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51. 发明授权

US6087520A Preparation of 1,3-bis(3-aminopropyl)tetramethyldisiloxane 有权
标题翻译： 1,3-双（3-氨基丙基）四甲基二硅氧烷的制备
公开(公告)号：US6087520A
公开(公告)日：2000-07-11
申请号：US233452
申请日：1999-01-20
申请人： Tohru Kubota , Mikio Endo
发明人： Tohru Kubota , Mikio Endo
IPC分类号： B01J27/13 , C07B61/00 , C07F7/08 , C07F7/10 , C07F7/04
CPC分类号： C07F7/0874
摘要： By subjecting to hydrosilylation a hydrogendimethylalkoxysilane compound and an N-silylated allylamine compound in the presence of a platinum catalyst, adding an alcohol to the reaction product to effect desilylation reaction, and hydrolyzing the resulting 3-aminopropyldimethylalkoxysilane compound, 1,3-bis(3-aminopropyl)tetramethyldisiloxane is prepared. The end product free of isomers and of quality can be prepared through simple steps, at a low cost and in high yields.
摘要翻译：通过在铂催化剂存在下进行氢化硅烷化氢化二甲基烷氧基硅烷化合物和N-甲硅烷基化烯丙胺化合物，向反应产物中加入醇进行脱甲硅烷基化反应，并水解得到的3-氨基丙基二甲基烷氧基硅烷化合物1,3-双（3 氨基丙基）四甲基二硅氧烷。不含异构体和质量的最终产品可以通过简单的步骤以低成本和高产率制备。

52. 发明授权

US5451693A Tert-butyl cycloalkyl dialkoxysilane compounds and method for preparing same 失效
标题翻译：叔丁基环烷基二烷氧基硅烷化合物及其制备方法
公开(公告)号：US5451693A
公开(公告)日：1995-09-19
申请号：US301880
申请日：1994-09-07
申请人： Tohru Kubota , Akira Yamamoto , Muneo Kudo
发明人： Tohru Kubota , Akira Yamamoto , Muneo Kudo
IPC分类号： C04B41/49 , C07F7/18
CPC分类号： C07F7/188 , C04B41/4922 , C07F7/184 , C07F7/1876
摘要： Herein disclosed are a tert-butyl cycloalkyl dialkoxysilane compound which is quite useful as a water repellant for treating the surface of a variety of construction materials such as wood, concrete and marble and which can easily be used, and a method for preparing the compound. A Grignard reagent represented by the formula: R.sup.1 MgX is reacted with a silane compound represented by the formula: (CH.sub.3).sub.3 CSiH(OR.sup.2).sub.2. Then the resulting silane compound: (CH.sub.3).sub.3 CSiHR.sup.1 (OR.sup.2) is further reacted with an alcohol: R.sup.2 OH in the presence of a catalyst to give a tert-butyl cycloalkyl dialkoxysilane compound: (CH.sub.3).sub.3 CSiR.sup.1 (OR.sup.2).sub.2.
摘要翻译：本文公开了叔丁基环烷基二烷氧基硅烷化合物，其作为用于处理各种建筑材料如木材，混凝土和大理石的表面的防水剂是非常有用的，并且可以容易地使用，以及制备该化合物的方法。由式：R1MgX表示的格利雅试剂与由式（CH3）3CSiH（OR2）2表示的硅烷化合物反应。然后将得到的硅烷化合物：（CH3）3CSiHR1（OR2）与醇：R2OH在催化剂存在下进一步反应，得到叔丁基环烷基二烷氧基硅烷化合物：（CH3）3CSiR1（OR2）2。

53. 发明授权

US5425988A Recording and reproducing device which includes a protective film and a monomolecular fluoro organo silicon film 失效
标题翻译：包括保护膜和单分子氟有机硅膜的记录和再现装置
公开(公告)号：US5425988A
公开(公告)日：1995-06-20
申请号：US127288
申请日：1993-09-27
申请人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
发明人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
IPC分类号： B05D1/18 , C10M105/76 , C10M107/50 , C10N40/18 , G11B5/187 , G11B5/255 , G11B5/64 , G11B5/72 , G11B5/725 , G11B5/00
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , G11B5/255 , G11B5/72 , G11B5/725 , Y10S428/90 , Y10T428/261 , Y10T428/268 , Y10T428/3154 , Y10T428/31544 , Y10T428/31663
摘要： A recording and reproducing device is provided. The device comprises a recording medium, a head giving and receiving recording signals to or from the recording medium, and a mechanism section and a circuit section giving and receiving the recording signals, wherein at least one protective film, and at least one fluorine-containing monomolecular film are formed in this order on the recording layer of the recording medium or on the surface of the head which comes into contact with said recording layer, wherein said protective film is a metal film, oxidized metal film, semi-conductor film, oxidized semi-conductor film, or organic monomolecular film, and wherein said fluorine-containing monomolecular film is formed by the chemical adsorption of a specific-type of silane compound that contains a perfluoroalkyl group at the molecular end on the surface of the protective film.
摘要翻译：提供了一种记录和再现装置。该装置包括记录介质，向记录介质提供和接收记录信号的磁头，以及提供和接收记录信号的机构部分和电路部分，其中至少一个保护膜和至少一个含氟单分子膜依次形成在记录介质的记录层上或与记录层接触的头的表面上，其中所述保护膜是金属膜，氧化金属膜，半导体膜，氧化物半导体膜或有机单分子膜，并且其中所述含氟单分子膜通过在保护膜的表面上的分子末端的含有全氟烷基的特定类型的硅烷化合物的化学吸附而形成。

54. 发明授权

US5326895A 3-(vinylbenzyloxy)propylsilane compounds 失效
标题翻译： 3-（乙烯基苄氧基）丙基硅烷化合物
公开(公告)号：US5326895A
公开(公告)日：1994-07-05
申请号：US976845
申请日：1992-11-16
申请人： Tohru Kubota , Toshinobu Ishihara , Mikio Endo , Katsuhiro Uehara
发明人： Tohru Kubota , Toshinobu Ishihara , Mikio Endo , Katsuhiro Uehara
IPC分类号： C07F7/18 , C07F7/14 , C08F30/08 , C07F7/08
CPC分类号： C07F7/14 , C07F7/1832 , C08F30/08
摘要： 3-(Vinylbenzyloxy)propylsilane compounds represented by the general formula, CH.sub.2 CH.PHI. CH.sub.2 OCH.sub. CH.sub.2 CH.sub.2 SiR.sup.1.sub.n (OR.sup.2).sub.3-n (wherein R.sup.1 and R.sup.2 each represent a hydrocarbon residue containing 1 to 4 carbon atoms, and n represents an integer from 0 to 2) are provided as novel styrene skeleton-containing alkoxysilane compounds which are highly useful as silane coupling agent or polymerizing monomer.
摘要翻译：由通式CH 2 CH PHI CH 2 OCHCH 2 CH 2 SiRnn（OR 2）3-n表示的3-（乙烯基苄氧基）丙基硅烷化合物（其中R 1和R 2各自表示含有1至4个碳原子的烃基，n表示0的整数提供作为硅烷偶联剂或聚合单体非常有用的新型含苯乙烯骨架的烷氧基硅烷化合物。

55. 发明授权

US5254439A Light-sensitive polymer, method for preparing the same and method for forming patterns 失效
标题翻译：光敏聚合物，其制备方法和形成图案的方法
公开(公告)号：US5254439A
公开(公告)日：1993-10-19
申请号：US854696
申请日：1992-03-20
申请人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
发明人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
IPC分类号： C08G77/48 , C08G77/60 , G03F7/075 , G03F7/30
CPC分类号： C08G77/48 , C08G77/60 , G03F7/0754 , G03F7/0757 , Y10S430/146
摘要： There is disclosed a polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that are greater than trisilane bonds, sensitive to far ultraviolet rays. The polymer is prepared by polymerizing a dichlorosiloxane alone or with at least one dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet, and is suitable for preparing a single layered resist or an upper resist of a two-layered system.
摘要翻译：公开了具有对远紫外线敏感的线性-Si-O-Si键和-Si-Si-Si键或大于丙硅烷键的聚硅烷键的聚合物。聚合物是通过在惰性溶剂中在钠的存在下单独或与至少一种二氯硅烷聚合二氯硅烷来制备的。聚合物用氧等离子体进行氧化以形成耐氧干蚀刻的SiO 2，仅在远紫外线下显示吸收峰，并且适用于制备双层系统的单层抗蚀剂或上抗蚀剂。

56. 发明授权

US5126419A Light-sensitive polymer, method for preparing the same andmethod for forming patterns 失效
标题翻译：光敏聚合物，其制备方法和形成图案的方法
公开(公告)号：US5126419A
公开(公告)日：1992-06-30
申请号：US622152
申请日：1990-12-03
申请人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
发明人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
IPC分类号： C08G77/48 , C08G77/60 , G03F7/075
CPC分类号： G03F7/0754 , C08G77/48 , C08G77/60 , G03F7/0757
摘要： A polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds more than trisilane bonds, sensitive to far ultraviolet rays. The light-sensitive polymer can be prepared by copolymerizing a dichlorodisiloxane and a dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet and is suitable for preparing a single layered resist or an upper resist of a two layered resist system.
摘要翻译：具有线性-Si-O-Si-键和-Si-Si-Si-键的聚合物，或聚硅烷键多于丙硅烷键，对远紫外线敏感。感光性聚合物可以通过在惰性溶剂中在钠的存在下使二氯二硅氧烷和二氯硅烷共聚来制备。聚合物用氧等离子体进行氧化以形成耐氧干蚀刻的SiO 2，仅在远紫外线下表现出吸收峰，并且适用于制备双层抗蚀剂体系的单层抗蚀剂或上抗蚀剂。

57. 发明授权

US4921989A .OMEGA.silylalkynyl silane compound and method for preparation thereof 失效
标题翻译： OMEGA甲硅烷基炔基硅烷化合物及其制备方法
公开(公告)号：US4921989A
公开(公告)日：1990-05-01
申请号：US359897
申请日：1989-06-01
申请人： Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
发明人： Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
IPC分类号： C07F7/12 , C07F7/18
CPC分类号： B82Y30/00 , B82Y40/00 , C07F7/12 , C07F7/1832 , C07F7/1836
摘要： The novel organosilicon compound of the invention is an .omega.-silylalkynyl silane compound represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Si(CH.sub.3).sub.m X.sub.3-m, in which each R is, independently from the others, a hydrogen atom, lower alkyl group or aryl group, X is a halogen atom or a lower alkoxy group, the subscript m is 0,1 or 2 and the subscript n is an integer in the range from 10 to 30 which forms a uniform monomolecular layer on a substrate surface with silyl ethynyl groups arranged in alignment. The compound can be prepared by a Grignard reaction starting form an .omega.-silylalkynyl halide represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Y, in which R and n each have the same meaning as defined above and Y is a halogen atom, and a methyl alkoxy or halosilane of the formula (CH.sub.3).sub.m SiX.sub.4-m, in which X and m each have the same meaning as defined before.
摘要翻译：本发明的新型有机硅化合物是通式为R 3 SiC 3 CF（CH 2）n Si（CH 3）m X 3-m表示的ω-甲硅烷基炔基硅烷化合物，其中R各自独立地为氢原子，低级烷基基团或芳基，X为卤素原子或低级烷氧基，下标m为0,1或2，下标n为10〜30的整数，在基材表面上形成均匀的单分子层，甲硅烷基乙炔基排列成对齐。该化合物可以通过由通式R3SiC 3BOND C（CH2）nY表示的ω-甲硅烷基炔基卤化物的格利雅反应制备，其中R和n各自具有与上述相同的含义，Y是卤素原子，式（CH3）mSiX4-m的甲基烷氧基或卤代硅烷，其中X和m各自具有与上述相同的含义。

58. 发明授权

US4883569A Method for the preparation of a cycloalkyl silane compound 失效
标题翻译：环烷基硅烷化合物的制备方法
公开(公告)号：US4883569A
公开(公告)日：1989-11-28
申请号：US154691
申请日：1988-02-11
申请人： Mikio Endo , Minoru Takamizawa , Toshinobu Ishihara , Tohru Kubota , Toshio Shinohara
发明人： Mikio Endo , Minoru Takamizawa , Toshinobu Ishihara , Tohru Kubota , Toshio Shinohara
IPC分类号： C07F7/12 , C07B61/00 , C07F7/08 , C07F7/14 , C07F7/18
CPC分类号： C07F7/0801 , C07F7/14 , C07F7/1876
摘要： Cycloalkyl silane compound such as cyclohexyl methyl dichlorosilane can be efficiently prepared by the photochemically induced hydrosilylation reaction. For example, an equimolar mixture of cyclohexene and methyl dichlorosilane with admixture of a catalytic amount of an alcoholic solution of, chloroplatinic acid, is irradiated at a temperature up to 70.degree. C. with ultraviolet light so that the hydrosilylation reaction takes place and proceeds almost to completeness without deactivation of the platinum catalyst to give the desired product in a yield of 90% or even higher.

59. 发明申请

US20120264964A1 ALKOXYSILANE COMPOUNDS HAVING FLUOROALKYL GROUP AND METHOD OF PREPARING THE SAME 有权
标题翻译：具有氟代醇基的烷氧基化合物及其制备方法
公开(公告)号：US20120264964A1
公开(公告)日：2012-10-18
申请号：US13444254
申请日：2012-04-11
申请人： Takayuki Honma , Ayumu Kiyomori , Tohru Kubota , Daijitsu Harada , Hiroyuki Yamazaki , Masaki Takeuchi
发明人： Takayuki Honma , Ayumu Kiyomori , Tohru Kubota , Daijitsu Harada , Hiroyuki Yamazaki , Masaki Takeuchi
IPC分类号： C07F7/18
CPC分类号： C07F7/1804
摘要： Alkoxysilane compounds having two fluoroalkyl groups and represented by the formula (1): wherein Rf and Rf′ are each a fluoroalkyl group of 1 to 10 carbon atoms, R1 is a hydrogen atom or an aliphatic monovalent hydrocarbon group of 1 to 6 carbon atoms, R2 and R3 are each methyl group or ethyl group, X and Y are each an ether linkage or an ester linkage, a and b are each 0 or 1, m, n and p are each an integer of 0 to 6, q is an integer of 1 to 6, and r is an integer of 0 to 2. By treating an inorganic material with the alkoxysilane compound having ether linkage and two fluoroalkyl groups, high water and oil repellency and high sliding properties are imparted to the inorganic material. The alkoxysilane compounds are easily purified, owing to enhanced volatility by the branched structure.
摘要翻译：具有两个氟代烷基并由式（1）表示的烷氧基硅烷化合物：其中Rf和Rf'分别为1-10个碳原子的氟代烷基，R1是氢原子或1至6个碳原子的脂肪族单价烃基， R2和R3各自为甲基或乙基，X和Y各自为醚键或酯键，a和b各自为0或1，m，n和p各自为0至6的整数，q为 1〜6的整数，r为0〜2的整数。通过用具有醚键的烷氧基硅烷化合物和2个氟代烷基处理无机材料，赋予无机材料高拒油拒油性和高滑动性。由于分支结构的挥发性增强，烷氧基硅烷化合物容易纯化。

60. 发明申请

US20120121493A1 METHOD FOR PURIFYING CHLOROSILANES 有权
标题翻译：纯化氯霉素的方法
公开(公告)号：US20120121493A1
公开(公告)日：2012-05-17
申请号：US13386926
申请日：2010-07-07
申请人： Naoki Nagai , Takaaki Shimizu , Katsuhiro Uehara , Tohru Kubota
发明人： Naoki Nagai , Takaaki Shimizu , Katsuhiro Uehara , Tohru Kubota
IPC分类号： C01B33/107
CPC分类号： C01B33/10778
摘要： The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R—S—R′ (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R′ is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: RxSi(OR′)4-x (wherein R and R′ are each an alkyl group having 1 to 20 carbon atoms).
摘要翻译：本发明提供从含有硼杂质和磷杂质的氯硅烷中获得高纯度氯硅烷的方法。基于通过添加芳族醛的氯硅烷纯化产生固体副产物的结果是由铁离子或铁锈铁的催化反应产生的，将具有掩蔽效应的路易斯碱加入到氯硅烷中。路易碱碱的实例包括二价含硫化合物和烷氧基硅烷。二价含硫化合物优选为由下式表示的化合物：R-S-R'（其中R为烃基或羰基; R和R'中的碳原子总数为7以上）烷氧基硅烷优选为下式所示的化合物：RxSi（OR'）4-x（式中，R和R'分别为碳原子数为1〜20的烷基）。

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