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51. 发明授权

US08137869B2 Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby 有权
标题翻译：光学元件，光刻设备，用于制造和/或保护光学元件的方法，由此制造的器件制造方法和器件
公开(公告)号：US08137869B2
公开(公告)日：2012-03-20
申请号：US10936716
申请日：2004-09-09
申请人： Levinus Pieter Bakker
发明人： Levinus Pieter Bakker
IPC分类号： G02B27/44 , G02B5/18
CPC分类号： G03F7/70958 , G03F7/70575 , G03F7/70983
摘要： A method for manufacturing and/or protecting an optical element, wherein the optical element has at least one surface comprising a profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, includes providing a transmissive layer in the cavities and on the elevations of the optical elements, the transmissive layer having a first height in the cavities that is larger than the predetermined maximum height difference, and surfacing the transmissive layer after providing the transmissive layer such that the transmissive layer has a second height on the elevations that is substantially zero or larger, thereby providing a transmissive layer with a substantially planar surface.
摘要翻译：一种用于制造和/或保护光学元件的方法，其中所述光学元件具有包括具有高度差的轮廓的至少一个表面，从而提供具有预定最大高度差的空腔和高度，包括在所述空腔中和在所述腔光学元件的高度，透射层在空腔中具有大于预定最大高度差的第一高度，并且在提供透射层之后，使透射层铺展，使得透射层在高度上具有第二高度，基本上为零或更大，由此提供具有基本平坦表面的透射层。

52. 发明授权

US08129702B2 Radiation system with contamination barrier 失效
标题翻译：具有污染屏障的辐射系统
公开(公告)号：US08129702B2
公开(公告)日：2012-03-06
申请号：US12771466
申请日：2010-04-30
申请人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
发明人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
IPC分类号： G21F1/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.
摘要翻译：辐射系统包括被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎片的污染屏障。污染屏障包括多个薄片。薄片的表面包括材料。辐射系统还包括被配置成收集来自污染屏障的辐射的收集器。收集器的光学表面包括与薄片表面的材料相同的材料。

53. 发明申请

US20110121665A1 POWER SUPPLY APPARATUS 审中-公开
标题翻译：电源设备
公开(公告)号：US20110121665A1
公开(公告)日：2011-05-26
申请号：US13054552
申请日：2009-07-13
申请人： Chenyang Liu , Hendrikus Albertus Adrianus Maria de Ruijter , Levinus Pieter Bakker
发明人： Chenyang Liu , Hendrikus Albertus Adrianus Maria de Ruijter , Levinus Pieter Bakker
IPC分类号： H02J9/00
CPC分类号： H02J7/00
摘要： To solve or mitigate the problem of lacking the “last mile” connection to a power grid, the invention provides a power supply apparatus for supplying electric energy to a plurality of devices. The apparatus comprises a power dock (130) configured to electrically couple to a power pack (110), wherein the power pack is configured to store electric energy; and a plurality of connectors each being configured to supply electric energy from the power dock to one of the plurality of devices (132, 134, 136). By utilizing the power pack, particularly a removable super capacitor (112), accessing power becomes easier for those people living away from power grids or suffering from an unstable power supply.
摘要翻译：为了解决或减轻与电网的“最后一英里”连接缺乏的问题，本发明提供一种用于向多个设备提供电能的电源装置。该装置包括被配置为电耦合到电源组（110）的功率坞（130），其中所述电源组被配置为存储电能; 以及多个连接器，每个连接器被配置为将电能从功率基座提供给多个设备（132,134,136）中的一个。通过利用动力组件，特别是可移除的超级电容器（112），对于远离电网或遭受不稳定电源的人来说，接入电力变得更容易。

54. 发明申请

US20100238311A1 IMAGING DEVICE 审中-公开
标题翻译：成像装置
公开(公告)号：US20100238311A1
公开(公告)日：2010-09-23
申请号：US12161187
申请日：2007-01-16
申请人： Aleksey Kolesnychenko , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
发明人： Aleksey Kolesnychenko , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
IPC分类号： H04N5/228
CPC分类号： G02B27/46 , G02B27/58 , G06E3/00
摘要： An imaging device for forming an image of a sample object includes an optical device and a processing unit. The optical device captures a Fourier spectrum of an object. The processing unit is arranged for processing the Fourier spectrum from the optical device and is adapted for determining the image of the sample object from the intensity of the Fourier spectrum of the sample object and the intensity of the Fourier spectrum of a combination of the sample object and a reference object.
摘要翻译：用于形成样本物体的图像的成像装置包括光学装置和处理单元。光学器件捕获对象的傅里叶谱。处理单元被布置用于从光学装置处理傅立叶频谱，并且适于根据样本对象的傅立叶频谱的强度和样本对象的组合的傅里叶谱的强度来确定样本对象的图像和参考对象。

55. 发明授权

US07776390B2 Filter window manufacturing method 有权
标题翻译：过滤窗制造方法
公开(公告)号：US07776390B2
公开(公告)日：2010-08-17
申请号：US11878989
申请日：2007-07-30
申请人： Ralph Kurt , Levinus Pieter Bakker
发明人： Ralph Kurt , Levinus Pieter Bakker
IPC分类号： B05D5/06
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24 , G21K1/10
摘要： A filter window manufacturing method includes fabricating a structure of wires on a substrate, depositing a lacquer over the wires and the substrate, depositing a first layer that includes a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C and combinations thereof, removing the lacquer, removing the substrate, and baking the first layer.
摘要翻译：一种滤光器窗口制造方法，包括在基板上制造导线的结构，在导线和基板上沉积漆，沉积第一层，该第一层包括选自由AlN，Ru，Ir，Au，SiN，Rh ，C及其组合，除去漆，除去基材，并烘烤第一层。

56. 发明申请

US20080309940A1 Method of, System For, and Medical Image Acquisition System For Imaging an Interior of a Turbid Medium Taking Into Account the Geometry of the Turbid Medium 审中-公开
公开(公告)号：US20080309940A1
公开(公告)日：2008-12-18
申请号：US12094698
申请日：2006-11-20
申请人： Martinus Bernardus Van Der Mark , Michael Cornelis Van Beek , Levinus Pieter Bakker
发明人： Martinus Bernardus Van Der Mark , Michael Cornelis Van Beek , Levinus Pieter Bakker
IPC分类号： G01N21/00
CPC分类号： G01N21/4795 , G01N2021/1787 , G01N2021/4766 , G01N2021/6439
摘要： The invention relates to a method of imaging an interior of a turbid medium (45) comprising the following steps: accommodation of the turbid medium (45) inside a receiving volume (20); coupling transmission input light (65) from a transmission light source into the receiving volume (12), with said transmission input light (65) being chosen such that it is capable of propagating through the turbid medium (45) and with at least a part of said transmission input light (65) passing through a matching medium (50) in the receiving volume (12), said matching medium (50) being chosen to reduce optical boundary effects at an interface between the turbid medium (45) and its surroundings; detection of transmission output light emanating from the receiving volume as a result of coupling transmission input light (65) from the transmission light source into the receiving volume (12) through use of a transmission photodetector unit. The invention also relates to a system for imaging an interior of a turbid medium (45) and a medical image acquisition system both using the method. According to the invention, the method, system for imaging an interior of a turbid medium (45), and medical image acquisition system are adapted such that data relating to the exterior of the turbid medium (45) can be obtained. This object is realized in that the method further comprises the following additional steps: coupling geometry input light (70, 75, 80) from a geometry light source into the receiving volume (12), with the receiving volume comprising the turbid medium (45), with the receiving volume (12) further comprising a geometry medium (60) for surrounding the turbid medium (45) during coupling of geometry input light (70, 75, 80) into the receiving volume (12), and with the combination of the geometry input light (70, 75, 80), the geometry medium (60), and the interface being chosen for creating a contrast between the turbid medium and its surroundings; —detection of the contrast between the turbid medium (45) and its surroundings; reconstructing an image of an interior of the turbid medium (45) using the detected contrast.

57. 发明授权

US07414251B2 Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system 失效
标题翻译：用于提供可操作的滤波器系统的方法，用于从辐射束，滤波器系统，装置和包括滤波器系统的光刻设备中过滤颗粒
公开(公告)号：US07414251B2
公开(公告)日：2008-08-19
申请号：US11317240
申请日：2005-12-27
申请人： Levinus Pieter Bakker
发明人： Levinus Pieter Bakker
IPC分类号： H05G2/00
CPC分类号： H05G2/001 , G03F7/70916
摘要： A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first position of a mounting assembly, and substantially stretching the slack foil or wire at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates.
摘要翻译：公开了一种提供用于在光刻中从辐射束中过滤颗粒的可操作的过滤系统的方法。该方法包括提供用于拦截颗粒的松弛箔或线，将箔或线的至少第一点或一侧安装到安装组件的第一位置，并且至少在松弛的箔或线的束辐射，基本上平行于辐射传播的方向。

58. 发明授权

US07405825B2 Optical analysis system 失效
标题翻译：光学分析系统
公开(公告)号：US07405825B2
公开(公告)日：2008-07-29
申请号：US10539540
申请日：2003-12-19
申请人： Frank Jeroen Pieter Schuurmans , Michael Cornelis Van Beek , Levinus Pieter Bakker , Wouter Harry Jacinth Rensen , Bernardus Hendrikus Wilhelmus Hendriks , Robert Frans Maria Hendriks , Thomas Steffen
发明人： Frank Jeroen Pieter Schuurmans , Michael Cornelis Van Beek , Levinus Pieter Bakker , Wouter Harry Jacinth Rensen , Bernardus Hendrikus Wilhelmus Hendriks , Robert Frans Maria Hendriks , Thomas Steffen
IPC分类号： G01J3/32 , G01J3/457 , G02B26/02
CPC分类号： G01J3/02 , G01J3/0205 , G01J3/021 , G01J3/10 , G01J3/28 , G01J3/36 , G01N21/274 , G01N21/31 , G01N2021/3196 , G01N2201/129
摘要： The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detecting the weighed optical signal. The optical analysis system (20) may further comprise a dispersive element (2) for spectrally dispersing the optical signal, the multivariate optical element being arranged to receive the dispersed optical signal. The blood analysis system (40) comprises the optical analysis system (20) according to the invention.
摘要翻译：用于确定光信号的主分量的幅度的光学分析系统（20）包括用于反射光信号并由此通过光谱称重功能称重光信号的多元光学元件（10） 9 P，9 N），用于检测加权的光信号。光学分析系统（20）还可以包括用于光谱分散光学信号的色散元件（2），所述多元光学元件被布置成接收分散的光信号。血液分析系统（40）包括根据本发明的光学分析系统（20）。

59. 发明授权

US07382436B2 Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：镜面，光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US07382436B2
公开(公告)日：2008-06-03
申请号：US10887306
申请日：2004-07-09
申请人： Levinus Pieter Bakker
发明人： Levinus Pieter Bakker
IPC分类号： G03B27/54 , G03B27/42 , G02B17/00
CPC分类号： G03F7/70958 , G02B5/09 , G02B5/1861 , G21K1/06
摘要： A mirror has a mirror surface, wherein the mirror surface includes a protrusion including a material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, or a first protrusion including a first material selected from at least one of Be, B, C, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and a second protrusion including a second material selected from at least one of Be, B, C, Si, P, S, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Nb, Mo, Ba, La, Ce, Pr, Pa and U, and the first and second materials are not the same. A lithographic projection apparatus includes such a mirror. A device manufacturing method includes reflecting a beam of radiation by use of such a mirror. A device is manufactured according to the method.
摘要翻译：反射镜具有镜面，其中镜面包括包括选自Be，B，C，P，S，K，Ca，Sc，Br，Rb，Sr，Y，Zr，Nb中的至少一种的材料的突起 Mo，Ba，La，Ce，Pr，Pa和U，或包含选自Be，B，C，P，S，K，Ca，Sc，Br，Rb，Sr中的至少一种的第一材料的第一突起，Y，Zr，Nb，Mo，Ba，La，Ce，Pr，Pa和U，以及第二突起，其包括选自Be，B，C，Si，P，S，K，Ca中的至少一种的第二材料，Sc，Br，Rb，Sr，Y，Zr，Nb，Mo，Ba，La，Ce，Pr，Pa和U，第一和第二材料不相同。光刻投影装置包括这样的反射镜。一种器件制造方法包括通过使用这种反射镜来反射辐射束。根据该方法制造装置。

60. 发明授权

US07309869B2 Lithographic apparatus, device manufacturing method and radiation system 有权
标题翻译：光刻设备，设备制造方法和辐射系统
公开(公告)号：US07309869B2
公开(公告)日：2007-12-18
申请号：US11127312
申请日：2005-05-12
申请人： Ralph Kurt , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
发明人： Ralph Kurt , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
IPC分类号： G03B27/52
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/7005 , G21K1/06
摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.
摘要翻译：光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜。照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。辐射源可以可操作地发射EUV波长范围内的辐射。

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