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61. 发明授权

US5798838A Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same 失效
标题翻译：具有检测空间图像的强度分布功能的投影曝光装置及其检测方法
公开(公告)号：US5798838A
公开(公告)日：1998-08-25
申请号：US713719
申请日：1996-09-13
申请人： Tetsuo Taniguchi , Toshihiko Tsuji , Tadashi Nagayama
发明人： Tetsuo Taniguchi , Toshihiko Tsuji , Tadashi Nagayama
IPC分类号： G03F7/20 , H01L21/30 , G01B11/00
CPC分类号： G03F7/70591 , G03F7/70133 , G03F7/70241 , G03F7/70258 , G03F7/70358
摘要： The invention relates to a projection exposure apparatus for detecting a light-intensity distribution of a spatial image of a mask pattern formed through a projection optical system. The projection exposure apparatus has a knife-edge member which is disposed on the main surface of a wafer stage such that a plane including an exposure surface of a photosensitive substrate is leveled with a light incidence surface of the knife-edge member. The knife-edge member has a transmission area for transmitting the exposure light passing through the projection optical system, a light shielding area for preventing transmission of the exposure light, and a knife-edge defined as a boundary line between the transmission area and the light shielding area. The projection exposure apparatus detects the light-intensity distribution of light from the spatial image while moving the spatial image of the mask pattern and the knife-edge of the knife-edge member relatively to each other. The information related to the light-intensity distribution is used in optically adjusting a projection optical system, or the like.
摘要翻译：本发明涉及一种用于检测通过投影光学系统形成的掩模图案的空间图像的光强度分布的投影曝光装置。投影曝光装置具有刀片部件，其设置在晶片台的主表面上，使得包括感光基板的曝光表面的平面与刀刃部件的光入射面平齐。刀刃部件具有用于透射通过投影光学系统的曝光光的透射区域，用于防止曝光光的透射的遮光区域和被定义为透射区域与光线之间的边界线的刀刃屏蔽区域。投影曝光装置在将掩模图案的空间图像和刀刃部件的刀刃相对于彼此移动的同时，检测来自空间图像的光的光强度分布。与光强分布有关的信息用于光学调整投影光学系统等。

62. 发明授权

US5652657A Inspection system for original with pellicle 失效
标题翻译：检测系统为原装带防护罩
公开(公告)号：US5652657A
公开(公告)日：1997-07-29
申请号：US467922
申请日：1995-06-06
申请人： Minoru Yoshii , Michio Kohno , Seiya Miura , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Minoru Yoshii , Michio Kohno , Seiya Miura , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G03F1/62 , G03F1/84 , H01L21/027 , G01B11/00
CPC分类号： G01N21/94
摘要： An inspection system inspecting an original with a pellicle, which system includes a light source for providing a light beam, a first detecting device for receiving light produced as a result of passage of the light beam through the pellicle, a second detecting device for receiving light produced as a result of non-passage of the light beam through the pellicle, and a processing system for determining information related to transmissivity of the pellicle, on the basis of outputs of the first and second detecting devices.
摘要翻译：一种用防护薄膜组件检查原件的检查系统，该系统包括用于提供光束的光源，用于接收由于光束通过防护薄膜的结果而产生的光的第一检测装置，用于接收光的第二检测装置由于不通过光束通过防护薄膜组件而产生的结果，以及用于根据第一和第二检测装置的输出确定与防护薄膜组件的透射率有关的信息的处理系统。

63. 发明授权

US5591985A Surface state inspecting system including a scanning optical system for scanning a surface to be inspected with a first light and for simultaneously scanning a diffraction grating with a second light 失效
$Surface state inspecting system including a scanning optical system for scanning a surface to be inspected with a first light and for simultaneously scanning a diffraction grating with a second light$
标题翻译：表面状态检查系统，包括用第一光扫描待检查表面的扫描光学系统，并且用第二光同时扫描衍射光栅
公开(公告)号：US5591985A
公开(公告)日：1997-01-07
申请号：US374884
申请日：1995-01-19
申请人： Toshihiko Tsuji , Michio Kohno
发明人： Toshihiko Tsuji , Michio Kohno
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/027 , G01N21/89
CPC分类号： G01N21/94
摘要： A surface state inspecting system includes a scanning optical system for scanning a surface to be inspected, with first light and simultaneously for scanning a diffraction grating with second light, wherein the first light and the second light have mutually different wavelengths and mutually different polarization directions, a light receiving optical system for receiving scattered light produced sidewardly from the surface and diffraction light produced sidewardly from the diffraction grating, and for superposing the received lights one upon another, and a photoelectric converting device for converting light from the light receiving optical system into an electric signal, wherein the scanning optical system and the light receiving optical system provide an optical system which is telecentric with respect to the surface to be inspected.
摘要翻译：表面状态检查系统包括用第一光扫描待检查表面的扫描光学系统，同时用第二光扫描衍射光栅，其中第一光和第二光具有相互不同的波长和相互不同的偏振方向，用于接收从表面侧面产生的散射光的光接收光学系统和从衍射光栅侧面产生的衍射光，并将所接收的光叠加在一起的光接收光学系统，以及用于将来自光接收光学系统的光转换为电信号，其中所述扫描光学系统和所述光接收光学系统提供相对于要检查的表面是远心的光学系统。

64. 发明授权

US5461474A Inspection apparatus for detecting foreign matter on a surface to be inspected, and an exposure apparatus and a device manufacturing method using the same 失效
标题翻译：用于检测被检查表面上的异物的检查装置，以及曝光装置及使用其的装置制造方法
公开(公告)号：US5461474A
公开(公告)日：1995-10-24
申请号：US266512
申请日：1994-06-27
申请人： Minoru Yoshii , Noriyuki Nose , Masayuki Suzuki , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
发明人： Minoru Yoshii , Noriyuki Nose , Masayuki Suzuki , Kyoichi Miyazaki , Toshihiko Tsuji , Seiji Takeuchi
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
CPC分类号： G01N21/956 , G01N21/94
摘要： When inspecting the presence of foreign matter on a surface to be inspected by scanning the surface with a light beam from a light source utilizing a scanning system, and receiving scattered light from the surface by a detector, a correlation is utilized between a signal representing first scattered light obtained from the detector when the light beam scans a first line on the surface, and a signal representing second scattered light obtained from the detector when the light beam scans a second line displaced from the first line by a predetermined amount in a direction orthogonal to the direction of the first line.
摘要翻译：当通过利用扫描系统的来自光源的光束扫描表面并通过检测器接收来自表面的散射光来检查要检查的表面上的异物的存在时，在表示第一当光束扫描表面上的第一条线时，从检测器获得的散射光，以及当光束沿正交方向扫描从第一条线移位预定量的第二条线时，从检测器获得的第二散射光的信号到第一行的方向。

65. 发明授权

US4390209A Plastic seat-back framework and method for the manufacture thereof 失效
标题翻译：塑料座椅靠背框架及其制造方法
公开(公告)号：US4390209A
公开(公告)日：1983-06-28
申请号：US223292
申请日：1981-01-08
申请人： Sadami Izuno , Isao Kiyomitsu , Toshihiko Tsuji
发明人： Sadami Izuno , Isao Kiyomitsu , Toshihiko Tsuji
IPC分类号： A47C7/38 , A47C7/40 , B60N2/48 , A47C7/36
CPC分类号： A47C7/40 , A47C7/38 , B60N2/4808
摘要： A seat back framework of one-piece construction together with a head rest support is made from a single blank of fiber-reinforced plastics. The seat back framework comprises a generally rectangular body having opposite upper and lower walls, a pair of opposite side walls and a connecting wall extending between the side walls in spaced relation to the upper wall with a support space defined therebetween. A pair of guide members for axially adjustably supporting corresponding legs forming a part of the head rest assembly together with a head rest are formed on the rectangular body within the support space.
摘要翻译：单件结构的座椅靠背框架以及头枕支撑件由纤维增强塑料的单个坯料制成。座椅靠背框架包括具有相对的上壁和下壁的大致矩形的主体，一对相对的侧壁和在侧壁之间延伸的连接壁，所述连接壁与上壁间隔开，并且其间限定有支撑空间。在支撑空间内的矩形主体上形成有用于轴向可调节地支撑形成头枕组件的一部分与头枕一起的一对引导构件。

66. 发明授权

US4021843A Color tone control device in color television receiver 失效
标题翻译：彩色电视接收机中的色调控制装置
公开(公告)号：US4021843A
公开(公告)日：1977-05-03
申请号：US544268
申请日：1975-01-27
申请人： Yoshisada Taniguchi , Toshihiko Tsuji , Masanori Oguino
发明人： Yoshisada Taniguchi , Toshihiko Tsuji , Masanori Oguino
IPC分类号： H04N9/64 , H04N9/535
CPC分类号： H04N9/643
摘要： Red, blue and green color difference signals are supplied to the bases of first, second and third transistors amplifying the tri-color signals of red, blue and green, and a luminance signal is introduced to the emitter of each transistor through a parallel circuit of two resistors. One of the resistors in each parallel circuit is connected through a switch. The switches are associatively operated so that the on-off operation of the switch connected to the emitter of the first transistor is opposite to that of the switches connected to the emitters of the second and the third transistor. By operating the switches, the amplification degree of the first transistor is increased and simultaneously the amplification degrees of the second and third transistors are decreased, and therefore an image with red emphasized can be obtained with no change in luminance.
摘要翻译：红色，蓝色和绿色差信号被提供给放大红色，蓝色和绿色三色信号的第一，第二和第三晶体管的基极，并且亮度信号通过并行电路被引入到每个晶体管的发射极两个电阻。每个并联电路中的一个电阻通过开关连接。这些开关被联接操作，使得连接到第一晶体管的发射极的开关的导通截止操作与连接到第二和第三晶体管的发射极的开关的开关操作相反。通过操作开关，第一晶体管的放大度增加，同时第二和第三晶体管的放大度减小，因此可以获得亮度不变的红色图像。

67. 发明授权

US09332166B2 Imaging apparatus equipped with illumination optical system having a plurality of optical integrators that guide light 有权
标题翻译：配备有具有引导光的多个光学积分器的照明光学系统的成像设备
公开(公告)号：US09332166B2
公开(公告)日：2016-05-03
申请号：US13821490
申请日：2011-09-06
申请人： Tomoaki Kawakami , Toshihiko Tsuji
发明人： Tomoaki Kawakami , Toshihiko Tsuji
IPC分类号： G02B6/42 , H04N9/31 , H04N5/225 , G02B27/09
CPC分类号： H04N5/2256 , G02B27/0994
摘要： An imaging apparatus (1) includes an illumination optical system (100) that includes a light source (110) and is configured to guide light from the light source to a target(B), an imaging optical system configured to capture an image of the target, and a plurality of image sensors (430) arranged on an image plane of the imaging optical system. The illumination optical system includes a plurality of integrators (121,122). Light flux exits from one of the plurality of integrators illuminates at least one of the plurality of image sensors, and light exits from the other integrators illuminates at least one of the plurality of image sensors other than the image sensor illuminated by the light exits from the one of the plurality of integrators.
摘要翻译：一种成像装置（1）包括照明光学系统（100），其包括光源（110）并且被配置为将来自所述光源的光引导到目标（B）;成像光学系统，被配置为捕获所述光源目标和布置在成像光学系统的图像平面上的多个图像传感器（430）。照明光学系统包括多个积分器（121,122）。从多个积分器中的一个出射的光束照射多个图像传感器中的至少一个，并且来自其他积分器的光离开照亮多个图像传感器中的至少一个图像传感器，而不是由光照射的图像传感器从多个集成商之一。

68. 发明申请

US20130169788A1 MICROSCOPE, IMAGE ACQUISITION APPARATUS, AND IMAGE ACQUISITION SYSTEM 审中-公开
标题翻译：显微镜，图像采集设备和图像采集系统
公开(公告)号：US20130169788A1
公开(公告)日：2013-07-04
申请号：US13823062
申请日：2011-10-11
申请人： Toshihiko Tsuji , Hirofumi Fujii , Shun Mochizuki
发明人： Toshihiko Tsuji , Hirofumi Fujii , Shun Mochizuki
IPC分类号： G02B21/36
CPC分类号： G02B21/365 , G02B21/362 , G02B21/367
摘要： A microscope 1 includes an illumination device 10 for illuminating a object 30, an optical system 40 for forming an image of the object 30, and an imaging device 50 for capturing the image of the object 30. The imaging device 50 includes a plurality of imaging units. Each of the imaging units includes an image sensor and a movement mechanism for moving the image sensor.
摘要翻译：显微镜1包括用于照射物体30的照明装置10，用于形成物体30的图像的光学系统40以及用于捕获物体30的图像的成像装置50.成像装置50包括多个成像单位。每个成像单元包括用于移动图像传感器的图像传感器和移动机构。

69. 发明申请

US20080088814A1 EXPOSURE APPARATUS 失效
标题翻译：曝光装置
公开(公告)号：US20080088814A1
公开(公告)日：2008-04-17
申请号：US11870626
申请日：2007-10-11
申请人： Kazuhiko KAJIYAMA , Toshihiko TSUJI
发明人： Kazuhiko KAJIYAMA , Toshihiko TSUJI
IPC分类号： G03B27/72
CPC分类号： G03B27/72 , G03F7/70075
摘要： An exposure apparatus includes a first optical unit configured to condense light from a light source, a catoptric integrator configured to form plural secondary light sources using light from the first optical unit, the catoptric integrator including plural cylindrical reflection surfaces having the same generatrix direction, an aperture stop arranged perpendicular to the generatrix direction, and a second optical unit configured to superpose light from each secondary light source onto an illumination surface, wherein the catoptric integrator includes plural integrator parts each having plural cylindrical reflection surfaces, and the plural integrator parts are arranged in a direction perpendicular to the generatrix direction and to an arrangement direction of the cylindrical reflection surfaces and located at an incident side of the aperture stop.
摘要翻译：曝光装置包括被配置为使来自光源的光聚光的第一光学单元，使用来自第一光学单元的光形成多个次级光源的反射积分器，该反射积分器包括具有相同母线方向的多个圆柱形反射面，孔径光阑，其垂直于母线方向排列;第二光学单元，被配置为将来自每个次级光源的光叠加到照明表面上，其中，所述反射积分器包括多个具有多个圆柱形反射表面的积分器部分，并且所述多个积分器部件布置在垂直于母线方向的方向和圆柱形反射表面的排列方向上并且位于孔径光阑的入射侧。

70. 发明授权

US07265816B2 Illumination optical system, exposure apparatus, and device manufacturing method with modified illumination generator 失效
标题翻译：照明光学系统，曝光装置和具有改进照明发生器的装置制造方法
公开(公告)号：US07265816B2
公开(公告)日：2007-09-04
申请号：US11158017
申请日：2005-06-20
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70191
摘要： An illumination optical system for illuminating a target surface using light from a light source includes a modified illumination generator for generating a modified illumination with a predetermined polarization state for the target surface, wherein the modified illumination generator includes a λ/4 phase plate unit that includes a λ/4 phase plate for converting a circularly polarized light into a linearly polarized light in a predetermined direction, and a diffractive optical element unit that is arranged in a substantially conjugate relationship with the target surface, and includes a diffractive optical element used for the λ/4 phase plate to generate a predetermined illumination intensity distribution when the diffractive optical element unit receives the linearly polarized light.
摘要翻译：使用来自光源的光照射目标表面的照明光学系统包括：修正照明发生器，用于为目标表面产生具有预定极化状态的改进的照明，其中，所述修改的照明发生器包括：λ/ 4相位板单元，用于将圆偏振光转换成预定方向的线偏振光的λ/ 4相位板，以及与目标表面大体上共轭的衍射光学元件单元，并且包括用于所述衍射光学元件的衍射光学元件 λ/ 4相位板，以在衍射光学元件单元接收线偏振光时产生预定的照明强度分布。

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