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51. 发明授权

US08653437B2 EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods 有权
标题翻译：具有子系统的EUV光源，用于在EUV非输出期间维持LPP驱动激光输出
公开(公告)号：US08653437B2
公开(公告)日：2014-02-18
申请号：US13157233
申请日：2011-06-09
申请人： William N. Partlo , Richard L. Sandstrom , Daniel J. W. Brown , Igor V. Fomenkov
发明人： William N. Partlo , Richard L. Sandstrom , Daniel J. W. Brown , Igor V. Fomenkov
IPC分类号： H05G2/00
CPC分类号： G21K5/00 , G03F7/70033 , H01S3/117 , H01S3/2232 , H01S3/2308 , H05G2/008
摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.
摘要翻译：本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路，所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统，以提供从截取时间延迟第一延迟时间的触发信号，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲。

52. 发明申请

US20120087386A1 LASER SYSTEM 有权
标题翻译：激光系统
公开(公告)号：US20120087386A1
公开(公告)日：2012-04-12
申请号：US12639339
申请日：2009-12-16
申请人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/22 , H01S3/09
CPC分类号： G03F7/70341 , G03F7/70025 , G03F7/70041 , G03F7/7055
摘要： An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the second seed laser.
摘要翻译：一种装置/方法可以包括线窄的脉冲光刻激光光源，其可以包括：提供激光系统的种子脉冲，其可以包括：以X kHz的速率产生种子脉冲的第一脉冲种子激光器; 第二脉冲种子激光器以XkHz的速率产生种子脉冲; 放大系统，其可以包括：第一放大器增益系统，其可以包括第一和第二脉冲气体放电放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第一个的输出脉冲上以1/2X kHz工作种子激光第二放大器增益系统，其可以包括第一和第二脉冲放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第二种子激光器的输出脉冲上以1/2XkHz工作。

53. 发明授权

US08144740B1 Laser system 有权
标题翻译：激光系统
公开(公告)号：US08144740B1
公开(公告)日：2012-03-27
申请号：US12639339
申请日：2009-12-16
申请人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/13
CPC分类号： G03F7/70341 , G03F7/70025 , G03F7/70041 , G03F7/7055
摘要： An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the second seed laser.
摘要翻译：一种装置/方法可以包括线窄的脉冲光刻激光光源，其可以包括：提供激光系统的种子脉冲，其可以包括：以X kHz的速率产生种子脉冲的第一脉冲种子激光器; 第二脉冲种子激光器以XkHz的速率产生种子脉冲; 放大系统，其可以包括：第一放大器增益系统，其可以包括第一和第二脉冲气体放电放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第一个的输出脉冲上以1/2X kHz工作种子激光第二放大器增益系统，其可以包括第一和第二脉冲放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第二种子激光器的输出脉冲上以1/2X kHz工作。

54. 发明授权

US07920616B2 Laser system 有权
标题翻译：激光系统
公开(公告)号：US07920616B2
公开(公告)日：2011-04-05
申请号：US11980172
申请日：2007-10-30
申请人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/22
CPC分类号： H01S3/2383 , G03F7/70583 , H01S3/0057 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/225 , H01S3/2325
摘要： A method/apparatus may comprise a laser light source which may comprise a solid state seed laser system producing a seed laser output having a nominal center wavelength at a pulse repetition rate; a first and a second gas discharge laser amplifier gain medium each operating at a pulse repetition rate less than that of the seed laser system; a beam divider providing each of the respective first and second amplifier gain mediums with seed laser output pulses; a frequency converter modifying the nominal center wavelength of the output of the seed laser to essentially the nominal center wavelength of the amplifier gain medium; a beam combiner combining the outputs of the respective amplifier gain mediums to provide a light source output having the pulse repetition rate of the seed laser; a coherence buster operating on either or both of the output of the seed laser or amplifier gain mediums.
摘要翻译：方法/装置可以包括激光光源，其可以包括固态种子激光器系统，其产生具有脉冲重复率的标称中心波长的种子激光器输出; 第一和第二气体放电激光放大器增益介质，每个以比种子激光器系统的脉冲重复频率工作; 一个分束器，为每个相应的第一和第二放大器增益介质提供种子激光输出脉冲; 变频器将种子激光器的输出的标称中心波长修改为基本上放大器增益介质的标称中心波长; 组合各个放大器增益介质的输出以提供具有种子激光器的脉冲重复率的光源输出的光束组合器; 在种子激光器或放大器增益介质的输出中的任一个或两者上工作的相干致动器。

55. 发明申请

US20090296758A1 Laser system 审中-公开
标题翻译：激光系统
公开(公告)号：US20090296758A1
公开(公告)日：2009-12-03
申请号：US11982217
申请日：2007-10-31
申请人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/10 , H01S3/13
CPC分类号： G03F7/7055 , H01S3/225 , H01S3/2308
摘要： An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the second seed laser.
摘要翻译：一种装置/方法可以包括线窄的脉冲光刻激光光源，其可以包括：提供激光系统的种子脉冲，其可以包括：以X kHz的速率产生种子脉冲的第一脉冲种子激光器; 第二脉冲种子激光器以XkHz的速率产生种子脉冲; 放大系统，其可以包括：第一放大器增益系统，其可以包括第一和第二脉冲气体放电放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第一种子激光器第二放大器增益系统，其可以包括第一和第二脉冲放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第二种子激光器的输出脉冲上以1/2 X kHz工作。

56. 发明授权

US07567607B2 Very narrow band, two chamber, high rep-rate gas discharge laser system 有权
标题翻译：非常窄带，二室，高倍率气体放电激光系统
公开(公告)号：US07567607B2
公开(公告)日：2009-07-28
申请号：US11346519
申请日：2006-02-01
申请人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scot T. Smith , William G. Hulburd , Jeffrey Oicles
发明人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scot T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.
摘要翻译：公开了一种振荡放大器气体放电激光器系统和方法，其可以包括第一激光器单元，该第一激光器单元可以包括可包含受激准分子或分子氟激光气体介质的第一放电区域; 限定含有激光气体介质的第一放电区域的第一对电极，用于使在所述第一放电区域中产生的输出激光脉冲光束脉冲的光谱带宽变窄的线窄化单元; 第二激光单元，其可以包括可包含受激准分子或分子氟激光气体介质的第二放电室; 限定包含所述激光气体介质的所述第二放电区域的第二对电极; 脉冲功率系统，其向所述第一对电极和所述第二对电极提供电脉冲，在所述相应的第一和第二对电极之间的所述激光气体介质中产生气体放电，以及激光参数控制机构修改所选择的所选择的参数通过控制第一对电极之间的气体放电的发生时间和第二对电极之间的气体放电的发生的时间，由所述气体放电激光系统产生的激光输出光脉冲束脉冲。

57. 发明授权

US07218661B2 Line selected F2 two chamber laser system 失效
标题翻译：线选F2双腔激光系统
公开(公告)号：US07218661B2
公开(公告)日：2007-05-15
申请号：US10854614
申请日：2004-05-25
申请人： David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scot T. Smith , William G. Hulburd
发明人： David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scot T. Smith , William G. Hulburd
IPC分类号： H01S3/22
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门设计用作集成电路光刻的光源的F 2 N 2激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有用于选择最强的F 2/2谱线的线选择包。

58. 发明授权

US06713770B2 High resolution spectral measurement device 有权
标题翻译：高分辨率光谱测量装置
公开(公告)号：US06713770B2
公开(公告)日：2004-03-30
申请号：US10098975
申请日：2002-03-15
申请人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith , Daniel J. W. Brown
发明人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith , Daniel J. W. Brown
IPC分类号： G01J314
CPC分类号： G01J3/26 , G01J1/4257 , G01J3/02 , G01J3/0205 , G01J3/12 , G01J3/1804 , G01J3/22 , G01J9/02
摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.
摘要翻译：高分辨率光谱测量装置。优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。表示对应于所选择的标准具条纹的波长的调度光的一部分通过第二狭缝并由光检测器监视。当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。在第二实施例中，第二狭缝和光检测器由光电二极管阵列替代，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。

59. 发明授权

US06567450B2 Very narrow band, two chamber, high rep rate gas discharge laser system 有权
公开(公告)号：US06567450B2
公开(公告)日：2003-05-20
申请号：US09943343
申请日：2001-08-29
申请人： David W. Myers , Herve A. Besaucele , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Xiaojiang J. Pan , Eckehard D. Onkels , Richard M. Ness , Daniel J. W. Brown
发明人： David W. Myers , Herve A. Besaucele , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Xiaojiang J. Pan , Eckehard D. Onkels , Richard M. Ness , Daniel J. W. Brown
IPC分类号： H01S322
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

60. 发明授权

US06566668B2 Plasma focus light source with tandem ellipsoidal mirror units 有权
公开(公告)号：US06566668B2
公开(公告)日：2003-05-20
申请号：US09875721
申请日：2001-06-06
申请人： John E. Rauch , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx , Richard L. Sandstrom , Stephan T. Melnychuk
发明人： John E. Rauch , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx , Richard L. Sandstrom , Stephan T. Melnychuk
IPC分类号： H05H104
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.

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