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51. 发明授权

US08532576B2 System for controlling wireless communication between portable device and communication controller 有权
标题翻译：用于控制便携式设备和通信控制器之间的无线通信的系统
公开(公告)号：US08532576B2
公开(公告)日：2013-09-10
申请号：US12061277
申请日：2008-04-02
申请人： Daisuke Kawamura , Yoshiyuki Mizuno , Hidenobu Hanaki , Hiroaki Iwashita
发明人： Daisuke Kawamura , Yoshiyuki Mizuno , Hidenobu Hanaki , Hiroaki Iwashita
IPC分类号： H04B1/00
CPC分类号： G07C9/00309 , B60R25/24 , G07C2009/00373 , G07C2009/00793 , G07C2209/61
摘要： A portable device for preventing communication errors caused by disturbance such as noise. The portable device receives a first request signal from a communication controller and transmits a first response signal corresponding to the first request signal. A transmitter transmits the first response signal with a selected one of a plurality of frequencies. A transmission control unit transmits the first response signal from the transmitter with the one of the plurality of frequencies. The portable device further receives a second request signal from the communication control unit, which receives the first response signal. When the second request signal cannot be received, the portable device retransmits the first response signal from the transmitter with a frequency that differs from the one of the plurality of frequencies.
摘要翻译：一种便携式设备，用于防止诸如噪声等干扰引起的通信错误。便携式设备从通信控制器接收第一请求信号并发送与第一请求信号对应的第一响应信号。发射机以多个频率中选择的一个发射第一响应信号。发送控制单元利用多个频率中的一个发送来自发送机的第一响应信号。便携式设备还从通信控制单元接收第一请求信号，该第一请求信号接收第一响应信号。当第二请求信号不能被接收时，便携式设备以与多个频率中的一个频率不同的频率从发射机重发第一响应信号。

52. 发明授权

US08275130B2 System and method for registering secret key 有权
标题翻译：用于注册密钥的系统和方法
公开(公告)号：US08275130B2
公开(公告)日：2012-09-25
申请号：US12613149
申请日：2009-11-05
申请人： Daisuke Kawamura , Hiroaki Iwashita , Kouhei Kishimoto , Yuuki Nawa , Yoshiyuki Mizuno , Hiromitsu Mizuno , Shinichi Koga , Kota Nishida , Tomohiro Ito , Hideki Kawai
发明人： Daisuke Kawamura , Hiroaki Iwashita , Kouhei Kishimoto , Yuuki Nawa , Yoshiyuki Mizuno , Hiromitsu Mizuno , Shinichi Koga , Kota Nishida , Tomohiro Ito , Hideki Kawai
IPC分类号： H04L9/00
CPC分类号： H04L9/0844 , H04L67/12 , H04L2209/80 , H04L2209/84 , H04W12/04 , H04W12/06
摘要： A secret key registration system which registers a secret key in a portable key device and vehicle. A first transformation equation is stored in a writer and the vehicle. A second transformation equation is stored in the portable key device and the vehicle. The writer transmits a registration code to the portable key device and generates intermediate data with the first transformation equation of the writer. The intermediate data is transmitted to the portable key device, which generates the secret key from the intermediate data with the second transformation equation. The portable key device transmits the registration code to the vehicle. The vehicle generates intermediate data from the registration code with the first transformation equation of the vehicle, and then generates the secret key from the intermediate data with the second transformation equation.
摘要翻译：秘密密钥登记系统，其将密钥登记在便携式密钥装置和车辆中。第一变换方程存储在写入器和车辆中。第二变换方程式存储在便携式钥匙装置和车辆中。作者将注册码发送到便携式钥匙装置，并用作者的第一变换方程产生中间数据。将中间数据发送到便携式密钥装置，便携式密钥装置利用第二变换方程从中间数据生成秘密密钥。便携式钥匙装置向车辆发送登记码。车辆使用车辆的第一变换方程从登记码生成中间数据，然后利用第二变换方程从中间数据生成秘密密钥。

53. 发明授权

US07742150B2 Manufacturing method of semiconductor device 失效
标题翻译：半导体器件的制造方法
公开(公告)号：US07742150B2
公开(公告)日：2010-06-22
申请号：US11654566
申请日：2007-01-18
申请人： Shinichi Ito , Kentaro Matsunaga , Daisuke Kawamura
发明人： Shinichi Ito , Kentaro Matsunaga , Daisuke Kawamura
IPC分类号： G03B27/32
CPC分类号： G03D3/08 , G03B27/42 , G03F7/70341
摘要： A manufacturing method of a semiconductor device including a liquid immersion movement exposure of interposing a liquid between an exposure target substrate and a projection optical system of an exposure apparatus, and carrying out an exposure processing with respect to a plurality of exposure regions set on a surface of the substrate while relatively moving the substrate with respect to the system, a first liquid immersion movement of relatively moving the substrate with respect to the system while interposing the liquid between the substrate and the system, in adjacent exposure regions of said each exposure region, and a second liquid immersion movement of relatively moving the substrate with respect to the system at a speed lower than a movement speed in the first movement, while interposing the liquid between the substrate and the system, in a distance that is longer than a movement distance in the first movement.
摘要翻译：一种半导体器件的制造方法，包括在曝光对象基板和曝光装置的投影光学系统之间插入液体的液浸式移动曝光，并对相对于设置在表面上的多个曝光区域进行曝光处理在相对于所述系统相对移动所述衬底的同时，在所述每个曝光区域的相邻曝光区域中相对于所述衬底相对地移动所述衬底同时在所述衬底和所述系统之间插入液体的第一液浸动作，以及第二液浸移动，其以比第一移动中的移动速度低的速度相对于所述系统移动所述基板，同时在所述基板和所述系统之间以比移动距离长的距离在第一动作。

54. 发明授权

US07662543B2 Pattern forming method and method of manufacturing semiconductor device 失效
公开(公告)号：US07662543B2
公开(公告)日：2010-02-16
申请号：US11350080
申请日：2006-02-09
申请人： Daisuke Kawamura , Shinichi Ito
发明人： Daisuke Kawamura , Shinichi Ito
IPC分类号： G03F7/26
CPC分类号： G03F7/11 , G03F7/70341 , G03F7/7065 , G03F7/70958 , Y10S430/162
摘要： A pattern forming method includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist film to form the cover film on the resist film, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a latent image on the resist film, removing the cover film after the formation of the latent image, conducting a first inspection to inspect whether or not the cover film has a defect between said forming the latent image and said removing the cover film, performing predetermined processing when the defect is found in the first inspection, and developing the resist film to form a resist pattern on the substrate after said removing the cover film.

55. 发明授权

US07630053B2 Method of manufacturing semiconductor device and liquid immersion lithography system 失效
标题翻译：制造半导体器件和液浸光刻系统的方法
公开(公告)号：US07630053B2
公开(公告)日：2009-12-08
申请号：US11727498
申请日：2007-03-27
申请人： Daisuke Kawamura
发明人： Daisuke Kawamura
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70866
摘要： A method of manufacturing a semiconductor device is disclosed. The manufacturing method includes the following steps in a period from a liquid immersion lithography step to a step in which a film structure of at least an edge of a wafer changes from a timing of the liquid immersion lithography step. At least one of a side surface of an edge of the wafer and an upper surface of the edge of the wafer is inspected. On the basis of an inspection result, at least one of the presence/absence of film peeling and the presence/absence of particle adhesion is determined on at least one of the side surface of the edge of the wafer and the upper surface of the edge of the wafer. A predetermined coping process is performed when it is determined that at least one of the film peeling and the particle adhesion has occurred.
摘要翻译：公开了制造半导体器件的方法。该制造方法包括以下步骤：从液浸光刻步骤到至少晶片边缘的膜结构从液浸光刻步骤的定时变化的步骤。检查晶片的边缘的侧表面和晶片的边缘的上表面中的至少一个。基于检查结果，在晶片边缘的侧表面和边缘的上表面中的至少一个上确定膜剥离的存在/不存在和颗粒附着的存在/不存在中的至少一个的晶片。当确定膜剥离和颗粒粘附中的至少一种已经发生时，执行预定的应对过程。

56. 发明授权

US07505279B2 Portable device having flexible case 有权
标题翻译：便携式设备具有灵活的外壳
公开(公告)号：US07505279B2
公开(公告)日：2009-03-17
申请号：US10766799
申请日：2004-01-28
申请人： Kiyokazu Ohtaki , Seiji Ishigaki , Daisuke Kawamura , Masayuki Kawamura
发明人： Kiyokazu Ohtaki , Seiji Ishigaki , Daisuke Kawamura , Masayuki Kawamura
IPC分类号： H05K5/00
CPC分类号： G07C9/00944 , E05B19/0082 , G07C2009/00952
摘要： A portable device that resists deformation caused by an external force while remaining water resistant. The portable device includes a case, which is made of a flexible material. A battery compartment is formed in the case. A separable portion is arranged in the part of the case corresponding to the battery compartment. Part of the case is bent to open the separable portion and expose the battery compartment from the case.
摘要翻译：一种抵抗由外力引起的变形同时保持防水性的便携式装置。便携式装置包括由柔性材料制成的壳体。在壳体中形成电池室。在与电池仓对应的壳体的一部分中布置有可分离部分。弯曲的部分情况是打开可分离部分并将电池仓从外壳中露出。

57. 发明申请

US20090063569A1 INFORMATION PROVIDING APPARATUS, INFORMATION RECEIVING TERMINAL, INFORMATION PROVIDING SYSTEM, INFORMATION PROVIDING METHOD AND PROGRAM 有权
标题翻译：信息提供设备，信息接收终端，信息提供系统，信息提供方法和程序
公开(公告)号：US20090063569A1
公开(公告)日：2009-03-05
申请号：US12179987
申请日：2008-07-25
申请人： Kazuhiro Fukuda , Tetsuo Maruyama , Ippei Tambata , Daisuke Kawamura
发明人： Kazuhiro Fukuda , Tetsuo Maruyama , Ippei Tambata , Daisuke Kawamura
IPC分类号： G06F17/30 , G06F7/00
CPC分类号： H04N5/44543 , H04H60/74 , H04N7/00 , H04N21/235 , H04N21/23602 , H04N21/2362 , H04N21/26603 , H04N21/2668 , H04N21/4345 , H04N21/435 , H04N21/44222 , H04N21/4722 , H04N21/482 , H04N21/4821 , H04N21/4828 , H04N21/8133
摘要： There is provided an information providing apparatus including an ECG scenario storage portion to store an ECG scenario related to a program in association with reference ID, an ECG package storage portion to store reference IDs of ECG scenarios related to programs in association with discrimination ID of an ECG channel allocated to an ECG package in order to provide a collection of information related to programs having a relationship as an ECG package, an ECG package providing portion to acquire discrimination ID of a particular channel from a receiving terminal, extract an ECG package corresponding to the acquired discrimination ID and provide it to the receiving terminal, and an ECG scenario providing portion to acquire reference ID of a particular ECG scenario included in the ECG package from the receiving terminal, extract an ECG scenario corresponding to the acquired reference ID and provide it to the receiving terminal.
摘要翻译：提供了一种信息提供装置，其包括ECG方案存储部分，用于存储与参考ID相关联的节目相关的ECG场景; ECG包存储部分，用于存储与节目相关的ECG场景的参考ID，该参考ID与 ECG信道被分配给ECG包，以提供与具有作为ECG包的关系的节目相关的信息的集合; ECG包提供部分，用于从接收终端获取特定信道的鉴别ID;提取对应于获取的鉴别ID并将其提供给接收终端;以及ECG场景提供部分，用于从接收终端获取包括在ECG包中的特定ECG场景的参考ID，提取与获取的参考ID相对应的ECG场景，并提供它到接收终端。

58. 发明申请

US20060102614A1 Apparatus for processing substrate and method of processing the same 失效
公开(公告)号：US20060102614A1
公开(公告)日：2006-05-18
申请号：US11304549
申请日：2005-12-16
申请人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
发明人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
IPC分类号： H05B3/68
CPC分类号： H01L21/6715 , B05C5/0254 , B05C11/08 , G03F7/168 , G03F7/3021 , G03F7/38 , G03F7/70358 , G03F7/70558 , H01L21/67109 , H01L21/67115
摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

59. 发明申请

US20050214695A1 Pattern forming method and method for manufacturing semiconductor device 审中-公开
标题翻译：图案形成方法和半导体器件的制造方法
公开(公告)号：US20050214695A1
公开(公告)日：2005-09-29
申请号：US11081579
申请日：2005-03-17
申请人： Hirokazu Kato , Yasunobu Onishi , Daisuke Kawamura
发明人： Hirokazu Kato , Yasunobu Onishi , Daisuke Kawamura
IPC分类号： G03F7/40 , B05D1/38 , G03F7/00 , G03F7/20 , G03F7/30 , H01L21/027 , H01L21/033
CPC分类号： H01L21/0337 , H01L21/0275
摘要： A pattern forming method which can suppress pattern collapse of a resist pattern comprises after developing a resist pattern formed from a resist film on a substrate, supplying a rinse agent onto the substrate to replace a developer on the substrate with the rinse agent, supplying an coating film material onto the substrate to replace at least a part of the rinse agent with the coating film material, wherein the coating film material contains a solvent and a solute different from the resist film, volatilizing the solvent in the coating film material to form an coating film covering the resist film on the substrate, removing at least a part of a surface of the coating film to expose at least a part of an upper surface of the resist pattern and form a mask pattern comprising the coating film, and processing the substrate using the mask pattern.
摘要翻译：可以抑制抗蚀剂图案的图案塌陷的图案形成方法包括在从基板上的抗蚀剂膜形成的抗蚀剂图案显影之后，将冲洗剂供应到基板上以用冲洗剂代替基板上的显影剂，将薄膜材料涂覆在基材上以用涂膜材料代替至少一部分漂洗剂，其中涂膜材料含有溶剂和不同于抗蚀剂膜的溶质，挥发涂膜材料中的溶剂以形成涂层膜，覆盖基板上的抗蚀剂膜，去除涂膜的表面的至少一部分以暴露抗蚀剂图案的上表面的至少一部分，并形成包含涂膜的掩模图案，并使用掩模图案。

60. 发明授权

US06558853B1 Method for manufacturing exposure mask, exposure apparatus and semiconductor device 失效
标题翻译：曝光掩模，曝光装置和半导体装置的制造方法
公开(公告)号：US06558853B1
公开(公告)日：2003-05-06
申请号：US09661553
申请日：2000-09-14
申请人： Daisuke Kawamura
发明人： Daisuke Kawamura
IPC分类号： G03F900
CPC分类号： G03F1/36 , G03F7/70433
摘要： An exposure mask is used for transcribing a desired pattern on a resist on a wafer in a photolithography step. This exposure mask is formed by the arrangement of transcribed pattern film formed in a desired pattern on the transparent substrate. In order to decrease background light, a dummy pattern film formed in a dummy pattern is arranged on the transparent substrate together with the transcribed pattern film. The dummy pattern is designed in such a manner that the dummy pattern is not transcribed on the resist under the exposure condition required for transcribing the desired pattern on the resist in a desired size. Besides, the dummy pattern film is arranged from the transcribed pattern film in a predetermined distance so that the intensity distribution of light which passes through the transcribed pattern film.
摘要翻译：曝光掩模用于在光刻步骤中在晶片上的抗蚀剂上转录所需图案。该曝光掩模由在透明基板上以期望图案形成的转录图案膜的排列形成。为了减少背景光，以虚拟图案形成的虚拟图案膜与转印图案膜一起布置在透明基板上。虚拟图案被设计成使得在用于以希望的尺寸转印抗蚀剂上的期望图案所需的曝光条件下，在抗蚀剂上不转印哑图案。此外，虚设图案膜从转录图案膜以预定距离布置，使得通过转录图案膜的光的强度分布。

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