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51. 发明申请

US20170355795A1 POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS 审中-公开
公开(公告)号：US20170355795A1
公开(公告)日：2017-12-14
申请号：US15596374
申请日：2017-05-16
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Jun Hatakeyama , Daisuke Domon
IPC分类号： C08F212/14 , G03F7/38 , G03F7/16 , G03F1/20 , G03F7/038 , G03F7/32 , G03F7/20 , G03F1/76 , G03F7/004 , G03F1/22
CPC分类号： C08F212/14 , C08F12/20 , C08F12/22 , C08F12/24 , C08F12/32 , C09D125/18 , G03F1/76 , G03F7/0045 , G03F7/0046 , G03F7/0382 , C08F220/20 , C08F212/32 , C08F2220/382 , C08F220/22 , C08F2220/282
摘要： A polymer comprising recurring units derived from vinylanthraquinone, recurring units containing a benzene ring having a hydroxyl-bearing tertiary alkyl group bonded thereto, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a negative resist composition having a high resolution and minimal LER.

52. 发明授权

US09529259B2 Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound 有权
标题翻译：辐射敏感性树脂组合物，抗蚀剂图案形成法，酸扩散控制剂，化合物和化合物的制造方法
公开(公告)号：US09529259B2
公开(公告)日：2016-12-27
申请号：US14827795
申请日：2015-08-17
申请人： JSR CORPORATION
发明人： Hayato Namai
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/32 , C07C59/185 , C07C59/205 , C07C59/84 , C07C59/21 , C07C69/36 , C07C381/12 , C07D307/77 , C07D313/04 , C07D317/46 , C07D317/72 , C07D327/04 , C07D313/10 , C07D307/93 , C07D315/00 , C07C51/41 , C07C327/32 , C07C67/30 , C07C51/02 , C08F212/14 , G03F7/038 , C08F2/38 , C08F4/00 , C07C69/63 , C07C327/06 , C08F12/24
CPC分类号： G03F7/0045 , C07C51/02 , C07C51/41 , C07C59/185 , C07C59/205 , C07C59/21 , C07C59/84 , C07C67/30 , C07C69/36 , C07C69/63 , C07C327/06 , C07C327/32 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2603/74 , C07D307/77 , C07D307/93 , C07D313/04 , C07D313/10 , C07D315/00 , C07D317/46 , C07D317/72 , C07D327/04 , C08F2/38 , C08F4/00 , C08F12/24 , C08F212/14 , G03F7/004 , G03F7/0046 , G03F7/038 , G03F7/039 , G03F7/0397 , G03F7/2041 , G03F7/30 , G03F7/322 , G03F7/325 , C07C319/20 , C07C323/52
摘要： A radiation-sensitive resin composition includes a polymer including a structural unit that includes an acid-labile group; and a compound represented by formula (1). R1 represents a monovalent organic group having 1 to 30 carbon atoms. L represents a single bond, an oxygen atom or a sulfur atom. M+ represents a monovalent radioactive ray-labile onium cation. The monovalent organic group represented by R1 is preferably a monovalent hydrocarbon group or a monovalent fluorinated hydrocarbon group, and L preferably represents a single bond. The monovalent organic group represented by R1 is preferably a monovalent hydrocarbon group, a monovalent fluorinated hydrocarbon group, a monovalent aliphatic heterocyclic group or a monovalent fluorinated aliphatic heterocyclic group, and L preferably represents an oxygen atom or a sulfur atom. The monovalent radioactive ray-labile onium cation represented by M+ is preferably represented by the formula (X).
摘要翻译：辐射敏感性树脂组合物包括含有酸不稳定基团的结构单元的聚合物; 和由式（1）表示的化合物。 R1表示碳原子数为1〜30的一价有机基团。 L表示单键，氧原子或硫原子。 M +代表一价放射性不稳定鎓阳离子。由R1表示的一价有机基团优选为一价烃基或一价氟化烃基，L优选表示单键。由R1表示的一价有机基团优选为一价烃基，一价氟化烃基，一价脂族杂环基或一价含氟脂族杂环基，L优选表示氧原子或硫原子。由M +表示的单价放射线不稳定鎓阳离子优选由式（X）表示。

53. 发明授权

US09170489B2 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device 有权
标题翻译：图案形成方法，电子束敏感或极紫外辐射敏感树脂组合物，抗蚀膜，使用它们的电子装置的制造方法和电子装置
公开(公告)号：US09170489B2
公开(公告)日：2015-10-27
申请号：US14207867
申请日：2014-03-13
申请人： FUJIFILM Corporation
发明人： Hiroo Takizawa , Hideaki Tsubaki , Shuji Hirano
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20 , G03F7/038 , C08F212/14 , G03F7/32 , H01J37/317 , C08F12/20 , C08F12/24 , C08F212/32
CPC分类号： G03F7/0041 , C08F12/20 , C08F12/24 , C08F212/14 , C08F212/32 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/20 , G03F7/2037 , G03F7/2059 , G03F7/325 , H01J37/3174
摘要： A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation and (C) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of forming a negative pattern by development of the film with a developer containing an organic solvent after the exposing of the film, wherein a content of the compound (B) is 21% by mass to 70% by mass on the basis of all solids content of the composition.
摘要翻译：图案形成方法包括以下顺序：用电子束敏感或极紫外线辐射敏感性树脂组合物形成膜的步骤（1），其包含（A）具有酸分解重复单元并能够降低的树脂（A）在含有有机溶剂的显影剂中的溶解度，（B）在电子束或极紫外线照射下能够产生酸的化合物和（C）溶剂; 步骤（2），用电子束或极紫外线辐射曝光胶片; 和步骤（4），通过在所述膜暴露之后用含有机溶剂的显影剂显影所述膜形成负图案，其中化合物（B）的含量为21质量％至70质量％组合物的所有固体含量的基础。

54. 发明申请

US20150219993A1 PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETCHING METHOD 有权
标题翻译：感光传输材料，图案形成方法和蚀刻方法
公开(公告)号：US20150219993A1
公开(公告)日：2015-08-06
申请号：US14687491
申请日：2015-04-15
申请人： FUJIFILM Corporation
发明人： Hideaki ITO , Shinji FUJIMOTO , Yasumasa KAWABE
IPC分类号： G03F7/039 , G03F7/40 , G03F7/30
CPC分类号： G03F7/094 , C08F12/22 , C08F12/24 , C08F212/14 , C08F220/28 , C08F2220/281 , G03F7/0045 , G03F7/033 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/161 , G03F7/20 , G03F7/26 , G03F7/30 , G03F7/40 , H03K17/962 , Y02P20/582 , C08F212/32
摘要： A photosensitive transfer material including a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, in which the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).
摘要翻译：感光性树脂组合物层包括具有包含具有构成单元（a1）的聚合物的聚合物成分（A）的感光性转印材料，其包含支撑体，热塑性树脂层和感光性树脂组合物层，酸基被酸可分解基团和光酸产生剂（B）保护的基团。

55. 发明授权

US09079989B2 Charge control resin and manufacturing method of the same 有权
标题翻译：充电控制树脂及其制造方法相同
公开(公告)号：US09079989B2
公开(公告)日：2015-07-14
申请号：US14507414
申请日：2014-10-06
申请人： ORIENT CHEMICAL INDUSTRIES CO., LTD.
发明人： Masashi Yasumatsu , Kaori Inoue , Satoko Ozaki
IPC分类号： C08F212/08 , G03G9/087 , G03G9/097 , C07C69/92 , C08F12/22 , C08F12/32 , C08F8/26 , C08F8/42
CPC分类号： C08F212/08 , C07C69/92 , C08F12/22 , C08F12/24 , C08F12/32 , C08F212/14 , G03G9/08704 , G03G9/08722 , G03G9/08735 , G03G9/08791 , G03G9/09733 , G03G9/09775 , Y10S526/923
摘要： Here is provided a charge control resin which is prompt in charge rising up, excellent in electrostatic charging propensity and easy in manufacturing. This charge control resin contains a polymer as an active ingredient having a constituent unit represented by following Formula (1) in the Formula (1), R1 is independent of one another, and is a hydrogen atom, a hydroxyl group, a halogen atom, a carboxy-containing group, a straight-chained or branched alkyl group having 1-18 carbon atoms, or a straight-chained or branched alkoxy group having 1-18 carbon atoms; R2 is a hydrogen atom, a hydroxyl group, a halogen atom, a carboxy-containing group, a straight-chained or branched alkyl group having 1-18 carbon atoms, or a straight-chained or branched alkoxy group having 1-18 carbon atoms; g is a number of 1-3; h is a number of 1-3; and M is a hydrogen atom, an alkali metal, a straight-chained or branched alkyl group having 1-18 carbon atoms, an ammonium radical or a mixture of any of these.
摘要翻译：这里提供一种充电控制树脂，其迅速充电，静电充电倾向优异，制造容易。该电荷控制树脂含有作为活性成分的聚合物，其具有式（1）中由下式（1）表示的结构单元，R 1彼此独立，为氢原子，羟基，卤素原子，含羧基的基团，具有1-18个碳原子的直链或支链烷基，或具有1-18个碳原子的直链或支链烷氧基; R2是氢原子，羟基，卤原子，含羧基，具有1-18个碳原子的直链或支链烷基，或具有1-18个碳原子的直链或支链烷氧基 ; g是1-3的数量; h是1-3的数量; M是氢原子，碱金属，具有1-18个碳原子的直链或支链烷基，铵基或它们的混合物。

56. 发明授权

US09052437B2 Photosensitive resin composition for forming microlens 有权
标题翻译：用于形成微透镜的感光树脂组合物
公开(公告)号：US09052437B2
公开(公告)日：2015-06-09
申请号：US13982316
申请日：2012-01-12
申请人： Takahiro Sakaguchi
发明人： Takahiro Sakaguchi
IPC分类号： C08F216/14 , G03F7/038 , C08F222/40 , G02B1/04 , C08F12/24 , C08F212/12 , C08F212/14 , C08F212/32
CPC分类号： G02B1/041 , C08F12/24 , C08F212/12 , C08F212/14 , C08F212/32 , C08F216/1416 , C08F222/40 , G03F7/0382 , C08F2222/402 , C08F2216/1433
摘要： There is provided a photosensitive resin composition for forming a microlens. A photosensitive resin composition for forming a microlens, the photosensitive resin composition comprising: a component (A), a component (B), a component (C) and a solvent. The component (A) is a copolymer having a maleimide structural unit of formula (1) below, a vinyl ether structural unit of formula (2) below, and at least one of the three structural units of formula (3), formula (4), and formula (5) below, the component (B) is a photosensitizer, and the component (C) is a cross-linking agent (where X is a C1-20 hydrocarbon group that optionally has an ether bond or a cyclic structure; Y is an organic group that optionally has a substituent; and Z is an aromatic hydrocarbon group or an alkoxy group that optionally has a substituent).
摘要翻译：提供了一种用于形成微透镜的感光性树脂组合物。用于形成微透镜的感光性树脂组合物，所述感光性树脂组合物包含：成分（A），成分（B），成分（C）和溶剂。组分（A）是具有下式（1）的马来酰亚胺结构单元，下式（2）的乙烯基醚结构单元和式（3），式（4）的三个结构单元中的至少一个的共聚物）和下式（5）中，成分（B）为光敏剂，成分（C）为交联剂（其中X为任选具有醚键或环状结构的C 1-20烃基 Y是任选具有取代基的有机基团; Z是任选具有取代基的芳族烃基或烷氧基）。

57. 发明申请

US20150132688A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN 有权
标题翻译：丙烯酸类敏感性或辐射敏感性树脂组合物，使用其的耐腐蚀膜，图案形成方法，电子设备的制造方法，电子设备和树脂
公开(公告)号：US20150132688A1
公开(公告)日：2015-05-14
申请号：US14605415
申请日：2015-01-26
申请人： FUJIFILM Corporation
发明人： Natsumi YOKOKAWA , Shuji HIRANO , Hiroo TAKIZAWA , Wataru NIHASHI
IPC分类号： G03F7/038 , G03F7/30
CPC分类号： G03F7/0388 , C08F12/24 , C08F20/28 , C08F220/12 , C08F220/18 , C08F220/20 , C08F220/26 , C08F2220/285 , G03F7/0002 , G03F7/0045 , G03F7/038 , G03F7/0392 , G03F7/0397 , G03F7/30 , H01L21/0274
摘要： There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.
摘要翻译：提供一种光化射线敏感或辐射敏感性树脂组合物，其包含（P）具有（a）由该具体式表示的重复单元的树脂; 使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜; 一种图案形成方法，包括（i）通过使用光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（ii）曝光所述膜的步骤，以及（iii）通过使用开发人员形成一个模式; 一种用于制造电子装置的方法，包括图案形成方法; 以及通过电子设备的制造方法制造的电子设备。

58. 发明授权

US09023950B2 Star polymer and method of producing same 有权
标题翻译：星形聚合物及其制造方法
公开(公告)号：US09023950B2
公开(公告)日：2015-05-05
申请号：US13639792
申请日：2011-04-18
申请人： Akihiro Shirai , Takeshi Niitani
发明人： Akihiro Shirai , Takeshi Niitani
IPC分类号： C08F12/22 , C08F297/04 , C08F212/14 , C08F12/24 , C08F297/02 , G03F7/039
CPC分类号： C08F12/22 , C08F12/24 , C08F212/14 , C08F297/023 , C08F297/044 , G03F7/0392
摘要： The present invention provides a styrene-based star polymer with narrow dispersion and suitable as a resist material, etc. A star polymer of the present invention is represented by the formula A[C(Y)Xm]n (wherein A represents a polyvalent aliphatic hydrocarbon group with 4-15 carbons, C represents a carbon atom, X represents a styrene-based polymer chain, Y represents a hydroxy group or an oxo group, m represents an integer of 1 or 2, and n represents any integer from 2 to 5, with the proviso that if Y is a hydroxy group, m is 2, and if Y is an oxo group, m is 1). The star polymer can be produced by reacting a styrene-based polymer having an anionic end, and an aliphatic carboxylic acid ester represented by A(COOR)n (wherein R represents an alkyl group having 1-8 carbons, and A and n are as defined for the above formula).
摘要翻译：本发明提供具有窄分散性且适合作为抗蚀剂材料等的苯乙烯类星形聚合物。本发明的星形聚合物由式A [C（Y）Xm] n表示（其中A表示多价脂族具有4-15个碳原子的烃基，C表示碳原子，X表示苯乙烯基聚合物链，Y表示羟基或氧代基，m表示1或2的整数，n表示2〜 5，条件是如果Y是羟基，m是2，如果Y是氧代基，m是1）。星形聚合物可以通过使具有阴离子末端的苯乙烯基聚合物和由A（COOR）n（其中R表示具有1-8个碳原子的烷基）和A与n表示的脂族羧酸酯定义为上述公式）。

59. 发明授权

US08937301B2 Photocurable polymeric dielectrics containing 6-substituted coumarin moieties and methods of preparation and use thereof 有权
标题翻译：含有6-取代香豆素部分的光固化聚合物电介质及其制备方法及用途
公开(公告)号：US08937301B2
公开(公告)日：2015-01-20
申请号：US13128961
申请日：2009-11-20
申请人： Jordan Quinn , He Yan , Yan Zheng , Christopher Newman , Silke Annika Koehler , Antonio Facchetti , Thomas Breiner
发明人： Jordan Quinn , He Yan , Yan Zheng , Christopher Newman , Silke Annika Koehler , Antonio Facchetti , Thomas Breiner
IPC分类号： H01L29/786 , H01L51/05 , H01L51/00 , C08G61/02
CPC分类号： H01L51/052 , B05D3/06 , C08F12/22 , C08F12/24 , C08F112/14 , C08F118/12 , C08F212/14 , C08F216/10 , C08G61/02 , C09D125/18 , H01B3/442 , H01B3/447 , H01L51/004 , H01L51/0043 , H01L51/0073 , Y10T428/31938 , C08F220/14 , C08F212/32
摘要： Disclosed are polymer-based dielectric compositions (e.g., formulations) and materials (e.g. films) and associated devices. The polymers generally include photocrosslinkable pendant groups; for example, the polymers can include one or more coumarin-containing pendant groups.
摘要翻译：公开了基于聚合物的电介质组合物（例如制剂）和材料（例如膜）和相关装置。聚合物通常包括可光致交联的侧基; 例如，聚合物可以包括一种或多种含香豆素的侧基。

60. 发明授权

US08785007B2 Pendant-type polymeric compound, color conversion film using pendant-type polymeric compound, and multicolor emission organic EL device 失效
标题翻译：悬挂型高分子化合物，使用侧基型高分子化合物的变色膜，以及多色发光有机EL元件
公开(公告)号：US08785007B2
公开(公告)日：2014-07-22
申请号：US13496847
申请日：2010-09-10
申请人： Masaru Nagai , Mitsuhiro Okada , Koichi Shigeno
发明人： Masaru Nagai , Mitsuhiro Okada , Koichi Shigeno
IPC分类号： H01L51/54
CPC分类号： C08F8/30 , C09D125/18 , H01L27/322 , C08F12/16 , C08F12/24
摘要： The present invention provides green and red conversion films capable of keeping a sufficient intensity of converted light over a long period, and a multicolor emission organic EL device which exhibits light-emitting properties stably over a long period. The present invention includes a pendant-type polymeric compound characterized in that the pendant-type polymeric compound contains at least one repeating unit represented by a general formula (1) and at least one repeating unit represented by a general formula (2), (6) or (7), wherein n/(m+n)=1/100 to 100/100 provided that the molar ratio of (1):(2), (6) or (7) is m:n.
摘要翻译：本发明提供能够长时间保持足够的转换光强度的绿色和红色转换膜，以及长期稳定地显示发光特性的多色发光有机EL器件。本发明包括侧挂型聚合物，其特征在于，所述侧挂型高分子化合物含有至少一个由通式（1）表示的重复单元和至少一个由通式（2）表示的重复单元，（6））或（7），其中n /（m + n）= 1/100〜100/100，条件是（1）：（2），（6）或（7）的摩尔比为m：n。

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