会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 52. 发明申请
    • Coating layer thickness measurement mechanism and coating layer forming apparatus using the same
    • 涂层厚度测量机构和使用其的涂层形成装置
    • US20070261638A1
    • 2007-11-15
    • US11797796
    • 2007-05-08
    • Hideaki AwataKatsuji EmuraKentaro Yoshida
    • Hideaki AwataKatsuji EmuraKentaro Yoshida
    • B05C11/00C23C16/00
    • C23C14/545C23C14/562
    • In a measurement mechanism for continuously measuring a thickness of a coating layer, provided in an apparatus for forming the coating layer on a conductive elongate base material in a coating treatment base station while the base material is fed, a sensing portion for measuring a capacitance value of the coating layer is arranged before and after the base station, and tension applied to the base material at the sensing portion is set to be greater than tension applied to the base material at the base station. Thus, in forming the coating layer on the elongate base material while the base material is continuously fed, variation in a feeding speed is suppressed, influence of sway of a measurement surface in a direction of thickness at the thickness sensing portion during feeding is minimized, and a thickness of the coating layer can be measured with higher accuracy.
    • 在用于连续地测量涂层厚度的测量机构中,设置在用于在馈送基材时在涂覆处理基站中的导电细长基材上形成涂层的设备中的涂层厚度,用于测量电容值的感测​​部分 在基站之前和之后布置涂层,并且施加到感测部分处的基材的张力设定为大于在基站处施加到基材的张力。 因此,在连续供给母材的同时,在细长基材上形成涂层时,抑制了进给速度的变化,使得测量表面在进给期间的厚度检测部分的厚度方向上的摆动的影响最小化, 并且能够以更高的精度测量涂层的厚度。
    • 53. 发明申请
    • Method of operating vacuum deposition apparatus and vacuum deposition apparatus
    • 操作真空沉积设备和真空沉积设备的方法
    • US20070110892A1
    • 2007-05-17
    • US11593619
    • 2006-11-07
    • Hideaki AwataKatsuji EmuraKentaro Yoshida
    • Hideaki AwataKatsuji EmuraKentaro Yoshida
    • C23C16/52C23C16/00
    • C23C14/30C23C14/16C23C14/20C23C14/546C23C14/562
    • In a previous experiment of a deposition work of depositing a film with a uniform thickness on a long strip base material in the longitudinal direction thereof, an elapsed time from the start of the deposition work and an output of a power supply at the elapsed time are measured. The resulting relation between the elapsed time and the output is stored in a storage device. Subsequent deposition on a long strip base material is performed by a method in which first, the output of the power supply is controlled to be stabilized at a desired value using a crystal oscillator thickness gauge in a pre-heating step before the start of the deposition work, and then, a base material transport device is driven to start the deposition work on the long strip base material after a desired deposition rate is obtained. After the start of the deposition work, the output of the power supply is controlled to coincide with the output at the elapsed time stored in the storage device.
    • 在上述的长条状基材长度方向上沉积厚度均匀的膜的沉积工作的实验中,从开始沉积工作起的经过时间和经过时间的电源的输出为止 测量。 经过时间与输出之间的关系存储在存储装置中。 在长条状基材上的后续沉积是通过以下方法进行的:首先,在开始沉积之前,使用晶体振荡器厚度计在预热步骤中将电源的输出控制为稳定在期望值 然后,在获得期望的沉积速率之后,驱动基材输送装置在长条状基材上开始沉积工作。 在开始沉积工作之后,电源的输出被控制成与存储在存储装置中的经过时间的输出一致。