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    • 53. 发明授权
    • Liquid crystal display panel and manufacturing method thereof
    • 液晶显示面板及其制造方法
    • US06803975B2
    • 2004-10-12
    • US10201789
    • 2002-07-25
    • Woong-Kwon KimSeung-Ryul Park
    • Woong-Kwon KimSeung-Ryul Park
    • G02F1136
    • G02F1/133514G02F2001/133354G02F2001/136222G02F2201/40
    • The present invention discloses an array substrate for use in a liquid crystal display device, which includes a transparent substrate that includes a display area and a non-display area. A plurality of red, green and blue color filters are formed on the transparent substrate in the display area. A first alignment key is formed on the transparent substrate in the non-display area and made of the same material as the color filters. An overcoat layer is formed on the plurality of red, green and blue color filters to cover the color filters in the display area. A passivation layer covers gate and data lines and a thin film transistor in the display area and covers the first alignment key in the non-display area, the passivation layer having a drain contact hole to the thin film transistor. A pixel electrode is formed on the passivation layer in the display area, the pixel electrode contacting the thin film transistor through the drain contact hole.
    • 本发明公开了一种液晶显示装置中使用的阵列基板,其包括具有显示区域和非显示区域的透明基板。 在显示区域中的透明基板上形成多个红色,绿色和蓝色滤色器。 第一对准键形成在非显示区域的透明基板上,由与滤色器相同的材料制成。 在多个红色,绿色和蓝色滤色器上形成覆盖层以覆盖显示区域中的滤色器。 钝化层覆盖显示区域中的栅极和数据线以及薄膜晶体管,并覆盖非显示区域中的第一对准键,钝化层具有到薄膜晶体管的漏极接触孔。 像素电极形成在显示区域的钝化层上,像素电极通过漏极接触孔与薄膜晶体管接触。
    • 54. 发明授权
    • Transflective liquid crystal display device and method of fabricating the same
    • 反射式液晶显示装置及其制造方法
    • US06654076B2
    • 2003-11-25
    • US10179394
    • 2002-06-26
    • Kyoung-Su HaWoong-Kwon KimDong-Guk Kim
    • Kyoung-Su HaWoong-Kwon KimDong-Guk Kim
    • G02F1368
    • G02F1/133555G02F1/133512G02F1/136227
    • The invention relates to an array substrate for use in a transflective liquid crystal display device that has a high contrast ratio. The array substrate includes a first light-shielding pattern on a substrate, which is made of the same material as a gate electrode. The array substrate further includes a second light-shielding pattern that is made of the same material as an active layer in the same process step. These first and second light-shielding patterns are disposed in a border portion between the transmissive portion and the reflective portion, where the liquid crystal molecules are misaligned and the light is distorted. The first and second light-shielding pattern prevents the light leakage occurring in the border region between the transmissive portion and the reflective portion, thereby increasing the contrast ratio of the transflective LCD device.
    • 本发明涉及一种具有高对比度的半透射型液晶显示装置中使用的阵列基板。 阵列基板包括由与栅电极相同的材料制成的基板上的第一遮光图案。 阵列基板还包括在相同的工艺步骤中由与有源层相同的材料制成的第二遮光图案。 这些第一和第二遮光图案设置在透射部分和反射部分之间的边界部分,其中液晶分子不对准并且光线变形。 第一和第二光屏蔽图案防止在透射部分和反射部分之间的边界区域中发生的光泄漏,从而增加透反射LCD装置的对比度。
    • 55. 发明授权
    • Thin film transistor assembly, particularly suitable for liquid crystal display device, and process for fabricating the same
    • 薄膜晶体管组件,特别适用于液晶显示装置及其制造方法
    • US06512243B1
    • 2003-01-28
    • US09686814
    • 2000-10-12
    • Joo-Young KimWoong-Kwon KimYoung-Jin Oh
    • Joo-Young KimWoong-Kwon KimYoung-Jin Oh
    • H01L29104
    • H01L29/66765G02F1/1345G02F1/13458
    • A method of fabricating a thin film transistor (TFT) assembly having a plurality of array lines, a plurality of pads, a plurality of link lines connecting the pads to the array lines, an insulating layer, and an electrode pattern formed on a substrate, and further having short-preventing structures for preventing electrical shorts between the pads and the link lines. The method includes the steps of forming the plurality of pads on the substrata, depositing the insulating layer on the substrate including over the pads, etching the insulating layer, to form contact holes, and etching the insulating layer between the adjacent pads to expose a surface of the substrate to prevent a short between the adjacent pads from occurring, and forming the electrode pattern on the insulating layer by depositing and patterning an electrode layer such that the electrode pattern contacts the pads through the contact holes formed in the insulating layer. The steps of etching the insulating layer between the adjacent pads is performed concurrently with the etching step for forming the contact holes. In addition, the areas between adjacent pads are further etched concurrently with the step of etching the electrode layer.
    • 一种制造具有多个阵列线的薄膜晶体管(TFT)组件的方法,多个焊盘,将焊盘连接到阵列线的多个连接线,绝缘层和形成在基板上的电极图案, 并且还具有用于防止焊盘和连接线之间的电短路的防短路结构。 该方法包括以下步骤:在基底上形成多个焊盘,在包括焊盘的衬底上沉积绝缘层,蚀刻绝缘层,形成接触孔,并蚀刻相邻焊盘之间的绝缘层以暴露表面 以防止发生相邻焊盘之间的短路;以及通过沉积和构图电极层,使电极图案通过形成在绝缘层中的接触孔接触焊盘而在绝缘层上形成电极图案。 蚀刻相邻焊盘之间的绝缘层的步骤与用于形成接触孔的蚀刻步骤同时进行。 此外,在蚀刻电极层的步骤的同时进一步蚀刻相邻焊盘之间的区域。