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51. 发明申请

US20080113281A1 Filter Device for the Compensation of an Asymmetric Pupil Illumination 有权
标题翻译：用于补偿不对称瞳孔照明的滤波器装置
公开(公告)号：US20080113281A1
公开(公告)日：2008-05-15
申请号：US11722631
申请日：2005-08-25
申请人： Manfred Maul , Damian Fiolka
发明人： Manfred Maul , Damian Fiolka
IPC分类号： G03F1/00 , G03F7/00
CPC分类号： G02B26/008 , G01J1/0488 , G02B27/0933 , G02B27/0994 , G03F7/70091 , G03F7/70191
摘要： The invention relates to a filter device for an illumination system, especially for the correction of the illumination of the illuminating pupil, including a light source, with the illumination system being passed through by a bundle of illuminating rays from the light source to an object plane, with the bundle of illuminating rays impinging upon the filter device, including at least one filter element which can be introduced into the beam path of the bundle of illuminating rays, with the filter element including an actuating device, so that the filter element can be brought with the help of the actuating device into the bundle of illuminating rays.
摘要翻译：本发明涉及一种用于照明系统的过滤装置，特别是用于校正包括光源的照明光瞳的照明，照明系统通过一束照明光线从光源穿过到物平面具有撞击在过滤装置上的一束照明光线，包括至少一个能够被引入照明光束的光束路径中的过滤元件，过滤元件包括致动装置，使得过滤元件可以是在致动装置的帮助下带入照明光束。

52. 发明申请

US20070217013A1 OPTICAL SYSTEM OF AN ILLUMINATION DEVICE OF A PROJECTION EXPOSURE APPARATUS 有权
标题翻译：投影曝光装置照明装置的光学系统
公开(公告)号：US20070217013A1
公开(公告)日：2007-09-20
申请号：US11685620
申请日：2007-03-13
申请人： Karl-Heinz Schuster , Juergen Hartmaier , Manfred Maul , Dieter Schmerek , Detlev Mueller , Otto Hahnemann , Frank Marianek , Gundula Weiss , Damian Fiolka
发明人： Karl-Heinz Schuster , Juergen Hartmaier , Manfred Maul , Dieter Schmerek , Detlev Mueller , Otto Hahnemann , Frank Marianek , Gundula Weiss , Damian Fiolka
IPC分类号： G02B5/18
CPC分类号： G03F7/70075 , G02B1/02 , G02B1/08 , G02B3/005 , G02B3/0068 , G02B5/1823 , G02B5/1833 , G02B5/1838 , G02B5/1866 , G03B27/72 , G03F7/70158 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, comprising at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.
摘要翻译：本发明涉及一种微光刻投影曝光装置的照明装置的光学系统，其包括至少一个第一光电导增量元件，其具有沿共同的第一优选方向延伸的多个衍射或折射的光束偏转结构，电导增加元件具有光学单轴晶体材料，使得晶体材料的光学晶体轴基本上平行或基本垂直于第一优选方向。

53. 发明申请

US20060290913A1 Microlithography exposure method and projection exposure apparatus for carrying out the method 审中-公开
标题翻译：微光曝光方法和投影曝光装置进行该方法
公开(公告)号：US20060290913A1
公开(公告)日：2006-12-28
申请号：US11475871
申请日：2006-06-28
申请人： Nils Dieckmann , Manfred Maul
发明人： Nils Dieckmann , Manfred Maul
IPC分类号： G03B27/42
CPC分类号： G03F7/70308 , G03F7/70566
摘要： In an exposure method for producing an image of a pattern, arranged in the object surface of a projection objective, in the image surface of the projection objective, the mask is illuminated with illumination radiation with the aid of the illumination system. The radiation varied by the mask and which enters the projection objective is thereby produced downstream of the mask. The projection objective is transirradiated with this radiation. An astigmatic variation of the radiation varied by the mask is effected in the region of at least one pupil surface of the projection objective, the astigmatic variation being designed such that an anisotropy of properties of the radiation striking the image surface that leads to direction-dependent contrast differences is at least partially compensated. The astigmatic variation can be achieved, for example, with the aid of an elliptical diaphragm or an elliptical transmission filter.
摘要翻译：在布置在投影物镜的物体表面上的图形图像的曝光方法中，在投影物镜的图像表面中，借助于照明系统照射照射的掩模。由掩模变化并进入投影物镜的辐射由此在掩模的下游产生。投射物镜用这种辐射进行辐照。由掩模变化的辐射的散光变化在投影物镜的至少一个瞳孔表面的区域中进行，散光变化被设计成使得射入图像表面的辐射的各向异性导致方向依赖对比差异至少部分得到补偿。像散变化可以例如借助椭圆形光阑或椭圆形透射滤光片来实现。

54. 发明申请

US20060268251A1 Illumination system for a microlithographic projection exposure apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20060268251A1
公开(公告)日：2006-11-30
申请号：US10564639
申请日：2004-07-15
申请人： Markus Deguenther , Manfred Maul , Damian Fiolka
发明人： Markus Deguenther , Manfred Maul , Damian Fiolka
IPC分类号： G03B27/54
CPC分类号： G03F7/70058 , G03F7/70066 , G03F7/70158 , G03F7/70191
摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (12) for generating a projection light beam, a first objective (20) and a masking system (38, 52) for masking a reticle (30). The masking system (38, 52) includes adjustable first blades (40) for masking in a first spatial direction (X) and adjustable second blades (54, 56) for masking in a second spatial direction (Y). The first blades (40) are arranged in the region of a first field plane (36) and the second blades (54, 56) are arranged in the region of a second field plane (44) which is different to the first field plane (36). The masking system can therefore be made spatially less concentrated, whereby constructional difficulties in the region of the field plane before the masking objective resulting from space requirement problems are reduced. A further contribution is made to solving the space requirement problem if an attenuation system for achieving the most uniform possible light intensity in the wafer plane (122) includes a transmission filter (162) which has locally varying transmissivity and can be moved synchronously with traversing movements of the reticle (30).
摘要翻译：用于微光刻投影曝光装置的照明系统包括用于产生投影光束的光源（12），用于掩蔽掩模（30）的第一物镜（20）和掩蔽系统（38,52）。掩蔽系统（38,52）包括可调节的第一叶片（40），用于在第一空间方向（X）和第二空间方向（Y）上遮蔽的可调节的第二叶片（54,56）进行掩蔽。第一叶片（40）布置在第一场平面（36）的区域中，并且第二叶片（54,56）布置在与第一场平面不同的第二场平面（44）的区域中 36）。因此，掩蔽系统可以在空间上较少地集中，由此减少了由空间需求问题导致的掩蔽目标之前的场平面区域中的构造困难。如果用于在晶片平面（122）中实现最均匀可能的光强度的衰减系统包括具有局部变化的透射率的传输滤波器（162）并且可以与横移运动同步地移动，则进一步作出了解决空间需求问题的贡献的标线（30）。

55. 发明授权

US07126765B2 Objective with fluoride crystal lenses 有权
公开(公告)号：US07126765B2
公开(公告)日：2006-10-24
申请号：US11029788
申请日：2005-01-05
申请人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
发明人： Daniel Krähmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christof Zaczek
IPC分类号： G02B17/00 , G02B13/14
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

56. 发明申请

US20050264786A1 Projection lens and microlithographic projection exposure apparatus 有权
公开(公告)号：US20050264786A1
公开(公告)日：2005-12-01
申请号：US11101235
申请日：2005-04-07
申请人： Martin Brunotte , Jurgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
发明人： Martin Brunotte , Jurgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
IPC分类号： G02B7/02 , G02B1/02 , G02B5/30 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

57. 发明授权

US5504620A Device for dividing an optical beam 失效
标题翻译：用于分割光束的装置
公开(公告)号：US5504620A
公开(公告)日：1996-04-02
申请号：US50219
申请日：1993-07-16
申请人： Manfred Maul
发明人： Manfred Maul
IPC分类号： G02B27/14 , G02B5/30 , G02B27/28
CPC分类号： G02B27/145
摘要： An optical beam-dividing device divides an optical beam into first and second sub-beams. A first prism has an entry face for an optical beam incident thereon. A first exit face is provided at which the first sub-beam exits. A second prism is provided adjoining the first prism at a first optical beam splitter. The second prism has a second exit face at which the second sub-beam exits. A third prism adjoins the second prism at a second optical beam splitter. The third prism has a reflection face opposite the second splitter. The second exit face has a third optical beam splitter thereat. The reflection face has a mirror aligned substantially perpendicular relative to the optical axis and has a circular-to-linear optical beam converter thereat. The various parts of the device are geometrically positioned relative to one another so that the optical beam entering the entry face is split into the first and second sub-beams for exiting from opposite sides of the device and so that each sub-beam undergoes an even number of reflections.
摘要翻译： PCT No.PCT / DE92 / 00624 Sec。 371日期：1993年7月16日 102（e）日期1993年7月16日PCT提交1992年7月30日PCT公布。出版物WO93 / 05427 日期：1993年3月18日。光束分割装置将光束分成第一和第二子光束。第一棱镜具有入射到其上的光束的入射面。提供第一出射面，第一子光束离开该第一出射面。在第一光束分离器处邻接第一棱镜设置第二棱镜。第二棱镜具有第二出射面，第二子光束出射。在第二光束分离器处，第三棱镜邻接第二棱镜。第三棱镜具有与第二分离器相对的反射面。第二出射面具有第三光束分离器。反射面具有相对于光轴基本垂直地对准的反射镜，并且在其上具有圆形至线性的光束转换器。装置的各部分相对于彼此几何地定位，使得进入入射面的光束被分成第一和第二子光束，用于从装置的相对侧离开，并且使得每个子光束经受均匀反射次数

58. 发明授权

US08891057B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US08891057B2
公开(公告)日：2014-11-18
申请号：US12818501
申请日：2010-06-18
申请人： Michael Layh , Markus Deguenther , Michael Patra , Johannes Wangler , Manfred Maul , Damian Fiolka , Gundula Weiss
发明人： Michael Layh , Markus Deguenther , Michael Patra , Johannes Wangler , Manfred Maul , Damian Fiolka , Gundula Weiss
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/702 , G02B5/09 , G02B26/105 , G03F7/70116 , G03F7/7055 , G03F7/70583
摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.
摘要翻译：公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下，和/或在极平衡小于2％的情况下。

59. 发明授权

US08246211B2 Filter device for the compensation of an asymmetric pupil illumination 有权
标题翻译：用于补偿不对称瞳孔照明的过滤装置
公开(公告)号：US08246211B2
公开(公告)日：2012-08-21
申请号：US13215910
申请日：2011-08-23
申请人： Manfred Maul , Damian Fiolka
发明人： Manfred Maul , Damian Fiolka
IPC分类号： F21V9/00 , G03B27/68
CPC分类号： G02B26/008 , G01J1/0488 , G02B27/0933 , G02B27/0994 , G03F7/70091 , G03F7/70191
摘要： The invention relates to a filter device for an illumination system, especially for the correction of the illumination of the illuminating pupil, including a light source, with the illumination system being passed through by a bundle of illuminating rays from the light source to an object plane, with the bundle of illuminating rays impinging upon the filter device, including at least one filter element which can be introduced into the beam path of the bundle of illuminating rays, with the filter element including an actuating device, so that the filter element can be brought with the help of the actuating device into the bundle of illuminating rays.
摘要翻译：本发明涉及一种用于照明系统的过滤装置，特别是用于校正包括光源的照明光瞳的照明，照明系统通过一束照明光线从光源穿过到物平面具有撞击在过滤装置上的一束照明光线，包括至少一个能够被引入照明光束的光束路径中的过滤元件，过滤元件包括致动装置，使得过滤元件可以是在致动装置的帮助下带入照明光束。

60. 发明授权

US08025427B2 Filter device for the compensation of an asymmetric pupil illumination 有权
标题翻译：用于补偿不对称瞳孔照明的过滤装置
公开(公告)号：US08025427B2
公开(公告)日：2011-09-27
申请号：US12855305
申请日：2010-08-12
申请人： Manfred Maul , Damian Fiolka
发明人： Manfred Maul , Damian Fiolka
IPC分类号： F21V9/00 , G03B27/68
CPC分类号： G02B26/008 , G01J1/0488 , G02B27/0933 , G02B27/0994 , G03F7/70091 , G03F7/70191
摘要： The invention relates to a filter device for an illumination system, especially for the correction of the illumination of the illuminating pupil, including a light source, with the illumination system being passed through by a bundle of illuminating rays from the light source to an object plane, with the bundle of illuminating rays impinging upon the filter device, including at least one filter element which can be introduced into the beam path of the bundle of illuminating rays, with the filter element including an actuating device, so that the filter element can be brought with the help of the actuating device into the bundle of illuminating rays.
摘要翻译：本发明涉及一种用于照明系统的过滤装置，特别是用于校正包括光源的照明光瞳的照明，照明系统通过一束照明光线从光源穿过到物平面具有撞击在过滤装置上的一束照明光线，包括至少一个能够被引入照明光束的光束路径中的过滤元件，过滤元件包括致动装置，使得过滤元件可以是在致动装置的帮助下带入照明光束。

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