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    • 51. 发明授权
    • Exhaust gas recirculation control method and apparatus for a diesel
engine
    • 柴油发动机废气再循环控制方法及装置
    • US4466416A
    • 1984-08-21
    • US404912
    • 1982-08-03
    • Yoshihisa Kawamura
    • Yoshihisa Kawamura
    • F02M25/07F02B3/06F02D9/02F02D11/08F02D21/08F02M25/06
    • F02D41/005F02D11/08F02D9/02F02M26/57F02M26/64F02B3/06F02D2009/0276F02D2041/0017F02D2041/0022Y02T10/47
    • An exhaust gas recirculation method and apparatus controls the duty cycles of a throttle valve provided in an air intake passageway leading to a diesel engine, and an exhaust gas recirculation valve provided in an exhaust gas recirculation passageway connecting the air intake passageway and an exhaust gas passage, according to a predetermined relationship. The respective valves are controlled via corresponding diaphragm actuators and electromagnetic valves for actuating the actuators by a control unit which produces duty cycle control signals for the respective electromagnetic valves in accordance with sensed operating parameter signals which represent engine speed, load and coolant temperature. The control of the throttle and EGR valves are related so that the throttle valve is held fully open when the EGR valve is not fully open. This ensures the absolute minimum emission of exhaust HC throughout the range of throttle-EGR control.
    • 排气再循环方法和装置控制设置在通向柴油发动机的进气通道中的节流阀的占空比,以及设置在排气再循环通道中的排气再循环阀,该废气再循环阀连接进气通道和排气通道 ,根据预定的关系。 相应的阀门通过相应的隔膜致动器和电磁阀来控制,该电磁阀通过控制单元来驱动致动器,该控制单元根据感测到的表示发动机转速,负载和冷却剂温度的操作参数信号,产生各个电磁阀的占空比控制信号。 节流阀和EGR阀的控制相关联,使得当EGR阀未完全打开时节流阀保持完全打开。 这确保了在节气门 - EGR控制范围内排气HC的绝对最小排放。
    • 54. 发明授权
    • Method for pattern formation
    • 图案形成方法
    • US08597873B2
    • 2013-12-03
    • US13592635
    • 2012-08-23
    • Yoshihisa Kawamura
    • Yoshihisa Kawamura
    • G03F7/26
    • H01L21/0271B82Y10/00B82Y40/00G03F7/0002G03F7/0035G03F7/0042G03F7/0043G03F7/038G03F7/0755G03F7/0757H01L21/31144H01L27/1052
    • According to one embodiment, a method for pattern formation comprises forming a first pattern on a first region of a processed film, forming a reverse material film, having a photosensitive compound, on the processed film so that the reverse material film covers the first pattern, exposing and developing the reverse material film and processing the reverse material film into a second pattern in a second region different from the first region on the processed film, applying etch-back, after exposing and developing the reverse material film, to the reverse material film to expose an upper surface of the first pattern and processing the reverse material film into a third pattern in the first region, and etching the processed film using the second pattern and the third pattern as masks.
    • 根据一个实施例,一种用于图案形成的方法包括在处理膜的第一区域上形成第一图案,在加工膜上形成具有感光性化合物的反向材料膜,使得反向材料膜覆盖第一图案, 曝光和显影反向材料膜并将反相材料膜在与处理膜上的第一区域不同的第二区域中处理成第二图案,在将反向材料膜曝光和显影之后施加回蚀刻到反向材料膜 以暴露第一图案的上表面,并将反向材料膜处理成第一区域中的第三图案,并且使用第二图案和第三图案作为掩模蚀刻处理的膜。