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51. 发明申请

US20120086931A1 Stage device including a heat insulating sheet supported by an auxiliary member 审中-公开
标题翻译：舞台装置包括由辅助构件支撑的隔热片
公开(公告)号：US20120086931A1
公开(公告)日：2012-04-12
申请号：US13325185
申请日：2011-12-14
申请人： Hitoshi Sato , Yasuhito Sasaki , Keiji Emoto
发明人： Hitoshi Sato , Yasuhito Sasaki , Keiji Emoto
IPC分类号： G03B27/62
CPC分类号： G03F7/70858 , G03F7/70725
摘要： A stage device that includes a base. A stage movable portion is movable along a surface of the base. An interferometer measures a position of the stage movable portion using measurement light. At least one of a piping element and a wiring element are connected to the stage movable portion. An auxiliary member, including a plurality of members connected with each other, guides a bend of at least one of the piping element and the wiring element. A heat insulating sheet is supported by the auxiliary member. The heat insulating material is provided between a space through which the measurement light of the interferometer passes, and the at least one of the piping element and the wiring element.
摘要翻译：包括基座的舞台装置。平台可动部分可沿底座的表面移动。干涉仪使用测量光来测量舞台可动部分的位置。管道元件和配线元件中的至少一个连接到台可动部。包括彼此连接的多个构件的辅助构件引导管道元件和布线元件中的至少一个的弯曲部。隔热片由辅助构件支承。绝热材料设置在干涉仪的测量光通过的空间与管道元件和布线元件中的至少一个之间。

52. 发明授权

US08098364B2 Exposure apparatus and method for photolithography process 有权
标题翻译：用于光刻工艺的曝光装置和方法
公开(公告)号：US08098364B2
公开(公告)日：2012-01-17
申请号：US11875471
申请日：2007-10-19
申请人： Vinvent Yu , Hsien-Cheng Wang , Hung-Chang Hsieh
发明人： Vinvent Yu , Hsien-Cheng Wang , Hung-Chang Hsieh
IPC分类号： G02F1/29 , G03B27/32 , G03B27/42 , G03B27/52 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70833 , G03F7/70258 , G03F7/70641 , G03F7/70858
摘要： Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field. The deformation of the transparent membrane may allow the focus length of a radiation beam to be modified. In an embodiment, the variable focusing device may be modulated such that a radiation beam having a first focus length is provided for a first position on an exposure target and a radiation beam having a second focus length is provided for a second position on the exposure target. A method and computer-readable medium are also provided.
摘要翻译：提供一种包括可变聚焦装置的曝光装置。可变聚焦装置可以包括可能在存在电场的情况下变形的透明膜。透明膜的变形可以允许改变辐射束的聚焦长度。在一个实施例中，可调制可变聚焦装置，使得具有第一聚焦长度的辐射束用于曝光目标上的第一位置，并且为曝光目标上的第二位置提供具有第二焦距的辐射束。还提供了一种方法和计算机可读介质。

53. 发明申请

US20110317139A1 EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和曝光方法及装置制造方法
公开(公告)号：US20110317139A1
公开(公告)日：2011-12-29
申请号：US13227673
申请日：2011-09-08
申请人： TOMOHARU FUJIWARA
发明人： TOMOHARU FUJIWARA
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70341 , G03F7/70858 , G03F7/70916
摘要： An exposure apparatus includes: a supply port through which a liquid is supplied to an optical path space of exposure light; and a supply passage in which the liquid flows and which is in fluid communication with the supply port. An amount of a predetermined substance mixed into the liquid in the supply passage is set to be not greater than a predetermined value.
摘要翻译：曝光装置包括：向曝光光的光路空间供给液体的供给口; 以及供给通道，液体在该供给通道中流动并且与供给口流体连通。混入供给通道中的液体中的预定物质的量被设定为不大于预定值。

54. 发明申请

US20110310367A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20110310367A1
公开(公告)日：2011-12-22
申请号：US13223952
申请日：2011-09-01
申请人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

55. 发明申请

US20110304418A1 MAGNETIC HOLDING DEVICE AND METHOD FOR HOLDING A SUBSTRATE 有权
标题翻译：磁性保持装置及用于保持基板的方法
公开(公告)号：US20110304418A1
公开(公告)日：2011-12-15
申请号：US12818392
申请日：2010-06-18
申请人： Uwe SCHUESSLER , Stefan BANGERT , Heike LANDGRAF
发明人： Uwe SCHUESSLER , Stefan BANGERT , Heike LANDGRAF
IPC分类号： H01F7/00
CPC分类号： G03F7/70858 , G03F7/707
摘要： A magnetic holding device is adapted for holding a mask during processing of a substrate. The magnetic holding device includes a substrate carrier which is adapted for receiving the substrate to be processed. The substrate carrier includes a permanent magnet adapted for generating a first magnetic field for holding the mask. Furthermore, the substrate carrier includes a solenoid which is adapted for generating a second magnetic field adapted for at least partially compensating the first magnetic field. In case the first magnetic field is compensated, at least partially, by means of the second magnetic field, the mask is released from the substrate carrier.
摘要翻译：磁性保持装置适于在基板的加工期间保持掩模。磁保持装置包括适于接收待处理基板的基板载体。衬底载体包括适于产生用于保持掩模的第一磁场的永磁体。此外，衬底载体包括螺线管，螺线管适于产生适于至少部分地补偿第一磁场的第二磁场。在通过第二磁场至少部分补偿第一磁场的情况下，掩模从衬底载体释放。

56. 发明申请

US20110273675A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110273675A1
公开(公告)日：2011-11-10
申请号：US13186123
申请日：2011-07-19
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
IPC分类号： G03B27/52
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译：在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。或者，多孔构件可以用于减少两相流中的不均匀性。

57. 发明授权

US08045134B2 Lithographic apparatus, control system and device manufacturing method 有权
标题翻译：光刻设备，控制系统和器件制造方法
公开(公告)号：US08045134B2
公开(公告)日：2011-10-25
申请号：US11373493
申请日：2006-03-13
申请人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
发明人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
IPC分类号： G03B27/52
CPC分类号： G03F7/70858 , G03F7/70258 , G03F7/70341 , G03F7/705 , G03F7/70575 , G03F7/706
摘要： An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
摘要翻译：公开了一种浸没式光刻设备，其具有用于分别测量和/或预测与浸没液体的温度波动相关的影响的测量系统或预测系统，以及用于控制与温度相关的或另一效应的控制系统基于由测量系统和/或预测系统获得的测量和/或预测的浸没液体。还公开了一种相关的控制系统和设备制造方法。

58. 发明授权

US07994484B2 Stage apparatus and exposure apparatus 有权
标题翻译：舞台装置和曝光装置
公开(公告)号：US07994484B2
公开(公告)日：2011-08-09
申请号：US12385059
申请日：2009-03-30
申请人： Keiichi Tanaka
发明人： Keiichi Tanaka
IPC分类号： G01N31/00 , A61N5/00
CPC分类号： G03F7/70858 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70766 , G03F7/70783 , G03F7/70808 , G03F7/70816 , G03F7/70841 , H01J37/3174
摘要： The present invention provides a stage apparatus wherein an object is disposed in an atmosphere with a gas pressure lower than atmospheric pressure, and the object can be driven with high accuracy. The stage apparatus that drives a reticle comprises: a vacuum chamber, which forms a space and has an opening; an integrated coarse and fine motion table, which has an electrostatic chuck that holds the object, that, when driven, moves the electrostatic chuck inside the space; a counter mass, which is disposed so that it covers the opening, that is capable of moving because of the reaction force produced when the integrated coarse and fine motion table is driven; and a vacuum cover, which forms a space that houses the counter mass; wherein the space and the space are set to prescribed gas pressures.
摘要翻译：本发明提供了一种舞台装置，其中物体设置在气压低于大气压的气氛中，并且可以高精度地驱动物体。驱动掩模版的平台装置包括：真空室，其形成空间并具有开口; 具有固定物体的静电卡盘的集成的粗细动作台，驱动时将静电卡盘移动到空间内; 设置为使其覆盖开口的反质量块，其由于在驱动集成的粗细动作台时产生的反作用力而能够移动; 和真空盖，其形成容纳对置质量的空间; 其中所述空间和所述空间被设定为规定的气体压力。

59. 发明授权

US07990518B2 Immersion exposure apparatus and device manufacturing method 失效
标题翻译：浸渍曝光装置及装置的制造方法
公开(公告)号：US07990518B2
公开(公告)日：2011-08-02
申请号：US12239074
申请日：2008-09-26
申请人： Kaoru Ogino
发明人： Kaoru Ogino
IPC分类号： G03B27/52
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/70525 , G03F7/70858
摘要： An immersion exposure apparatus that projects a pattern of an original onto a substrate via a projection optical system and a liquid, thereby exposing the substrate. A substrate stage mechanism includes a substrate stage to hold the substrate. An immersion unit supplies the liquid into a space between the substrate or the substrate stage and the projection optical system, and recovers the liquid from above the substrate or the substrate stage. A control unit controls the immersion unit to recover the liquid from above the substrate or the substrate stage, and then controls the substrate stage mechanism to move the substrate stage to a retreat position, in response to a shutoff request for requesting shutoff of electrical power supply to the substrate stage mechanism. The control unit executes, in response to the shutoff request, a special process according to a process being executed by the immersion exposure apparatus when the control unit has received the shutoff request, and then controls the immersion unit to recover the liquid from above the substrate stage.
摘要翻译：一种浸没曝光装置，其通过投影光学系统和液体将原稿的图案投影到基板上，从而使基板曝光。衬底台机构包括用于保持衬底的衬底台。浸没单元将液体供应到基板或基板台与投影光学系统之间的空间中，并从基板或基板台上方回收液体。控制单元控制浸没单元从基板或基板台上方回收液体，然后响应于关闭请求关闭电力供应的关闭请求而控制基板台机构将基板台移动到退避位置到基板台机构。当控制单元接收到切断请求时，控制单元根据关闭请求执行根据由浸没曝光装置执行的处理的特殊处理，然后控制浸没单元从基板上方回收液体阶段。

60. 发明申请

US20110170079A1 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 有权
标题翻译：辐射系统和光刻设备
公开(公告)号：US20110170079A1
公开(公告)日：2011-07-14
申请号：US13062872
申请日：2009-04-30
申请人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
发明人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
IPC分类号： G03B27/54 , H01J1/50
CPC分类号： G03F7/70916 , G03F7/70175 , G03F7/70858 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.
摘要翻译：辐射系统被配置为产生辐射束。辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。

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