触进入设备。该装置以预定的力沿着将片材与放置在板上的其它片材或板材分开的方向吹送到片材上。相对于纸张被供给到装置中的进给方向，该部件将在辊的上游位置与上侧接触。

70. 发明授权

US07232769B2 Method of forming amorphous silica-based coating film with low dielectric constant and thus obtained silica-based coating film 有权
标题翻译：形成具有低介电常数的无定形二氧化硅基涂膜的方法，由此得到二氧化硅基涂膜
公开(公告)号：US07232769B2
公开(公告)日：2007-06-19
申请号：US10533238
申请日：2003-10-27
申请人： Akira Nakashima , Miki Egami , Michio Komatsu , Yoshihiro Nakata , Ei Yano , Katsumi Suzuki
发明人： Akira Nakashima , Miki Egami , Michio Komatsu , Yoshihiro Nakata , Ei Yano , Katsumi Suzuki
IPC分类号： H01L21/30
CPC分类号： C09D183/02 , C08G77/08 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/316 , H01L21/31695
摘要： The present invention relates to an amorphous silica-based coating film with a low specific dielectric constant of 2.5 or below and the Young's modulus of 6.0 GPa or more and having excellent hydrophobic property, and to a method of forming the same. A liquid composition containing a silicon compound obtained by hydrolyzing tetraalkyl ortho silicate (TAOS) and specific alkoxysilane (AS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) is prepared. The liquid composition is then applied on a substrate, heated and cured to obtain a coating film. The coating film obtained as described has a smooth surface and also has specific micropores therein.
摘要翻译：本发明涉及具有2.5以下的比介电常数低，6.0GPa以上的杨氏模量和疏水性优异的无定形二氧化硅系涂膜及其形成方法。制备含有在四烷基氢氧化铵（TAAOH）存在下水解四烷基原硅酸盐（TAOS）和特定烷氧基硅烷（AS））得到的硅化合物的液体组合物。然后将液体组合物涂布在基材上，加热固化，得到涂膜。如上所述获得的涂膜具有光滑表面，并且其中也具有特定的微孔。

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