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51. 发明授权

US06447980B1 Photoresist composition for deep UV and process thereof 失效
标题翻译：用于深紫外线的光致抗蚀剂组合物及其工艺
公开(公告)号：US06447980B1
公开(公告)日：2002-09-10
申请号：US09619336
申请日：2000-07-19
申请人： M. Dalil Rahman , Munirathna Padmanaban , Ralph R. Dammel
发明人： M. Dalil Rahman , Munirathna Padmanaban , Ralph R. Dammel
IPC分类号： G03C1492
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0395 , Y10S430/115
摘要： The present invention relates to a chemically amplified system, which is, sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a polymer that is insoluble an aqueous alkaline solution and comprises at least one acid labile group, b) a compound capable of producing an acid upon radiation. The present invention comprises a polymer that is made from a alicyclic hydrocarbon olefin, an acrylate with a pendant cyclic moeity, and a cyclic anhydride. The present invention also relates to a process for imaging such a photoresist.
摘要翻译：本发明涉及一种化学放大系统，其对300nm至100nm之间的波长敏感，并且包括a）不溶于碱性水溶液并且包含至少一种酸不稳定基团的聚合物，b）具有能力的化合物在辐射时产生酸。本发明包括由脂环烃烯烃，具有侧链环状的丙烯酸酯和环状酸酐制成的聚合物。本发明还涉及这种光致抗蚀剂的成像方法。

52. 发明授权

US09296922B2 Stable metal compounds as hardmasks and filling materials, their compositions and methods of use 有权
标题翻译：稳定的金属化合物作为硬掩模和填充材料，其组成和使用方法
公开(公告)号：US09296922B2
公开(公告)日：2016-03-29
申请号：US14015222
申请日：2013-08-30
申请人： Huirong Yao , Salem K. Mullen , Elizabeth Wolfer , Douglas McKenzie , JoonYeon Cho , Munirathna Padmanaban
发明人： Huirong Yao , Salem K. Mullen , Elizabeth Wolfer , Douglas McKenzie , JoonYeon Cho , Munirathna Padmanaban
IPC分类号： C07F7/08 , G03F7/075 , C09D185/00 , H01L21/033 , C08G77/58 , G03F7/09
CPC分类号： C09D185/00 , C07F7/08 , C08G77/58 , G03F7/0752 , G03F7/091 , G03F7/094 , H01L21/0332 , H01L21/0337 , H01L21/0338
摘要： The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. Specifically, the invention pertains to compounds having the following structure (I) wherein M is a metal and n is 1 to 20, and wherein at least one of R1, R2, R3, and R4 is i) and at least at least one of R1, R2, R3, and R4 is ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety. The invention also relates to spin-coatable compositions of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate.
摘要翻译：本发明涉及新颖的可溶性多配体取代的金属氧化物化合物，以形成具有改进的稳定性的金属氧化物膜以及由它们制备的组合物及其使用方法。具体地说，本发明涉及具有以下结构（I）的化合物，其中M是金属，n是1至20，并且其中R 1，R 2，R 3和R 4中的至少一个是i）和至少一个 R1，R2，R3和R4是ii），其中i）是具有至少2个碳的含硅有机部分，和ii）是有机部分。本发明还涉及溶解在溶剂中的结构（I）化合物的可旋涂组合物。本发明还涉及使用该可旋涂组合物在图案化基材上形成涂层的方法。

53. 发明授权

US08796398B2 Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern 有权
标题翻译：超细纹图案掩模，其制造方法，以及使用其形成超细纹图案的方法
公开(公告)号：US08796398B2
公开(公告)日：2014-08-05
申请号：US12978740
申请日：2010-12-27
申请人： Munirathna Padmanaban , Jin Li , Toru Koike , Yusuke Takano , Kazunori Kurosawa
发明人： Munirathna Padmanaban , Jin Li , Toru Koike , Yusuke Takano , Kazunori Kurosawa
IPC分类号： C08L83/16
CPC分类号： C09D183/16 , C08G77/12 , C08G77/62 , G03F7/405 , H01L21/0337 , H01L21/0338 , C08L83/00
摘要： There are provided a composition for forming a superfine pattern and a method employing the same for forming a superfine pattern. The composition enables to simply produce a superfine pattern with high mass productivity.The composition comprises perhydropolysilazane (I), silicon-containing polymer (II) having a hydrocarbon group, and a solvent. The mixture of those polymers contains silicon-hydrogen bonds and silicon-hydrocarbon group bonds in such amounts that the number of the silicon-hydrocarbon group bonds is in a ratio of 1 to 44% based on the total number of the silicon-hydrogen bonds and the silicon-hydrocarbon group bonds. The composition is applied on a resist pattern to form a spacer formed of the composition on the side wall of the ridges in the pattern, and then the spacer or a resin layer disposed around the spacer is used as a mask to form a superfine pattern.
摘要翻译：提供了用于形成超细纹图案的组合物和使用该组合物形成超细纹图案的方法。该组合物能够简单地产生具有高批量生产率的超细纹理。组合物包含全氢聚硅氮烷（I），具有烃基的含硅聚合物（II）和溶剂。这些聚合物的混合物含有硅 - 氢键和硅 - 烃基键，其量使得硅 - 烃基键的数量相对于硅 - 氢键的总数为1〜44％，硅烃基键合。将该组合物施加在抗蚀剂图案上以在图案的脊的侧壁上形成由该组合物形成的间隔物，然后将隔离物或设置在间隔物周围的树脂层用作掩模以形成超细纹图案。

54. 发明申请

US20110076626A1 Positive-Working Photoimageable Bottom Antireflective Coating 有权
标题翻译：正面照相底部防反射涂层
公开(公告)号：US20110076626A1
公开(公告)日：2011-03-31
申请号：US12570923
申请日：2009-09-30
申请人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
发明人： Munirathna Padmanaban , Srinivasan Chakrapani , Francis M. Houlihan , Shinji Miyazaki , Edward Ng , Mark O. Neisser
IPC分类号： G03F7/00 , G03C1/00
CPC分类号： G03F7/091
摘要： The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.
摘要翻译：本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团，在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。本发明还涉及用于对抗反射涂层进行成像的方法。

55. 发明申请

US20090042148A1 Photoresist Composition for Deep UV and Process Thereof 审中-公开
标题翻译：用于深紫外线及其工艺的光刻胶组合物
公开(公告)号：US20090042148A1
公开(公告)日：2009-02-12
申请号：US11834490
申请日：2007-08-06
申请人： Munirathna Padmanaban , Srinivasan Chakrapani , Guanyang Lin
发明人： Munirathna Padmanaban , Srinivasan Chakrapani , Guanyang Lin
IPC分类号： G03C1/04 , G03C5/00
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： The present invention refers to a photoresist composition comprising (i) a polymer A comprising at least one acid labile group; (ii) at least one photoacid generator; (iii) at least one base; (iv) a polymer B, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (v) a coating solvent composition. The present invention also relates to the process of imaging the photoresist.
摘要翻译：本发明涉及一种光致抗蚀剂组合物，其包含（i）包含至少一种酸不稳定基团的聚合物A; （ii）至少一种光致酸发生剂; （iii）至少一个碱基; （iv）聚合物B，其中聚合物B与聚合物A不可溶并且可溶于涂布溶剂中; （v）涂料溶剂组合物。本发明还涉及对光刻胶成像的方法。

56. 发明授权

US06329117B1 Antireflection or light-absorbing coating composition and polymer therefor 有权
标题翻译：防反射或光吸收涂料组合物及其聚合物
公开(公告)号：US06329117B1
公开(公告)日：2001-12-11
申请号：US09319129
申请日：1999-08-09
申请人： Munirathna Padmanaban , Wen-Bing Kang , Georg Pawlowski , Ken Kimura , Hatsuyuki Tanaka
发明人： Munirathna Padmanaban , Wen-Bing Kang , Georg Pawlowski , Ken Kimura , Hatsuyuki Tanaka
IPC分类号： G03C173
CPC分类号： G03F7/091 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/111
摘要： A composition for an anti-reflective coating or a light absorbing coating, which shows good light absorption for lights of 100-450 nm in wavelength, suffers neither footing nor intermixing, and has excellent storage stability and step coverage, and novel copolymers to be used therein. The novel polymers comprise acrylic or methacrylic copolymers or terpolymers, at least having both recurring units (1) wherein an amino group- or hydroxyl-group containing organic chromophore capable of absorbing lights of 100 to 450 nm in wavelength is chemically bound to the carbonyl group bound to a carbon atom in the main chain, directly or through —R1NHCXY— (wherein R1 represents an alkylene group, X represents O or S, Y represents O or NR6, R6 represents H, a substituted or non-substituted, straight chain or cyclic alkyl group or a phenylene group) and for example recurring units (2) wherein a double bond-or epoxy group-containing alkyl group is chemically bound to the carboxyl or oxygen group bound to a carbon atom in the main chain. The composition containing the copolymer is coated on a wafer to form a bottom anti-reflective coating and, after coating thereon a photoresist, deep UV exposure and development are conducted to form a resist image with high resolution.
摘要翻译：用于抗反射涂层或光吸收涂层的组合物对于波长为100-450nm的光显示出良好的光吸收，既不起脚也不混合，并且具有优异的储存稳定性和阶梯覆盖率，以及要使用的新型共聚物其中。该新型聚合物包含至少具有两个重复单元（1）的丙烯酸或甲基丙烯酸共聚物或三元共聚物，其中能够吸收波长为100至450nm的光的含氨基或羟基的有机发色团与羰基化学键合直接或通过-R1NHCXY-（其中R1表示亚烷基，X表示O或S，Y表示O或NR6，R6表示H，取代或未取代的直链或未取代的直链或环状烷基或亚苯基），例如其中双键或含环氧基的烷基与与主链中的碳原子结合的羧基或氧基化学键合的重复单元（2）。将包含共聚物的组合物涂覆在晶片上以形成底部抗反射涂层，并且在其上涂覆光致抗蚀剂之后，进行深紫外线曝光和显影以形成具有高分辨率的抗蚀剂图像。

57. 发明授权

US06277750B1 Composition for bottom reflection preventive film and novel polymeric dye for use in the same 失效
标题翻译：用于底部防反射膜的组合物和用于其的新型聚合物染料
公开(公告)号：US06277750B1
公开(公告)日：2001-08-21
申请号：US09508624
申请日：2000-06-27
申请人： Georg Pawlowski , Munirathna Padmanaban , Wen-Bing Kang , Hatsuyuki Tanaka , Ken Kimura , Yoshinori Nishiwaki
发明人： Georg Pawlowski , Munirathna Padmanaban , Wen-Bing Kang , Hatsuyuki Tanaka , Ken Kimura , Yoshinori Nishiwaki
IPC分类号： H01L2100
CPC分类号： G03F7/091 , C08F8/28 , C08F2800/10 , G03F7/0382 , G03F7/0392 , C08F8/48 , C08F16/06
摘要： As a bottom anti-reflective coating material for use in photolithography, polymer dyes represented by following general formula are used. The polymer dyes are able to form a bottom anti-reflective coating having good film formation properties, good absorption properties at exposure wavelength, good step coverage, non-intermixing with photoresist and high etch rate. wherein R represents H or a substituted or non-substituted alkyl, cycloalkyl, or aryl group, R1 represents a substituted or non-substituted alkyl or aryl, or a —COOR3 group in which R3 represents an alkyl group, R2 represents a substituted or non-substituted alkyl, cycloalkyl, or aryl group, D is an organic chromophore which absorbs at the exposure wavelength (150-450 nm) and represents a substituted or non-substituted aryl, condensed aryl, or heteroaryl group, m and o are any integer above zero, and n, p and q are any integer including zero.
摘要翻译：作为用于光刻的底部抗反射涂层材料，使用由以下通式表示的聚合物染料。聚合物染料能够形成底部抗反射涂层，其具有良好的成膜性能，在曝光波长下具有良好的吸收性能，良好的步骤覆盖率，与光致抗蚀剂的非混合和高蚀刻速率。其中R表示H或取代或未取代的烷基，环烷基或芳基，R 1表示取代或未取代的烷基或芳基或其中R 3表示烷基的-COOR 3基团，R 2表示取代或未取代的烷基，环烷基或芳基，D 是在曝光波长（150-450nm）下吸收并表示取代或未取代的芳基，缩合芳基或杂芳基的有机发色团，m和o是大于零的任何整数，n，p和q是任何整数包括零。

58. 发明授权

US5846690A Radiation-sensitive composition containing plasticizer 失效
标题翻译：含增塑剂的辐射敏感组合物
公开(公告)号：US5846690A
公开(公告)日：1998-12-08
申请号：US615831
申请日：1996-03-14
申请人： Munirathna Padmanaban , Yoshiaki Kinoshita , Hiroshi Okazaki , Seiya Masuda , Natsumi Kawasaki , Satoru Funato , Georg Pawlowski
发明人： Munirathna Padmanaban , Yoshiaki Kinoshita , Hiroshi Okazaki , Seiya Masuda , Natsumi Kawasaki , Satoru Funato , Georg Pawlowski
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03F7/038 , G03F7/30
CPC分类号： G03F7/0045
摘要： A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor composed of (b1) a poly(N,O-acetal) having a general formula: ##STR1## wherein R.sup.3 is alkyl or substituted or unsubstituted aryl, R.sup.4 is a divalent group selected from alkylene, cycloalkylene, alkene or alkyne, R.sup.5 is alkyl, alkene, alkyne or cycloalkyl, X is --OCO--, --CO-- or --NHCO--, and p is a number not less than 1, and/or (b2) a phenol compound having a hydroxyl group which is protected by a group which can be cleaved in the presence of an acid, (c) a photosensitive compound capable of generating an acid when exposed to an active radiation, (d) a base capable of being decomposed when exposed to an active radiation to form a neutral compound derived therefrom, (e) a plasticizer, and (f) a solvent.
摘要翻译：公开了一种辐射敏感性组合物，其包括（a）不溶于水但可溶于或能够在碱性水溶液中溶胀或能够溶胀的粘合剂，（b）由（b1）聚（N，O-缩醛））具有以下通式：其中R 3是烷基或取代或未取代的芳基，R 4是选自亚烷基，亚环烷基，烯烃或炔烃的二价基团，R 5是烷基，烯烃，炔烃或环烷基，X是-OCO-， -CO-或-NHCO-，p为不小于1的数，和/或（b2）具有羟基的酚化合物，该羟基被酸可以被可被切割的基团保护，（c ）当暴露于活性辐射时能够产生酸的光敏化合物，（d）当暴露于活性辐射时能够分解以形成由其衍生的中性化合物的碱，（e）增塑剂，和（f）溶剂。

59. 发明授权

US5773191A Radiation-sensitive composition 失效
标题翻译：辐射敏感组合物
公开(公告)号：US5773191A
公开(公告)日：1998-06-30
申请号：US685850
申请日：1996-07-24
申请人： Munirathna Padmanaban , Yoshiaki Kinoshita , Satoru Funato , Natsumi Kawasaki , Hiroshi Okazaki , Georg Pawlowski
发明人： Munirathna Padmanaban , Yoshiaki Kinoshita , Satoru Funato , Natsumi Kawasaki , Hiroshi Okazaki , Georg Pawlowski
IPC分类号： G03F7/00 , G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , H01L21/027 , G03F7/032 , G03F7/30
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/11
摘要： A radiation-sensitive composition is disclosed which includes: (a) a copolymer represented by the general formula: ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group, Ar is a substituted or unsubstituted phenylene group or a substituted or unsubstituted cyclohexylene group, X is a divalent group represented by --SO.sub.2 -- or --CO--, m and n are individually an integer not less than 1; (b) a dissolution inhibitor composed of a compound represented by the general formula: ##STR2## wherein R.sup.3 is an alkyl group or a substituted or unsubstituted aryl group, R.sup.4 is an alkylene group, a cycloalkylene group, an alkenylene group or an alkynylene group, R.sup.5 is an alkyl group or an cycloalkyl group, Y is --OCO--, --CO-- or --NHCO--, and p is an integer not less than 1, or (b') a cross-linking agent; (c) a photosensitive compound capable of generating an acid when exposed to a radiation; and (e) a solvent.
摘要翻译：公开了一种辐射敏感性组合物，其包括：（a）由以下通式表示的共聚物：其中R 1为氢原子或甲基，R 2为取代或未取代的烷基或取代或未取代的芳基 Ar为取代或未取代的亚苯基或取代或未取代的亚环己基，X为-SO 2 - 或-CO-表示的二价基，m和n分别为1以上的整数，（b）由以下通式表示的化合物组成的溶解抑制剂：其中R3为烷基或取代或未取代的芳基，R4为亚烷基，亚环烷基，亚烯基或亚炔基，R5是烷基或环烷基，Y是-OCO-，-CO-或-NHCO-，p是不小于1的整数，或（b'）交联剂; （c）当暴露于辐射时能够产生酸的光敏化合物; 和（e）溶剂。

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