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51. 发明授权

US07718344B2 Resist composition and pattern forming method using the same 有权
标题翻译：抗蚀剂组合物和图案形成方法使用其
公开(公告)号：US07718344B2
公开(公告)日：2010-05-18
申请号：US11864049
申请日：2007-09-28
申请人： Sou Kamimura , Kenji Wada , Yasutomo Kawanishi
发明人： Sou Kamimura , Kenji Wada , Yasutomo Kawanishi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： A resist composition, includes: (B) a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and (Z) a compound containing a sulfonium cation having a structure represented by formula (Z-1): wherein Y1 to Y13 each independently represents a hydrogen atom or a substituent, and adjacent members of Y1 to Y13 may combine with each other to form a ring; and Z represents a single bond or a divalent linking group.
摘要翻译：抗蚀剂组合物包括：（B）具有能够在酸的作用下分解并且重均分子量为1,000至5,000的基团的聚合物，其在碱性显影剂中的溶解度在酸的作用下增加; 和（Z）含有具有由式（Z-1）表示的结构的锍阳离子的化合物：其中Y 1至Y 13各自独立地表示氢原子或取代基，并且Y 1至Y 13的相邻成员可以相互结合形成戒指; Z表示单键或二价连接基团。

52. 发明授权

US07695891B2 Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition 有权
标题翻译：感光组合物，使用光敏组合物的图案形成方法和用于感光组合物中的化合物
公开(公告)号：US07695891B2
公开(公告)日：2010-04-13
申请号：US11471713
申请日：2006-06-21
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： G03F7/004 , C07C309/00
CPC分类号： C07C309/80 , C07C311/48 , C07C381/12 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/122 , Y10S430/124 , Y10S430/126
摘要： A photosensitive composition comprising a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; a compound having a specific structure; and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.
摘要翻译：一种光敏组合物，其包含能够在用光化射线或辐射照射时产生具有特定结构的化合物的化合物; 使用该感光性组合物的图案形成方法; 具有特定结构的化合物; 以及能够在用光化射线或辐射照射时产生具有特定结构的化合物的化合物。

53. 发明授权

US07615330B2 Positive resist composition and pattern formation method using the same 有权
标题翻译：正型抗蚀剂组成和使用其的图案形成方法
公开(公告)号：US07615330B2
公开(公告)日：2009-11-10
申请号：US11727267
申请日：2007-03-26
申请人： Sou Kamimura , Tomoya Sasaki , Yasutomo Kawanishi , Kenji Wada
发明人： Sou Kamimura , Tomoya Sasaki , Yasutomo Kawanishi , Kenji Wada
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/122 , Y10S430/123
摘要： A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.
摘要翻译：含有具有本文定义的式（ZI）所示结构的锍阳离子的化合物的正性抗蚀剂组合物，通过酸的作用增加在碱性显影液中的溶解度的低分子量化合物和产生在通过光化射线或辐射照射时具有如本文所定义的式（AI）表示的结构的化合物。

54. 发明授权

US07544973B2 Miniature optical element for wireless bonding in an electronic instrument 有权
标题翻译：微型光学元件，用于电子仪器中的无线键合
公开(公告)号：US07544973B2
公开(公告)日：2009-06-09
申请号：US11896708
申请日：2007-09-05
申请人： Kenji Wada
发明人： Kenji Wada
IPC分类号： H01L33/00 , H01L31/0232 , H01L23/48
CPC分类号： H01L27/14683 , H01L21/76898 , H01L23/481 , H01L24/48 , H01L24/73 , H01L27/14618 , H01L27/1462 , H01L27/14621 , H01L27/14627 , H01L27/14632 , H01L27/14636 , H01L27/14687 , H01L31/0203 , H01L31/18 , H01L33/382 , H01L2224/32225 , H01L2224/48227 , H01L2224/48465 , H01L2224/73265 , H01L2924/00014 , H01L2924/00015 , H01L2924/01013 , H01L2924/01029 , H01L2924/01046 , H01L2924/01057 , H01L2924/01078 , H01L2924/01079 , H01L2924/12042 , H01L2924/15153 , H01L2924/15165 , H01L2924/15312 , H01L2924/16195 , H01L2924/3025 , H01L2933/0016 , Y10S257/911 , H01L2924/00 , H01L2924/00012 , H01L2224/45099 , H01L2224/85399 , H01L2224/05599 , H01L2224/45015 , H01L2924/207
摘要： A method of manufacturing an optical element including the steps of: forming a through hole in a semiconductor element which has an optical section and an electrode electrically connected to the optical section; and forming a conductive layer extending from a first surface of the semiconductor element on which the optical section is formed, through an inner wall surface of the through hole, to a second surface opposite to the first surface.
摘要翻译：一种制造光学元件的方法，包括以下步骤：在具有光学部分和电连接到光学部分的电极的半导体元件中形成通孔; 以及形成从其上形成有所述光学部分的所述半导体元件的第一表面延伸穿过所述通孔的内壁表面到与所述第一表面相对的第二表面的导电层。

55. 发明申请

US20090017400A1 PATTERN FORMING METHOD 审中-公开
标题翻译：图案形成方法
公开(公告)号：US20090017400A1
公开(公告)日：2009-01-15
申请号：US12140119
申请日：2008-06-16
申请人： Shinji Tarutani , Kenji Wada , Hideaki Tsubaki
发明人： Shinji Tarutani , Kenji Wada , Hideaki Tsubaki
IPC分类号： G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2022 , G03F7/2041
摘要： A pattern forming method, includes: exposing a resist film with actinic rays or radiation a plurality of times; and heating the resist film at a first temperature in at least one interval between the exposures.
摘要翻译：一种图案形成方法，包括：用光化射线或辐射多次曝光抗蚀剂膜; 以及在所述曝光之间的至少一个间隔中以第一温度加热所述抗蚀剂膜。

56. 发明申请

US20080289150A1 Method of Purifying Metal 有权
标题翻译：净化金属的方法
公开(公告)号：US20080289150A1
公开(公告)日：2008-11-27
申请号：US11631287
申请日：2005-07-04
申请人： Kenji Wada , Toshiaki Fukuyama , Ryotatsu Otsuka
发明人： Kenji Wada , Toshiaki Fukuyama , Ryotatsu Otsuka
IPC分类号： B01D9/00
CPC分类号： C22B9/02 , C01B33/037 , C22B61/00 , Y02P10/234
摘要： A method for purifying a metal, which includes: a first step of holding a first molten metal containing impurities in a first crucible; a second step of immersing a first cooling body in the first molten metal held in the first crucible while letting a cooling fluid flow in the interior of the cooling body to crystallize a first purified metal on a surface of the cooling body; a third step of taking out the first cooling body with the first purified metal crystallized thereon from the first molten metal; a fourth step of holding in a crucible a second molten metal having an impurity concentration less than that of the first molten metal of the first step; a fifth step of melting the first purified metal crystallized in the second step and holding the molten metal in a second crucible together with the second molten metal held in the fourth step; a sixth step of immersing a second cooling body in the second molten metal held in the fifth step while letting a cooling fluid flow in the interior of the cooling body to crystallize a second purified metal on a surface of the cooling body; and a seventh step of taking out the second cooling body with the second purified metal crystallized thereon in the sixth step from the second molten metal.
摘要翻译：一种净化金属的方法，其特征在于包括：将含有杂质的第一熔融金属保持在第一坩埚中的第一步骤; 将第一冷却体浸入保持在第一坩埚中的第一熔融金属中，同时使冷却流体在冷却体的内部流动使第一纯化金属在冷却体的表面上结晶的第二步骤; 第三步骤，从第一熔融金属取出第一冷却体，其中结晶有第一纯化金属; 在坩埚中保持杂质浓度小于第一步骤的第一熔融金属的第二熔融金属的第四步骤; 熔化在第二步骤中结晶的第一纯化金属并将熔融金属与保持在第四步骤中的第二熔融金属一起保持在第二坩埚中的第五步骤; 将第二冷却体浸渍在第五工序中保持的第二熔融金属中，同时使冷却液在冷却体内流动，使第二纯化金属在冷却体的表面上结晶的第六工序; 以及第七步骤，从第二熔融金属在第六步骤中从第二冷却体中取出第二纯化金属在其上结晶化。

57. 发明申请

US20080165963A1 RECEIVING APPARATUS 审中-公开
标题翻译：接收装置
公开(公告)号：US20080165963A1
公开(公告)日：2008-07-10
申请号：US11959591
申请日：2007-12-19
申请人： Kenji Wada , Hitoshi Akiyama
发明人： Kenji Wada , Hitoshi Akiyama
IPC分类号： H04N7/167
CPC分类号： H04N7/163 , H04N7/1675 , H04N21/4334 , H04N21/4405 , H04N21/4424 , H04N21/458 , H04N21/472
摘要： For enabling a counter-program recording when viewing a program, with only one (1) system of POD, a digital broadcast receiving apparatus, for receiving information being scrambled or coded, comprises a display unit for displaying the information being scrambled or coded thereon, a recording unit for recording the information being scrambled or coded, therein; and a controller unit for setting up timing for releasing the information recorded in the recording unit from scrambling or coding thereof, thereby achieving recording of the counter-program, by recording the contents while being descrambled, when recoding the counter-program during when viewing the program, and turning back the stream into POD when a user does not use the receiving apparatus or upon an operation of the user, so as to re-record that descrambled therein.
摘要翻译：为了在观看节目时启用计数器记录，仅使用一个（1）POD系统，用于接收被加密或编码的信息的数字广播接收装置包括：显示单元，用于显示被加扰或编码的信息，用于记录被加扰或编码的信息的记录单元; 以及控制器单元，用于设置用于释放记录在记录单元中的信息的定时以对其进行加扰或编码，从而通过在解密期间记录内容来实现对计数器的记录，当在查看程序，并且当用户不使用接收设备或用户的操作时将流转回POD，以便重新记录其中解扰的流。

58. 发明申请

US20080081290A1 RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION 有权
标题翻译：耐腐蚀组合物，用于组合物中的树脂，用于合成树脂的化合物和使用抗蚀剂组合物的图案形成方法
公开(公告)号：US20080081290A1
公开(公告)日：2008-04-03
申请号：US11860585
申请日：2007-09-25
申请人： Kenji Wada , Hiroshi Saegusa
发明人： Kenji Wada , Hiroshi Saegusa
IPC分类号： G03C1/73
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/111
摘要： A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×104 or less.
摘要翻译：抗蚀剂组合物包含：（A）能够通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）具有氟原子和硅原子中的至少一个的树脂; 和（D）溶剂，其中树脂（C）的分子量分散度为1.3以下，重均分子量为1.0×10 4以下。

59. 发明授权

US07250377B2 Multi-layered structure forming method, method of manufacturing wiring substrate, and method of manufacturing electronic apparatus 有权
标题翻译：多层结构形成方法，布线基板的制造方法以及电子设备的制造方法
公开(公告)号：US07250377B2
公开(公告)日：2007-07-31
申请号：US11201100
申请日：2005-08-11
申请人： Tsuyoshi Shintate , Toshiaki Mikoshiba , Kenji Wada , Kazuaki Sakurada , Jun Yamada
发明人： Tsuyoshi Shintate , Toshiaki Mikoshiba , Kenji Wada , Kazuaki Sakurada , Jun Yamada
IPC分类号： H01L21/31
CPC分类号： H05K3/4664 , H05K3/125 , H05K2203/013 , Y10S257/921
摘要： There is provided a multi-layered structure forming method comprising: (A) forming a first insulating material layer containing a first photo-curing material on a substrate; (B) semi-hardening the first insulating material layer by radiating light having a first wavelength to the first insulating material layer; (C) forming a conductive material layer on the semi-hardened first insulating material layer by ejecting droplets of a conductive material to the semi-hardened first insulating material layer from a nozzle of a liquid droplet ejecting apparatus; (D) forming a second insulating material layer containing a second photo-curing material so as to cover the semi-hardened first insulating material layer and the conductive material layer; and (E) forming a first insulating layer, a conductive layer positioned on the first insulating material, and a second insulating layer covering the first insulating layer and the conductive layer by simultaneously heating the first insulating material layer, the conductive material layer, and the second insulating material layer.
摘要翻译：提供一种多层结构形成方法，包括：（A）在基板上形成含有第一光固化材料的第一绝缘材料层; （B）通过向第一绝缘材料层照射具有第一波长的光而使第一绝缘材料层半硬化; （C）通过从液滴喷射装置的喷嘴向半硬化的第一绝缘材料层喷射导电材料的液滴，在半硬化的第一绝缘材料层上形成导电材料层; （D）形成包含第二光固化材料的第二绝缘材料层以覆盖半硬化的第一绝缘材料层和导电材料层; 和（E）形成第一绝缘层，位于第一绝缘材料上的导电层和通过同时加热第一绝缘材料层，导电材料层和覆盖第一绝缘层和导电层的第二绝缘层第二绝缘材料层。

60. 发明申请

US20070141512A1 Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition 有权
标题翻译：感光组合物，使用光敏组合物中的光敏组合物和化合物的图案形成方法
公开(公告)号：US20070141512A1
公开(公告)日：2007-06-21
申请号：US11642540
申请日：2006-12-21
申请人： Kenji Wada , Hiromi Kanda
发明人： Kenji Wada , Hiromi Kanda
IPC分类号： G03C1/00
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： A photosensitive composition containing a compound having a specific structure as described in the specification, a pattern-forming method using the photosensitive composition and the compound having a specific structure used in the photosensitive composition.
摘要翻译：含有本说明书中记载的具有特定结构的化合物的感光性组合物，使用感光性组合物的图案形成方法和在感光性组合物中使用的具有特定结构的化合物。

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