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    • 7. 发明授权
    • Manufacturing method of array substrate for liquid crystal display device with color filter layer on thin film transistor
    • 在薄膜晶体管上具有滤色器层的液晶显示装置的阵列基板的制造方法
    • US07858452B2
    • 2010-12-28
    • US12559433
    • 2009-09-14
    • Jong-Jin Park
    • Jong-Jin Park
    • H01L21/00H01L21/84
    • H01L27/1288G02F1/13458G02F1/136209G02F1/136227G02F2001/136222H01L27/1214H01L27/124
    • A method of manufacturing a liquid crystal display device includes forming a gate line and a gate electrode on a substrate, forming a gate insulating layer on substantially an entire surface of the substrate, forming an active layer, an ohmic contact layer, a source electrode, a drain electrode and a data line on the gate insulating layer, forming a black matrix on the first passivation layer, forming a color filter layer on the first passivation layer in the pixel region, forming a second passivation layer on substantially an entire surface of the substrate, forming a photoresist pattern to expose the second passivation layer, removing the exposed second passivation and removing a portion of the first passivation layer contacting the second passivation layer, forming a transparent conductive layer on substantially an entire surface of the substrate, and forming a pixel electrode in the pixel region by removing the photoresist pattern and the transparent conductive layer on the photoresist pattern.
    • 一种制造液晶显示装置的方法包括在基板上形成栅极线和栅电极,在基板的基本整个表面上形成栅极绝缘层,形成有源层,欧姆接触层,源电极, 在栅极绝缘层上的漏电极和数据线,在第一钝化层上形成黑矩阵,在像素区域的第一钝化层上形成滤色器层,在第一钝化层的基本上整个表面上形成第二钝化层 衬底,形成光致抗蚀剂图形以暴露第二钝化层,去除暴露的第二钝化并去除与第二钝化层接触的第一钝化层的一部分,在基底的基本上整个表面上形成透明导电层,并形成 通过去除光致抗蚀剂图案和光电上的透明导电层,在像素区域中形成像素电极 sist模式