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    • 54. 发明申请
    • ANISOTROPIC ETCHING OF METALLIC SUBSTRATES
    • 金属基板的各向异性蚀刻
    • US20160222518A1
    • 2016-08-04
    • US14642171
    • 2015-03-09
    • Rolls-Royce North American Technologies, Inc.
    • James Carl Loebig
    • C23C18/16G03F7/30C23C16/44C23F1/00C23C14/22
    • C25F3/14C23C14/22C23C16/44C23C18/1637C23F1/00G03F7/3007
    • In some examples, a method includes forming a photoresist layer on a surface of a metallic substrate and developing the photoresist layer to define a pattern exposing a portion of the surface of the metallic substrate. The method also may include forming an electrically conductive layer on a surface of the photoresist layer and the exposed portions of the surface of the metallic substrate. The electrically conductive layer contacts the exposed portions of the surface of the metallic substrate. The method may further include submerging the substrate, the photoresist layer, and the electrically conductive layer in an electrolyte solution; and applying a voltage to between a cathode and an anode submerged in the electrolyte solution to anisotropically etch the metallic substrate where the electrically conductive layer contacts the exposed portions of the surface of the metallic substrate to form at least one feature in the metallic substrate.
    • 在一些实例中,一种方法包括在金属基底的表面上形成光致抗蚀剂层并使该光致抗蚀剂层显影以限定暴露金属基底表面的一部分的图案。 该方法还可以包括在光致抗蚀剂层的表面和金属基底的表面的暴露部分上形成导电层。 导电层接触金属基底表面的暴露部分。 该方法可以进一步包括将基底,光致抗蚀剂层和导电层浸没在电解质溶液中; 以及向沉积在电解液中的阴极和阳极之间施加电压以各向异性地蚀刻金属基底,其中导电层与金属基底的表面的暴露部分接触以形成金属基底中的至少一个特征。