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51. 发明授权

US07294389B2 Microstructure array and a microlens array 失效
标题翻译：微结构阵列和微透镜阵列
公开(公告)号：US07294389B2
公开(公告)日：2007-11-13
申请号：US10930959
申请日：2004-09-01
申请人： Takayuki Teshima , Takayuki Yagi , Yasuhiro Shimada , Takashi Ushijima
发明人： Takayuki Teshima , Takayuki Yagi , Yasuhiro Shimada , Takashi Ushijima
IPC分类号： B32B3/00 , H01L23/48
CPC分类号： G02B3/0025 , G02B3/0012 , G02B3/0031 , G02B3/0056 , Y10S428/901 , Y10T428/24917
摘要： In a method of fabricating an array of microstructures, a substrate with an electrically-conductive portion is provided, an insulating mask layer is formed on the electrically-conductive portion of the substrate, a plurality of openings are formed in the insulating mask layer to expose the electrically-conductive portion, and a first plated or electrodeposited layer is deposited in the openings and on the insulating mask layer by electroplating or electrodeposition. A second plated layer is further formed on the first plated or electrodeposited layer and on the electrically-conductive portion by electroless plating to reduce a size distribution of microstructures over the array.
摘要翻译：在制造微结构阵列的方法中，提供具有导电部分的衬底，在衬底的导电部分上形成绝缘掩模层，在绝缘掩模层中形成多个开口以露出导电部分和第一电镀或电沉积层通过电镀或电沉积沉积在开口中和绝缘掩模层上。在第一镀层或电沉积层上和通过无电镀处理导电部分上进一步形成第二镀层，以减小阵列上微结构的尺寸分布。

52. 发明申请

US20050140737A1 Beam, ink jet recording head having beams, and method for manufacturing ink jet recording head having beams 有权
标题翻译：光束，具有光束的喷墨记录头，以及具有光束的喷墨记录头的制造方法
公开(公告)号：US20050140737A1
公开(公告)日：2005-06-30
申请号：US11008101
申请日：2004-12-10
申请人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
发明人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B41J2/05 , B41J2/14 , B41J2/16 , B81B1/00
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1646 , Y10T428/24331 , Y10T428/24479 , Y10T428/24562 , Y10T428/2457 , Y10T428/24612
摘要： A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.
摘要翻译：一种具有单晶硅基材和至少一个突起的光束，其一体地形成为至少在其一端被支撑并且具有两个具有取向平面（111）的表面，该平面包括在平面中的底表面与基材的平面相同; 从所述底表面到所述突起的顶部穿透的凹槽; 以及对结晶各向异性蚀刻液具有抵抗性并覆盖所述槽的内壁的保护构件。

53. 发明授权

US06835443B2 Microstructure array, and a microlens array 失效
标题翻译：微结构阵列和微透镜阵列
公开(公告)号：US06835443B2
公开(公告)日：2004-12-28
申请号：US10449103
申请日：2003-06-02
申请人： Takayuki Teshima , Takayuki Yagi , Yasuhiro Shimada , Takashi Ushijima
发明人： Takayuki Teshima , Takayuki Yagi , Yasuhiro Shimada , Takashi Ushijima
IPC分类号： B32B300
CPC分类号： G02B3/0025 , G02B3/0012 , G02B3/0031 , G02B3/0056 , Y10S428/901 , Y10T428/24917
摘要： In a method of fabricating an array of microstructures, a substrate with an electrically-conductive portion is provided, an insulating mask layer is formed on the electrically-conductive portion of the substrate, a plurality of openings are formed in the insulating mask layer to expose the electrically-conductive portion, and a first plated or electrodeposited layer is deposited in the openings and on the insulating mask layer by electroplating or electrodeposition. A second plated layer is further formed on the first plated or electrodeposited layer and on the electrically-conductive portion by electroless plating to reduce a size distribution of microstructures over the array.
摘要翻译：在制造微结构阵列的方法中，提供具有导电部分的衬底，在衬底的导电部分上形成绝缘掩模层，在绝缘掩模层中形成多个开口以露出导电部分和第一电镀或电沉积层通过电镀或电沉积沉积在开口中和绝缘掩模层上。在第一镀层或电沉积层上和通过无电镀处理导电部分上进一步形成第二镀层，以减小阵列上微结构的尺寸分布。

54. 发明授权

US06800950B2 Microstructure array, mold for forming a microstructure array, and method of fabricating the same 失效
标题翻译：微结构阵列，用于形成微结构阵列的模具及其制造方法
公开(公告)号：US06800950B2
公开(公告)日：2004-10-05
申请号：US10232328
申请日：2002-09-03
申请人： Takayuki Teshima , Takashi Ushijima
发明人： Takayuki Teshima , Takashi Ushijima
IPC分类号： H01L23544
CPC分类号： H01L23/544 , H01L21/2885 , H01L2223/5442 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： In a fabrication method of a microstructure array, such as a mold for forming a microlens array, a first insulating mask layer is formed on a conductive portion of s substrate, an array of openings for the microstructure array and at least an opening for an alignment marker are formed in the first insulating mask layer during a common process to expose the conductive portion of the substrate at the openings, and first plated or electrodeposited layers are grown in the openings and on the first insulating mask layer using the conductive portion of the substrate as a cathode. The opening for the alignment marker is surrounded by the array of openings for the microstructure array, and a pattern of the opening for the alignment marker is determined such that a current density distribution at the time of electroplating or electrodeposition can be oppressed.
摘要翻译：在诸如用于形成微透镜阵列的模具的微结构阵列的制造方法中，第一绝缘掩模层形成在基板的导电部分上，用于微结构阵列的开口阵列和用于对准的至少一个开口在通常的工艺中，在第一绝缘掩模层中形成标记，以在开口处露出衬底的导电部分，并且使用衬底的导电部分在开口和第一绝缘掩模层上生长第一电镀或电沉积层作为阴极。用于对准标记的开口由用于微结构阵列的开口阵列包围，并且确定用于对准标记的开口的图案，使得可以抑制电镀或电沉积时的电流密度分布。

55. 发明授权

US06656393B2 Mold for forming a microlens and method of fabricating the same 失效
标题翻译：用于形成微透镜的模具及其制造方法
公开(公告)号：US06656393B2
公开(公告)日：2003-12-02
申请号：US09360455
申请日：1999-07-26
申请人： Takayuki Yagi , Yasuhiro Shimada , Takayuki Teshima , Takashi Ushijima
发明人： Takayuki Yagi , Yasuhiro Shimada , Takayuki Teshima , Takashi Ushijima
IPC分类号： B29D1100
CPC分类号： B29C33/42 , B29C33/3842 , B29D11/00365 , Y10S425/808
摘要： A mold for a microlens includes a substrate at least a portion of which is electrically conductive, such as an electrically-conductive substrate or a substrate with an electrode layer, an insulating mask layer formed on the substrate and including an opening or plural openings, and a plated layer electroplated in the opening and on the mask layer. A first condition that a diameter or width (&phgr;) of the opening has a relation of &phgr;≦0.35R, wherein (R) is a radius of curvature of the plated layer right above the opening, or a second condition that the diameter or width (&phgr;) of the opening is &phgr;≦10 &mgr;m, is met.
摘要翻译：用于微透镜的模具包括其导电性的至少一部分的基板，例如导电基板或具有电极层的基板，形成在基板上的绝缘掩模层，并且包括开口或多个开口，以及电镀在开口和掩模层上的镀层。第一条件是开口的直径或宽度（phi）具有phi <= 0.35R的关系，其中（R）是开口正上方的镀层的曲率半径，或第二条件，即直径或开口的宽度（phi）为phi <= 10um。

56. 发明授权

US06506623B2 Microstructure array, mold for forming a microstructure array, and method of fabricating the same 失效
公开(公告)号：US06506623B2
公开(公告)日：2003-01-14
申请号：US09949772
申请日：2001-09-12
申请人： Takayuki Teshima , Takashi Ushijima
发明人： Takayuki Teshima , Takashi Ushijima
IPC分类号： H01L2100
CPC分类号： H01L23/544 , H01L21/2885 , H01L2223/5442 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： In a fabrication method of a microstructure array, such as a mold for forming a microlens array, a first insulating mask layer is formed on a conductive portion of s substrate, an array of openings for the microstructure array and at least an opening for an alignment marker are formed in the first insulating mask layer during a common process to expose the conductive portion of the substrate at the openings, and first plated or electrodeposited layers are grown in the openings and on the first insulating mask layer using the conductive portion of the substrate as a cathode. The opening for the alignment marker is surrounded by the array of openings for the microstructure array, and a pattern of the opening for the alignment marker is determined such that a current density distribution at the time of electroplating or electrodeposition can be oppressed.

57. 发明授权

US5929004A Detergent for cleaning tire wheels and cleaning method 失效
标题翻译：洗涤剂用于清洁轮胎轮胎和清洁方法
公开(公告)号：US5929004A
公开(公告)日：1999-07-27
申请号：US948577
申请日：1997-10-10
申请人： Takashi Ushijima , Atsushi Ikeda , Seigo Shinohara , Tetsuo Kijima
发明人： Takashi Ushijima , Atsushi Ikeda , Seigo Shinohara , Tetsuo Kijima
IPC分类号： C11D1/12 , C11D1/22 , C11D1/37 , C11D3/02 , C11D3/30 , C11D3/40 , C11D11/00
CPC分类号： C11D3/046 , C11D1/37 , C11D11/0058 , C11D3/044 , C11D3/30 , C11D3/40 , C11D1/123 , C11D1/22
摘要： This invention there provides a detergent for cleaning tire wheels, which is applied in a foamy state onto the tire wheels, thereby allowing a grime adhered to the surface of the tire wheels to come off from the tire wheels, which contains a surfactant, at least one alkali compound selected from the group consisting of ammonia and amino group-containing alkali compounds, and a color change indicator capable of changing its own color when transferred from an alkaline condition to a neutral condition, in which the alkali compound is contained in the detergent in such an amount that the compound is eliminated from the detergent by reaction with carbon dioxide for the same period of time as required to release most amounts of grime from the surface of tire wheels, and a method of cleaning tire wheels with the detergent.
摘要翻译：本发明提供了一种用于清洁轮胎轮胎的洗涤剂，轮胎轮胎以泡沫状态施加到轮胎车轮上，从而允许粘附到轮胎车轮表面的污垢至少包含表面活性剂的轮胎车轮脱落一种选自氨和含氨基的碱性化合物的碱性化合物，以及当从碱性条件转移到中性条件时能够改变其自身颜色的变色指示剂，其中碱性化合物包含在洗涤剂中其量使得化合物通过与二氧化碳反应从与轮胎轮胎表面释放大量污垢所需的相同时间段从洗涤剂中除去，以及用洗涤剂清洁轮胎轮胎的方法。

58. 发明授权

US5131942A Method for producing molten metal from powder state ore 失效
标题翻译：从粉状态生产金属的方法
公开(公告)号：US5131942A
公开(公告)日：1992-07-21
申请号：US518333
申请日：1990-05-04
申请人： Hideshi Katayama , Takao Hamada , Shinobu Takeuchi , Takashi Ushijima , Hideyuki Momokawa , Hiroshi Itaya
发明人： Hideshi Katayama , Takao Hamada , Shinobu Takeuchi , Takashi Ushijima , Hideyuki Momokawa , Hiroshi Itaya
IPC分类号： C21B13/00 , C22B5/10
CPC分类号： C22B5/10 , C21B13/002 , Y02P10/265 , Y02P10/283
摘要： A method and apparatus for producing molten metal from powder state ore through smelting process to be performed in a shaft furnace, utilized the reducing material having grain size greater than that n-times of the gas flow velocity corresponding grain size to charge from the top of a shaft furnace for forming fluidized bed at the upper section of the furnace and a reducing material filled section below the fluidized bed. The method and apparatus for smelting the powder state ore also takes the reducing material having smaller grain size to be blown into the furnace through tuyeres.

59. 发明授权

US07833608B2 Beam, ink jet recording head having beams, and method for manufacturing ink jet recording head having beams 有权
标题翻译：光束，具有光束的喷墨记录头，以及具有光束的喷墨记录头的制造方法
公开(公告)号：US07833608B2
公开(公告)日：2010-11-16
申请号：US11835746
申请日：2007-08-08
申请人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
发明人： Takashi Ushijima , Takeo Yamazaki , Makoto Terui , Kazuhiro Hayakawa
IPC分类号： B32B3/00 , B41J2/05
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1646 , Y10T428/24331 , Y10T428/24479 , Y10T428/24562 , Y10T428/2457 , Y10T428/24612
摘要： A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.
摘要翻译：一种具有单晶硅基材和至少一个突起的光束，其一体地形成为至少在其一端被支撑并且具有两个具有取向平面（111）的表面，该平面包括在平面中的底表面与基材的平面相同; 从所述底表面到所述突起的顶部穿透的凹槽; 以及对结晶各向异性蚀刻液具有抵抗性并覆盖所述槽的内壁的保护构件。

60. 发明申请

US20060261034A1 Liquid discharge head and producing method therefor 失效
标题翻译：排液头及其制造方法
公开(公告)号：US20060261034A1
公开(公告)日：2006-11-23
申请号：US11436633
申请日：2006-05-19
申请人： Rei Kurashima , Takashi Ushijima , Koichiro Nakanishi
发明人： Rei Kurashima , Takashi Ushijima , Koichiro Nakanishi
IPC分类号： B41J3/00 , G01D15/00
CPC分类号： B41J2/14145 , B41J2/1404 , B41J2/14233 , B41J2/1603 , B41J2/161 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2002/14419
摘要： The invention is to suppress a loss in the rigidity of a substrate for a liquid discharge head having nozzles at a high density. The invention provides a liquid discharge head including plural pressure generating chambers respectively provided with pressure generating elements, plural nozzle apertures respectively communicating with the plural pressure generating chambers and adapted to discharge a liquid, and a reservoir with which the plural pressure generating chambers commonly communicate respectively through communicating parts, wherein the pressure generating chambers and the reservoir respectively have recessed portions formed respectively on one and the other of two principal planes of a same substrate, and the reservoir contains a portion shallower than a communicating part nearby area in the vicinity of the communicating part within the reservoir.
摘要翻译：本发明是为了抑制具有高密度喷嘴的液体排出头的基板的刚度的损失。本发明提供了一种液体排出头，其包括分别设置有压力产生元件的多个压力产生室，分别与多个压力发生室连通并适于排出液体的多个喷嘴孔，以及多个压力发生室共同连通的储存器通过连通部分，其中压力发生室和储存器分别具有分别形成在相同基板的两个主平面中的一个和另一个上的凹部，并且储存器包含比在邻近的连通部附近区域更浅的部分在水库内连通部分。

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