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51. 发明授权

US07447249B2 Lighting system 失效
标题翻译：照明系统
公开(公告)号：US07447249B2
公开(公告)日：2008-11-04
申请号：US11464325
申请日：2006-08-14
申请人： Takahiro Matsumoto , Masayuki Kanechika
发明人： Takahiro Matsumoto , Masayuki Kanechika
IPC分类号： H01S3/093
CPC分类号： H01S3/0975 , H01J65/044 , H01S3/2232
摘要： A lighting system includes a microwave resonator (2) for generating a standing microwave in the internal space, and a gas cell (6) enclosing a medium is disposed in the internal space of the microwave resonator 2. The lighting system excites the medium in the gas cell (6) by the standing microwave to generate light. The gas cell (6) is replaceably mounted on the microwave resonator (2). The generated light is output to the outside of the microwave resonator (2) through a light lead-out hole (26). Thereby, it is possible to provide a lighting system (including a gas laser) capable of emitting light efficiently with a compact and inexpensive device configuration and of achieving a long life. Moreover, it can also be used as a lighting system in the THz-wave region by enclosing the medium for generating light in the far-infrared region in the gas cell (6).
摘要翻译：照明系统包括用于在内部空间中产生驻波的微波谐振器（2），并且包围介质的气室（6）设置在微波谐振器2的内部空间中。照明系统通过立式微波激发气室（6）中的介质以产生光。气体电池（6）可更换地安装在微波谐振器（2）上。所产生的光通过光导出孔（26）输出到微波谐振器（2）的外部。由此，能够提供能够以紧凑且廉价的装置结构有效发光的长寿命的照明系统（包括气体激光器）。而且，也可以在气体电池（6）的远红外区域包围用于产生光的介质，作为太赫兹波区域的照明系统。

52. 发明授权

US07388943B2 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus 失效
标题翻译：用于调整两个物体之间的间隙的方法和使用其的曝光方法，间隙调节装置和曝光装置
公开(公告)号：US07388943B2
公开(公告)日：2008-06-17
申请号：US11556005
申请日：2006-11-02
申请人： Takahiro Matsumoto
发明人： Takahiro Matsumoto
IPC分类号： G21K5/00
CPC分类号： G03F9/703 , G03F1/22 , G03F1/42 , G03F7/7035 , G03F9/7038 , G03F9/7049 , G03F9/7088
摘要： A method of making a gap between first and second objects have a predetermined value includes steps of introducing light to an entry window on the first object, detecting an intensity of light from an exit window on the first object, and positioning the second object, with respect to a direction concerning the gap, based on an intensity of light detected in the detecting step. The exit window is positioned so that light enters through the entry window of the first object, reflects off the second object, and then enters the exit window of the first object if the gap has the predetermined value.
摘要翻译：在第一和第二物体之间形成间隙的方法具有预定值，包括将光引入到第一物体上的入口窗口，检测来自第一物体上的出口窗口的光强度以及将第二物体定位的步骤，基于在检测步骤中检测到的光强度，关于间隙的方向。出口窗口被定位成使得光通过第一物体的入口窗口进入，反射离开第二物体，然后如果间隙具有预定值，则进入第一物体的出口窗口。

53. 发明授权

US07271882B2 Shape measuring apparatus, shape measuring method, and aligning method 有权
标题翻译：形状测量装置，形状测量方法和对准方法
公开(公告)号：US07271882B2
公开(公告)日：2007-09-18
申请号：US11130073
申请日：2005-05-17
申请人： Hideki Ina , Koichi Sentoku , Takahiro Matsumoto
发明人： Hideki Ina , Koichi Sentoku , Takahiro Matsumoto
IPC分类号： G01N21/00
CPC分类号： G01Q30/02 , B24B37/005 , B24B37/042 , B24B49/10 , B24B49/12 , G01B11/2441 , G01B21/20 , Y10S977/868
摘要： A shape measuring method for measuring a shape of a surface of an object. The method includes a first measuring step for measuring the surface of the object by detecting light from the object, and a second measuring step for measuring the surface of the object by relatively scanning a probe and the object. A scanning speed changes on the basis of the result of the first measurement step.
摘要翻译：一种用于测量物体表面形状的形状测量方法。该方法包括：第一测量步骤，用于通过检测来自物体的光来测量物体的表面;以及第二测量步骤，用于通过相对扫描探针和物体来测量物体的表面。基于第一测量步骤的结果，扫描速度改变。

54. 发明申请

US20070041417A1 LIGHTING SYSTEM 失效
标题翻译：照明系统
公开(公告)号：US20070041417A1
公开(公告)日：2007-02-22
申请号：US11464325
申请日：2006-08-14
申请人： Takahiro Matsumoto , Masayuki Kanechika
发明人： Takahiro Matsumoto , Masayuki Kanechika
IPC分类号： H01S3/22
CPC分类号： H01S3/0975 , H01J65/044 , H01S3/2232
摘要： A lighting system includes a microwave resonator (2) for generating a standing microwave in the internal space, and a gas cell (6) enclosing a medium is disposed in the internal space of the microwave resonator 2. The lighting system excites the medium in the gas cell (6) by the standing microwave to generate light. The gas cell (6) is replaceably mounted on the microwave resonator (2). The generated light is output to the outside of the microwave resonator (2) through a light lead-out hole (26). Thereby, it is possible to provide a lighting system (including a gas laser) capable of emitting light efficiently with a compact and inexpensive device configuration and of achieving a long life. Moreover, it can also be used as a lighting system in the THz-wave region by enclosing the medium for generating light in the far-infrared region in the gas cell (6).
摘要翻译：照明系统包括用于在内部空间中产生驻波的微波谐振器（2），并且包围介质的气室（6）设置在微波谐振器2的内部空间中。照明系统通过立式微波激发气室（6）中的介质以产生光。气体电池（6）可更换地安装在微波谐振器（2）上。所产生的光通过光导出孔（26）输出到微波谐振器（2）的外部。由此，能够提供能够以紧凑且廉价的装置结构有效发光的长寿命的照明系统（包括气体激光器）。而且，也可以在气体电池（6）的远红外区域包围用于产生光的介质，作为太赫兹波区域的照明系统。

55. 发明授权

US07103497B2 Position detecting device and position detecting method 有权
标题翻译：位置检测装置和位置检测方法
公开(公告)号：US07103497B2
公开(公告)日：2006-09-05
申请号：US11190168
申请日：2005-07-27
申请人： Takahiro Matsumoto , Hideki Ina
发明人： Takahiro Matsumoto , Hideki Ina
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G03F7/70633 , G03F9/7003 , G03F9/7046 , G03F9/7065 , G03F9/7069 , G03F9/7092
摘要： A position detection method for detecting the position of marks includes the following steps: a step for detecting first information relating to the position of the mark by detecting light from the mark under first measurement conditions; a step for detecting second information relating to the position of the mark by detecting light from the mark under second measurement conditions which differ from the first measurement conditions; and a step for detecting the position of the mark based on the first and second information, thereby providing a high-precision position detecting method and device serving as an alignment or overlaying detection device in an exposure apparatuses used in manufacturing semiconductor devices, wherein position detection precision is not lost even in the event that the alignment marks are not symmetrical or there are irregularities in the non-symmetry of multiple alignment marks within the same wafer.
摘要翻译：用于检测标记位置的位置检测方法包括以下步骤：用于通过在第一测量条件下检测来自标记的光来检测与标记的位置有关的第一信息的步骤; 通过在与第一测量条件不同的第二测量条件下检测来自标记的光来检测与标记的位置有关的第二信息的步骤; 以及基于第一和第二信息来检测标记的位置的步骤，从而在用于制造半导体器件的曝光装置中提供用于对准或重叠检测装置的高精度位置检测方法和装置，其中位置检测即使在对准标记不对称或在同一晶片内的多个对准标记的非对称性中存在不规则性的情况下，精度也不会降低。

56. 发明申请

US20060193432A1 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus 失效
标题翻译：用于调整两个物体之间的间隙的方法和使用其的曝光方法，间隙调节装置和曝光装置
公开(公告)号：US20060193432A1
公开(公告)日：2006-08-31
申请号：US11411462
申请日：2006-04-25
申请人： Takahiro Matsumoto
发明人： Takahiro Matsumoto
IPC分类号： G21K5/00
CPC分类号： G03F9/703 , G03F1/22 , G03F1/42 , G03F7/7035 , G03F9/7038 , G03F9/7049 , G03F9/7088
摘要： A method of making a gap between first and second objects have a predetermined value includes steps of introducing light to an entry window on the first object, detecting an intensity of light from an exit window on the first object, and positioning the second object, with respect to a direction concerning the gap, based on an intensity of light detected in the detecting step. The exit window is positioned so that light enters through the entry window of the first object, reflects off the second object, and then enters the exit window of the first object if the gap has the predetermined value.
摘要翻译：在第一和第二物体之间形成间隙的方法具有预定值，包括将光引入到第一物体上的入口窗口，检测来自第一物体上的出口窗口的光强度以及将第二物体定位的步骤，基于在检测步骤中检测到的光强度，关于间隙的方向。出口窗口被定位成使得光通过第一物体的入口窗口进入，反射离开第二物体，然后如果间隙具有预定值，则进入第一物体的出口窗口。

57. 发明授权

US06999893B2 Position detecting device and position detecting method 失效
标题翻译：位置检测装置和位置检测方法
公开(公告)号：US06999893B2
公开(公告)日：2006-02-14
申请号：US10662408
申请日：2003-09-16
申请人： Takahiro Matsumoto , Hideki Ina
发明人： Takahiro Matsumoto , Hideki Ina
IPC分类号： G01C3/00
CPC分类号： G03F9/7088 , G03F7/70633 , G03F9/7003 , G03F9/7046 , G03F9/7065 , G03F9/7069 , G03F9/7092
摘要： A position detection method for detecting the position of marks comprises the following steps: a step for detecting first information relating to the position of the mark by detecting light from the mark under first measurement conditions; a step for detecting second information relating to the position of the mark by detecting light from the mark under second measurement conditions which differ from the first measurement conditions; and a step for detecting the position of the mark based on the first and second information, thereby providing a high-precision position detecting method and device serving as an alignment or overlaying detection device in an exposure apparatuses used in manufacturing semiconductor devices, wherein position detection precision is not lost even in the event that the alignment marks are not symmetrical or there are irregularities in the non-symmetry of multiple alignment marks within the same wafer.
摘要翻译：用于检测标记位置的位置检测方法包括以下步骤：通过在第一测量条件下检测来自标记的光来检测与标记的位置有关的第一信息的步骤; 通过在与第一测量条件不同的第二测量条件下检测来自标记的光来检测与标记的位置有关的第二信息的步骤; 以及用于基于第一和第二信息检测标记的位置的步骤，从而在用于制造半导体器件的曝光装置中提供用作对准或重叠检测装置的高精度位置检测方法和装置，其中位置检测即使在对准标记不对称或在同一晶片内的多个对准标记的非对称性中存在不规则性的情况下，精度也不会降低。

58. 发明授权

US06950179B2 Shape measuring apparatus, shape measuring method, and aligning method 失效
标题翻译：形状测量装置，形状测量方法和对准方法
公开(公告)号：US06950179B2
公开(公告)日：2005-09-27
申请号：US10156921
申请日：2002-05-30
申请人： Hideki Ina , Koichi Sentoku , Takahiro Matsumoto
发明人： Hideki Ina , Koichi Sentoku , Takahiro Matsumoto
IPC分类号： G01B11/22 , B24B49/10 , B24B49/12 , G01B11/24 , G01B21/00 , G01B21/02 , G01B21/20 , G01Q10/02 , G01Q30/02 , G01Q60/00 , G01Q60/24 , G01Q60/34 , G01Q60/38 , G01Q80/00 , G03F9/00 , G01N21/00 , G01N23/00
CPC分类号： G01Q30/02 , B24B37/005 , B24B37/042 , B24B49/10 , B24B49/12 , G01B11/2441 , G01B21/20 , Y10S977/868
摘要： A shape measuring method for measuring a shape of a surface of an object. The method includes a first measuring step for measuring the surface of the object by detecting light from the object, and a second measuring step for measuring the surface of the object by relatively scanning a probe and the object. A scanning speed changes on the basis of the result of the first measurement step.
摘要翻译：一种用于测量物体表面形状的形状测量方法。该方法包括：第一测量步骤，用于通过检测来自物体的光来测量物体的表面;以及第二测量步骤，用于通过相对扫描探针和物体来测量物体的表面。基于第一测量步骤的结果，扫描速度改变。

59. 发明申请

US20050137837A1 Management system and apparatus method therefor, and device manufacturing method 有权
标题翻译：管理系统及其装置方法及装置制造方法
公开(公告)号：US20050137837A1
公开(公告)日：2005-06-23
申请号：US10901106
申请日：2004-07-29
申请人： Satoru Oishi , Hideki Ina , Takehiko Suzuki , Koichi Sentoku , Takahiro Matsumoto
发明人： Satoru Oishi , Hideki Ina , Takehiko Suzuki , Koichi Sentoku , Takahiro Matsumoto
IPC分类号： G03F9/00 , G03F7/20 , G05B19/418 , H01L21/027 , G06F17/50
CPC分类号： G03F7/70633 , G03F7/705 , G03F7/70525 , G03F9/7092 , G05B2219/32018 , Y02P90/22
摘要： A management apparatus which manages a parameter for an industrial device acquires AGA measurement results obtained by operating the industrial device with an operation job parameter value and non-operation job parameter value. An inspection apparatus acquires an “inspection result” obtained by inspecting the result of operating the industrial device in the operation job. A change in inspection result upon a change in parameter value is estimated on the basis of the AGA measurement result and inspection result. A variable which minimizes (extreme) both or at least one of the sensitivity (slope) of the inspection result upon a change in parameter value and variations (3σ) in inspection result between objects to be processed (e.g., wafers) is set as an optimal parameter.
摘要翻译：管理工业设备的参数的管理装置获取通过操作工作装置具有操作作业参数值和非操作作业参数值而获得的AGA测量结果。检查装置获取通过检查操作工作中的工业装置的操作结果而获得的“检查结果”。根据AGA测量结果和检查结果估计参数值变化时检查结果的变化。将待处理对象（例如，晶片）之间的参数值和检查结果中的变化（3sigma）的检查结果的灵敏度（斜率）两者或至少一个最小化（极端）的变量设置为最优参数。

60. 发明申请

US20050128452A1 Wavelength selecting method, position detecting method and apparatus, exposure method and apparatus, and device manufacturing method 失效
标题翻译：波长选择方法，位置检测方法和装置，曝光方法和装置以及装置制造方法
公开(公告)号：US20050128452A1
公开(公告)日：2005-06-16
申请号：US11002906
申请日：2004-12-03
申请人： Takahiro Matsumoto
发明人： Takahiro Matsumoto
IPC分类号： G03B27/52 , G03F9/00
CPC分类号： G03F9/7065 , G03B27/52 , G03F9/7011
摘要： A wavelength selecting method for selecting a wavelength of light, the light being used to detect a position of a target with a signal from an image of an alignment mark covered with resist, includes the steps of obtaining a reflectance of the resist at a position outside the alignment mark by irradiating lights having plural wavelengths to the resist at the position, and selecting one of the lights which one has a wavelength that provides the maximum value of reflectance among the reflectances measured by the measuring step or which one has a wavelength that falls within a predetermined wave range centering on the wavelength that provide the maximum reflectance.
摘要翻译：一种用于选择光的波长选择方法，用于利用由抗蚀剂覆盖的对准标记的图像的信号来检测目标的位置的光包括以下步骤：获得外部位置处的抗蚀剂的反射率通过将该多个波长的光照射到该位置处的抗蚀剂，并选择一个具有提供最大值由测量步骤测量的反射率之间的反射率一个具有以提供最大反射率的波长为中心的预定波长范围内的波长。

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