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    • 61. 发明授权
    • Method for programmatic representation and enforcement of resource controls
    • US07086060B2
    • 2006-08-01
    • US09785022
    • 2001-02-15
    • Stephen C. Hahn
    • Stephen C. Hahn
    • G06F9/46
    • G06F9/5011G06F2209/504Y02D10/22
    • Methods, apparatus, and computer program products are disclosed for a process of dynamically adding new software having resource controls to an operating system and having the resource controls added to various resource control files in the operating system. The process also allows for a resource control to have an arbitrary number of limit values before a highest limit value is reached. A method of dynamically checking a resource control associated with newly added software to an operating system is described. A process or other type of entity in the operating system encounters newly added software and its associated resource control. The operating system then determines whether the resource associated with the resource control is active. If so, the operating system then determines whether usage of the resource by the entity exceeds a limiting value stored in the resource control. If so, one or more actions related to the resource are triggered by the operating system. If the limiting value has not been exceeded, granting the resource to the process or entity. At this time, the operating system can reset the limiting value of the resource control to another threshold value. In this manner, the process can have an arbitrary number of limiting values associated with the resource control.
    • 64. 发明授权
    • Method of in-situ treatment of low-k films with a silylating agent after exposure to oxidizing environments
    • 暴露于氧化环境后用甲硅烷基化剂原位处理低k膜的方法
    • US07083991B2
    • 2006-08-01
    • US11065624
    • 2005-02-24
    • Justin F. Gaynor
    • Justin F. Gaynor
    • H01L21/00
    • H01L21/31058H01L21/02126H01L21/02134H01L21/02137H01L21/02203H01L21/02337H01L21/67155H01L21/76814H01L21/76826
    • Method and apparatus for using a silylating agent after exposure to an oxidizing environment for repairing damage to low-k dielectric films are described. Plasma photoresist removal, or ashing, may damage bonds in the low-k materials, which may lead to a significant increase in the dielectric constant of the materials. The silylating agent may be used to repair damage to the low-k films after the ashing process. Additionally, a curing process using an oxidizing environment may damage bonds in low-k materials, which may subsequently be repaired by a silylating process. The described method and apparatus may be used with low-k dielectric films including hydrophobic porous oxide films. A chamber for processing a wafer in an oxidizing environment and subsequently performing a silylation process includes an oxidizing agent inlet and a silylating agent inlet. Additionally, a chamber for performing an etch process, processing a wafer in an oxidizing environment, and subsequently performing a silylation process includes an oxidizing agent inlet, a silylating agent inlet, and an etch gas inlet. A cluster tool can include a chamber for processing a wafer in an oxidizing environment and subsequently performing a silylation process, a wafer in/out module, and may include additional processing modules such as etch modules, deposition modules for depositing low-k layers, and deposition modules for depositing cap layers.
    • 描述了在暴露于氧化环境之后使用甲硅烷基化剂以修复对低k电介质膜的损伤的方法和装置。 等离子体光致抗蚀剂去除或灰化可能损坏低k材料中的键,这可能导致材料的介电常数的显着增加。 甲硅烷化剂可用于在灰化过程后修复对低k膜的损伤。 另外,使用氧化环境的固化方法可能损坏低k材料中的键,随后可以通过甲硅烷基化方法修复。 所描述的方法和装置可以与包括疏水性多孔氧化物膜的低k电介质膜一起使用。 用于在氧化环境中处理晶片并随后进行甲硅烷化处理的室包括氧化剂入口和甲硅烷基化剂入口。 另外,用于进行蚀刻处理的室,在氧化环境中处理晶片,随后进行甲硅烷基化处理包括氧化剂入口,甲硅烷基化剂入口和蚀刻气体入口。 集群工具可以包括用于在氧化环境中处理晶片并且随后执行硅烷化工艺,晶片入/出模块的腔室,并且可以包括附加的处理模块,例如蚀刻模块,用于沉积低k层的沉积模块,以及 用于沉积盖层的沉积模块。
    • 66. 发明授权
    • Representation of objects in a Java programming environment
    • 在Java编程环境中表示对象
    • US07082597B2
    • 2006-07-25
    • US09886454
    • 2001-06-20
    • Stepan SokolovDavid Wallman
    • Stepan SokolovDavid Wallman
    • G06F9/44
    • G06F9/45504G06F9/445G06F9/4488
    • Improved techniques for representation of objects in a Java™ programming environment are disclosed. The techniques are highly suitable for representation of Java™ objects inside virtual machines, especially those that operate with limited resources (e.g., embedded systems). In accordance with one embodiment, a Java™ object representation is disclosed. As will be appreciated, the Java™ object representation provides a reference that can be used to directly access the internal class representation associated with the object. The internal class representation provides information regarding the Java™ object (e.g., object size, object type, static fields, etc.) As a result, information regarding Java™ objects can quickly be accessed. This means that the processing time conventionally needed to access information regarding Java™ objects is reduced. Thus, performance of virtual machines, especially in systems with limited computing power and/or memory, can be enhanced.
    • 公开了用于在Java(TM)编程环境中表示对象的改进的技术。 这些技术非常适合于虚拟机内的Java(TM)对象的表示,特别是那些以有限的资源(例如嵌入式系统)运行的那些对象。 根据一个实施例,公开了Java TM对象表示。 如将理解的,Java TM对象表示提供了可用于直接访问与该对象相关联的内部类表示的引用。 内部类表示提供有关Java(TM)对象的信息(例如,对象大小,对象类型,静态字段等)。因此,可以快速访问有关Java(TM)对象的信息。 这意味着传统上需要访问关于Java(TM)对象的信息的处理时间被减少。 因此,可以增强虚拟机的性能,特别是在具有有限计算能力和/或存储器的系统中。
    • 67. 发明授权
    • Methods and apparatus for creating a high speed connection between a device under test and automatic test equipment
    • 用于在被测设备和自动测试设备之间建立高速连接的方法和设备
    • US07078890B2
    • 2006-07-18
    • US11189953
    • 2005-07-25
    • Roger SinsheimerD. Evan Williams
    • Roger SinsheimerD. Evan Williams
    • H05K1/00
    • G01R31/2886G01R31/2822G01R31/2889G01R31/31905
    • A clamping assembly for connecting a first plurality of contacts to a second plurality of contacts on a circuit board. The circuit board has a first outer face and a second outer face. The second contacts are arranged on at least one of the first and second outer faces. The clamping assembly includes a first assembly having a first inner face, and a second assembly having a second inner face substantially parallel to the first inner face. The first plurality of contacts are arranged on at least one of the first and second inner faces. Mechanical alignment features facilitate alignment of the first contacts with the second contacts. The first and second assemblies are configured to enable relative motion therebetween to effect clamping of the first and second inner faces to the first and second outer faces of the circuit board.
    • 一种用于将第一多个触点连接到电路板上的第二多个触点的夹持组件。 电路板具有第一外表面和第二外表面。 第二触点设置在第一和第二外表面中的至少一个上。 夹紧组件包括具有第一内表面的第一组件和具有基本上平行于第一内表面的第二内表面的第二组件。 第一多个触点布置在第一和第二内表面中的至少一个上。 机械对准特征促进了第一触头与第二触头的对准。 第一和第二组件构造成使得它们之间的相对运动能够实现将第一和第二内表面夹紧到电路板的第一和第二外表面。
    • 70. 发明授权
    • Resource managing system for changing resource consumption state of the lower priority resource entity to more restrictive state when resource reached critical level
    • 资源管理系统,当资源达到关键水平时,将较低优先级资源实体的资源消耗状态更改为更严格的状态
    • US07073177B2
    • 2006-07-04
    • US10045514
    • 2001-10-26
    • William F. FooteHideya Kawahara
    • William F. FooteHideya Kawahara
    • G06F9/46
    • G06F11/28G06F9/50
    • Disclosed are methods and apparatus for managing resources. In general terms, a resource manager manages resource consumption of several resource entities which are each capable of consuming resources. The resource manager tracks the availability of such resources and determines whether a resource is critically short or reaches a particular usage level. When a resource becomes critically short or reaches a particular usage level, the resource manager selects one or more resource entities based on one or more criteria. For example, a resource entity which has the least restrictive resource usage policy or state is selected. The resource manager then requests that the selected resource entity changes its resource usage state to a more restrictive state. Of course, when resource usage reaches an acceptable level, the resource manager may also inform each resource entity (or previously selected resource entities) that they may set their resource consumption state to a less restrictive state.
    • 公开了用于管理资源的方法和装置。 一般来说,资源管理器管理能够消耗资源的几个资源实体的资源消耗。 资源管理器跟踪这种资源的可用性,并确定资源是否严重短暂或达到特定的使用级别。 当资源变得严重短暂或达到特定使用水平时,资源管理器基于一个或多个标准来选择一个或多个资源实体。 例如,选择具有最少限制性资源使用策略或状态的资源实体。 资源管理器然后请求所选择的资源实体将其资源使用状态改变到更严格的状态。 当然,当资源使用达到可接受的水平时,资源管理器也可以通知每个资源实体(或先前选择的资源实体),他们可以将它们的资源消耗状态设置为较少的限制状态。