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51. 发明申请

US20110180721A1 SYSTEM, METHOD AND APPARATUS FOR MULTI-BEAM LITHOGRAPHY INCLUDING A DISPENSER CATHODE FOR HOMOGENEOUS ELECTRON EMISSION 有权
标题翻译：包含用于均质电子发射的分配器阴极的多光束光刻的系统，方法和装置
公开(公告)号：US20110180721A1
公开(公告)日：2011-07-28
申请号：US13082333
申请日：2011-04-07
申请人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
发明人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
IPC分类号： H01J3/14 , H01J1/28 , H01T23/00
CPC分类号： H01J37/065 , B82Y10/00 , B82Y40/00 , H01J1/28 , H01J37/3177 , H01J2237/3175 , H01J2237/31754 , H01J2237/31774
摘要： A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
摘要翻译：分配器阴极，其包括排放表面，用于材料释放的储存器，当被加热时，功能降低颗粒和至少一个通道，用于允许功能降低颗粒从所述储存器扩散到所述发射表面，所述发射表面包括至少一个发射区域和至少一个覆盖有发射抑制材料并且围绕每个发射区域的非发射区域，所述非发射区域包括将所述储层与所述非发射区域连接的至少一个通道，并在从放射区域的扩散长度距离，用于允许功能降低颗粒从所述储存器扩散到所述发射区域。

52. 发明申请

US20110163244A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20110163244A1
公开(公告)日：2011-07-07
申请号：US13050875
申请日：2011-03-17
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J3/14
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。进一步阐述，透镜与限流孔结合，相对于所述结构的透镜对准，使得由所述透镜中的所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

53. 发明授权

US07859760B2 Method and apparatus for imaging 有权
标题翻译：成像方法和装置
公开(公告)号：US07859760B2
公开(公告)日：2010-12-28
申请号：US12339551
申请日：2008-12-19
申请人： Bob van Someren , Pieter Kruit
发明人： Bob van Someren , Pieter Kruit
IPC分类号： G02B27/10
CPC分类号： H01J29/488 , G02B3/0056 , Y10S359/90
摘要： A method for forming an image of a beam source that during operation provides a beam, and wherein the beam is split so as to divide the beam into beamlets, wherein a redirecting organ is used with which each individual beamlet is redirected to a predetermined degree with the extent of redirection of each beamlet by means of the redirecting organ depending on the distance of that beamlet to a central axis of the beam, such that the beamlets converge in a common point with the beamlets from the beam source being focused to foci located in the redirecting organ, and with the beamlets originating from these foci being focused in the common imaging point.
摘要翻译：一种在操作期间形成光束源的图像的方法提供一个光束，并且其中光束被分割以将光束分成子束，其中使用重定向器件，每个单独的子束通过该重定向器被重定向到预定的程度，取决于该子束到该光束的中心轴的距离，通过重定向装置重定向每个子束的程度，使得子束在与源光束的子束被聚焦到位于重定向器官以及源自这些灶的子束被聚焦在共同的成像点中。

54. 发明申请

US20100219357A1 SYSTEM, METHOD AND APPARATUS FOR MULTI-BEAM LITHOGRAPHY INCLUDING A DISPENSER CATHODE FOR HOMOGENEOUS ELECTRON EMISSION 有权
标题翻译：包含用于均质电子发射的分配器阴极的多光束光刻的系统，方法和装置
公开(公告)号：US20100219357A1
公开(公告)日：2010-09-02
申请号：US12750619
申请日：2010-03-30
申请人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
发明人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
IPC分类号： H01J37/30 , H01J1/28
CPC分类号： H01J37/065 , B82Y10/00 , B82Y40/00 , H01J1/28 , H01J37/3177 , H01J2237/3175 , H01J2237/31754 , H01J2237/31774
摘要： A dispenser cathode which is comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, and emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
摘要翻译：分配器阴极，其包括排放表面，用于材料释放的储存器，当加热时，功能降低颗粒和用于允许功能降低颗粒从所述储存器扩散到所述排放表面的至少一个通道，以及发射表面包括至少一个发射区域和被发射抑制材料覆盖并围绕每个发射区域的至少一个非发射区域，所述非发射区域包括将所述储层与所述非发射区域连接的至少一个通道并在与发射区域的扩散长度距离，用于允许作业功能降低颗粒从所述储存器扩散到所述发射区域。

55. 发明授权

US07772564B2 Particle-optical apparatus equipped with a gas ion source 有权
标题翻译：配备气体离子源的粒子光学仪器
公开(公告)号：US07772564B2
公开(公告)日：2010-08-10
申请号：US11709303
申请日：2007-02-21
申请人： Pieter Kruit , Vipin Nagnath Tondare
发明人： Pieter Kruit , Vipin Nagnath Tondare
IPC分类号： H01J27/02
CPC分类号： H01J27/205 , H01J37/08 , H01J2237/0807 , H01J2237/082
摘要： The invention relates to an electron impact gas ion with high brightness and low energy spread. This high brightness is achieved by injecting electrons in a small ionization volume (from less than 1 μm to several tens of micrometers in size) from one side and extracting ions from the other. The electrons injected are produced by a high brightness electron source, such as a field emitter or a Schottky emitter.In one embodiment of the invention the required high electron density in the ionization volume is realized by placing a field emitter close to the ionization volume (e.g. 30 μm), without optics between source and ionization volume.In another embodiment of the invention the source is imaged onto a MEMS structure. Two small diaphragms of e.g. 50 nm are spaced e.g. 1 μm apart. The electrons enter through one of these diaphragms, while the ions leave the ionization volume through the other one. The two diaphragms are manufactured by e.g. drilling with an ion beam, resulting in two small and well aligned diaphragms.
摘要翻译：本发明涉及具有高亮度和低能量扩散的电子冲击气体离子。通过从一侧注入小电离体积（小于1μm至数十微米）的电子并从另一侧提取离子来实现该高亮度。注入的电子通过高亮度电子源产生，例如场发射体或肖特基发射极。在本发明的一个实施方案中，电离体积中所需的高电子密度通过将场致发射体靠近离子化体积（例如30μm）放置，而不需要源和电离体积之间的光学元件。在本发明的另一个实施例中，源被成像到MEMS结构上。两个小的隔膜。 50nm间隔开。相距1μm。电子通过这些隔膜中的一个进入，而离子离开离子化体积通过另一个。两个隔膜由例如，用离子束进行钻孔，产生两个小且良好对准的膜片。

56. 发明申请

US20080158537A1 OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM 审中-公开
公开(公告)号：US20080158537A1
公开(公告)日：2008-07-03
申请号：US12041635
申请日：2008-03-03
申请人： Jan-Jaco Marco Wieland , Johannes Christiaan Van 't Spijker , Remco Jager , Pieter Kruit
发明人： Jan-Jaco Marco Wieland , Johannes Christiaan Van 't Spijker , Remco Jager , Pieter Kruit
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

57. 发明授权

US07348567B1 Apparatus for generating a plurality of beamlets 有权
标题翻译：用于产生多个子束的装置
公开(公告)号：US07348567B1
公开(公告)日：2008-03-25
申请号：US11545975
申请日：2006-10-10
申请人： Pieter Kruit
发明人： Pieter Kruit
IPC分类号： H01J37/04
CPC分类号： H01J3/07 , B82Y10/00 , B82Y40/00 , H01J37/063 , H01J37/12 , H01J37/153 , H01J37/3174 , H01J37/3177 , H01J2237/1205 , H01J2237/151 , H01J2237/1536 , H01J2237/26 , H01J2237/31774
摘要： The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.
摘要翻译：本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述透镜阵列位于所述带电粒子源和所述会聚装置之间。以这种方式，可以减小会聚装置的像差。

58. 发明申请

US20070138403A1 Particle optical apparatus 审中-公开
标题翻译：粒子光学仪器
公开(公告)号：US20070138403A1
公开(公告)日：2007-06-21
申请号：US10569963
申请日：2004-08-02
申请人： Dane Cubric , Pieter Kruit
发明人： Dane Cubric , Pieter Kruit
IPC分类号： H01J1/50
CPC分类号： H01J37/05 , H01J37/09 , H01J37/263 , H01J2237/045 , H01J2237/0453 , H01J2237/0455 , H01J2237/0456 , H01J2237/0458
摘要： A particle optical apparatus including an aperture plate for shaping a particle beam before the particle beam enters a monochromator filter assembly. The aperture plate has at least one aperture and is adjustable with respect to the monochromator filter assembly, in normal operating conditions, so that the size of the aperture used to shape the particle beam can be varied, and therefore the beam current entering the filter assembly can be varied.
摘要翻译：一种粒子光学装置，包括用于在粒子束进入单色器过滤器组件之前成形粒子束的孔板。孔板具有至少一个孔，并且在正常操作条件下可相对于单色仪滤光器组件可调节，使得用于成形粒子束的孔的尺寸可以改变，因此射入电流进入过滤组件可以变化。

59. 发明申请

US20070029509A1 Apparatus for generating a plurality of beamlets 有权
标题翻译：用于产生多个子束的装置
公开(公告)号：US20070029509A1
公开(公告)日：2007-02-08
申请号：US11545976
申请日：2006-10-10
申请人： Pieter Kruit
发明人： Pieter Kruit
IPC分类号： G21K5/10
CPC分类号： H01J3/07 , B82Y10/00 , B82Y40/00 , H01J37/063 , H01J37/12 , H01J37/153 , H01J37/3174 , H01J37/3177 , H01J2237/1205 , H01J2237/151 , H01J2237/1536 , H01J2237/26 , H01J2237/31774
摘要： The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
摘要翻译：本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述透镜阵列位于所述带电粒子源和所述会聚装置之间。以这种方式，可以减小会聚装置的像差。

60. 发明申请

US20070018112A1 Apparatus for generating a plurality of beamlets 有权
公开(公告)号：US20070018112A1
公开(公告)日：2007-01-25
申请号：US11527206
申请日：2006-09-25
申请人： Pieter Kruit
发明人： Pieter Kruit
IPC分类号： H01J3/14 , G21K1/08
CPC分类号： H01J3/07 , B82Y10/00 , B82Y40/00 , H01J37/063 , H01J37/12 , H01J37/153 , H01J37/3174 , H01J37/3177 , H01J2237/1205 , H01J2237/151 , H01J2237/1536 , H01J2237/26 , H01J2237/31774
摘要： The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

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